Claims
- 1. A method for patterning a photoresist layer comprising:
- formulating a photoresist composition comprising a compound of the general formula
- R.sub.1 --COO--(CH.sub.2).sub.n --O--R.sub.2, where R.sub.1 and R.sub.2 are organic radicals having about 1 to about 5 C atoms, and n is 2 to 18: and a silylating agent; wherein the ratio of the compound of the general formula to the silylating agent is about 99.9:0.1 to about 95.5,
- coating a semiconductor surface of a workpiece with the photoresist composition to form a photoresist layer;
- drying the workpiece at a time and temperature effective for initiating a reaction between the compound of the general formula and the silylating agent;
- selectively exposing said photoresist layer to a radiation source to form exposed areas;
- removing said photoresist layer from said exposed areas to form a positive image in said photoresist layer on said semiconductor surface; and
- exposing said workpiece to an ion etch process,
- wherein the photoresist composition is not eroded by the etching process, and areas of the workpiece coated with the photoresist are not eroded by the ion etching process.
- 2. The method for patterning a photoresist layer of claim 1 wherein the compound of the general formula is 2-ethoxyethylacetate.
- 3. The method for patterning a photoresist layer of claim 1 wherein the silylating agent is selected from the group consisting of hexamethyldisilazane (HMDS), heptamethyidisilazane, methyl ethyl siloxane, and hexaphenyldisilazane.
- 4. The method of claim 1 wherein the photoresist composition further comprises n-butyl acetate.
Parent Case Info
This application is a divisional of application Ser. No. 08/978,735 filed on Nov. 26, 1997, U.S. Pat. No. 5,981,143.
US Referenced Citations (6)
Divisions (1)
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Number |
Date |
Country |
Parent |
978735 |
Nov 1997 |
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