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H01L21/31654

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31654of semiconductor materials

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods of forming a semiconductor device by thermally treating a c...
- Patent number 9,799,523
- Issue date Oct 24, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui OuYang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post treatment methods for oxide layers on semiconductor devices
- Patent number 9,431,237
- Issue date Aug 30, 2016
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a semiconductor device
- Patent number 9,159,582
- Issue date Oct 13, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui OuYang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 9,059,229
- Issue date Jun 16, 2015
- Hitachi Kokusai Electric Inc.
- Tadashi Terasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor gate structure and semiconductor g...
- Patent number 9,006,088
- Issue date Apr 14, 2015
- Tsinghua University
- Mei Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device with a contact pad on a sl...
- Patent number 8,674,511
- Issue date Mar 18, 2014
- Toyota Jidosha Kabushiki Kaisha
- Masaru Senoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction using oxide spacer
- Patent number 8,592,318
- Issue date Nov 26, 2013
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric structures
- Patent number 8,421,140
- Issue date Apr 16, 2013
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for growing thin oxide films on silicon while...
- Patent number 8,236,706
- Issue date Aug 7, 2012
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures resulting from selective oxidation
- Patent number 8,227,875
- Issue date Jul 24, 2012
- Micron Technology, Inc.
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 8,183,670
- Issue date May 22, 2012
- Foundation fõr Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra shallow junction formation by epitaxial interface limited dif...
- Patent number 8,067,805
- Issue date Nov 29, 2011
- International Business Machines Corporation
- Huajie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor, method of manufacturing same, display device,...
- Patent number 8,039,403
- Issue date Oct 18, 2011
- Sharp Kabushiki Kaisha
- Shigeki Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for insulating film formation, storage medium from which inf...
- Patent number 8,034,179
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon oxide film and method of production of se...
- Patent number 8,026,187
- Issue date Sep 27, 2011
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for rapid thermal treatment using high energy electromagneti...
- Patent number 7,989,363
- Issue date Aug 2, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- David Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods of laser assisted field induced oxide nanopatter...
- Patent number 7,976,765
- Issue date Jul 12, 2011
- Northwestern University
- Mark C. Hersam
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Ultra shallow junction formation by epitaxial interface limited dif...
- Patent number 7,816,237
- Issue date Oct 19, 2010
- International Business Machines Corporation
- Huajie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of semiconductor integrated circuit device
- Patent number 7,759,224
- Issue date Jul 20, 2010
- Renesas Technology Corp.
- Chuichi Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of selectively oxidizing semiconductor structures, and stru...
- Patent number 7,749,849
- Issue date Jul 6, 2010
- Micron Technology, Inc.
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for evaluating a gate insulation film characteristic for use...
- Patent number 7,696,047
- Issue date Apr 13, 2010
- Seiko Epson Corporation
- Masayasu Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Peripheral processing method and method of manufacturing a semicond...
- Patent number 7,638,439
- Issue date Dec 29, 2009
- Kabushiki Kaisha Toshiba
- Takeo Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming shallow trench isolation of semiconductor device
- Patent number 7,615,461
- Issue date Nov 10, 2009
- Hynix Semiconductor Inc.
- Seung Bum Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor, method of manufacturing same, display device,...
- Patent number 7,595,230
- Issue date Sep 29, 2009
- Sharp Kabushiki Kaisha
- Shigeki Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of semiconductor integrated circuit device
- Patent number 7,452,787
- Issue date Nov 18, 2008
- Renesas Technology Corp.
- Chuichi Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra shallow junction formation by epitaxial interface limited dif...
- Patent number 7,402,870
- Issue date Jul 22, 2008
- International Business Machines Corporation
- Huajie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate manufacturing method and substrate processing apparatus
- Patent number 7,256,104
- Issue date Aug 14, 2007
- Canon Kabushiki Kaisha
- Masataka Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled growth of highly uniform, oxide layers, especially ultra...
- Patent number 7,235,495
- Issue date Jun 26, 2007
- FSI International, Inc.
- Thomas J. Wagener
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of surface treatment for manufacturing semiconductor device
- Patent number 7,179,746
- Issue date Feb 20, 2007
- Foundation fõr Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective plasma re-oxidation process using pulsed RF source power
