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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/024Moving components not otherwise provided for

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,875,966
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun, electron gun component, electron beam applicator, and...
- Patent number 11,842,879
- Issue date Dec 12, 2023
- Photo electron Soul Inc.
- Tomohiro Nishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collision avoidance for particle beam instruments
- Patent number 11,798,774
- Issue date Oct 24, 2023
- Oxford Instruments Nanotechnology Tools Limited
- Stuart Andrew Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,705,300
- Issue date Jul 18, 2023
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closure mechanism vacuum chamber isolation device and sub-system
- Patent number 11,530,751
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Tuan Anh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV sterilization of container, room, space or defined environment
- Patent number 11,260,138
- Issue date Mar 1, 2022
- BlueMorph, LLC
- Alexander Farren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,205,557
- Issue date Dec 21, 2021
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,177,107
- Issue date Nov 16, 2021
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collision avoidance for particle beam instruments
- Patent number 11,139,137
- Issue date Oct 5, 2021
- Oxford Instruments Nanotechnology Tools Limited
- Stuart Andrew Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,094,502
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
UV sterilization of container, room, space or defined environment
- Patent number 11,040,121
- Issue date Jun 22, 2021
- BlueMorph, LLC
- Alexander Farren
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Grant
Mirror device, mirror drive method, light irradiation device, and i...
- Patent number 10,962,768
- Issue date Mar 30, 2021
- Hamamatsu Photonics K.K.
- Akira Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation analysis apparatus
- Patent number 10,908,104
- Issue date Feb 2, 2021
- Hitachi High-Tech Science Corporation
- Satoshi Nakayama
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,879,031
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for driving member and processing apparatus
- Patent number 10,825,662
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Rumiko Moriya
- G01 - MEASURING TESTING
Information Patent Grant
Mirror device, mirror drive method, light irradiation device, and i...
- Patent number 10,761,318
- Issue date Sep 1, 2020
- Hamamatsu Photonics K.K.
- Akira Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,714,304
- Issue date Jul 14, 2020
- HITACHI HIGH-TECH CORPORATION
- Muneyuki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Retractable detector
- Patent number 10,714,305
- Issue date Jul 14, 2020
- Applied Materials Israel Ltd.
- Alon Litman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image capture assembly and method for electron back scatter diffrac...
- Patent number 10,692,689
- Issue date Jun 23, 2020
- VG Systems Limited
- Zoran Pesic
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD F...
- Publication number 20250079111
- Publication date Mar 6, 2025
- Carl Zeiss MultiSEM GmbH
- Joerg Jacobi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITION MONITORING DEVICES
- Publication number 20240274401
- Publication date Aug 15, 2024
- KLA Corporation
- James Richard Bella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
- Publication number 20240194446
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20240186107
- Publication date Jun 6, 2024
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240047184
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
- Publication number 20240038486
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ching Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
HIGH PRECISION EDGE RING CENTERING FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20230369025
- Publication date Nov 16, 2023
- LAM RESEARCH CORPORATION
- Hui Ling HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID CHAMBER
- Publication number 20230326723
- Publication date Oct 12, 2023
- TES CO., LTD.
- Jae-Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230317436
- Publication date Oct 5, 2023
- SEMES CO., LTD.
- Dukhyun Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING
- Publication number 20230317402
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Derk Ferdinand WALVOORT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF ALIGNIN...
- Publication number 20230282443
- Publication date Sep 7, 2023
- Shânêl Ondrej
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER
- Publication number 20230282439
- Publication date Sep 7, 2023
- mi2-factory GmbH
- Florian KRIPPENDORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20230260754
- Publication date Aug 17, 2023
- ASM IP HOLDING B.V.
- Doohan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...
- Publication number 20230241650
- Publication date Aug 3, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- B08 - CLEANING
Information Patent Application
PLASMA GENERATING DEVICE AND PROCESS EXECUTING APPARATUS INCLUDING...
- Publication number 20230245861
- Publication date Aug 3, 2023
- NP Holdings Co., Ltd.
- Dai Kyu CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230230817
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON GUN, ELECTRON GUN COMPONENT, ELECTRON BEAM APPLICATION DEV...
- Publication number 20230207249
- Publication date Jun 29, 2023
- PHOTO ELECTRON SOUL INC.
- Tomohiro Nishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230207282
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Shusei KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MID-RING EROSION COMPENSATION IN SUBSTRATE PROCESSING SYSTEMS
- Publication number 20230162953
- Publication date May 25, 2023
- LAM RESEARCH CORPORATION
- Hui Ling HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Storage Cassette for Replaceable Parts for Plasma Processing Apparatus
- Publication number 20230142778
- Publication date May 11, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Kin Pong Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230135026
- Publication date May 4, 2023
- SEMES CO., LTD.
- Young Hwan YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING...
- Publication number 20230129976
- Publication date Apr 27, 2023
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion Milling Device
- Publication number 20230048299
- Publication date Feb 16, 2023
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM ELECTRODE ASSEMBLY, PLASMA PROCESSING APPARATUS, AND METHOD...
- Publication number 20220165551
- Publication date May 26, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Jiangtao PEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV STERILIZATION OF CONTAINER, ROOM, SPACE OR DEFINED ENVIRONMENT
- Publication number 20220125970
- Publication date Apr 28, 2022
- BLUEMORPH, LLC
- Alexander Farren
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES

Moving components not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma generating device and process executing apparatus including...

Apparatus of plural charged-particle beams

Ion milling device

Bottom electrode assembly, plasma processing apparatus, and method...

Vacuum chamber arrangement for charged particle beam generator

Semiconductor wafer

Apparatus of plural charged-particle beams

Method and apparatus for inspection

Electron gun, electron gun component, electron beam applicator, and...

Collision avoidance for particle beam instruments

Vacuum chamber arrangement for charged particle beam generator

Method and device for implanting ions in wafers

Apparatus of plural charged-particle beams

Closure mechanism vacuum chamber isolation device and sub-system

UV sterilization of container, room, space or defined environment

Multi charged particle beam writing apparatus

Multi charged particle beam writing apparatus

Collision avoidance for particle beam instruments

Vacuum chamber arrangement for charged particle beam generator

Method and apparatus for inspection

Method and device for implanting ions in wafers

UV sterilization of container, room, space or defined environment

Mirror device, mirror drive method, light irradiation device, and i...

Radiation analysis apparatus

Apparatus of plural charged-particle beams

Method for driving member and processing apparatus

Mirror device, mirror drive method, light irradiation device, and i...

Charged particle beam apparatus

Retractable detector

Image capture assembly and method for electron back scatter diffrac...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD F...

Apparatus and Methods for Plasma Processing

SUBSTRATE POSITION MONITORING DEVICES

CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER

METHOD AND APPARATUS FOR INSPECTION

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

HIGH PRECISION EDGE RING CENTERING FOR SUBSTRATE PROCESSING SYSTEMS

HYBRID CHAMBER

SUBSTRATE PROCESSING APPARATUS

ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING

TRANSMISSION CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF ALIGNIN...

SEMICONDUCTOR WAFER

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...

PLASMA GENERATING DEVICE AND PROCESS EXECUTING APPARATUS INCLUDING...

DEPOSITION METHOD AND DEPOSITION APPARATUS

ELECTRON GUN, ELECTRON GUN COMPONENT, ELECTRON BEAM APPLICATION DEV...

PLASMA PROCESSING APPARATUS

MID-RING EROSION COMPENSATION IN SUBSTRATE PROCESSING SYSTEMS

Storage Cassette for Replaceable Parts for Plasma Processing Apparatus

SUBSTRATE PROCESSING APPARATUS

IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING...

Ion Milling Device

BOTTOM ELECTRODE ASSEMBLY, PLASMA PROCESSING APPARATUS, AND METHOD...

UV STERILIZATION OF CONTAINER, ROOM, SPACE OR DEFINED ENVIRONMENT