of siliconnitrides

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H01L21/3185

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3185of siliconnitrides

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods of manufacturing an integrated circuit having stress tuning...
- Patent number 11,935,842
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shin-Puu Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing an integrated circuit having stress tuning...
- Patent number 11,094,646
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shin-Puu Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 10,541,332
- Issue date Jan 21, 2020
- Sony Corporation
- Yuki Miyanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing an integrated circuit having stress tuning...
- Patent number 10,269,730
- Issue date Apr 23, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shin-Puu Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus for forming film including at least...
- Patent number 10,026,607
- Issue date Jul 17, 2018
- Hitachi Kokusai Electric, Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication technique for high frequency, high power group III nitr...
- Patent number 9,882,039
- Issue date Jan 30, 2018
- University of South Carolina
- M. Asif Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 9,799,768
- Issue date Oct 24, 2017
- Sony Corporation
- Yuki Miyanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 9,761,718
- Issue date Sep 12, 2017
- Sony Corporation
- Yuki Miyanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate dielectric for high-k metal gate devices
- Patent number 9,711,373
- Issue date Jul 18, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon nitride film, and semiconductor device
- Patent number 9,679,918
- Issue date Jun 13, 2017
- Semiconductor Energy Laboratory Co., Ltd.
- Toru Takayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of manufacturing an integrated circuit having stress tuning...
- Patent number 9,633,954
- Issue date Apr 25, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shin-Puu Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device for forming film inclu...
- Patent number 9,478,417
- Issue date Oct 25, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,971
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of manufacturing a semiconductor device by for...
- Patent number 9,385,013
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device by forming a film on...
- Patent number 9,384,966
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device by forming a film on...
- Patent number 9,384,968
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,969
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,972
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device by forming a film on...
- Patent number 9,384,967
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,970
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vaporizing unit, film forming apparatus, film forming method, compu...
- Patent number 9,343,295
- Issue date May 17, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and substrate processi...
- Patent number 9,330,904
- Issue date May 3, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, method of processing...
- Patent number 9,318,316
- Issue date Apr 19, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve etch selectivity during silicon nitride spacer etch
- Patent number 9,318,343
- Issue date Apr 19, 2016
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and substrate processi...
- Patent number 9,312,123
- Issue date Apr 12, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated circuit having stress tuning layer
- Patent number 9,275,948
- Issue date Mar 1, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shin-Puu Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device using the same
- Patent number 9,269,568
- Issue date Feb 23, 2016
- Wonik IPS Co., Ltd.
- Young Soo Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure with different fins of FinFETs
- Patent number 9,184,292
- Issue date Nov 10, 2015
- United Microelectronics Corp.
- Chin-Fu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing chip stacks
- Patent number 9,123,829
- Issue date Sep 1, 2015
- Infineon Technologies AG
- Hans-Joachim Barth
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
CVD precursors
- Patent number 9,117,664
- Issue date Aug 25, 2015
- Dow Corning Corporation
- Xiaobing Zhou
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR STRUCTURE WITH DIFFERENT FINS OF FINFETS
- Publication number 20140332824
- Publication date Nov 13, 2014
- Chin-Fu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- Publication number 20140322920
- Publication date Oct 30, 2014
- Young Soo KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELETRIC CAP HAVING MATERIAL WITH OPTICAL BAND GAP TO SUBSTANTIALL...
- Publication number 20140302685
- Publication date Oct 9, 2014
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD PRECURSORS
- Publication number 20140256159
- Publication date Sep 11, 2014
- Dow Corning Corporation
- XIAOBING ZHOU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20140256157
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Ikuo SAWADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...
- Publication number 20140065840
- Publication date Mar 6, 2014
- Hitachi Kokusai Electric Inc.
- Naonori Akae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20140057459
- Publication date Feb 27, 2014
- Mitsubishi Heavy Industries, Ltd.
- Tadashi Shimazu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
- Publication number 20140045345
- Publication date Feb 13, 2014
- Fujitsu Limited
- Kozo MAKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Novel Fabrication Technique for High Frequency, High Power Group II...
- Publication number 20140015011
- Publication date Jan 16, 2014
- M. Asif Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER FOR A GATE ELECTRODE HAVING TENSILE STRESS AND A METHOD OF F...
- Publication number 20140011302
- Publication date Jan 9, 2014
- GLOBALFOUNDRIES INC.
- Hartmut Ruelke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing chip stacks
- Publication number 20140004657
- Publication date Jan 2, 2014
- INFINEON TECHNOLOGIES AG
- Hans-Joachim BARTH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENT FOR LOW K DIELECTRICS TO CONDUCTIVE MATERIALS
- Publication number 20130230986
- Publication date Sep 5, 2013
- Applied Materials, Inc.
- NAGARAJAN RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING FINFETS AND SEMICONDUCTOR STRUCTURE FABRICAT...
- Publication number 20130207122
- Publication date Aug 15, 2013
- United Microelectronics Corp.
- Chin-Fu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Temperature Deposition of Silicon-Containing Films
- Publication number 20130189853
- Publication date Jul 25, 2013
- TOKYO ELECTRON LIMITED
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESS
- Publication number 20130171837
- Publication date Jul 4, 2013
- Te-Lin Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20130149872
- Publication date Jun 13, 2013
- L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEO...
- Yoshiro HIROSE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated Circuit Having Stress Tuning Layer and Methods of Manufa...
- Publication number 20130140715
- Publication date Jun 6, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shin-Puu Jeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM AND METH...
- Publication number 20130072033
- Publication date Mar 21, 2013
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manufacturing Method of Semiconductor Device and Substrate Processi...
- Publication number 20130068159
- Publication date Mar 21, 2013
- Hitachi Kokusai Electric Inc.
- Takahiro Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of a Masking Layer on a Dielectric Region to Facilitate F...
- Publication number 20130072026
- Publication date Mar 21, 2013
- Intermolecular, Inc.
- David E. Lazovsky
- B82 - NANO-TECHNOLOGY
Information Patent Application
ORGANOMETALLIC COMPOUNDS
- Publication number 20130047890
- Publication date Feb 28, 2013
- Scott Houston Meiere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOMETALLIC COMPOUNDS
- Publication number 20130052349
- Publication date Feb 28, 2013
- Scott Houston Meiere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CIRCUIT SYSTEM INCLUDING NITRIDE LAYER TECHNOLOGY
- Publication number 20130034954
- Publication date Feb 7, 2013
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Sripad Sheshagiri Nagarad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120322272
- Publication date Dec 20, 2012
- FUJITSU SEMICONDUCTOR LIMITED
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON PO...
- Publication number 20120301706
- Publication date Nov 29, 2012
- International Business Machines Corporation
- Andrew J. Kellock
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20120279451
- Publication date Nov 8, 2012
- FUJITSU SEMICONDUCTOR LIMITED
- Katsuaki Ookoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon Nitride Film, A Semiconductor Device, A Display Device and...
- Publication number 20120270413
- Publication date Oct 25, 2012
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shinji Maekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS CAPABLE OF CLEANING INSIDE THEREOF A...
- Publication number 20120266817
- Publication date Oct 25, 2012
- Tomohide KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING THE GATE INSULATOR OF A MOS TRANSISTOR
- Publication number 20120270410
- Publication date Oct 25, 2012
- Olivier Gourhant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of a Masking Layer on a Dielectric Region to Facilitate F...
- Publication number 20120258595
- Publication date Oct 11, 2012
- Intermolecular, Inc.
- David E. Lazovsky
- B82 - NANO-TECHNOLOGY