- Patent number 7,141,514
- Issue date Nov 28, 2006
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Substrate Processing Apparatus and Method of Manufacturing Semicond...
- Publication number 20140106573
- Publication date Apr 17, 2014
- Hitachi Kokusai Electric Inc.
- Tadashi TERASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20130034955
- Publication date Feb 7, 2013
- Toyota Jidosha Kabushiki Kaisha
- Masaru Senoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...
- Publication number 20120298039
- Publication date Nov 29, 2012
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20120208375
- Publication date Aug 16, 2012
- Foundation for Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PITCH REDUCTION USING OXIDE SPACER
- Publication number 20120052683
- Publication date Mar 1, 2012
- LAM RESEARCH CORPORATION
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INSULATING FILM FORMATION, STORAGE MEDIUM FROM WHICH INF...
- Publication number 20110039418
- Publication date Feb 17, 2011
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post Treatment Methods for Oxide Layers on Semiconductor Devices
- Publication number 20100267248
- Publication date Oct 21, 2010
- Applied Materials, Inc.
- Kai Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20100258943
- Publication date Oct 14, 2010
- Masaru Senoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES RESULTING FROM SELECTIVE OXIDATION
- Publication number 20100244158
- Publication date Sep 30, 2010
- Micron Technology, Inc.
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SILICON OXIDE FILM AND METHOD OF PRODUCTION OF SE...
- Publication number 20100184267
- Publication date Jul 22, 2010
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...
- Publication number 20100151694
- Publication date Jun 17, 2010
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IC FORMED WITH DENSIFIED CHEMICAL OXIDE LAYER
- Publication number 20100032813
- Publication date Feb 11, 2010
- TEXAS INSTRUMENTS INCORPORATED
- Deborah J. Riley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Rapid Thermal Treatment Using High Energy Electromagneti...
- Publication number 20100009528
- Publication date Jan 14, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- David GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming an Oxide Layer and Methods of Forming a Gate Usi...
- Publication number 20090239368
- Publication date Sep 24, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Jae Hwa Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF SELECTIVELY OXIDIZING SEMICONDUCTOR STRUCTURES, AND STRU...
- Publication number 20090152629
- Publication date Jun 18, 2009
- Micron Technology, Inc.
- Yongjun Jeff Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR, METHOD OF MANUFACTURING SAME, DISPLAY DEVICE,...
- Publication number 20090137131
- Publication date May 28, 2009
- Sharp Kabushiki Kaisha
- Shigeki IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming a Semiconductor Device
- Publication number 20090117750
- Publication date May 7, 2009
- Interuniversitair Microelektronica Centrum (IMEC)
- Hui OuYang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHODS OF LASER ASSISTED FIELD INDUCED OXIDE NANOPATTER...
- Publication number 20090085258
- Publication date Apr 2, 2009
- Northwestern University
- Mark C. HERSAM
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
- Publication number 20090029564
- Publication date Jan 29, 2009
- TOKYO ELECTRON LIMITED
- Jun Yamashita
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR EVALUATING A GATE INSULATION FILM CHARACTERISTIC FOR USE...
- Publication number 20080293170
- Publication date Nov 27, 2008
- SEIKO EPSON CORPORATION
- Masayasu Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication Method of Semiconductor Integrated Circuit Device
- Publication number 20080286948
- Publication date Nov 20, 2008
- Chuichi Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA SHALLOW JUNCTION FORMATION BY EPITAXIAL INTERFACE LIMITED DIF...
- Publication number 20080233687
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Huajie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA SHALLOW JUNCTION FORMATION BY EPITAXIAL INTERFACE LIMITED DIF...
- Publication number 20080230840
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Huajie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Shallow Trench Isolation of Semiconductor Device
- Publication number 20080200006
- Publication date Aug 21, 2008
- Hynix Semiconductor Inc.
- Seung Bum Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Peripheral processing method and method of manufacturing a semicond...
- Publication number 20070264822
- Publication date Nov 15, 2007
- Takeo Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlled growth of highly uniform, oxide layers, especially ultra...
- Publication number 20070218668
- Publication date Sep 20, 2007
- Thomas J. Wagener
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20070215572
- Publication date Sep 20, 2007
- Kimitsugu Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20070190746
- Publication date Aug 16, 2007
- Canon Kabushiki Kaisha
- Masataka Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20070145535
- Publication date Jun 28, 2007
- Foundation for Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, an electronic device and an electronic apparatus
- Publication number 20070145513
- Publication date Jun 28, 2007
- SEIKO EPSON CORPORATION
- Masayasu Miyata
- H01 - BASIC ELECTRIC ELEMENTS

of semiconductor materials

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of forming a semiconductor device by thermally treating a c...

Post treatment methods for oxide layers on semiconductor devices

Methods of forming a semiconductor device

Substrate processing apparatus and method of manufacturing semicond...

Method for forming semiconductor gate structure and semiconductor g...

Method of forming a semiconductor device with a contact pad on a sl...

Pitch reduction using oxide spacer

Dielectric structures

Method and apparatus for growing thin oxide films on silicon while...

Semiconductor structures resulting from selective oxidation

Semiconductor device and method of manufacturing the same

Ultra shallow junction formation by epitaxial interface limited dif...

Thin film transistor, method of manufacturing same, display device,...

Method for insulating film formation, storage medium from which inf...

Method of forming silicon oxide film and method of production of se...

Method for rapid thermal treatment using high energy electromagneti...

System and methods of laser assisted field induced oxide nanopatter...

Ultra shallow junction formation by epitaxial interface limited dif...

Fabrication method of semiconductor integrated circuit device

Methods of selectively oxidizing semiconductor structures, and stru...

Method for evaluating a gate insulation film characteristic for use...

Peripheral processing method and method of manufacturing a semicond...

Method for forming shallow trench isolation of semiconductor device

Thin film transistor, method of manufacturing same, display device,...

Fabrication method of semiconductor integrated circuit device

Ultra shallow junction formation by epitaxial interface limited dif...

Substrate manufacturing method and substrate processing apparatus

Controlled growth of highly uniform, oxide layers, especially ultra...

Method of surface treatment for manufacturing semiconductor device

Selective plasma re-oxidation process using pulsed RF source power

Patents Applicationslast 30 patents

Substrate Processing Apparatus and Method of Manufacturing Semicond...

SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PITCH REDUCTION USING OXIDE SPACER

METHOD FOR INSULATING FILM FORMATION, STORAGE MEDIUM FROM WHICH INF...

Post Treatment Methods for Oxide Layers on Semiconductor Devices

SEMICONDUCTOR DEVICE

SEMICONDUCTOR STRUCTURES RESULTING FROM SELECTIVE OXIDATION

METHOD OF FORMING SILICON OXIDE FILM AND METHOD OF PRODUCTION OF SE...

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...

IC FORMED WITH DENSIFIED CHEMICAL OXIDE LAYER

Method for Rapid Thermal Treatment Using High Energy Electromagneti...

Methods of Forming an Oxide Layer and Methods of Forming a Gate Usi...

METHODS OF SELECTIVELY OXIDIZING SEMICONDUCTOR STRUCTURES, AND STRU...

THIN FILM TRANSISTOR, METHOD OF MANUFACTURING SAME, DISPLAY DEVICE,...

Methods of Forming a Semiconductor Device

SYSTEM AND METHODS OF LASER ASSISTED FIELD INDUCED OXIDE NANOPATTER...

PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD

METHOD FOR EVALUATING A GATE INSULATION FILM CHARACTERISTIC FOR USE...

Fabrication Method of Semiconductor Integrated Circuit Device

ULTRA SHALLOW JUNCTION FORMATION BY EPITAXIAL INTERFACE LIMITED DIF...

ULTRA SHALLOW JUNCTION FORMATION BY EPITAXIAL INTERFACE LIMITED DIF...

Method for Forming Shallow Trench Isolation of Semiconductor Device

Peripheral processing method and method of manufacturing a semicond...

Controlled growth of highly uniform, oxide layers, especially ultra...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

Semiconductor device and method of manufacturing the same

Semiconductor device, an electronic device and an electronic apparatus