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C23C16/45589

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

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C23C16/45589Movable means

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,116,666
- Issue date Oct 15, 2024
- Kokusai Electric Corporation
- Daigi Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of using high density plasma chemical vapor deposition chamber
- Patent number 12,020,905
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ching Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for manufacturing semiconductor
- Patent number 11,929,263
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,913,115
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Yoshitaka Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,804,366
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD apparatus, method and valve
- Patent number 11,761,082
- Issue date Sep 19, 2023
- Picosun Oy
- Marko Pudas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for controlling concentration of precursors t...
- Patent number 11,753,715
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Kenric Choi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for conducting plasma surface treatment, board treatment...
- Patent number 11,728,142
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Junyoung Oh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for improving chemical utilization rate in de...
- Patent number 11,713,508
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum systems in semiconductor fabrication facilities
- Patent number 11,525,185
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Fa Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for improving chemical utilization rate in de...
- Patent number 11,396,703
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma chemical vapor deposition chamber and method of...
- Patent number 11,342,164
- Issue date May 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ching Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus for containers
- Patent number 11,274,061
- Issue date Mar 15, 2022
- Arkema B.V.
- Bram Van Dis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Axisymmetric material deposition from plasma assisted by angled gas...
- Patent number 11,261,522
- Issue date Mar 1, 2022
- Diamond Foundry Inc.
- Jeremy Scholz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Actuator to adjust dynamically showerhead tilt in a semiconductor-p...
- Patent number 11,230,765
- Issue date Jan 25, 2022
- Lam Research Corporation
- John Wiltse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,208,721
- Issue date Dec 28, 2021
- Tokyo Electron Limited
- Kohei Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shadow ring for modifying wafer edge and bevel deposition
- Patent number 11,136,665
- Issue date Oct 5, 2021
- Applied Materials, Inc.
- Dale Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,101,114
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,098,405
- Issue date Aug 24, 2021
- TOSHIBA MEMORY CORPORATION
- Hideaki Masuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling an adjustable nozzle and method of making a s...
- Patent number 10,910,199
- Issue date Feb 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ching Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of aluminum oxide etch stop layers
- Patent number 10,804,144
- Issue date Oct 13, 2020
- Lam Research Corporation
- Meliha Gozde Rainville
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active showerhead
- Patent number 10,804,079
- Issue date Oct 13, 2020
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 10,786,837
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Yukimasa Saito
- B08 - CLEANING
Information Patent Grant
Reaction chamber for chemical vapor apparatus
- Patent number 10,704,145
- Issue date Jul 7, 2020
- KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Chul Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing atomic layers on a substrate
- Patent number 10,676,822
- Issue date Jun 9, 2020
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Adrianus Johannes Petrus Maria Vermeer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of Aluminum oxide etch stop layers
- Patent number 10,665,501
- Issue date May 26, 2020
- Lam Research Corporation
- Meliha Gozde Rainville
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 10,612,141
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Variable conductance gas distribution apparatus and method
- Patent number 10,561,975
- Issue date Feb 18, 2020
- ASM IP Holdings B.V.
- John Kevin Shugrue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus with concentric pumping for multiple pressure regimes
- Patent number 10,559,451
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Nikolai Nikolaevich Kalnin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed gas multiple line supply system and substrate processing appa...
- Patent number 10,550,471
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Shinobu Kawamorita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER DEPOSITING APPARATUS AND ATOMIC LAYER DEPOSITING METHO...
- Publication number 20240352581
- Publication date Oct 24, 2024
- NEXUSBE CO., LTD
- Hag Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS CHAMBER VOLUME ADJUSTMENT
- Publication number 20240218514
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Christopher Falcone
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE HARDWARE TO CONTROL RADIAL FLOW DISTRIBUTION IN A PROCESSIN...
- Publication number 20240209506
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION APPARATUSES FOR IMPROVING MIXING UNIFORMITY
- Publication number 20240068095
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Youngki Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSOR SUPPLY SYSTEM
- Publication number 20240035159
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Kyungrim KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD APPARATUS, METHOD AND VALVE
- Publication number 20230383404
- Publication date Nov 30, 2023
- Picosun Oy
- Marko PUDAS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...
- Publication number 20230343560
- Publication date Oct 26, 2023
- New Power Plasma Co., Ltd.
- Junyoung Oh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230272523
- Publication date Aug 31, 2023
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEPOSITION METHOD AND SEMICONDUCTOR DEPOSITION SYSTEM
- Publication number 20230054190
- Publication date Feb 23, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lifeng QIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN-FILM-DEPOSITION EQUIPMENT
- Publication number 20220415623
- Publication date Dec 29, 2022
- SKY TECH INC.
- JING-CHENG LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Systems in Semiconductor Fabrication Facilities
- Publication number 20220356567
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Fa Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Methods for Improving Chemical Utilization Rate in De...
- Publication number 20220316061
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF USING HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION CHAMBER
- Publication number 20220270855
- Publication date Aug 25, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Ching WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220243322
- Publication date Aug 4, 2022
- ASM IP HOLDING B.V.
- TaeWoong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20220208530
- Publication date Jun 30, 2022
- Kokusai Electric Corporation
- Yuji TAKEBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Methods for Improving Chemical Utilization Rate in De...
- Publication number 20220195600
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR
- Publication number 20220139728
- Publication date May 5, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- YU-HSIANG CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR ZONE CONTROL FOR A PROCESSING CHAMBER
- Publication number 20220108891
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Zubin Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR CONTROLLING CONCENTRATION OF PRECURSORS T...
- Publication number 20210381104
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Kenric Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210375597
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Yuki HOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION CHAMBER AND METHOD OF...
- Publication number 20210125811
- Publication date Apr 29, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Ching WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Systems in Semiconductor Fabrication Facilities
- Publication number 20210079522
- Publication date Mar 18, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Fa Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF ALUMINUM OXIDE ETCH STOP LAYERS
- Publication number 20200251384
- Publication date Aug 6, 2020
- LAM RESEARCH CORPORATION
- Meliha Gozde Rainville
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD APPARATUS, METHOD AND VALVE
- Publication number 20200190666
- Publication date Jun 18, 2020
- Picosun Oy
- Marko PUDAS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACTUATOR TO ADJUST DYNAMICALLY SHOWERHEAD TILT IN A SEMICONDUCTOR-...
- Publication number 20200181776
- Publication date Jun 11, 2020
- LAM RESEARCH CORPORATION
- John WILTSE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EVAPORATOR APPARATUS
- Publication number 20200176721
- Publication date Jun 4, 2020
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Zhao LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AXISYMMETRIC MATERIAL DEPOSITION FROM PLASMA ASSISTED BY ANGLED GAS...
- Publication number 20200123653
- Publication date Apr 23, 2020
- Diamond Foundry Inc.
- Jeremy Scholz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIZONE ROTATABLE DIFFUSER APPARATUS
- Publication number 20190309418
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Akshay GUNAJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIN CONTAINER COATING DEVICE
- Publication number 20190249304
- Publication date Aug 15, 2019
- NISSEI ASB MACHINE CO., LTD.
- Kiyonori Shimada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION
- Publication number 20190153592
- Publication date May 23, 2019
- Applied Materials, Inc.
- Dale Du BOIS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Movable means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus and method of manufacturing semicond...

