Nitrogen in heterocyclic ring

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CPC
Y10S430/121

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

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Y10S430/121Nitrogen in heterocyclic ring

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,585
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators
- Patent number 8,932,797
- Issue date Jan 13, 2015
- Dow Global Technologies LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, resist composition and method for producing resist pattern
- Patent number 8,921,028
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,906,591
- Issue date Dec 9, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,883,395
- Issue date Nov 11, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,871,429
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,852,846
- Issue date Oct 7, 2014
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and new compound
- Patent number 8,846,291
- Issue date Sep 30, 2014
- Tokyo Ohka Kogyo Co. Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,835,095
- Issue date Sep 16, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,709,700
- Issue date Apr 29, 2014
- International Business Machines Corporation
- Sen Liu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,663,901
- Issue date Mar 4, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,658,345
- Issue date Feb 25, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,628,910
- Issue date Jan 14, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,628,909
- Issue date Jan 14, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,623,584
- Issue date Jan 7, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,617,791
- Issue date Dec 31, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,574,812
- Issue date Nov 5, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, compound and...
- Patent number 8,557,499
- Issue date Oct 15, 2013
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
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Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,518,630
- Issue date Aug 27, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,367,299
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,343,706
- Issue date Jan 1, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition and pattern-forming method using the pho...
- Patent number 8,206,886
- Issue date Jun 26, 2012
- FUJIFILM Corporation
- Kunihiko Kodama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,206,890
- Issue date Jun 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 8,198,008
- Issue date Jun 12, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 8,192,916
- Issue date Jun 5, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymerization initiator containing unsaturated double bond an...
- Patent number 8,182,979
- Issue date May 22, 2012
- LG Chem, Ltd.
- Keon Woo Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition
- Patent number 8,148,044
- Issue date Apr 3, 2012
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition, and, photosensitive element, meth...
- Patent number 8,105,759
- Issue date Jan 31, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344436
- Publication date Dec 26, 2013
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017489
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017490
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017491
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011788
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011790
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011792
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011793
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011786
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011794
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011787
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011789
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011795
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120258403
- Publication date Oct 11, 2012
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120231392
- Publication date Sep 13, 2012
- Sumitomo Chemical Company, Limited
- Satoshi YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219905
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219906
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND
- Publication number 20120148955
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATORS
- Publication number 20120141939
- Publication date Jun 7, 2012
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20120009521
- Publication date Jan 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20110183259
- Publication date Jul 28, 2011
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND...
- Publication number 20110008731
- Publication date Jan 13, 2011
- FUJIFILM CORPORATION
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHO...
- Publication number 20100304300
- Publication date Dec 2, 2010
- FUJIFILM CORPORATION
- Kunihiko KODAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20100285408
- Publication date Nov 11, 2010
- Masahiro MIYASAKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20100279229
- Publication date Nov 4, 2010
- Masahiro MIYASAKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE-WORKING IMAGEABLE ELEMENTS
- Publication number 20100209846
- Publication date Aug 19, 2010
- Bernd Strehmel
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION
- Publication number 20100136479
- Publication date Jun 3, 2010
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photopolymerization initiator containing unsaturated double bond an...
- Publication number 20100112479
- Publication date May 6, 2010
- Keon Woo Lee
- C07 - ORGANIC CHEMISTRY

Nitrogen in heterocyclic ring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Photoacid generators

Salt, resist composition and method for producing resist pattern

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Salt and photoresist composition comprising the same

Resist composition, method of forming resist pattern, and new compound

Resist composition and method for producing resist pattern

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Resist composition and method for producing resist pattern

Actinic-ray- or radiation-sensitive resin composition, compound and...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Resist composition, method of forming resist pattern, compound and...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Photosensitive composition and pattern-forming method using the pho...

Resist composition, method of forming resist pattern, compound and...

Photosensitive resin composition, photosensitive element, method fo...

Photosensitive resin composition, photosensitive element, method fo...

Photopolymerization initiator containing unsaturated double bond an...

Positive photosensitive composition

Photosensitive resin composition, and, photosensitive element, meth...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND

PHOTOACID GENERATORS

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND...

PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

NEGATIVE-WORKING IMAGEABLE ELEMENTS

POSITIVE PHOTOSENSITIVE COMPOSITION

Photopolymerization initiator containing unsaturated double bond an...