of optical system

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G03F7/70883

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70883of optical system

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for avoiding a degradation of an optical element, projection...
- Patent number 12,140,877
- Issue date Nov 12, 2024
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus and article manufacturing method
- Patent number 12,140,876
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Tsutomu Terao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for measuring a substrate and method for correcting cyclic e...
- Patent number 12,135,211
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Stephan Zschaeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual vacuum seal
- Patent number 12,044,313
- Issue date Jul 23, 2024
- KLA Corporation
- Francis Chilese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,762,304
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Güneş Nakiboğlu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mounting arrangement for optical systems
- Patent number 11,692,816
- Issue date Jul 4, 2023
- Cognex Corporation
- Andrew Goodale
- G01 - MEASURING TESTING
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an optical apparatus, and optical apparatus
- Patent number 11,307,505
- Issue date Apr 19, 2022
- Carl Zeiss SMT GmbH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and cleaning method thereof
- Patent number 11,287,755
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Ta Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 11,281,108
- Issue date Mar 22, 2022
- SCREEN Holdings Co., Ltd.
- You Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens control for lithography tools
- Patent number 11,221,563
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh Lin Yang
- G02 - OPTICS
Information Patent Grant
Method for localizing assembly errors
- Patent number 11,175,595
- Issue date Nov 16, 2021
- Carl Zeiss SMT GmbH
- Thomas Niederhausen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Non-contact measurement of a stress in a film on substrate
- Patent number 11,105,611
- Issue date Aug 31, 2021
- APPLEJACK 199 L.P.
- Wojciech J Walecki
- G01 - MEASURING TESTING
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 11,086,237
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for removing residues from source vessel
- Patent number 11,048,179
- Issue date Jun 29, 2021
- Samsung Electronics Co., Ltd.
- Ho Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective lens protection device, objective lens system and lithogr...
- Patent number 10,983,448
- Issue date Apr 20, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Xianming Li
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet exposure apparatus and method, and method of ma...
- Patent number 10,969,691
- Issue date Apr 6, 2021
- Samsung Electronics Co., Ltd.
- Seung-yoon Lee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus, lithographic projection apparatus and devic...
- Patent number 10,955,761
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and cleaning method thereof
- Patent number 10,942,459
- Issue date Mar 9, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Ta Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with actively adjustable metrology supp...
- Patent number 10,890,850
- Issue date Jan 12, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for a projection exposure apparatus
- Patent number 10,866,528
- Issue date Dec 15, 2020
- Carl Zeiss SMT GmbH
- Thomas Wolfsteiner
- G02 - OPTICS
Information Patent Grant
Lens control for lithography tools
- Patent number 10,845,717
- Issue date Nov 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh Lin Yang
- G02 - OPTICS
Information Patent Grant
Projection exposure system for semiconductor lithography, comprisin...
- Patent number 10,712,677
- Issue date Jul 14, 2020
- Carl Zeiss SMT GmbH
- Irene Ament
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,705,439
- Issue date Jul 7, 2020
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,678,139
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for delivering gas and illumination source for generating...
- Patent number 10,630,037
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Sudhir Srivastava
- G01 - MEASURING TESTING
Information Patent Grant
Lens control for lithography tools
- Patent number 10,627,727
- Issue date Apr 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh Lin Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,599,054
- Issue date Mar 24, 2020
- ASML Holding N.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PULSE STRETCHER APPARATUS
- Publication number 20250208404
- Publication date Jun 26, 2025
- CYMER, LLC
- Thao Trieu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20250202184
- Publication date Jun 19, 2025
- CYMER, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250174452
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHIC SYSTEM
- Publication number 20240152058
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Wonki LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Frequency and Amplitude Modulation of Implant Dose for Stress Manag...
- Publication number 20240103385
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Pradeep K. SUBRAHMANYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING T...
- Publication number 20230324649
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Thomas Gorius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229091
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR USE IN A METROLOGY PROCESS OR LITHOGRAPHIC PROCESS
- Publication number 20230205101
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Luuc KEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL ELEMENT, PROJECTION...
- Publication number 20220308463
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Dirk EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR MEASURING A SUBSTRATE AND METHOD FOR CORRECTING CYCLIC E...
- Publication number 20220260359
- Publication date Aug 18, 2022
- Carl Zeiss SMT GMBH
- Stephan Zschaeck
- G01 - MEASURING TESTING
Information Patent Application
MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20220187516
- Publication date Jun 16, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20220158401
- Publication date May 19, 2022
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20210364934
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND CLEANING METHOD THEREOF
- Publication number 20210191284
- Publication date Jun 24, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Ta Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20210088911
- Publication date Mar 25, 2021
- SCREEN Holdings Co., Ltd.
- You Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS CONTROL FOR LITHOGRAPHY TOOLS
- Publication number 20210033984
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yueh Lin YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND CLEANING METHOD THEREOF
- Publication number 20210033990
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Ta Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR REMOVING RESIDUES FROM SOURCE VESSEL
- Publication number 20200363736
- Publication date Nov 19, 2020
- Samsung Electronics Co., Ltd.
- Ho YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS CONTROL FOR LITHOGRAPHY TOOLS
- Publication number 20200209764
- Publication date Jul 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yueh Lin YANG
- G02 - OPTICS
Information Patent Application
METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS
- Publication number 20200183292
- Publication date Jun 11, 2020
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR IMMERSION GRATING LITHOGRAPHY
- Publication number 20200159122
- Publication date May 21, 2020
- Newport Corporation
- Svetlen H. Tonchev
- G02 - OPTICS
Information Patent Application
PELLICLE FOR PHOTOMASK, RETICLE INCLUDING THE SAME, AND EXPOSURE AP...
- Publication number 20200117078
- Publication date Apr 16, 2020
- Samsung Electronics Co., Ltd.
- Hyeonjin SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR LOCALIZING ASSEMBLY ERRORS
- Publication number 20200012197
- Publication date Jan 9, 2020
- Carl Zeiss SMT GMBH
- Thomas Niederhausen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EVALUATION METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING AN...
- Publication number 20190361355
- Publication date Nov 28, 2019
- Canon Kabushiki Kaisha
- Bunsuke Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190294058
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190250518
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Joeri LOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...
- Publication number 20190243258
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Irene AMENT
- B08 - CLEANING

