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CPC
H01J2237/0822

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0822Multiple sources

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,020,893
- Issue date Jun 25, 2024
- HITACHI HIGH-TECH CORPORATION
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 11,715,621
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ionization for tandem ion mobility spectrometry
- Patent number 11,525,803
- Issue date Dec 13, 2022
- Hamilton Sundstrand Corporation
- Benjamin D. Gardner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam sample preparation and coating apparatus and methods
- Patent number 10,731,246
- Issue date Aug 4, 2020
- Gatan, Inc.
- John Andrew Hunt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus
- Patent number 10,651,006
- Issue date May 12, 2020
- Hitachi High-Tech Science Corporation
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Innovative source assembly for ion beam production
- Patent number 10,651,005
- Issue date May 12, 2020
- FEI Company
- Leon van Kouwen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a plurality of FIB-SEM systems
- Patent number 10,615,002
- Issue date Apr 7, 2020
- Carl Zeiss Microscopy GmbH
- Josef Biberger
- G01 - MEASURING TESTING
Information Patent Grant
Boron implanting using a co-gas
- Patent number 10,446,371
- Issue date Oct 15, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron implanting using a co-gas
- Patent number 10,290,466
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron implanting using a co-gas
- Patent number 9,887,067
- Issue date Feb 6, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron implanting using a co-gas
- Patent number 9,865,430
- Issue date Jan 9, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device manufacturing apparatus and manufacturing method of magnetic...
- Patent number 9,799,482
- Issue date Oct 24, 2017
- TOSHIBA MEMORY CORPORATION
- Yuichi Ohsawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for generating a hollow cathode arc discharge plasma
- Patent number 9,443,703
- Issue date Sep 13, 2016
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Henry Morgner
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion implanting system
- Patent number 8,575,574
- Issue date Nov 5, 2013
- Samsung Display Co., Ltd.
- Jin-Hee Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, and magnetic recording medium manuf...
- Patent number 8,281,740
- Issue date Oct 9, 2012
- Canon Anelva Corporation
- Kazuto Yamanaka
- G11 - INFORMATION STORAGE
Information Patent Grant
Multiple nozzle gas cluster ion beam processing system and method o...
- Patent number 8,097,860
- Issue date Jan 17, 2012
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and cleaning method of the same
- Patent number 8,053,747
- Issue date Nov 8, 2011
- Canon Anelva Corporation
- Einstein Noel Abarra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam field source
- Patent number 8,030,621
- Issue date Oct 4, 2011
- Massachusetts Institute of Technology
- Paulo Lozano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for milling of material using ions
- Patent number 7,504,623
- Issue date Mar 17, 2009
- E. A. Fischione Instruments, Inc.
- Paul E. Fischione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for improving ion implanter productivity
- Patent number 7,446,326
- Issue date Nov 4, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam ion implanter cluster tool
- Patent number 7,375,355
- Issue date May 20, 2008
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for milling of material using ions
- Patent number 7,132,673
- Issue date Nov 7, 2006
- E. A. Fischione Instruments, Inc.
- Paul E. Fischione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-column FIB for nanofabrication applications
- Patent number 6,797,969
- Issue date Sep 28, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Through-the-lens neutralization for charged particle beam system
- Patent number 6,683,320
- Issue date Jan 27, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus
- Patent number 6,555,831
- Issue date Apr 29, 2003
- Nissin Electric Co., Ltd.
- Masashi Konishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method
- Patent number 6,368,678
- Issue date Apr 9, 2002
- Terry Bluck
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems with dual ion sources
- Patent number 6,203,862
- Issue date Mar 20, 2001
- Intevac, Inc.
- Terry Bluck
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system and method
- Patent number 6,101,972
- Issue date Aug 15, 2000
- Intevac, Inc.
- Terry Bluck
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHODS FOR AUTOMATED PROCESSING OF MULTIPLE SAMPLES IN...
- Publication number 20230377833
- Publication date Nov 23, 2023
- FEI Company
- Michal HROUZEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE
- Publication number 20230352263
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...
- Publication number 20230335375
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...
- Publication number 20200194226
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A PLURALITY OF FIB-SEM SYSTEMS
- Publication number 20200027696
- Publication date Jan 23, 2020
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- G01 - MEASURING TESTING
Information Patent Application
Ion Beam Apparatus
- Publication number 20180308658
- Publication date Oct 25, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Shinichi MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Boron Implanting Using A Co-Gas
- Publication number 20180122618
- Publication date May 3, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Boron Implanting Using A Co-Gas
- Publication number 20180068830
- Publication date Mar 8, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR GENERATING A HOLLOW CATHODE ARC DISCHARGE PLASMA
- Publication number 20140354149
- Publication date Dec 4, 2014
- Fraunhofer Gesellschaft zur Forderung der angewandten Forschung e.V.
- Henry Morgner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE
- Publication number 20130082189
- Publication date Apr 4, 2013
- TEL Epion Inc.
- Robert K. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTING SYSTEM
- Publication number 20110140005
- Publication date Jun 16, 2011
- Sumsung Mobile Display Co., Ltd.
- Jin-Hee KANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...
- Publication number 20100193472
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF THE SAME
- Publication number 20100096568
- Publication date Apr 22, 2010
- Canon ANELVA Corporation
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND MAGNETIC RECORDING MEDIUM MANUF...
- Publication number 20100025363
- Publication date Feb 4, 2010
- Canon ANELVA Corporation
- Kazuto Yamanaka
- G11 - INFORMATION STORAGE
Information Patent Application
FOCUSED ION BEAM FIELD SOURCE
- Publication number 20090114838
- Publication date May 7, 2009
- Massachusetts Institute Technology
- Paulo Lozano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ribbon beam ion implanter cluster tool
- Publication number 20070262271
- Publication date Nov 15, 2007
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for improving ion implanter productivity
- Publication number 20070045570
- Publication date Mar 1, 2007
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and method for milling of material using ions
- Publication number 20070023701
- Publication date Feb 1, 2007
- Paul E. Fishione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and method for milling of material using ions
- Publication number 20060022148
- Publication date Feb 2, 2006
- Paul E. Fischione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Universal pattern generator with multiplex addressing
- Publication number 20040051053
- Publication date Mar 18, 2004
- William A. Barletta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Through-the-lens neutralization for charged particle beam system
- Publication number 20020134949
- Publication date Sep 26, 2002
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Through-the-lens-collection of secondary particles for a focused io...
- Publication number 20010032938
- Publication date Oct 25, 2001
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-column FIB for nanofabrication applications
- Publication number 20010032939
- Publication date Oct 25, 2001
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS

