Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

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G03F7/0755

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photopolymer composition
- Patent number 12,001,141
- Issue date Jun 4, 2024
- LG Chem Ltd.
- Heon Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, substrate for pattern formation, photodegradable coupling...
- Patent number 11,953,833
- Issue date Apr 9, 2024
- Nikon Corporation
- Yusuke Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Blocked silicone dual cure resins for additive manufacturing
- Patent number 11,905,423
- Issue date Feb 20, 2024
- Carbon, Inc.
- Jessica D. Drazba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Adhesion promoter and photosensitive resin composition containing same
- Patent number 11,886,117
- Issue date Jan 30, 2024
- SHANDONG SHENGQUAN NEW MATERIALS CO LTD.
- Diyuan Tang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, patterning process, and polymer
- Patent number 11,851,530
- Issue date Dec 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming a patterned structure and device thereof
- Patent number 11,803,125
- Issue date Oct 31, 2023
- Singapore University of Technology and Design
- You Sin Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 11,782,342
- Issue date Oct 10, 2023
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating method of reducing photoresist footing
- Patent number 11,762,293
- Issue date Sep 19, 2023
- United Microelectronics Corp.
- Hao-Hsuan Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Crosslinking agent compound, photosensitive composition comprising...
- Patent number 11,754,921
- Issue date Sep 12, 2023
- LG Chem, Ltd.
- Kichul Koo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable coating composition for forming low refractive layer
- Patent number 11,680,172
- Issue date Jun 20, 2023
- LG Chem, Ltd.
- Jin Seok Byun
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,686
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing compound, substrate for patterning, photodegrad...
- Patent number 11,518,731
- Issue date Dec 6, 2022
- Nikon Corporation
- Kazuo Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Adhesion promoters
- Patent number 11,500,290
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Dario Goldfarb
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Curable composition for imprinting, method of manufacturing cured p...
- Patent number 11,435,663
- Issue date Sep 6, 2022
- FUJIFILM Corporation
- Yuichiro Goto
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Curable composition for imprinting, method of manufacturing cured p...
- Patent number 11,402,750
- Issue date Aug 2, 2022
- FUJIFILM Corporation
- Yuichiro Goto
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photo-imprinting curable composition and pattern transferring metho...
- Patent number 11,226,553
- Issue date Jan 18, 2022
- DIC Corporation
- Takeshi Ibe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming metal-containing film, method of producing...
- Patent number 11,209,735
- Issue date Dec 28, 2021
- Mitsui Chemicals, Inc.
- Yasuhisa Kayaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive stacked structure
- Patent number 11,175,582
- Issue date Nov 16, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Sanjay Malik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, pattern forming process, and fabr...
- Patent number 11,156,919
- Issue date Oct 26, 2021
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Click-chemistry compatible structures, click-chemistry functionaliz...
- Patent number 11,106,131
- Issue date Aug 31, 2021
- Lawrence Livermore National Security, LLC
- Patrick Campbell
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Photosensitive composite material and method for forming composite...
- Patent number 11,106,134
- Issue date Aug 31, 2021
- Industrial Technology Research Institute
- Yu-Yang Su
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive tone photopatternable silicone
- Patent number 11,029,601
- Issue date Jun 8, 2021
- Dow Silicones Corporation
- Lizhi Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Curable composition for imprinting, cured product, pattern forming...
- Patent number 10,990,011
- Issue date Apr 27, 2021
- FUJIFILM Corporation
- Yuichiro Goto
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Click-chemistry compatible structures, click-chemistry functionaliz...
- Patent number 10,962,879
- Issue date Mar 30, 2021
- Lawrence Livermore National Security, LLC
- Patrick Campbell
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Photosensitive resin composition
- Patent number 10,948,821
- Issue date Mar 16, 2021
- Toray Industries, Inc.
- Yohei Kiuchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition and cured film prepared therefrom
- Patent number 10,942,449
- Issue date Mar 9, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Yeonok Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin formulations for polymer-derived ceramic materials
- Patent number 10,934,397
- Issue date Mar 2, 2021
- HRL Laboratories, LLC
- Zak C. Eckel
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Dispersion liquid, composition, film, manufacturing method of film,...
- Patent number 10,928,726
- Issue date Feb 23, 2021
- FUJIFILM Corporation
- Takashi Kawashima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of forming a three-dimensional object comprised of a silicon...
- Patent number 10,787,583
- Issue date Sep 29, 2020
- Carbon, Inc.
- Jessica D. Drazba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
On-site Growth of Halide Perovskite Micro and Nanocrystals
- Publication number 20250003109
- Publication date Jan 2, 2025
- Massachusetts Institute of Technology
- Farnaz Niroui
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR PRODUCING DISPLAY DEVICE, AND DISPLAY DEVICE
- Publication number 20240431190
- Publication date Dec 26, 2024
- SHARP KABUSHIKI KAISHA
- Yukio TAKENAKA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20240427245
- Publication date Dec 26, 2024
- TAKOMA TECHNOLOGY CO., LTD.
- Mi Sun Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS
- Publication number 20240419076
- Publication date Dec 19, 2024
- The Aerospace Corporation
- Sean C. STUART
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...
- Publication number 20240419073
- Publication date Dec 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...
- Publication number 20240377751
- Publication date Nov 14, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material For Forming Organic Film, Substrate For Manufacturing Semi...
- Publication number 20240363335
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...
- Publication number 20240361695
- Publication date Oct 31, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION COMPRISING INORGANIC PARTICLE
- Publication number 20240280904
- Publication date Aug 22, 2024
- DUK SAN NEOLUX CO., LTD.
- Changmin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, AND CURED FILM
- Publication number 20240160104
- Publication date May 16, 2024
- NATIONAL UNIVERSITY CORPORATION KYOTO INSTITUTE OF TECHNOLOGY
- NAOKI WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV-INDUCED CONDENSATION OF POLYSILOXANE SOL-GEL THIN FILM
- Publication number 20240134281
- Publication date Apr 25, 2024
- Brewer Science, Inc.
- Daniel Patrick Sweat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURABLE RESIN COMPOSITION FOR SILICON-CONTAINING RESIST, PATTERN FO...
- Publication number 20240004294
- Publication date Jan 4, 2024
- DAI NIPPON PRINTING CO., LTD.
- Yasuhiro OKAWA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20230384675
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152700
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152699
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SILICON-BASED TIMEPIECE COMPONENT
- Publication number 20230126149
- Publication date Apr 27, 2023
- PATEK PHILIPPE SA GENEVE
- Jean-Luc BUCAILLE
- G04 - HOROLOGY
Information Patent Application
ADHESION PROMOTER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
- Publication number 20220373887
- Publication date Nov 24, 2022
- SHANDONG SHENGQUAN NEW MATERIALS CO LTD.
- Diyuan TANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...
- Publication number 20220373888
- Publication date Nov 24, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATING METHOD OF REDUCING PHOTORESIST FOOTING
- Publication number 20220365433
- Publication date Nov 17, 2022
- UNITED MICROELECTRONICS CORP.
- Hao-Hsuan Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE
- Publication number 20220350244
- Publication date Nov 3, 2022
- TORAY INDUSTRIES, INC.
- Hideyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATION OF BLAZED DIFFRACTIVE OPTICS BY THROUGH-MASK OXIDATION
- Publication number 20220299685
- Publication date Sep 22, 2022
- PAUL SCHERRER INSTITUT
- Christian David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20220291586
- Publication date Sep 15, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURABLE RESIN COMPOSITION, CURED FILM FORMED THEREFROM, AND ELECTRO...
- Publication number 20220260911
- Publication date Aug 18, 2022
- Samsung SDI Co., Ltd.
- Seungeun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, LIGHT SHIELDI...
- Publication number 20220206387
- Publication date Jun 30, 2022
- FUJIFILM CORPORATION
- Daisuke HAMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
A Multi-Layered Coating
- Publication number 20220195205
- Publication date Jun 23, 2022
- Mark Allen Moxey
- G02 - OPTICS
Information Patent Application
Functional hydrogen silsesquioxane resins and the use thereof
- Publication number 20220162391
- Publication date May 26, 2022
- PIBOND OY
- Thomas Gädda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER SURFACE MODIFICATION
- Publication number 20220011670
- Publication date Jan 13, 2022
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING A PATTERNED STRUCTURE AND DEVICE THEREOF
- Publication number 20210405532
- Publication date Dec 30, 2021
- Singapore University of Technology and Design
- You Sin Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZ...
- Publication number 20210364915
- Publication date Nov 25, 2021
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Patrick Campbell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photopolymer composition

