Non-macromolecular compounds containing silicon-to-silicon bonds

Industry

CPC
G03F7/0754

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0754Non-macromolecular compounds containing silicon-to-silicon bonds

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition and application thereof
- Patent number 9,606,436
- Issue date Mar 28, 2017
- Chi Mei Corporation
- Yu-Jie Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and devices for forming nanostructure monolayers and device...
- Patent number 8,981,452
- Issue date Mar 17, 2015
- SanDisk Corporation
- Jian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and devices for forming nanostructure monolayers and device...
- Patent number 8,558,304
- Issue date Oct 15, 2013
- SanDisk Corporation
- Jian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist composition for color filter protective layer, color fi...
- Patent number 8,420,296
- Issue date Apr 16, 2013
- Cheil Industries Inc.
- Jae-Hyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist sensitizer
- Patent number 8,158,338
- Issue date Apr 17, 2012
- Massachusetts Institute of Technology
- Theodore H. Fedynyshyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and devices for forming nanostructure monolayers and device...
- Patent number 7,968,273
- Issue date Jun 28, 2011
- Nanosys, Inc.
- Jian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photopatternable deposition inhibitor containing siloxane
- Patent number 7,846,644
- Issue date Dec 7, 2010
- Eastman Kodak Company
- Lyn M. Irving
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contrast enhancing layers
- Patent number 7,622,246
- Issue date Nov 24, 2009
- Massachusetts Institute of Technology
- Theodore H. Fedynyshyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of observing monolayer ultraviolet decomposition process, me...
- Patent number 7,326,580
- Issue date Feb 5, 2008
- Seiko Epson Corporation
- Hitoshi Fukushima
- G01 - MEASURING TESTING
Information Patent Grant
Silicon-containing compositions for spin-on arc/hardmask materials
- Patent number 7,276,327
- Issue date Oct 2, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicon-containing compositions for spin-on ARC/hardmask materials
- Patent number 7,270,931
- Issue date Sep 18, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing color filter, color filter, and display
- Patent number 6,861,185
- Issue date Mar 1, 2005
- Sharp Kabushiki Kaisha
- Keiichi Tanaka
- G02 - OPTICS
Information Patent Grant
Method for preparing polysilane pattern-bearing substrate
- Patent number 6,110,651
- Issue date Aug 29, 2000
- Shin-Etsu Chemical, Co., Ltd.
- Motoo Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a pattern using polysilane
- Patent number 6,025,117
- Issue date Feb 15, 2000
- Kabushiki Kaisha Toshiba
- Yoshihiko Nakano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for developing images in energy sensitive materials
- Patent number 6,013,418
- Issue date Jan 11, 2000
- Lucent Technologies Inc.
- Yi Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition comprising aryl-substituted polysilane a...
- Patent number 5,985,513
- Issue date Nov 16, 1999
- Kabushiki Kaisha Toshiba
- Rikako Kani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for use of photosensitive polysilanes as photoresist
- Patent number 5,866,306
- Issue date Feb 2, 1999
- International Business Machines Corporation
- Robert Dennis Miller
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming thin film pattern
- Patent number 5,863,679
- Issue date Jan 26, 1999
- Nippon Paint Co., Ltd.
- Hiroshi Tsushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysilane compositions
- Patent number 5,804,257
- Issue date Sep 8, 1998
- Shin-Etsu Chemical Co., Ltd.
- Akira Hayashida
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...
Information Patent Grant
Polysilane type photosensitive resin composition and method for for...
- Patent number 5,776,764
- Issue date Jul 7, 1998
- Nippon Paint Co., Ltd.
- Emi Ueta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic polysilane composition, colored material, method of manufac...
- Patent number 5,702,776
- Issue date Dec 30, 1997
- Kabushiki Kaisha Toshiba
- Shuzi Hayase
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Energy sensitive materials and methods for their use
- Patent number 5,635,338
- Issue date Jun 3, 1997
- Lucent Technologies Inc.
- Ajey M. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface-imaging technique for lithographic processes for device fab...
- Patent number 5,550,007
- Issue date Aug 27, 1996
- Lucent Technologies Inc.
- Gary N. Taylor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface-imaging technique for lithographic processes for device fab...
- Patent number 5,487,967
- Issue date Jan 30, 1996
- AT&T Corp.
- Richard S. Hutton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine pattern forming method
- Patent number 5,476,753
- Issue date Dec 19, 1995
- Matsushita Electric Industrial Co., Ltd.
- Kazuhiko Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy sensitive materials and methods for their use
- Patent number 5,439,780
- Issue date Aug 8, 1995
- AT&T Corp.
- Ajey M. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming color pattern on a polysilane layer
- Patent number 5,391,442
- Issue date Feb 21, 1995
- Nippon Paint Co., Ltd.
- Hiroshi Tsushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition comprising a polysilane and an acid form...
- Patent number 5,372,908
- Issue date Dec 13, 1994
- Kabushiki Kaisha Toshiba
- Shuji Hayase
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polysilane compositions
- Patent number 5,358,987
- Issue date Oct 25, 1994
- Canon Kabushiki Kaisha
- Masahiro Kanai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition and resin-encapsulated semiconductor device
- Patent number 5,340,684
- Issue date Aug 23, 1994
- Kabushiki Kaisha Toshiba
- Rumiko Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND DEVICES FOR FORMING NANOSTRUCTURE MONOLAYERS AND DEVICE...
- Publication number 20140035011
- Publication date Feb 6, 2014
- SANDISK CORPORATION
- Jian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods and Devices for Forming Nanostructure Monolayers and Device...
- Publication number 20110204432
- Publication date Aug 25, 2011
- Nanosys, Inc.
- Jian Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photoresist Composition for Color Filter Protective Layer, Color Fi...
- Publication number 20110160329
- Publication date Jun 30, 2011
- CHEIL INDUSTRIES INC.
- Jae-Hyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and devices for forming nanostructure monolayers and device...
- Publication number 20100155786
- Publication date Jun 24, 2010
- Nanosys, Inc.
- David L. Heald
- B82 - NANO-TECHNOLOGY
Information Patent Application
RESIST SENSITIZER
- Publication number 20100009289
- Publication date Jan 14, 2010
- Massachusetts Institute of Technology
- Theodore H. Fedynyshyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE
- Publication number 20090130608
- Publication date May 21, 2009
- Lyn M. Irving
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Direct laser and ultraviolet lithography of porous silicon photonic...
- Publication number 20090111046
- Publication date Apr 30, 2009
- Heungmann Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Holographic optical recording medium, manufacturing method thereof...
- Publication number 20080138718
- Publication date Jun 12, 2008
- Kabushiki Kaisha Toshiba
- Rumiko Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTRAST ENHANCING LAYERS
- Publication number 20080076060
- Publication date Mar 27, 2008
- Massachuetts Institute of Technology
- Theodore H. Fedynyshyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming a polymer layer and method of forming a pat...
- Publication number 20060186086
- Publication date Aug 24, 2006
- Myungsun Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silicon-containing compositions for spin-on arc/hardmask materials
- Publication number 20060058489
- Publication date Mar 16, 2006
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of observing monolayer ultraviolet decomposition process, me...
- Publication number 20050244588
- Publication date Nov 3, 2005
- SEIKO EPSON CORPORATION
- Hitoshi Fukushima
- G01 - MEASURING TESTING
Information Patent Application
Silicon-containing compositions for spin-on arc/hardmask materials
- Publication number 20050074689
- Publication date Apr 7, 2005
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Holographic optical recording medium, manufacturing method thereof...
- Publication number 20050068593
- Publication date Mar 31, 2005
- Kabushiki Kaisha Toshiba
- Rumiko Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing color filter, color filter, and display
- Publication number 20040142254
- Publication date Jul 22, 2004
- Keiichi Tanaka
- G02 - OPTICS

Non-macromolecular compounds containing silicon-to-silicon bonds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive resin composition and application thereof

Methods and devices for forming nanostructure monolayers and device...

Methods and devices for forming nanostructure monolayers and device...

Photoresist composition for color filter protective layer, color fi...

Resist sensitizer

Methods and devices for forming nanostructure monolayers and device...

Photopatternable deposition inhibitor containing siloxane

Contrast enhancing layers

Method of observing monolayer ultraviolet decomposition process, me...

Silicon-containing compositions for spin-on arc/hardmask materials

Silicon-containing compositions for spin-on ARC/hardmask materials

Method of manufacturing color filter, color filter, and display

Method for preparing polysilane pattern-bearing substrate

Method of forming a pattern using polysilane

Method for developing images in energy sensitive materials

Photosensitive composition comprising aryl-substituted polysilane a...

Process for use of photosensitive polysilanes as photoresist

Method for forming thin film pattern

Polysilane compositions

Polysilane type photosensitive resin composition and method for for...

Organic polysilane composition, colored material, method of manufac...

Energy sensitive materials and methods for their use

Surface-imaging technique for lithographic processes for device fab...

Surface-imaging technique for lithographic processes for device fab...

Fine pattern forming method

Energy sensitive materials and methods for their use

Method of forming color pattern on a polysilane layer

Photosensitive composition comprising a polysilane and an acid form...

Polysilane compositions

Photosensitive composition and resin-encapsulated semiconductor device

Patents Applicationslast 30 patents

METHODS AND DEVICES FOR FORMING NANOSTRUCTURE MONOLAYERS AND DEVICE...

Methods and Devices for Forming Nanostructure Monolayers and Device...

Photoresist Composition for Color Filter Protective Layer, Color Fi...

Methods and devices for forming nanostructure monolayers and device...

RESIST SENSITIZER

PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE

Direct laser and ultraviolet lithography of porous silicon photonic...

Holographic optical recording medium, manufacturing method thereof...

CONTRAST ENHANCING LAYERS

Composition for forming a polymer layer and method of forming a pat...

Silicon-containing compositions for spin-on arc/hardmask materials

Method of observing monolayer ultraviolet decomposition process, me...

Silicon-containing compositions for spin-on arc/hardmask materials

Holographic optical recording medium, manufacturing method thereof...

Method of manufacturing color filter, color filter, and display