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Nonresinous additive to promote interlayer adhesion in element
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CPC
Y10S430/155
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GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10
USPC classification
Y10S
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S430/00
Radiation imagery chemistry: process, composition, or product thereof
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Y10S430/155
Nonresinous additive to promote interlayer adhesion in element
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Patents Grants
last 30 patents
Information
Patent Grant
Imaging methods
Patent number
8,048,606
Issue date
Nov 1, 2011
Rohm and Haas Electronic Materials LLC
Robert K. Barr
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Imaging methods
Patent number
7,977,026
Issue date
Jul 12, 2011
Rohm and Haas Electronic Materials LLC
Robert K. Barr
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Imaging methods
Patent number
7,749,685
Issue date
Jul 6, 2010
Rohm and Haas Electronic Materials LLC
Robert K. Barr
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Imaging methods
Patent number
7,615,335
Issue date
Nov 10, 2009
Rohm and Haas Electronic Materials LLC
Robert K. Barr
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Photoresist formulation for high aspect ratio plating
Patent number
7,563,559
Issue date
Jul 21, 2009
FormFactor, Inc.
Treliant Fang
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Polymer composite
Patent number
7,252,912
Issue date
Aug 7, 2007
Toyo Gosei Co., Ltd.
Kazunori Kataoka
C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information
Patent Grant
Photoresist formulation for high aspect ratio plating
Patent number
7,238,464
Issue date
Jul 3, 2007
FormFactor, Inc.
Treliant Fang
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Adhesion promoting polymeric materials and planographic printing el...
Patent number
7,198,882
Issue date
Apr 3, 2007
Eastman Kodak Company
John M. Higgins
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Photoresist formulation for high aspect ratio plating
Patent number
7,005,233
Issue date
Feb 28, 2006
FormFactor, Inc.
Treliant Fang
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Thermal imaging material containing combustible nitro-resin particles
Patent number
6,884,563
Issue date
Apr 26, 2005
Eastman Kodak Company
Jeffrey W. Leon
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Imaging member containing heat sensitive thiosulfate polymer on imp...
Patent number
6,465,152
Issue date
Oct 15, 2002
Kodak Polychrome Graphics LLC
Thap DoMinh
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Grant
Resist compositions
Patent number
6,458,509
Issue date
Oct 1, 2002
Toagosei Co., Ltd.
Yoichi Haruta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Self-contained imaging assembly having improved peel strength
Patent number
6,387,585
Issue date
May 14, 2002
Cycolor, Inc.
Ibrahim Katampe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silver halide photographic light-sensitive material
Patent number
6,146,819
Issue date
Nov 14, 2000
Mitsubishi Paper Mills Limited
Akira Furukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silver halide light-sensitive material comprising support, hardenin...
Patent number
6,132,925
Issue date
Oct 17, 2000
Fuji Photo Film Co., Ltd.
Satoshi Hoshi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silver halide light-sensitive material comprising support, hardenin...
Patent number
6,066,432
Issue date
May 23, 2000
Fuji Photo Film Co., Ltd.
Hiromitsu Yanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically treated photoresist for withstanding ion bombarded proce...
Patent number
6,045,978
Issue date
Apr 4, 2000
TRW Inc.
Dean Tran
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Thermally stable subbing layer for imaging elements
Patent number
6,037,108
Issue date
Mar 14, 2000
Eastman Kodak Company
Janglin Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Adhesion promotion method employing glycol ether acetate as adhesio...
Patent number
5,998,103
Issue date
Dec 7, 1999
Chartered Semiconductor Manufacturing, Ltd.
Ai-Qiang Zhang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically treated photoresist for withstanding ion bombarded proce...
Patent number
5,981,143
Issue date
Nov 9, 1999
TRW Inc.
Dean Tran
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive element and process for producing multilayer printed...
Patent number
5,976,762
Issue date
Nov 2, 1999
Fuji Photo Film Co., Ltd.
Takashi Takayanagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Molecular grafting of hardener/gelatin blends to energetically trea...
Patent number
5,968,646
Issue date
Oct 19, 1999
Eastman Kodak Company
Jeremy M. Grace
B32 - LAYERED PRODUCTS
Information
Patent Grant
Method for manufacturing printed circuit board
Patent number
5,712,080
Issue date
Jan 27, 1998
Hitachi, Ltd.
Yuichi Satsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoimageable composition having improved adhesion promoter
Patent number
5,320,933
Issue date
Jun 14, 1994
Morton International, Inc.
Daniel E. Lundy
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist adhesion promoter
Patent number
5,296,333
Issue date
Mar 22, 1994
Raytheon Company
Philip A. Lamarre
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photographic light-sensitive elements
Patent number
5,279,934
Issue date
Jan 18, 1994
Eastman Kodak Company
Dennis E. Smith
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photopolymerizable resin composition employing (meth)acrylonitrile...
Patent number
5,236,809
Issue date
Aug 17, 1993
Tokyo Ohka Kogyo Co., Ltd.
Junichi Onodera
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for promoting adhesion of a layer of photoresist on a subst...
Patent number
5,091,290
Issue date
Feb 25, 1992
Micron Technology, Inc.
J. Brett Rolfson
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for reducing chemical interaction between copper features an...
Patent number
5,081,005
Issue date
Jan 14, 1992
The Boeing Company
Kishore K. Chakravorty
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Microcapsule coating compositions containing coupling agents for im...
Patent number
4,971,885
Issue date
Nov 20, 1990
The Mead Corporation
William A. Hammann
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
Photoresist Formulation For High Aspect Ratio Plating
Publication number
20070248896
Publication date
Oct 25, 2007
FormFactor, Inc.
Treliant Fang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Imaging methods
Publication number
20070003865
Publication date
Jan 4, 2007
Rohm and Haas Electronic Materials L.L.C.
Robert K. Barr
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Imaging methods
Publication number
20060223009
Publication date
Oct 5, 2006
Rohm and Haas Electronic Materials L.L.C.
Robert K. Barr
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Imaging methods
Publication number
20060160024
Publication date
Jul 20, 2006
Rohm and Haas Electronic Materials L.L.C.
Robert K. Barr
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist formulation for high aspect ratio plating
Publication number
20060141394
Publication date
Jun 29, 2006
FormFactor, Inc.
Treliant Fang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Imaging methods
Publication number
20050175229
Publication date
Aug 11, 2005
Rohm and Haas Electronic Materials, L.L.C.
Robert K. Barr
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Adhesion promoting polymeric materials and planographic printing el...
Publication number
20050095536
Publication date
May 5, 2005
Eastman Kodak Company
John M. Higgins
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Application
Thermal imaging material containing combustible nitro-resin particles
Publication number
20040234887
Publication date
Nov 25, 2004
Eastman Kodak Company
Jeffrey W. Leon
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Application
Photoresist formulation for high aspect ratio plating
Publication number
20040214098
Publication date
Oct 28, 2004
Treliant Fang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist formulation for high aspect ratio plating
Publication number
20030138731
Publication date
Jul 24, 2003
Treliant Fang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY