of an edge bead on wafers

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G03F7/2028

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2028of an edge bead on wafers

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, estimation method of substrate proc...
- Patent number 12,051,587
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hiroshi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens adjustment for an edge exposure tool
- Patent number 11,852,979
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yong-Ting Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus for forming a coating film on a substrate havi...
- Patent number 11,791,162
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Yasuaki Noda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of coating a photoresist and apparatus for performing the same
- Patent number 11,726,406
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Sunghwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens adjustment for an edge exposure tool
- Patent number 11,378,888
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yong-Ting Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method, method of preparing flexible substrate and...
- Patent number 11,249,399
- Issue date Feb 15, 2022
- Chengdu BOE Optoelectronics Technology Co., Ltd.
- Cheng Tang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor method of protecting wafer from bevel contamination
- Patent number 11,137,685
- Issue date Oct 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Portion of layer removal at substrate edge
- Patent number 11,054,746
- Issue date Jul 6, 2021
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer reconfiguration during a coating process or an electric plati...
- Patent number 10,964,580
- Issue date Mar 30, 2021
- Dyi-Chung Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing photosensitive material on a substrate
- Patent number 10,948,825
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- Christianus Wilhelmus Johannes Berendsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon wafer processing device and method
- Patent number 10,782,615
- Issue date Sep 22, 2020
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Gang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge-exposure tool with an ultraviolet (UV) light emitting diode (LED)
- Patent number 10,739,682
- Issue date Aug 11, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Hao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing device and method therefor
- Patent number 10,658,214
- Issue date May 19, 2020
- Shanghai Micro Electronics Equipment Co., Ltd.
- Gang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor method of protecting wafer from bevel contamination
- Patent number 10,635,000
- Issue date Apr 28, 2020
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,591,820
- Issue date Mar 17, 2020
- SCREEN Holdings Co., Ltd.
- Masahiko Harumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge-exposure tool with an ultraviolet (UV) light emitting diode (LED)
- Patent number 10,509,323
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Hao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, substrate processing apparatus and a c...
- Patent number 10,381,221
- Issue date Aug 13, 2019
- Tokyo Electron Limited
- Yasuaki Noda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Peripheral exposure method and apparatus therefor
- Patent number 10,126,665
- Issue date Nov 13, 2018
- Tokyo Electron Limited
- Kenichi Miyamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming edge etch protection using dual layer of positive-negative...
- Patent number 10,095,115
- Issue date Oct 9, 2018
- GLOBALFOUNDRIES Inc.
- Christopher B. Shing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor method of protecting wafer from bevel contamination
- Patent number 10,073,347
- Issue date Sep 11, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, and method of manufacturing device
- Patent number 9,829,794
- Issue date Nov 28, 2017
- Canon Kabushiki Kaisha
- Nobuyuki Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge exposure apparatus, edge exposure method and non-transitory co...
- Patent number 9,810,989
- Issue date Nov 7, 2017
- Tokyo Electron Limited
- Hiroshi Tomita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer reconfiguration
- Patent number 9,545,776
- Issue date Jan 17, 2017
- Dyi-Chung Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Peripheral exposure method and apparatus therefor
- Patent number 9,268,230
- Issue date Feb 23, 2016
- Tokyo Electron Limited
- Kenichi Miyamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, optical module and auto-focusing system for wafer edge expo...
- Patent number 9,081,149
- Issue date Jul 14, 2015
- Semiconductor Manufacturing International (Beijing) Corporation
- Qiang Wu
- G02 - OPTICS
Information Patent Grant
Photolithography method including dual development process
- Patent number 8,846,305
- Issue date Sep 30, 2014
- Samsung Electronics Co., Ltd.
- Eunsung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating treatment method and coating treatment apparatus
- Patent number 8,697,187
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Yoshiteru Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for processing substrate edges
- Patent number 8,658,937
- Issue date Feb 25, 2014
- UVTech Systems, Inc.
- Kenneth J. Harte
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus, substrate processing system and ins...
- Patent number 8,477,301
- Issue date Jul 2, 2013
- Sokudo Co., Ltd.
- Masahito Kashiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,142,985
- Issue date Mar 27, 2012
- Kabushiki Kaisha Toshiba
- Katsutoshi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...
- Publication number 20240369935
- Publication date Nov 7, 2024
- Samsung SDI Co., Ltd.
- Hyungrang MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...
- Publication number 20240355617
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi Nakamura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20240112933
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jeonghee Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL
- Publication number 20240085798
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Ting WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING APPARATUS FOR FORMING A COATING FILM ON A SUBSTRATE HAVI...
- Publication number 20230395380
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Yasuaki NODA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PERIPHERAL EDGE PROCESSING APPARATUS, PERIPHERAL EDGE PROCESSING ME...
- Publication number 20230314960
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Masashi ENOMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF COATING A PHOTORESIST AND APPARATUS FOR PERFORMING THE SAME
- Publication number 20230119739
- Publication date Apr 20, 2023
- Seoul National University R&DB Foundation
- Sunghwan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL
- Publication number 20220342318
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Ting WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Method of Protecting Wafer from Bevel Contamination
- Publication number 20200257203
- Publication date Aug 13, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE
- Publication number 20200166845
- Publication date May 28, 2020
- ASML NETHERLANDS B.V.
- Christianus Wilhelmus Johannes BERENDSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE-EXPOSURE TOOL WITH AN ULTRAVIOLET (UV) LIGHT EMITTING DIODE (LED)
- Publication number 20200089120
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Ying-Hao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND A C...
- Publication number 20190287796
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Yasuaki NODA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Method of Protecting Wafer from Bevel Contamination
- Publication number 20190064669
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography System and Lithography Method for Improving Image Contrast
- Publication number 20180164688
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20180068845
- Publication date Mar 8, 2018
- RENESAS ELECTRONICS CORPORATION
- Takuya HAGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING EDGE ETCH PROTECTION USING DUAL LAYER OF POSITIVE-NEGATIVE...
- Publication number 20180067396
- Publication date Mar 8, 2018
- GLOBALFOUNDRIES INC.
- CHRISTOPHER B. SHING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIA...
- Publication number 20150198798
- Publication date Jul 16, 2015
- CARL ZEISS SMS GMBH
- Holger Seitz
- G02 - OPTICS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20140234782
- Publication date Aug 21, 2014
- Tomoya OORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PERIPHERAL EXPOSURE METHOD AND APPARATUS THEREFOR
- Publication number 20130224639
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Kenichi MIYAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD INCLUDING DUAL DEVELOPMENT PROCESS
- Publication number 20130095433
- Publication date Apr 18, 2013
- Eunsung KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, OPTICAL MODULE AND AUTO-FOCUSING SYSTEM FOR WAFER EDGE EXPO...
- Publication number 20130083305
- Publication date Apr 4, 2013
- Semiconductor Manufacturing International (Beijing) Corporation
- Qiang WU
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING WAFER EDGE PORTION
- Publication number 20130005056
- Publication date Jan 3, 2013
- SEMES CO., LTD.
- Duk Sik Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120141944
- Publication date Jun 7, 2012
- Kabushiki Kaisha Toshiba
- Katsutoshi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE EDGE TREATMENT FOR COATER/DEVELOPER
- Publication number 20120077128
- Publication date Mar 29, 2012
- Tomoyuki TAKEISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR LITHOGRAPHY PROCESS
- Publication number 20110250540
- Publication date Oct 13, 2011
- Pei-Lin Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SUBSTRATE EDGES
- Publication number 20110168672
- Publication date Jul 14, 2011
- UVTech Systems, Inc.
- Kenneth J. Harte
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND INS...
- Publication number 20110063588
- Publication date Mar 17, 2011
- Masahito KASHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS
- Publication number 20110033626
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Yoshiteru FUKUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100196828
- Publication date Aug 5, 2010
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090305169
- Publication date Dec 10, 2009
- Katsutoshi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

