of mask or workpiece

Industry

CPC
G03F7/70866

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70866of mask or workpiece

Industries

Patents Grantslast 30 patents

Information Patent Grant
Reticle detection apparatus, reticle detection method, exposure mac...
- Patent number 12,117,738
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure system, and method for manufacturing elec...
- Patent number 12,105,425
- Issue date Oct 1, 2024
- Gigaphoton Inc.
- Koichi Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask cleaning
- Patent number 11,921,434
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,789,369
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,789,371
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus and method using the same
- Patent number 11,740,564
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask cleaning
- Patent number 11,740,563
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask chuck and mask manufacturing apparatus including same
- Patent number 11,619,885
- Issue date Apr 4, 2023
- Samsung Display Co., Ltd.
- Junho Jo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,609,504
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for generating drop patterns
- Patent number 11,556,055
- Issue date Jan 17, 2023
- Canon Kabushiki Kaisha
- Ahmed M. Hussein
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,409,203
- Issue date Aug 9, 2022
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Humidity control in EUV lithography
- Patent number 11,307,504
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer table with dynamic support pins
- Patent number 11,302,566
- Issue date Apr 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask chuck and mask manufacturing apparatus including same
- Patent number 11,287,749
- Issue date Mar 29, 2022
- Samsung Display Co., Ltd.
- Junho Jo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask cleaning
- Patent number 11,256,179
- Issue date Feb 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Supporting frame for pellicle, pellicle, method for manufacturing s...
- Patent number 11,243,463
- Issue date Feb 8, 2022
- Mitsui Chemicals, Inc.
- Akira Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 11,226,568
- Issue date Jan 18, 2022
- ASML Netherlands B.V.
- Paul Van Dongen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer table with dynamic support pins
- Patent number 11,217,475
- Issue date Jan 4, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate table, immersion lithographic apparatus and device manufa...
- Patent number 11,215,933
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Marco Koert Stavenga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,209,738
- Issue date Dec 28, 2021
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle suppression systems and methods
- Patent number 11,204,558
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and article manufacturing method
- Patent number 11,199,784
- Issue date Dec 14, 2021
- Canon Kabushiki Kaisha
- Atsushi Shigenobu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process delay characterization and effective dose compe...
- Patent number 11,194,254
- Issue date Dec 7, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle suppression systems and methods
- Patent number 11,137,694
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation device and electronic device m...
- Patent number 11,126,095
- Issue date Sep 21, 2021
- Gigaphoton Inc.
- Georg Saumagne
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,061,322
- Issue date Jul 13, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device cooling system and method of thermally conditioni...
- Patent number 11,036,148
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of a lithography apparatus or patterning process based...
- Patent number 11,029,594
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,016,395
- Issue date May 25, 2021
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240248417
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Yoji SAKATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20240248413
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
- Publication number 20240219828
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Ho Jin JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20240192611
- Publication date Jun 13, 2024
- SEMES CO., LTD.
- Ho Jin JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...
- Publication number 20240027923
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Tomoya ONITSUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20230369060
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Hai YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Cleaning
- Publication number 20230124211
- Publication date Apr 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY
- Publication number 20230066297
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guancyun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV RETICLE STOCKER AND METHOD OF OPERATING THE SAME
- Publication number 20230011873
- Publication date Jan 12, 2023
- BROOKS AUTOMATION (GERMANY) GMBH
- Lutz Rebstock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING ELEC...
- Publication number 20220390851
- Publication date Dec 8, 2022
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Cleaning
- Publication number 20220179326
- Publication date Jun 9, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK CHUCK AND MASK MANUFACTURING APPARATUS INCLUDING SAME
- Publication number 20220179322
- Publication date Jun 9, 2022
- SAMSUNG DISPLAY CO., LTD.
- JUNHO JO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFA...
- Publication number 20220121131
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Marco Koert STAVENGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20220113641
- Publication date Apr 14, 2022
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK CHUCK AND MASK MANUFACTURING APPARATUS INCLUDING SAME
- Publication number 20220026813
- Publication date Jan 27, 2022
- SAMSUNG DISPLAY CO., LTD.
- JUNHO JO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR GENERATING DROP PATTERNS
- Publication number 20210397082
- Publication date Dec 23, 2021
- Canon Kabushiki Kaisha
- Ahmed M. Hussein
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...
- Publication number 20210302828
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...
- Publication number 20210271173
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Yu CAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE SUPPRESSION SYSTEMS AND METHODS
- Publication number 20210173315
- Publication date Jun 10, 2021
- ASML NETHERLANDS B.V.
- Yang-Shan HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Process Delay Characterization and Effective Dose Compe...
- Publication number 20210132502
- Publication date May 6, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20210096476
- Publication date Apr 1, 2021
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE M...
- Publication number 20210080842
- Publication date Mar 18, 2021
- Gigaphoton Inc.
- Georg SAUMAGNE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Wafer Table with Dynamic Support Pins
- Publication number 20210035848
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20200401057
- Publication date Dec 24, 2020
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20200393770
- Publication date Dec 17, 2020
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20200363734
- Publication date Nov 19, 2020
- Canon Kabushiki Kaisha
- Atsushi Shigenobu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Humidity Control in EUV Lithography
- Publication number 20200319565
- Publication date Oct 8, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Table With Dynamic Support Pins
- Publication number 20200273741
- Publication date Aug 27, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING DEVICE, MANUFACTURING METHOD FOR A PATTERNING DEVICE, SY...
- Publication number 20200232933
- Publication date Jul 23, 2020
- ASML NETHERLANDS B.V.
- Thomas Leo Maria HOOGENBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

of mask or workpiece

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reticle detection apparatus, reticle detection method, exposure mac...

Exposure method, exposure system, and method for manufacturing elec...

Mask cleaning

Lithographic apparatus and device manufacturing method

Methods of determining scattering of radiation by structures of fin...

Lithography apparatus and method using the same

Mask cleaning

Mask chuck and mask manufacturing apparatus including same

Lithographic apparatus and device manufacturing method

Systems and methods for generating drop patterns

Methods of determining scattering of radiation by structures of fin...

Humidity control in EUV lithography

Wafer table with dynamic support pins

Mask chuck and mask manufacturing apparatus including same

Systems and methods using mask pattern measurements performed with...

Mask cleaning

Supporting frame for pellicle, pellicle, method for manufacturing s...

Lithographic apparatus and method

Wafer table with dynamic support pins

Substrate table, immersion lithographic apparatus and device manufa...

Lithographic apparatus and device manufacturing method

Particle suppression systems and methods

Exposure apparatus and article manufacturing method

Lithography process delay characterization and effective dose compe...

Particle suppression systems and methods

Extreme ultraviolet light generation device and electronic device m...

Systems and methods using mask pattern measurements performed with...

Patterning device cooling system and method of thermally conditioni...

Optimization of a lithography apparatus or patterning process based...

Methods of determining scattering of radiation by structures of fin...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...

METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE

Mask Cleaning

STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY

EUV RETICLE STOCKER AND METHOD OF OPERATING THE SAME

EXPOSURE METHOD, EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING ELEC...

Mask Cleaning

MASK CHUCK AND MASK MANUFACTURING APPARATUS INCLUDING SAME

SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFA...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

MASK CHUCK AND MASK MANUFACTURING APPARATUS INCLUDING SAME

SYSTEMS AND METHODS FOR GENERATING DROP PATTERNS

SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...

METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...

PARTICLE SUPPRESSION SYSTEMS AND METHODS

Lithography Process Delay Characterization and Effective Dose Compe...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE M...

Wafer Table with Dynamic Support Pins

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic Apparatus and Method

EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD

Humidity Control in EUV Lithography

Wafer Table With Dynamic Support Pins

PATTERNING DEVICE, MANUFACTURING METHOD FOR A PATTERNING DEVICE, SY...