multiple apertures

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CPC
H01J2237/0453

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0453multiple apertures

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to correct first order astigmatism and first order distortio...
- Patent number 12,106,933
- Issue date Oct 1, 2024
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,033,830
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device for inspection of a specimen with a pl...
- Patent number 11,961,709
- Issue date Apr 16, 2024
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 11,929,232
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput multi-electron beam system
- Patent number 11,869,743
- Issue date Jan 9, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus and methods
- Patent number 11,854,765
- Issue date Dec 26, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 11,804,355
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical module for providing an off-axial electron beam wi...
- Patent number 11,804,357
- Issue date Oct 31, 2023
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, and systems and methods for operat...
- Patent number 11,798,777
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,798,776
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector
- Patent number 11,791,125
- Issue date Oct 17, 2023
- NuFlare Technology, Inc.
- Yuichi Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source with ceramic electrode plate
- Patent number 11,776,793
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Robert B. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam manipulation device and method for manipulati...
- Patent number 11,705,301
- Issue date Jul 18, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,670,477
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,657,999
- Issue date May 23, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of creating multiple electron beams
- Patent number 11,651,934
- Issue date May 16, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-resolution multiple beam source
- Patent number 11,615,938
- Issue date Mar 28, 2023
- NUFLARE TECHNOLOGY, INC.
- John Hartley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,605,523
- Issue date Mar 14, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE ELECTRON BEAM OPTICS
- Publication number 20240387140
- Publication date Nov 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Alon Litman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
- Publication number 20240304423
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose Cup Assembly for an Ion Implanter
- Publication number 20240249908
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Frank Sinclair
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
- Publication number 20240194438
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS
- Publication number 20240145214
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...
- Publication number 20240079207
- Publication date Mar 7, 2024
- Carl Zeiss MultiSEM GmbH
- Michael Behnke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20240038485
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...
- Publication number 20240029995
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PL...
- Publication number 20240006149
- Publication date Jan 4, 2024
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20230411110
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...
- Publication number 20230402253
- Publication date Dec 14, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
- Publication number 20230324318
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...
- Publication number 20230298848
- Publication date Sep 21, 2023
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230290609
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230245849
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSES...
- Publication number 20230238211
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE MULTI-BEAM COLUMN, CHARGED-PARTICLE MULTI-BEAM COL...
- Publication number 20230238215
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20230238221
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS

multiple apertures

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Beam pattern device having beam absorber structure

Multi-source charged particle illumination apparatus

Particle beam system and the use thereof for flexibly setting the c...

Method to correct first order astigmatism and first order distortio...

Method for operating a multiple particle beam system while altering...

Multiple charged-particle beam apparatus with low crosstalk

Charged particle assessment tool, inspection method

Beam grid layout

Apparatus using charged particle beams

Charged particle beam device for inspection of a specimen with a pl...

Systems and methods for charged particle flooding to enhance voltag...

Apparatus of plural charged-particle beams

High throughput multi-electron beam system

Multiple charged-particle beam apparatus and methods

Apparatus for multiple charged-particle beams

Electron optical module for providing an off-axial electron beam wi...

Charged particle beam apparatus, and systems and methods for operat...

Charged particle beam apparatus

Charged particle assessment tool, inspection method

Aberration corrector

Plasma source with ceramic electrode plate

Method and system for the removal and/or avoidance of contamination...

Apparatus of plural charged-particle beams

Charged particle beam manipulation device and method for manipulati...

Apparatus using charged particle beams

Particle beam system and method for the particle-optical examinatio...

Systems and methods of creating multiple electron beams

High-resolution multiple beam source

Aberration corrector and multiple electron beam irradiation apparatus

Patents Applicationslast 30 patents

MULTIPLE ELECTRON BEAM OPTICS

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

CHARGED-PARTICLE OPTICAL DEVICE

SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES

System and Method for Reducing Particle Formation in a Process Cham...

Dose Cup Assembly for an Ion Implanter

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

CHARGED PARTICLE APPARATUS AND METHOD

ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...

ELECTRON-OPTICAL DEVICE

ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PL...

APPARATUS USING CHARGED PARTICLE BEAMS

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...

CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD

CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSES...

CHARGED-PARTICLE MULTI-BEAM COLUMN, CHARGED-PARTICLE MULTI-BEAM COL...

PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING