Non ionic diazonium compounds

Industry

CPC
G03F7/0163

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0163Non ionic diazonium compounds

Industries

Patents Grantslast 30 patents

Information Patent Grant
Compound, polymer, photosensitive resin composition, and color filter
- Patent number 10,101,655
- Issue date Oct 16, 2018
- Samsung SDI Co., Ltd.
- Kyuyoung Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Materials and methods for improved photoresist performance
- Patent number 9,851,636
- Issue date Dec 26, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amine treated maleic anhydride polymers, compositions and applicati...
- Patent number 9,422,376
- Issue date Aug 23, 2016
- Sumitomo Bakelite Co., Ltd.
- Pramod Kandanarachchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist composition and method for forming a metal pattern
- Patent number 9,417,521
- Issue date Aug 16, 2016
- Samsung Display Co., Ltd.
- Ki-Hyun Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a resist film on a substrate having non-uniform...
- Patent number 7,199,062
- Issue date Apr 3, 2007
- Infineon Technologies AG
- Yayi Wei
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Material and method for making an electroconductive pattern
- Patent number 6,638,680
- Issue date Oct 28, 2003
- Agfa-Gevaert
- Johan Lamotte
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Poly (disulfonyl diazomethane) compound and positive-working chemic...
- Patent number 6,180,313
- Issue date Jan 30, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yukawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(Disulfonyl diazomethane compounds)
- Patent number 6,153,733
- Issue date Nov 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yukawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aromatic hexafluoropropanesulfonate diazonium salts and their use i...
- Patent number 5,776,652
- Issue date Jul 7, 1998
- AGFA-Gevaert A.G.
- Mathias Eichhorn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working radiation-sensitive mixture containing diazomethan...
- Patent number 5,424,166
- Issue date Jun 13, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ionic modification of organic resins and photoresists to produce ph...
- Patent number 5,393,642
- Issue date Feb 28, 1995
- The University of North Carolina at Charlotte
- Thomas D. DuBois
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,340,682
- Issue date Aug 23, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,338,641
- Issue date Aug 16, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and recording material...
- Patent number 5,256,517
- Issue date Oct 26, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positively operating radiation-sensitive mixture containing a polyf...
- Patent number 5,198,322
- Issue date Mar 30, 1993
- Hoechst Aktiengesellschaft
- Peter Wilharm
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester...
- Patent number 5,191,069
- Issue date Mar 2, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Deep u.v. photoresist compositions containing 4-tert-butylstyrene/m...
- Patent number 5,182,185
- Issue date Jan 26, 1993
- Hoechst Celanese Corporation
- Chengjiu Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition
- Patent number 5,171,656
- Issue date Dec 15, 1992
- Siemens Aktiengesellschaft
- Michael Sebald
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming high sensitivity positive patterns employing a m...
- Patent number 5,169,741
- Issue date Dec 8, 1992
- Matsushita Electric Industrial Co., Ltd.
- Yoshiyuki Tani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
.alpha.-diazoacetoacetates and photosensitive resin compositions co...
- Patent number 5,158,855
- Issue date Oct 27, 1992
- Hitachi, Ltd.
- Hisashi Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deep u.v. photoresist process utilizing compositions containing pol...
- Patent number 5,039,596
- Issue date Aug 13, 1991
- Hoechst Celanese Corporation
- Chengjiu Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyfunctional .alpha.-diazo-.beta.-keto esters and their use in li...
- Patent number 4,996,301
- Issue date Feb 26, 1991
- Hoechst Aktiengesellschaft
- Peter Wilharm
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modific...
- Patent number 4,959,293
- Issue date Sep 25, 1990
- J. T. Baker, Inc.
- George Schwartzkopf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
1,3 Disubstituted-5-diazobarbituric acids
- Patent number 4,902,784
- Issue date Feb 20, 1990
- Hoechst Celanese Corporation
- Frederick R. Hopf
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process of deep ultra-violet imaging lithographic resist compositions
- Patent number 4,808,512
- Issue date Feb 28, 1989
- J. T. Baker Inc.
- George Schwartzkopf
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive solubilization inhibition agents, and deep ultra-vio...
- Patent number 4,752,551
- Issue date Jun 21, 1988
- J. T. Baker Inc.
- George Schwartzkopf
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbi...
- Patent number 4,735,885
- Issue date Apr 5, 1988
- Allied Corporation
- Frederick R. Hopf
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Deep ultra-violet lithographic resist composition and process of using
- Patent number 4,624,908
- Issue date Nov 25, 1986
- J. T. Baker Chemical Company
- George Schwartzkopf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deep ultra-violet lithographic resist composition and process of using
- Patent number 4,622,283
- Issue date Nov 11, 1986
- J. T. Baker Chemical Company
- Gary M. Gray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High contrast, high resolution deep ultraviolet lithographic resist...
- Patent number 4,601,969
- Issue date Jul 22, 1986
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY DEVICE, AND P...
- Publication number 20190094692
- Publication date Mar 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuro ISHIKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER
- Publication number 20170248846
- Publication date Aug 31, 2017
- Samsung SDI Co., Ltd.
- Kyuyoung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE DRY FILM COMPOSITIONS
- Publication number 20160327861
- Publication date Nov 10, 2016
- E I DU PONT DE NEMOURS AND COMPANY
- Thomas K. Foreman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR FORMING A METAL PATTERN
- Publication number 20140183162
- Publication date Jul 3, 2014
- Ki-Hyun CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a resist film on a substrate having non-uniform...
- Publication number 20060223336
- Publication date Oct 5, 2006
- Yayi Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material and method for making an electroconductive pattern
- Publication number 20020022191
- Publication date Feb 21, 2002
- Johan Lamotte
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Non ionic diazonium compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Compound, polymer, photosensitive resin composition, and color filter

Materials and methods for improved photoresist performance

Amine treated maleic anhydride polymers, compositions and applicati...

Photoresist composition and method for forming a metal pattern

Method for forming a resist film on a substrate having non-uniform...

Material and method for making an electroconductive pattern

Poly (disulfonyl diazomethane) compound and positive-working chemic...

(Disulfonyl diazomethane compounds)

Aromatic hexafluoropropanesulfonate diazonium salts and their use i...

Negative-working radiation-sensitive mixture containing diazomethan...

Ionic modification of organic resins and photoresists to produce ph...

Positive-working radiation-sensitive mixture and copying material p...

Positive-working radiation-sensitive mixture and copying material p...

Positive-working radiation-sensitive mixture and recording material...

Positively operating radiation-sensitive mixture containing a polyf...

Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester...

Deep u.v. photoresist compositions containing 4-tert-butylstyrene/m...

Photosensitive composition

Method for forming high sensitivity positive patterns employing a m...

.alpha.-diazoacetoacetates and photosensitive resin compositions co...

Deep u.v. photoresist process utilizing compositions containing pol...

Polyfunctional .alpha.-diazo-.beta.-keto esters and their use in li...

Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modific...

1,3 Disubstituted-5-diazobarbituric acids

Process of deep ultra-violet imaging lithographic resist compositions

Photosensitive solubilization inhibition agents, and deep ultra-vio...

Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbi...

Deep ultra-violet lithographic resist composition and process of using

Deep ultra-violet lithographic resist composition and process of using

High contrast, high resolution deep ultraviolet lithographic resist...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY DEVICE, AND P...

COMPOUND, POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER

PHOTOSENSITIVE DRY FILM COMPOSITIONS

PHOTORESIST COMPOSITION AND METHOD FOR FORMING A METAL PATTERN

Method for forming a resist film on a substrate having non-uniform...

Material and method for making an electroconductive pattern