Nitrogen in heterocyclic ring

Industry

CPC
Y10S430/121

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/121Nitrogen in heterocyclic ring

Industries

Patents Grantslast 30 patents

Information Patent Grant
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Resist composition and method of forming resist pattern
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- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
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- Dow Global Technologies LLC
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Salt, resist composition and method for producing resist pattern
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- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
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- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
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- International Business Machines Corporation
- Sen Liu
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- International Business Machines Corporation
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Salt and photoresist composition comprising the same
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- Sumitomo Chemical Company, Limited
- Yukako Anryu
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- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
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- Issue date Sep 16, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
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- International Business Machines Corporation
- Sen Liu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- International Business Machines Corporation
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- C07 - ORGANIC CHEMISTRY
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- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
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Fluorine-free fused ring heteroaromatic photoacid generators and re...
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- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,628,909
- Issue date Jan 14, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,623,584
- Issue date Jan 7, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,617,791
- Issue date Dec 31, 2013
- International Business Machines Corporation
- Sen Liu
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Resist composition and method for producing resist pattern
- Patent number 8,574,812
- Issue date Nov 5, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
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- Issue date Oct 15, 2013
- FUJIFILM Corporation
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Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
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- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
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Fluorine-free fused ring heteroaromatic photoacid generators and re...
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- International Business Machines Corporation
- Sen Liu
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Photosensitive composition and pattern-forming method using the pho...
- Patent number 8,206,886
- Issue date Jun 26, 2012
- FUJIFILM Corporation
- Kunihiko Kodama
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Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
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- Issue date Jun 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
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Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
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- Issue date Jun 12, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
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Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 8,192,916
- Issue date Jun 5, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
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Photopolymerization initiator containing unsaturated double bond an...
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- Issue date May 22, 2012
- LG Chem, Ltd.
- Keon Woo Lee
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Information Patent Grant
Positive photosensitive composition
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- Issue date Apr 3, 2012
- FUJIFILM Corporation
- Shuhei Yamaguchi
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Photosensitive resin composition, and, photosensitive element, meth...
- Patent number 8,105,759
- Issue date Jan 31, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344436
- Publication date Dec 26, 2013
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
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- Publication number 20130017489
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- International Business Machines Corporation
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- Publication number 20130017490
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- International Business Machines Corporation
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- Publication number 20130017491
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- Publication number 20130011788
- Publication date Jan 10, 2013
- International Business Machines Corporation
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FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011790
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011792
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
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- Publication number 20130011793
- Publication date Jan 10, 2013
- International Business Machines Corporation
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- Publication number 20130011786
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- International Business Machines Corporation
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- Sumitomo Chemical Company, Limited
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- Publication date Sep 13, 2012
- Sumitomo Chemical Company, Limited
- Satoshi YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
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- Sumitomo Chemical Company, Limited
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- Publication number 20120219906
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- Sumitomo Chemical Company, Limited
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- Tokyo Ohka Kogyo Co., Ltd.
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- Publication date Jan 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
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- Publication date Jan 13, 2011
- FUJIFILM CORPORATION
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- Masahiro MIYASAKA
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NEGATIVE-WORKING IMAGEABLE ELEMENTS
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- FUJIFILM CORPORATION
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Nitrogen in heterocyclic ring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Photoacid generators

Salt, resist composition and method for producing resist pattern

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Salt and photoresist composition comprising the same

Resist composition, method of forming resist pattern, and new compound

Resist composition and method for producing resist pattern

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Resist composition and method for producing resist pattern

Actinic-ray- or radiation-sensitive resin composition, compound and...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Resist composition, method of forming resist pattern, compound and...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Photosensitive composition and pattern-forming method using the pho...

Resist composition, method of forming resist pattern, compound and...

Photosensitive resin composition, photosensitive element, method fo...

Photosensitive resin composition, photosensitive element, method fo...

Photopolymerization initiator containing unsaturated double bond an...

Positive photosensitive composition

Photosensitive resin composition, and, photosensitive element, meth...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND

PHOTOACID GENERATORS

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND...

PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

NEGATIVE-WORKING IMAGEABLE ELEMENTS

POSITIVE PHOTOSENSITIVE COMPOSITION

Photopolymerization initiator containing unsaturated double bond an...