of siliconnitrides

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of manufacturing an integrated circuit having stress tuning...

Methods of manufacturing an integrated circuit having stress tuning...

Semiconductor device and method for manufacturing same

Methods of manufacturing an integrated circuit having stress tuning...

Substrate processing apparatus for forming film including at least...

Fabrication technique for high frequency, high power group III nitr...

Semiconductor device and method for manufacturing same

Semiconductor device and method for manufacturing same

Method of fabricating a gate dielectric for high-k metal gate devices

Silicon nitride film, and semiconductor device

Methods of manufacturing an integrated circuit having stress tuning...

Method of manufacturing semiconductor device for forming film inclu...

Method of manufacturing semiconductor device by forming a film on a...

Method and apparatus of manufacturing a semiconductor device by for...

Method of manufacturing a semiconductor device by forming a film on...

Method of manufacturing a semiconductor device by forming a film on...

Method of manufacturing semiconductor device by forming a film on a...

Method of manufacturing semiconductor device by forming a film on a...

Method of manufacturing a semiconductor device by forming a film on...

Method of manufacturing semiconductor device by forming a film on a...

Vaporizing unit, film forming apparatus, film forming method, compu...

Method of manufacturing semiconductor device and substrate processi...

Method of manufacturing semiconductor device, method of processing...

Method to improve etch selectivity during silicon nitride spacer etch

Method of manufacturing semiconductor device and substrate processi...

Integrated circuit having stress tuning layer

Method of manufacturing semiconductor device using the same

Semiconductor structure with different fins of FinFETs

Method for producing chip stacks

CVD precursors

Patents Applicationslast 30 patents

SEMICONDUCTOR STRUCTURE WITH DIFFERENT FINS OF FINFETS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

DIELETRIC CAP HAVING MATERIAL WITH OPTICAL BAND GAP TO SUBSTANTIALL...

CVD PRECURSORS

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

Novel Fabrication Technique for High Frequency, High Power Group II...

SPACER FOR A GATE ELECTRODE HAVING TENSILE STRESS AND A METHOD OF F...

Method for producing chip stacks

ADHESION IMPROVEMENT FOR LOW K DIELECTRICS TO CONDUCTIVE MATERIALS

METHOD FOR FABRICATING FINFETS AND SEMICONDUCTOR STRUCTURE FABRICAT...

Low Temperature Deposition of Silicon-Containing Films

SEMICONDUCTOR PROCESS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

Integrated Circuit Having Stress Tuning Layer and Methods of Manufa...

PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM AND METH...

Manufacturing Method of Semiconductor Device and Substrate Processi...

Formation of a Masking Layer on a Dielectric Region to Facilitate F...

ORGANOMETALLIC COMPOUNDS

ORGANOMETALLIC COMPOUNDS

INTEGRATED CIRCUIT SYSTEM INCLUDING NITRIDE LAYER TECHNOLOGY

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON PO...

FILM DEPOSITION APPARATUS, METHOD OF MANUFACTURING A SEMICONDUCTOR...

Silicon Nitride Film, A Semiconductor Device, A Display Device and...

SUBSTRATE PROCESSING APPARATUS CAPABLE OF CLEANING INSIDE THEREOF A...

METHOD FOR FORMING THE GATE INSULATOR OF A MOS TRANSISTOR

Formation of a Masking Layer on a Dielectric Region to Facilitate F...