Method of using high density plasma chemical vapor deposition chamber

Method and system for manufacturing semiconductor

Substrate processing apparatus and substrate processing method

Plasma processing apparatus

ALD apparatus, method and valve

Apparatus and methods for controlling concentration of precursors t...

Apparatus for conducting plasma surface treatment, board treatment...

Apparatus and methods for improving chemical utilization rate in de...

Vacuum systems in semiconductor fabrication facilities

Apparatus and methods for improving chemical utilization rate in de...

High density plasma chemical vapor deposition chamber and method of...

Coating apparatus for containers

Axisymmetric material deposition from plasma assisted by angled gas...

Actuator to adjust dynamically showerhead tilt in a semiconductor-p...

Substrate processing apparatus

Shadow ring for modifying wafer edge and bevel deposition

Plasma processing apparatus

Film forming apparatus and film forming method

Method of controlling an adjustable nozzle and method of making a s...

Deposition of aluminum oxide etch stop layers

Active showerhead

Method for cleaning chamber of substrate processing apparatus

Reaction chamber for chemical vapor apparatus

Method and apparatus for depositing atomic layers on a substrate

Deposition of Aluminum oxide etch stop layers

Film forming apparatus

Variable conductance gas distribution apparatus and method

Apparatus with concentric pumping for multiple pressure regimes

Mixed gas multiple line supply system and substrate processing appa...

Patents Applicationslast 30 patents

ATOMIC LAYER DEPOSITING APPARATUS AND ATOMIC LAYER DEPOSITING METHO...

PROCESS CHAMBER VOLUME ADJUSTMENT

TUNABLE HARDWARE TO CONTROL RADIAL FLOW DISTRIBUTION IN A PROCESSIN...

GAS DISTRIBUTION APPARATUSES FOR IMPROVING MIXING UNIFORMITY

PRECURSOR SUPPLY SYSTEM

ALD APPARATUS, METHOD AND VALVE

APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...

DEPOSITION METHOD AND DEPOSITION APPARATUS

SEMICONDUCTOR DEPOSITION METHOD AND SEMICONDUCTOR DEPOSITION SYSTEM

THIN-FILM-DEPOSITION EQUIPMENT

Vacuum Systems in Semiconductor Fabrication Facilities

Apparatus and Methods for Improving Chemical Utilization Rate in De...

METHOD OF USING HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION CHAMBER

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

Apparatus and Methods for Improving Chemical Utilization Rate in De...

METHOD AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR

MODULAR ZONE CONTROL FOR A PROCESSING CHAMBER

APPARATUS AND METHODS FOR CONTROLLING CONCENTRATION OF PRECURSORS T...

PLASMA PROCESSING APPARATUS

HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION CHAMBER AND METHOD OF...

Vacuum Systems in Semiconductor Fabrication Facilities

DEPOSITION OF ALUMINUM OXIDE ETCH STOP LAYERS

ALD APPARATUS, METHOD AND VALVE

ACTUATOR TO ADJUST DYNAMICALLY SHOWERHEAD TILT IN A SEMICONDUCTOR-...

EVAPORATOR APPARATUS

AXISYMMETRIC MATERIAL DEPOSITION FROM PLASMA ASSISTED BY ANGLED GAS...

MULTIZONE ROTATABLE DIFFUSER APPARATUS

RESIN CONTAINER COATING DEVICE

SHADOW RING FOR MODIFYING WAFER EDGE AND BEVEL DEPOSITION