of an edge bead on wafers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus, estimation method of substrate proc...

Lens adjustment for an edge exposure tool

Processing apparatus for forming a coating film on a substrate havi...

Method of coating a photoresist and apparatus for performing the same

Lens adjustment for an edge exposure tool

Photolithography method, method of preparing flexible substrate and...

Semiconductor method of protecting wafer from bevel contamination

Portion of layer removal at substrate edge

Wafer reconfiguration during a coating process or an electric plati...

Method for removing photosensitive material on a substrate

Silicon wafer processing device and method

Edge-exposure tool with an ultraviolet (UV) light emitting diode (LED)

Wafer processing device and method therefor

Semiconductor method of protecting wafer from bevel contamination

Substrate processing apparatus and substrate processing method

Edge-exposure tool with an ultraviolet (UV) light emitting diode (LED)

Substrate processing method, substrate processing apparatus and a c...

Peripheral exposure method and apparatus therefor

Forming edge etch protection using dual layer of positive-negative...

Semiconductor method of protecting wafer from bevel contamination

Exposure apparatus, and method of manufacturing device

Edge exposure apparatus, edge exposure method and non-transitory co...

Wafer reconfiguration

Peripheral exposure method and apparatus therefor

Method, optical module and auto-focusing system for wafer edge expo...

Photolithography method including dual development process

Coating treatment method and coating treatment apparatus

Method and apparatus for processing substrate edges

Substrate processing apparatus, substrate processing system and ins...

Method for manufacturing semiconductor device

Patents Applicationslast 30 patents

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...

SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL

PROCESSING APPARATUS FOR FORMING A COATING FILM ON A SUBSTRATE HAVI...

PERIPHERAL EDGE PROCESSING APPARATUS, PERIPHERAL EDGE PROCESSING ME...

METHOD OF COATING A PHOTORESIST AND APPARATUS FOR PERFORMING THE SAME

LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL

Semiconductor Method of Protecting Wafer from Bevel Contamination

METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE

EDGE-EXPOSURE TOOL WITH AN ULTRAVIOLET (UV) LIGHT EMITTING DIODE (LED)

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND A C...

Semiconductor Method of Protecting Wafer from Bevel Contamination

Lithography System and Lithography Method for Improving Image Contrast

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

FORMING EDGE ETCH PROTECTION USING DUAL LAYER OF POSITIVE-NEGATIVE...

EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIA...

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

PERIPHERAL EXPOSURE METHOD AND APPARATUS THEREFOR

PHOTOLITHOGRAPHY METHOD INCLUDING DUAL DEVELOPMENT PROCESS

METHOD, OPTICAL MODULE AND AUTO-FOCUSING SYSTEM FOR WAFER EDGE EXPO...

METHOD AND APPARATUS FOR PROCESSING WAFER EDGE PORTION

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE EDGE TREATMENT FOR COATER/DEVELOPER

SEMICONDUCTOR LITHOGRAPHY PROCESS

METHOD AND APPARATUS FOR PROCESSING SUBSTRATE EDGES

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND INS...

COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE