Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

Industry

CPC
G03F7/027

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of producing three-dimensional objects with apparatus havin...
- Patent number 12,179,435
- Issue date Dec 31, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods for producing three-dimensional objects
- Patent number 12,172,382
- Issue date Dec 24, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable resin composition and use thereof
- Patent number 12,122,867
- Issue date Oct 22, 2024
- Arisawa Mfg. Co., Ltd.
- Makoto Tai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,085,855
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable composition comprising a fullerene
- Patent number 12,061,416
- Issue date Aug 13, 2024
- Canon Kabushiki Kaisha
- Fen Wan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Core-shell compound, photosensitive resin composition including the...
- Patent number 12,055,851
- Issue date Aug 6, 2024
- Samsung SDI Co., Ltd.
- Young Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive compositions, preparation methods thereof, and quant...
- Patent number 12,055,852
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Shang Hyeun Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coloring composition, color filter, pattern forming method, solid-s...
- Patent number 12,019,369
- Issue date Jun 25, 2024
- FUJIFILM Corporation
- Shoichi Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for removing resist layer, method of forming a pattern and m...
- Patent number 12,013,645
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Christine Y Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-cure phase-separation type photosensitive resin composition fo...
- Patent number 12,013,638
- Issue date Jun 18, 2024
- SUZHOU POLLY NEW MATERIAL TECH CO., LTD.
- Wenbin Wang
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Method for manufacturing electronic device
- Patent number 12,013,644
- Issue date Jun 18, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and resist film
- Patent number 11,960,207
- Issue date Apr 16, 2024
- Zeon Corporation
- Manabu Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoinitiator composition containing acylcarbazole derivative and...
- Patent number 11,947,259
- Issue date Apr 2, 2024
- IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
- Wenchao Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic radiation curable polymeric mixtures, cured polymeric mixtu...
- Patent number 11,926,688
- Issue date Mar 12, 2024
- Bridgestone Americas Tire Operations, LLC
- Joshua P. Abell
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Blocked silicone dual cure resins for additive manufacturing
- Patent number 11,905,423
- Issue date Feb 20, 2024
- Carbon, Inc.
- Jessica D. Drazba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Binder resin, negative-type photosensitive resin composition, and d...
- Patent number 11,892,772
- Issue date Feb 6, 2024
- LG Chem, Ltd.
- Junhyun An
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,880,135
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Support material formulation and additive manufacturing processes e...
- Patent number 11,850,802
- Issue date Dec 26, 2023
- Stratasys Ltd.
- Yuval Vidavsky
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Methods for producing three-dimensional objects with apparatus havi...
- Patent number 11,850,803
- Issue date Dec 26, 2023
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stabilized matrix-filled liquid radiation curable resin composition...
- Patent number 11,840,618
- Issue date Dec 12, 2023
- Stratasys, Inc.
- Mingbo He
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photo-curable composition and methods for preparing cured film, opt...
- Patent number 11,835,858
- Issue date Dec 5, 2023
- Canon Kabushiki Kaisha
- Toshiki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle stereolithography
- Patent number 11,826,949
- Issue date Nov 28, 2023
- Desktop Metal, Inc.
- Michael Andrew Gibson
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Negative-type photosensitive resin composition, cured film, element...
- Patent number 11,822,243
- Issue date Nov 21, 2023
- Toray Industries, Inc.
- Yugo Tanigaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions, quantum dot polymer composite pattern...
- Patent number 11,815,800
- Issue date Nov 14, 2023
- Samsung Electronics Co., Ltd.
- Jonggi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bifunctional (meth)acrylate compound and polymer
- Patent number 11,814,351
- Issue date Nov 14, 2023
- Maruzen Petrochemical Co., Ltd.
- Satoshi Kakuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursors and method of use
- Patent number 11,813,884
- Issue date Nov 14, 2023
- Eastman Kodak Company
- Johannes Obenauf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,809,077
- Issue date Nov 7, 2023
- Rohm and Haas Electronic Materials LLC
- Thomas Cardolaccia
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...
- Publication number 20250004368
- Publication date Jan 2, 2025
- XSYS Germany GmbH
- Patrick-Kurt Dannecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
- Publication date Jan 2, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...
- Publication number 20240427239
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240427238
- Publication date Dec 26, 2024
- NISSAN CHEMICAL CORPORATION
- Tetsuya KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...
- Publication number 20240419073
- Publication date Dec 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM INCLUDING HEATING MEANS AND ACTINIC RADIATION SOURCE AND A M...
- Publication number 20240411225
- Publication date Dec 12, 2024
- Canon Kabushiki Kaisha
- Timothy Brian STACHOWIAK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240377739
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240361689
- Publication date Oct 31, 2024
- Samsung SDI Co., Ltd.
- Heejo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DE...
- Publication number 20240357849
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Moon Gyu HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240345477
- Publication date Oct 17, 2024
- Samsung SDI Co., Ltd.
- Dong Wan RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295822
- Publication date Sep 5, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...
- Publication number 20240288776
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Christine Y. Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Actinic Radiation Curable Polymeric Mixtures, Cured Polymeric Mixtu...
- Publication number 20240247091
- Publication date Jul 25, 2024
- BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC
- Joshua P. Abell
- B60 - VEHICLES IN GENERAL
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20240192593
- Publication date Jun 13, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuki URAKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240168377
- Publication date May 23, 2024
- Samsung SDI Co., Ltd.
- Chang-Hyun KWON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS
- Publication number 20240116251
- Publication date Apr 11, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240111210
- Publication date Apr 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Hsiung LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABILIZED MATRIX-FILLED LIQUID RADIATION CURABLE RESIN COMPOSITION...
- Publication number 20240076471
- Publication date Mar 7, 2024
- Stratasys, Inc.
- Mingbo HE
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTO-CURABLE COMPOSITION AND METHODS FOR PREPARING CURED FILM, OPT...
- Publication number 20240069438
- Publication date Feb 29, 2024
- Canon Kabushiki Kaisha
- Toshiki Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS
- Publication number 20240034000
- Publication date Feb 1, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT...
- Publication number 20240027906
- Publication date Jan 25, 2024
- Samsung SDI Co., Ltd.
- Jinsuop YOUN
- B82 - NANO-TECHNOLOGY
Information Patent Application
THERMALLY DECOMPOSABLE FILL MATERIAL
- Publication number 20240030063
- Publication date Jan 25, 2024
- Brewer Science, Inc.
- Daniel Patrick Sweat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240012326
- Publication date Jan 11, 2024
- Asahi Kasei Kabushiki Kaisha
- Shota YANAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20230393467
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- Siao-Shan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230367211
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
- Publication number 20230324800
- Publication date Oct 12, 2023
- FUJIFILM CORPORATION
- Kazuki WATANABE
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
A METHOD OF PREPARING AN EMBOSSED STRUCTURE, EMBOSSED STRUCTURE AND...
- Publication number 20230280650
- Publication date Sep 7, 2023
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Dieter Nees
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICALLY ACTIVE DEVICES
- Publication number 20230273456
- Publication date Aug 31, 2023
- Johnson & Johnson Surgical Vision, Inc.
- Lars DOBELMANN-MARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICALLY ACTIVE DEVICES
- Publication number 20230273455
- Publication date Aug 31, 2023
- Johnson & Johnson Surgical Vision, Inc.
- David MOORE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...
- Publication number 20230258864
- Publication date Aug 17, 2023
- Arizona Board of Regents on behalf of The University of Arizona
- Dong-Chul "Jeffrey" PYUN
- G02 - OPTICS

Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of producing three-dimensional objects with apparatus havin...

Methods for producing three-dimensional objects

Photocurable composition and method for producing semiconductor device

Resin, photoresist composition, and method of manufacturing semicon...

Photocurable resin composition and use thereof

Resin, photoresist composition, and method of manufacturing semicon...

Photocurable composition comprising a fullerene

Core-shell compound, photosensitive resin composition including the...

Photosensitive compositions, preparation methods thereof, and quant...

Coloring composition, color filter, pattern forming method, solid-s...

Method for removing resist layer, method of forming a pattern and m...

Dual-cure phase-separation type photosensitive resin composition fo...

Method for manufacturing electronic device

Negative resist composition and pattern forming process

Resist composition and resist film

Photoinitiator composition containing acylcarbazole derivative and...

Actinic radiation curable polymeric mixtures, cured polymeric mixtu...

Blocked silicone dual cure resins for additive manufacturing

Binder resin, negative-type photosensitive resin composition, and d...

Photoresist compositions and pattern formation methods

Support material formulation and additive manufacturing processes e...

Methods for producing three-dimensional objects with apparatus havi...

Stabilized matrix-filled liquid radiation curable resin composition...

Photo-curable composition and methods for preparing cured film, opt...

Particle stereolithography

Negative-type photosensitive resin composition, cured film, element...

Photosensitive compositions, quantum dot polymer composite pattern...

Bifunctional (meth)acrylate compound and polymer

Lithographic printing plate precursors and method of use

Photoresist compositions and pattern formation methods

Patents Applicationslast 30 patents

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...

SYSTEM INCLUDING HEATING MEANS AND ACTINIC RADIATION SOURCE AND A M...

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

FILM PATTERNING METHOD AND ELECTROLUMINESCENT DEVICE AND DISPLAY DE...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...

Actinic Radiation Curable Polymeric Mixtures, Cured Polymeric Mixtu...

PHOTOSENSITIVE COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS

PHOTORESIST AND FORMATION METHOD THEREOF

STABILIZED MATRIX-FILLED LIQUID RADIATION CURABLE RESIN COMPOSITION...

PHOTO-CURABLE COMPOSITION AND METHODS FOR PREPARING CURED FILM, OPT...

METHODS FOR PRODUCING THREE-DIMENSIONAL OBJECTS

COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT...

THERMALLY DECOMPOSABLE FILL MATERIAL

PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

RESIST COMPOSITION AND PATTERNING PROCESS

FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...

A METHOD OF PREPARING AN EMBOSSED STRUCTURE, EMBOSSED STRUCTURE AND...

OPTICALLY ACTIVE DEVICES

OPTICALLY ACTIVE DEVICES

REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...