Multi-beam

Industry

CPC
H01J37/3177

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3177Multi-beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 12,142,453
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode mechanism of electron emission source, and method for manuf...
- Patent number 12,106,928
- Issue date Oct 1, 2024
- NuFlare Technology, Inc.
- Ryoei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern data processing for programmable direct-write apparatus
- Patent number 12,040,157
- Issue date Jul 16, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Multiple electron-beam image acquisition apparatus and multiple ele...
- Patent number 11,961,703
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Chosaku Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam device for inspection of a specimen with a pl...
- Patent number 11,961,709
- Issue date Apr 16, 2024
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data generation method, charged particle beam irradiation device, a...
- Patent number 11,942,305
- Issue date Mar 26, 2024
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,908,659
- Issue date Feb 20, 2024
- NuFlare Technology, Inc.
- Toshiki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus and methods
- Patent number 11,854,765
- Issue date Dec 26, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Embedded high-Z marker material and process for alignment of multil...
- Patent number 11,823,864
- Issue date Nov 21, 2023
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Writing data generating method, multi charged particle beam writing...
- Patent number 11,774,860
- Issue date Oct 3, 2023
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,756,766
- Issue date Sep 12, 2023
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...
- Publication number 20250006459
- Publication date Jan 2, 2025
- Carl Zeiss MultiSEM GmbH
- Daniel Weiss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
- Publication number 20240339294
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Marijke SCOTUZZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20240297010
- Publication date Sep 5, 2024
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...
- Publication number 20240282550
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242933
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20240242932
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242919
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...
- Publication number 20240242931
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242920
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...
- Publication number 20240203684
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- David Disterheft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS
- Publication number 20240145214
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING...
- Publication number 20240128051
- Publication date Apr 18, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...
- Publication number 20240128045
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION REDUCTION IN A MULTI-BEAM IMAGING SYSTEM
- Publication number 20240112884
- Publication date Apr 4, 2024
- KLA Corporation
- Michael I. Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...
- Publication number 20240079207
- Publication date Mar 7, 2024
- Carl Zeiss MultiSEM GmbH
- Michael Behnke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20240038485
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240029999
- Publication date Jan 25, 2024
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Thermal Control Device
- Publication number 20240021403
- Publication date Jan 18, 2024
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system for the removal and/or avoidance of contamination...

Multi-beam inspection apparatus

Multi-source charged particle illumination apparatus

Particle beam system and the use thereof for flexibly setting the c...

Cathode mechanism of electron emission source, and method for manuf...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Method for operating a multiple particle beam system while altering...

Multi-charged-particle-beam writing method, multi-charged-particle-...

Pattern data processing for programmable direct-write apparatus

Charged particle assessment tool, inspection method

Beam grid layout

Multiple electron-beam image acquisition apparatus and multiple ele...

Replaceable module for a charged particle apparatus

Vacuum chamber arrangement for charged particle beam generator

Charged particle beam device for inspection of a specimen with a pl...

Data generation method, charged particle beam irradiation device, a...

Multi charged particle beam writing apparatus

Massive overlay metrology sampling with multiple measurement columns

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Multi-beam writing method and multi-beam writing apparatus

Multiple charged-particle beam apparatus and methods

Blanking aperture array unit

Embedded high-Z marker material and process for alignment of multil...

Multi charged particle beam adjustment method, multi charged partic...

Charged particle assessment tool, inspection method

Aperture array with integrated current measurement

Writing data generating method, multi charged particle beam writing...

Method and system for determining a charged particle beam exposure...

Charged particle beam writing apparatus and charged particle beam w...

Method and system for the removal and/or avoidance of contamination...

Patents Applicationslast 30 patents

METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

CHARGED-PARTICLE OPTICAL DEVICE

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

Device and Method for Calibrating a Charged-Particle Beam

Method for Determining Focal Properties in a Target Beam Field of a...

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS

MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING...

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...

DISTORTION REDUCTION IN A MULTI-BEAM IMAGING SYSTEM

MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...

ELECTRON-OPTICAL DEVICE

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

Adjustable Permanent Magnetic Lens Having Thermal Control Device