Movable magnets

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CPC
H01J37/3455

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3455Movable magnets

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Movable magnet array for magnetron sputtering
- Patent number 12,191,128
- Issue date Jan 7, 2025
- Intellivation LLC
- Michael G. Simmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,176,253
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron design for improved bottom coverage and uniformity
- Patent number 12,176,191
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Cory Lafollett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,163,215
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition into trenches and vias
- Patent number 12,154,770
- Issue date Nov 26, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 12,094,698
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 12,094,699
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for adjustable coating using magnetron sputtering...
- Patent number 12,062,531
- Issue date Aug 13, 2024
- Interpane Entwicklungs-und Beratungsgesellschaft mbH
- Dominik Wagner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and apparatus
- Patent number 12,027,353
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus
- Patent number 11,978,615
- Issue date May 7, 2024
- Samsung Display Co., Ltd.
- Hyun-Woo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tilted PVD source with rotating pedestal
- Patent number 11,948,784
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Harish Penmethsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,932,934
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and a method of controlling thickness variation in a mate...
- Patent number 11,913,109
- Issue date Feb 27, 2024
- SPTS Technologies Limited
- Tony Wilby
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering apparatus and magnetron sputtering method
- Patent number 11,901,166
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Tetsuya Miyashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for extended chamber for through silicon via...
- Patent number 11,846,013
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- David Gunther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 11,821,068
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering a layer on a substrate using a high-energy density plasm...
- Patent number 11,823,859
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,810,770
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tilted magnetron in a PVD sputtering deposition chamber
- Patent number 11,784,032
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Lizhong Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,784,033
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Mengxue Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,761,078
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Mengxue Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system and method
- Patent number 11,728,226
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 11,688,591
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for depositing aluminum by physical vapor dep...
- Patent number 11,670,485
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Siew Kit Hoi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Depositing apparatus
- Patent number 11,646,180
- Issue date May 9, 2023
- Samsung Display Co., Ltd.
- Kwanyong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of coating a substrate and coating apparatus for coating a s...
- Patent number 11,624,110
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Hyun Chan Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode unit and film forming apparatus
- Patent number 11,581,171
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming system and method for forming film on substrate
- Patent number 11,542,592
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modifiable magnet configuration for arc vaporization sources
- Patent number 11,535,928
- Issue date Dec 27, 2022
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Siegfried Krassnitzer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Magnetron Design for Improved Bottom Coverage and Uniformity
- Publication number 20240290593
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Cory LAFOLLETT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY
- Publication number 20240282558
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Sathiyamurthi GOVINDASAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION DEVICE
- Publication number 20240274420
- Publication date Aug 15, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SHIMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240258088
- Publication date Aug 1, 2024
- SAMSUNG DISPLAY CO., LTD.
- HYUN-WOO KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS APPARATUS
- Publication number 20240212980
- Publication date Jun 27, 2024
- Samsung Electronics Co., Ltd.
- Jaesuk KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...
- Publication number 20240191340
- Publication date Jun 13, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yujie GENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20240183027
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Naoki TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE
- Publication number 20240170269
- Publication date May 23, 2024
- Applied Materials, Inc.
- Harish PENMETHSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS
- Publication number 20240136156
- Publication date Apr 25, 2024
- Evatec AG
- Stephan VOSER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM DEPOSITION INTO TRENCHES AND VIAS
- Publication number 20240021421
- Publication date Jan 18, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...
- Publication number 20240021423
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Yasuhiko KOJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20230402271
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20230352350
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Hao CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20230307218
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cathode Unit for Magnetron Sputtering Apparatus and Magnetron Sputt...
- Publication number 20230207295
- Publication date Jun 29, 2023
- Ulvac, Inc.
- Toshiya Aoyagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS AND MAGNETRON MECHANISM
- Publication number 20230170196
- Publication date Jun 1, 2023
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yujie YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNET SYSTEM, SPUTTERING DEVICE AND HOUSING COVER
- Publication number 20230154734
- Publication date May 18, 2023
- VON ARDENNE Asset GmbH & Co. KG
- Thorsten SANDER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAY
- Publication number 20230097276
- Publication date Mar 30, 2023
- Evatec AG
- Mohamed ELGHAZZALI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION PROCESS APPARATUS AND METHOD OF OPTIMIZIN...
- Publication number 20230067466
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hung LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR APPARATUS AND MAGNETIC STRUCTURE OF SEMICONDUCTOR APP...
- Publication number 20230055004
- Publication date Feb 23, 2023
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Zhenduo YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING
- Publication number 20230052340
- Publication date Feb 16, 2023
- INTELLIVATION LLC
- Michael G. Simmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20230035198
- Publication date Feb 2, 2023
- SAMSUNG DISPLAY CO., LTD.
- HYUN-WOO KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...
- Publication number 20230002885
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD,...
- Publication number 20220415634
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Kenichi Imakita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220380883
- Publication date Dec 1, 2022
- Mengxue WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220384165
- Publication date Dec 1, 2022
- Mengxue WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20220367161
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING MET...
- Publication number 20220301837
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Akitsugu HATAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PERFORMING SPUTTERING PROCESS AND METHOD THEREOF
- Publication number 20220270866
- Publication date Aug 25, 2022
- TOKYO ELECTRON LIMITED
- Tetsuya MIYASHITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...
- Publication number 20220195585
- Publication date Jun 23, 2022
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Movable magnets

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Movable magnet array for magnetron sputtering

Deposition system and method

Magnetron design for improved bottom coverage and uniformity

Film forming apparatus and film forming method

Physical vapor deposition process apparatus and method of optimizin...

Vacuum deposition into trenches and vias

Physical vapor deposition apparatus and method thereof

Methods and apparatus for controlling ion fraction in physical vapo...

Method and system for adjustable coating using magnetron sputtering...

Substrate processing method and apparatus

Sputtering apparatus

Tilted PVD source with rotating pedestal

Method for particle removal from wafers through plasma modification...

Apparatus and a method of controlling thickness variation in a mate...

Magnetron sputtering apparatus and magnetron sputtering method

Methods and apparatus for extended chamber for through silicon via...

Magnetically enhanced high density plasma-chemical vapor deposition...

Sputtering a layer on a substrate using a high-energy density plasm...

Methods and apparatus for controlling ion fraction in physical vapo...

Tilted magnetron in a PVD sputtering deposition chamber

Methods and apparatus for processing a substrate

Methods and apparatus for processing a substrate

Deposition system and method

Physical vapor deposition apparatus and method thereof

Methods and apparatus for depositing aluminum by physical vapor dep...

Depositing apparatus

Method of coating a substrate and coating apparatus for coating a s...

Cathode unit and film forming apparatus

Film forming system and method for forming film on substrate

Modifiable magnet configuration for arc vaporization sources

Patents Applicationslast 30 patents

Magnetron Design for Improved Bottom Coverage and Uniformity

PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY

FILM FORMATION METHOD AND FILM FORMATION DEVICE

SPUTTERING APPARATUS

PLASMA PROCESS APPARATUS

BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE

SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS

VACUUM DEPOSITION INTO TRENCHES AND VIAS

FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

DEPOSITION SYSTEM AND METHOD

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

Cathode Unit for Magnetron Sputtering Apparatus and Magnetron Sputt...

SEMICONDUCTOR PROCESSING APPARATUS AND MAGNETRON MECHANISM

MAGNET SYSTEM, SPUTTERING DEVICE AND HOUSING COVER

APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAY

PHYSICAL VAPOR DEPOSITION PROCESS APPARATUS AND METHOD OF OPTIMIZIN...

SEMICONDUCTOR APPARATUS AND MAGNETIC STRUCTURE OF SEMICONDUCTOR APP...

MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING

SPUTTERING APPARATUS

METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...

FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD,...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING MET...

APPARATUS FOR PERFORMING SPUTTERING PROCESS AND METHOD THEREOF

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...