Semiconductor device production method employing silicon-containing...

Compound, substrate for pattern formation, photodegradable coupling...

Blocked silicone dual cure resins for additive manufacturing

Adhesion promoter and photosensitive resin composition containing same

Material for forming organic film, patterning process, and polymer

Method of forming a patterned structure and device thereof

Salt and photoresist composition containing the same

Fabricating method of reducing photoresist footing

Crosslinking agent compound, photosensitive composition comprising...

Photocurable coating composition for forming low refractive layer

Resist composition and patterning process

Fluorine-containing compound, substrate for patterning, photodegrad...

Adhesion promoters

Curable composition for imprinting, method of manufacturing cured p...

Curable composition for imprinting, method of manufacturing cured p...

Photo-imprinting curable composition and pattern transferring metho...

Composition for forming metal-containing film, method of producing...

Photosensitive stacked structure

Photosensitive resin composition, pattern forming process, and fabr...

Click-chemistry compatible structures, click-chemistry functionaliz...

Photosensitive composite material and method for forming composite...

Positive tone photopatternable silicone

Curable composition for imprinting, cured product, pattern forming...

Click-chemistry compatible structures, click-chemistry functionaliz...

Photosensitive resin composition

Photosensitive resin composition and cured film prepared therefrom

Resin formulations for polymer-derived ceramic materials

Dispersion liquid, composition, film, manufacturing method of film,...

Method of forming a three-dimensional object comprised of a silicon...

Patents Applicationslast 30 patents

On-site Growth of Halide Perovskite Micro and Nanocrystals

METHOD FOR PRODUCING DISPLAY DEVICE, AND DISPLAY DEVICE

PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...

STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...

Material For Forming Organic Film, Substrate For Manufacturing Semi...

STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...

PHOTOSENSITIVE COMPOSITION COMPRISING INORGANIC PARTICLE

PHOTOSENSITIVE COMPOSITION, AND CURED FILM

EUV-INDUCED CONDENSATION OF POLYSILOXANE SOL-GEL THIN FILM

CURABLE RESIN COMPOSITION FOR SILICON-CONTAINING RESIST, PATTERN FO...

UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

METHOD FOR MANUFACTURING A SILICON-BASED TIMEPIECE COMPONENT

ADHESION PROMOTER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...

FABRICATING METHOD OF REDUCING PHOTORESIST FOOTING

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE

FABRICATION OF BLAZED DIFFRACTIVE OPTICS BY THROUGH-MASK OXIDATION

UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

CURABLE RESIN COMPOSITION, CURED FILM FORMED THEREFROM, AND ELECTRO...

PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, LIGHT SHIELDI...

A Multi-Layered Coating

Functional hydrogen silsesquioxane resins and the use thereof

RESIST UNDERLAYER SURFACE MODIFICATION

METHOD OF FORMING A PATTERNED STRUCTURE AND DEVICE THEREOF

CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZ...