Off-axis setting using a programmable means

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G03F7/70116

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70116Off-axis setting using a programmable means

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for photolithographic imaging
- Patent number 12,117,730
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography device and method of operating extr...
- Patent number 11,960,212
- Issue date Apr 16, 2024
- Samsung Electronics Co., Ltd.
- Hoduk Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of assembling a facet mirror of an optical system
- Patent number 11,841,620
- Issue date Dec 12, 2023
- Carl Zeiss SMT GmbH
- Andreas Königer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to register template with spatial light modulator
- Patent number 11,768,445
- Issue date Sep 26, 2023
- Canon Kabushiki Kaisha
- James W. Irving
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable illuminator for lithography systems
- Patent number 11,543,753
- Issue date Jan 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matching pupil determination
- Patent number 11,460,782
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G02 - OPTICS
Information Patent Grant
Optical arrangement and lithography apparatus
- Patent number 11,402,760
- Issue date Aug 2, 2022
- Carl Zeiss SMT GmbH
- Jan Horn
- G02 - OPTICS
Information Patent Grant
Photolithography device having illuminator and method for adjusting...
- Patent number 11,360,392
- Issue date Jun 14, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling extreme ultraviolet light
- Patent number 11,320,744
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Component for a mirror array for EUV lithography
- Patent number 11,126,087
- Issue date Sep 21, 2021
- Carl Zeiss SMT GmbH
- Eric Eva
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Euv lithography system for dense line patterning
- Patent number 11,099,483
- Issue date Aug 24, 2021
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test of operational status of a digital scanner during lithographic...
- Patent number 11,099,007
- Issue date Aug 24, 2021
- Nikon Corporation
- Eric Peter Goodwin
- G01 - MEASURING TESTING
Information Patent Grant
Method for producing a reflective optical element and reflective op...
- Patent number 11,073,765
- Issue date Jul 27, 2021
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly with a protective element and optical arrangement...
- Patent number 11,022,893
- Issue date Jun 1, 2021
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Apparatus and related method to control radiation transmission thro...
- Patent number 10,976,666
- Issue date Apr 13, 2021
- GLOBALFOUNDRIES U.S. INC.
- Ezra D. B. Hall
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit and optical system for EUV projection lit...
- Patent number 10,976,668
- Issue date Apr 13, 2021
- Carl Zeiss SMT GmbH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and article manufacturing method
- Patent number 10,921,717
- Issue date Feb 16, 2021
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system for dense line patterning
- Patent number 10,890,849
- Issue date Jan 12, 2021
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror array
- Patent number 10,845,706
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Marco Matheus Louis Steeghs
- G02 - OPTICS
Information Patent Grant
Spatial light modulator unit, illumination optical system, exposure...
- Patent number 10,768,409
- Issue date Sep 8, 2020
- Nikon Corporation
- Osamu Tanitsu
- G02 - OPTICS
Information Patent Grant
Spatial light modulator, method of driving same, and exposure metho...
- Patent number 10,761,431
- Issue date Sep 1, 2020
- Nikon Corporation
- Yoji Watanabe
- G02 - OPTICS
Information Patent Grant
Determination of operability of a digital scanner with shearing int...
- Patent number 10,753,732
- Issue date Aug 25, 2020
- Nikon Corporation
- Eric Peter Goodwin
- G01 - MEASURING TESTING
Information Patent Grant
Beam transmission system, exposure device, and illumination optical...
- Patent number 10,739,686
- Issue date Aug 11, 2020
- Gigaphoton Inc.
- Akiyoshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flexible illuminator
- Patent number 10,698,226
- Issue date Jun 30, 2020
- ASML Holding N.V.
- Parag Vinayak Kelkar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination device for optimizing polarization in an illumination...
- Patent number 10,690,317
- Issue date Jun 23, 2020
- Nikon Corporation
- Daniel Gene Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, device production...
- Patent number 10,691,026
- Issue date Jun 23, 2020
- Nikon Corporation
- Osamu Tanitsu
- G02 - OPTICS
Information Patent Grant
Imprint system and imprinting process with spatially non-uniform il...
- Patent number 10,663,869
- Issue date May 26, 2020
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for microlithographic projection exposure appara...
- Patent number 10,663,873
- Issue date May 26, 2020
- Carl Zeiss SMT GmbH
- Willi Heintel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror element, in particular for a microlithographic projection ex...
- Patent number 10,598,921
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical device, illumination method, and exposure meth...
- Patent number 10,591,824
- Issue date Mar 17, 2020
- Nikon Corporation
- Toru Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...
- Publication number 20240272058
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Michal Emanuel PAWLOWSKI
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...
- Publication number 20240255855
- Publication date Aug 1, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION...
- Publication number 20240045338
- Publication date Feb 8, 2024
- ESOL Inc.
- Dong Gun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20240019785
- Publication date Jan 18, 2024
- Carl Zeiss SMT GMBH
- Ralf Ameling
- G02 - OPTICS
Information Patent Application
HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
- Publication number 20240012332
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSI...
- Publication number 20240004184
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230384685
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230384686
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20230367230
- Publication date Nov 16, 2023
- Nikon Corporation
- Koichi MURAKAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF...
- Publication number 20230221649
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS TO REGISTER TEMPLATE WITH SPATIAL LIGHT MODULATOR
- Publication number 20230053682
- Publication date Feb 23, 2023
- Canon Kabushiki Kaisha
- James W. Irving
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PUPIL DETERMINATION
- Publication number 20220404718
- Publication date Dec 22, 2022
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROMIRROR ARRAYS
- Publication number 20220342199
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Alexandre HALBACH
- G02 - OPTICS
Information Patent Application
MICROMIRROR ARRAYS
- Publication number 20220283428
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- G02 - OPTICS
Information Patent Application
METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT
- Publication number 20220260927
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssu-Yu CHEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
- Publication number 20220236645
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Joern-Holger FRANKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT AND LITHOGRAPHY APPARATUS
- Publication number 20220004107
- Publication date Jan 6, 2022
- Carl Zeiss SMT GMBH
- Jan Horn
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT
- Publication number 20210364931
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssu-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PUPIL DETERMINATION
- Publication number 20210302844
- Publication date Sep 30, 2021
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G02 - OPTICS
Information Patent Application
APPARATUS AND RELATED METHOD TO CONTROL RADIATION TRANSMISSION THRO...
- Publication number 20210124272
- Publication date Apr 29, 2021
- GLOBALFOUNDRIES U.S. Inc.
- Ezra D.B. Hall
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20200249582
- Publication date Aug 6, 2020
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEST OF OPERATIONAL STATUS OF A DIGITAL SCANNER DURING LITHOGRAPHIC...
- Publication number 20200096326
- Publication date Mar 26, 2020
- Nikon Corporation
- Eric Peter Goodwin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ASSEMBLY WITH HEAT TRANSFER MECHANISM
- Publication number 20190339479
- Publication date Nov 7, 2019
- Nikon Research Corporation
- Christopher Margeson
- G02 - OPTICS
Information Patent Application
TILTING AN OPTICAL ELEMENT
- Publication number 20190243089
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Boaz Pnini-Mittler
- G02 - OPTICS
Information Patent Application
DETERMINATION OF OPERABILITY OF A DIGITAL SCANNER WITH SHEARING INT...
- Publication number 20190204074
- Publication date Jul 4, 2019
- Nikon Corporation
- Eric Peter Goodwin
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION OPTICAL ASSEMBLY, EXPOSURE DEVICE, AND DEVICE MANUFACT...
- Publication number 20190163068
- Publication date May 30, 2019
- Nikon Corporation
- Norio Miyake
- G02 - OPTICS
Information Patent Application
DISCRETE SOURCE MASK OPTIMIZATION
- Publication number 20190155165
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPATIAL LIGHT MODULATOR UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE...
- Publication number 20190155017
- Publication date May 23, 2019
- Nikon Corporation
- OSAMU TANITSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING A LIGHTING SETTING
- Publication number 20190146353
- Publication date May 16, 2019
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Off-axis setting using a programmable means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for photolithographic imaging

Extreme ultraviolet lithography device and method of operating extr...

Method of assembling a facet mirror of an optical system

Method and apparatus to register template with spatial light modulator

Tunable illuminator for lithography systems

Matching pupil determination

Optical arrangement and lithography apparatus

Photolithography device having illuminator and method for adjusting...

Method and apparatus for controlling extreme ultraviolet light

Component for a mirror array for EUV lithography

Euv lithography system for dense line patterning

Test of operational status of a digital scanner during lithographic...

Method for producing a reflective optical element and reflective op...

Optical assembly with a protective element and optical arrangement...

Apparatus and related method to control radiation transmission thro...

Illumination optical unit and optical system for EUV projection lit...

Exposure apparatus and article manufacturing method

EUV lithography system for dense line patterning

Mirror array

Spatial light modulator unit, illumination optical system, exposure...

Spatial light modulator, method of driving same, and exposure metho...

Determination of operability of a digital scanner with shearing int...

Beam transmission system, exposure device, and illumination optical...

Flexible illuminator

Illumination device for optimizing polarization in an illumination...

Illumination optical system, exposure apparatus, device production...

Imprint system and imprinting process with spatially non-uniform il...

Mirror arrangement for microlithographic projection exposure appara...

Mirror element, in particular for a microlithographic projection ex...

Illumination optical device, illumination method, and exposure meth...

Patents Applicationslast 30 patents

HIGH RESOLUTION PHOTOLITHOGRAPHY

INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION...

FACET SYSTEM AND LITHOGRAPHY APPARATUS

HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR

HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSI...

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

EXPOSURE APPARATUS

DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF...

METHOD AND APPARATUS TO REGISTER TEMPLATE WITH SPATIAL LIGHT MODULATOR

MATCHING PUPIL DETERMINATION

MICROMIRROR ARRAYS

MICROMIRROR ARRAYS

METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT

METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING

OPTICAL ARRANGEMENT AND LITHOGRAPHY APPARATUS

METHOD AND APPARATUS FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT

MATCHING PUPIL DETERMINATION

APPARATUS AND RELATED METHOD TO CONTROL RADIATION TRANSMISSION THRO...

EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD

TEST OF OPERATIONAL STATUS OF A DIGITAL SCANNER DURING LITHOGRAPHIC...

MIRROR ASSEMBLY WITH HEAT TRANSFER MECHANISM

TILTING AN OPTICAL ELEMENT

DETERMINATION OF OPERABILITY OF A DIGITAL SCANNER WITH SHEARING INT...

ILLUMINATION OPTICAL ASSEMBLY, EXPOSURE DEVICE, AND DEVICE MANUFACT...

DISCRETE SOURCE MASK OPTIMIZATION

SPATIAL LIGHT MODULATOR UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE...

METHOD FOR ADJUSTING A LIGHTING SETTING