Multiple sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System and methods for automated processing of multiple samples in...

Scanned angled etching apparatus and techniques providing separate...

Ion milling device

Scanned angled etching apparatus and techniques providing separate...

Ionization for tandem ion mobility spectrometry

Ion beam sample preparation and coating apparatus and methods

Ion beam apparatus

Innovative source assembly for ion beam production

Method for operating a plurality of FIB-SEM systems

Boron implanting using a co-gas

Boron implanting using a co-gas

Boron implanting using a co-gas

Boron implanting using a co-gas

Device manufacturing apparatus and manufacturing method of magnetic...

Apparatus for generating a hollow cathode arc discharge plasma

Ion implanting system

Substrate processing apparatus, and magnetic recording medium manuf...

Multiple nozzle gas cluster ion beam processing system and method o...

Substrate processing apparatus and cleaning method of the same

Focused ion beam field source

Device and method for milling of material using ions

Technique for improving ion implanter productivity

Ribbon beam ion implanter cluster tool

Device and method for milling of material using ions

Multi-column FIB for nanofabrication applications

Through-the-lens neutralization for charged particle beam system

Ion implanting apparatus

Plasma processing system and method

Processing systems with dual ion sources

Plasma processing system and method

Patents Applicationslast 30 patents

SYSTEM AND METHODS FOR AUTOMATED PROCESSING OF MULTIPLE SAMPLES IN...

ION MILLING DEVICE

SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...

SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...

METHOD FOR OPERATING A PLURALITY OF FIB-SEM SYSTEMS

Ion Beam Apparatus

Boron Implanting Using A Co-Gas

Boron Implanting Using A Co-Gas

APPARATUS FOR GENERATING A HOLLOW CATHODE ARC DISCHARGE PLASMA

PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE

ION IMPLANTING SYSTEM

MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF THE SAME

SUBSTRATE PROCESSING APPARATUS, AND MAGNETIC RECORDING MEDIUM MANUF...

FOCUSED ION BEAM FIELD SOURCE

Ribbon beam ion implanter cluster tool

Technique for improving ion implanter productivity

Device and method for milling of material using ions

Device and method for milling of material using ions

Universal pattern generator with multiplex addressing

Through-the-lens neutralization for charged particle beam system

Through-the-lens-collection of secondary particles for a focused io...

Multi-column FIB for nanofabrication applications