of optical system

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for avoiding a degradation of an optical element, projection...

Processing apparatus and article manufacturing method

Device for measuring a substrate and method for correcting cyclic e...

Extreme ultraviolet lithography system

Dual vacuum seal

Prolonging optical element lifetime in an EUV lithography system

Lithographic apparatus

Mounting arrangement for optical systems

Prolonging optical element lifetime in an EUV lithography system

Method for operating an optical apparatus, and optical apparatus

Lithography system and cleaning method thereof

Exposure device

Lens control for lithography tools

Method for localizing assembly errors

Non-contact measurement of a stress in a film on substrate

Extreme ultraviolet lithography system

Apparatus for removing residues from source vessel

Objective lens protection device, objective lens system and lithogr...

Extreme ultraviolet exposure apparatus and method, and method of ma...

Lithographic apparatus, lithographic projection apparatus and devic...

Lithography system and cleaning method thereof

Optical imaging arrangement with actively adjustable metrology supp...

Component for a projection exposure apparatus

Lens control for lithography tools

Projection exposure system for semiconductor lithography, comprisin...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Apparatus for delivering gas and illumination source for generating...

Lens control for lithography tools

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

OPTICAL PULSE STRETCHER APPARATUS

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

IMMERSION LITHOGRAPHIC SYSTEM

Frequency and Amplitude Modulation of Implant Dose for Stress Manag...

FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING T...

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

APPARATUS FOR USE IN A METROLOGY PROCESS OR LITHOGRAPHIC PROCESS

METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL ELEMENT, PROJECTION...

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

DEVICE FOR MEASURING A SUBSTRATE AND METHOD FOR CORRECTING CYCLIC E...

MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

LITHOGRAPHY SYSTEM AND CLEANING METHOD THEREOF

EXPOSURE DEVICE

LENS CONTROL FOR LITHOGRAPHY TOOLS

LITHOGRAPHY SYSTEM AND CLEANING METHOD THEREOF

APPARATUS FOR REMOVING RESIDUES FROM SOURCE VESSEL

LENS CONTROL FOR LITHOGRAPHY TOOLS

METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS

METHOD AND APPARATUS FOR IMMERSION GRATING LITHOGRAPHY

PELLICLE FOR PHOTOMASK, RETICLE INCLUDING THE SAME, AND EXPOSURE AP...

METHOD FOR LOCALIZING ASSEMBLY ERRORS

EVALUATION METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING AN...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...