Multi-beam

Industry

CPC
H01J2237/31774

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31774Multi-beam

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Multiple electron-beam image acquisition apparatus and multiple ele...
- Patent number 11,961,703
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Chosaku Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number RE49483
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,476,086
- Issue date Oct 18, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of sample preparation using dual ion beam trenching
- Patent number 11,476,120
- Issue date Oct 18, 2022
- Intel Corporation
- Purushotham Kaushik Muthur Srinath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam optical apparatus, exposure apparatus, exposu...
- Patent number 11,387,074
- Issue date Jul 12, 2022
- Nikon Corporation
- Hiroyuki Nagasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and beam evaluating m...
- Patent number 11,024,485
- Issue date Jun 1, 2021
- NuFlare Technology, Inc.
- Eita Fujisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam optical apparatus, exposure apparatus, exposu...
- Patent number 10,984,982
- Issue date Apr 20, 2021
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Writing data generation method, computer-readable recording medium...
- Patent number 10,971,331
- Issue date Apr 6, 2021
- NuFlare Technology, Inc.
- Shinji Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedthrough device and signal conductor path arrangement
- Patent number 10,916,362
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Johannes Petrus Sprengers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 10,790,115
- Issue date Sep 29, 2020
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing apparatus, and multiple char...
- Patent number 10,784,080
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing apparatus, and multiple char...
- Patent number 10,607,812
- Issue date Mar 31, 2020
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of obtaining beam deflection shape and method of obtaining a...
- Patent number 10,586,682
- Issue date Mar 10, 2020
- NuFlare Technology, Inc.
- Shunsuke Isaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatus and charged particle ray exposure apparatus
- Patent number 10,586,677
- Issue date Mar 10, 2020
- Kabushiki Kaisha Toshiba
- Shiro Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose-related feature reshaping in an exposure pattern to be exposed...
- Patent number 10,522,329
- Issue date Dec 31, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,504,696
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical systems and arrangements and particle-optical comp...
- Patent number 10,504,681
- Issue date Dec 10, 2019
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,497,539
- Issue date Dec 3, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240186100
- Publication date Jun 6, 2024
- NuFlare Technology, Inc.
- Shuji YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER FOR EMITTING CHARGED PARTICLES
- Publication number 20230154725
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230125800
- Publication date Apr 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSU...
- Publication number 20210225611
- Publication date Jul 22, 2021
- Nikon Corporation
- Hiroyuki NAGASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Beam Processing of Substrates
- Publication number 20210109450
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE ELE...
- Publication number 20200411280
- Publication date Dec 31, 2020
- NuFlare Technology, Inc.
- Chosaku Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDTHROUGH DEVICE AND SIGNAL CONDUCTOR PATH ARRANGEMENT
- Publication number 20200176151
- Publication date Jun 4, 2020
- ASML NETHERLANDS B.V.
- Johannes Petrus Sprengers
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR APPARATUS AND CHARGED PARTICLE RAY EXPOSURE APPARATUS
- Publication number 20200083016
- Publication date Mar 12, 2020
- Kabushiki Kaisha Toshiba
- Shiro Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WRITING DATA GENERATION METHOD, COMPUTER-READABLE RECORDING MEDIUM...
- Publication number 20200051782
- Publication date Feb 13, 2020
- NuFlare Technology, Inc.
- Shinji SAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND BEAM EVALUATING M...
- Publication number 20190385812
- Publication date Dec 19, 2019
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...
- Publication number 20190304749
- Publication date Oct 3, 2019
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20190198293
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...
- Publication number 20190198290
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Hideo INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...
- Publication number 20190172678
- Publication date Jun 6, 2019
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING...
- Publication number 20190096632
- Publication date Mar 28, 2019
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...
- Publication number 20190066976
- Publication date Feb 28, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20190051494
- Publication date Feb 14, 2019
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20190043693
- Publication date Feb 7, 2019
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20190027340
- Publication date Jan 24, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM DRAWING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180350552
- Publication date Dec 6, 2018
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Apparatus and methods for beam processing of substrates

Multi-charged particle beam writing apparatus, and multi-charged pa...

Beam grid layout

Multiple electron-beam image acquisition apparatus and multiple ele...

Method and system for determining a charged particle beam exposure...

Method for determining a beamlet position and method for determinin...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-beam writing method and multi-beam writing apparatus

Method of sample preparation using dual ion beam trenching

Charged particle beam optical apparatus, exposure apparatus, exposu...

Aberration correction in charged particle system

Method and system for determining a charged particle beam exposure...

Multi-charged-particle-beam writing apparatus and beam evaluating m...

Charged particle beam optical apparatus, exposure apparatus, exposu...

Writing data generation method, computer-readable recording medium...

Feedthrough device and signal conductor path arrangement

Multi charged particle beam writing method, and multi charged parti...

Multiple charged particle beam writing apparatus, and multiple char...

Charged particle beam lithography apparatus and charged particle be...

Method and system for determining a charged particle beam exposure...

Charged particle beam lithography apparatus and charged particle be...

Multiple charged particle beam writing apparatus, and multiple char...

Method of obtaining beam deflection shape and method of obtaining a...

Semiconductor apparatus and charged particle ray exposure apparatus

Dose-related feature reshaping in an exposure pattern to be exposed...

Multi charged particle beam writing apparatus and multi charged par...

Particle-optical systems and arrangements and particle-optical comp...

Multi charged particle beam writing apparatus and multi charged par...

Patents Applicationslast 30 patents

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

Multi-Beam Pattern Definition Device

EMITTER FOR EMITTING CHARGED PARTICLES

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSU...

Apparatus and Methods for Beam Processing of Substrates

MULTIPLE ELECTRON-BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE ELE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

FEEDTHROUGH DEVICE AND SIGNAL CONDUCTOR PATH ARRANGEMENT

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

SEMICONDUCTOR APPARATUS AND CHARGED PARTICLE RAY EXPOSURE APPARATUS

WRITING DATA GENERATION METHOD, COMPUTER-READABLE RECORDING MEDIUM...

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND BEAM EVALUATING M...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...

METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...

CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING...

Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

MULTI CHARGED PARTICLE BEAM DRAWING APPARATUS AND MULTI CHARGED PAR...