Off-axis setting using an aperture

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/701Off-axis setting using an aperture

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Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Radiation collector
- Patent number 12,360,458
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng Hung Tsai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Field facet system and lithography apparatus
- Patent number 12,353,137
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for regulating and controlling incident angle of...
- Patent number 12,346,030
- Issue date Jul 1, 2025
- Tsinghua University
- Leijie Wang
- G01 - MEASURING TESTING
Information Patent Grant
Curved reticle by mechanical and phase bending along orthogonal axes
- Patent number 12,346,029
- Issue date Jul 1, 2025
- Nikon Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facet assembly for a facet mirror
- Patent number 12,339,587
- Issue date Jun 24, 2025
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Grant
Digital micromirror device for an illumination optical component of...
- Patent number 12,339,589
- Issue date Jun 24, 2025
- Carl Zeiss SMT GmbH
- Michael Patra
- G02 - OPTICS
Information Patent Grant
High force low voltage piezoelectric micromirror actuator
- Patent number 12,339,588
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Luc Roger Simonne Haspeslagh
- G02 - OPTICS
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 12,332,572
- Issue date Jun 17, 2025
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Grant
Optical component
- Patent number 12,326,663
- Issue date Jun 10, 2025
- Carl Zeiss SMT GmbH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Film formation device, film formation method, and article manufactu...
- Patent number 12,313,977
- Issue date May 27, 2025
- Canon Kabushiki Kaisha
- Hiroshi Kurosawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source apparatus, lithography apparatus, and article manufact...
- Patent number 12,306,387
- Issue date May 20, 2025
- Canon Kabushiki Kaisha
- Takayuki Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element, EUV lithography system, and method for forming nan...
- Patent number 12,306,539
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-performance EUV microscope device with free-form illumination...
- Patent number 12,287,579
- Issue date Apr 29, 2025
- ESOL Inc.
- Dong Gun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxygen-loss resistant top coating for optical elements
- Patent number 12,287,455
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-performance EUV microscope device with free-form illumination...
- Patent number 12,282,144
- Issue date Apr 22, 2025
- ESOL Inc.
- Dong Gun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micromirror arrays
- Patent number 12,276,784
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Luc Roger Simonne Haspeslagh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmissive diffusor
- Patent number 12,271,008
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Andrey Nikipelov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Micromirror arrays
- Patent number 12,259,546
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Alexandre Halbach
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of forming photoresist pattern and projection exposure appar...
- Patent number 12,253,804
- Issue date Mar 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Kanyu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, exposure device, method for manufacturing flat pane...
- Patent number 12,248,253
- Issue date Mar 11, 2025
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of optical component alignment
- Patent number 12,244,116
- Issue date Mar 4, 2025
- Cymer, LLC
- Hong Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
Radiation conduit
- Patent number 12,235,585
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Remco Johannes Elisa Heijmans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 12,210,289
- Issue date Jan 28, 2025
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual diffraction order spin-on-glass phase-grating beam-splitter ba...
- Patent number 12,204,249
- Issue date Jan 21, 2025
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for setting relative laser intensities
- Patent number 12,197,135
- Issue date Jan 14, 2025
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
- Publication number 20250237962
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Manfred Petrus Johannes Maria DIKKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250237963
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND E...
- Publication number 20250216793
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Soojung KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM
- Publication number 20250216792
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Joerg ZIMMERMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...
- Publication number 20250208524
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Eva Linda MATHIEU
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
APPARATUS FOR STRESS-REDUCED MOUNTING OF MEMS-BASED MICROMIRRORS
- Publication number 20250206598
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Markus HAUF
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMIN...
- Publication number 20250199413
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Stig BIELING
- G02 - OPTICS
Information Patent Application
MICROELECTROMECHANICAL DEVICE
- Publication number 20250199414
- Publication date Jun 19, 2025
- ROBERT BOSCH GmbH
- Ralf NOLTEMEYER
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...
- Publication number 20250199422
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Stefan LIPPOLDT
- G02 - OPTICS
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20250202184
- Publication date Jun 19, 2025
- CYMER, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffraction-Based Illumination Sampling
- Publication number 20250198836
- Publication date Jun 19, 2025
- KLA Corporation
- Florian Melsheimer
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...
- Publication number 20250170671
- Publication date May 29, 2025
- Nikon Corporation
- Yasushi MIZUNO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20250164889
- Publication date May 22, 2025
- Gigaphoton Inc.
- Kotaro MIYASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION CONDUIT
- Publication number 20250155820
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Remco Johannes Elisa HEIJMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS
- Publication number 20250155822
- Publication date May 15, 2025
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND
- Publication number 20250147438
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...
- Publication number 20250138431
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sungmin Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...
- Publication number 20250130506
- Publication date Apr 24, 2025
- Carl Zeiss Jena GmbH
- Markus GIEHL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS
- Publication number 20250126698
- Publication date Apr 17, 2025
- Carl Zeiss SMT GMBH
- Silvi HAENDEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARA...
- Publication number 20250116939
- Publication date Apr 10, 2025
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS
- Publication number 20250116938
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DIE
- Publication number 20250095987
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20250068082
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- YingChiao WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20250060677
- Publication date Feb 20, 2025
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJEC...
- Publication number 20250044703
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
- Publication number 20250044711
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...
- Publication number 20250044705
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Off-axis setting using an aperture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Radiation collector

Field facet system and lithography apparatus

Device and method for regulating and controlling incident angle of...

Curved reticle by mechanical and phase bending along orthogonal axes

Facet assembly for a facet mirror

Digital micromirror device for an illumination optical component of...

High force low voltage piezoelectric micromirror actuator

Configuring optical layers in imprint lithography processes

Optical component

Method for generating EUV radiation

Film formation device, film formation method, and article manufactu...

Light source apparatus, lithography apparatus, and article manufact...

Optical element, EUV lithography system, and method for forming nan...

High-performance EUV microscope device with free-form illumination...

Oxygen-loss resistant top coating for optical elements

High-performance EUV microscope device with free-form illumination...

Method for controlling extreme ultraviolet light

Micromirror arrays

Transmissive diffusor

Micromirror arrays

Method of forming photoresist pattern and projection exposure appar...

Optical device, exposure device, method for manufacturing flat pane...

Apparatus for and method of optical component alignment

Inspection method and apparatus, lithographic apparatus, lithograph...

Radiation conduit

Mirror, in particular for a microlithographic projection exposure a...

Dual diffraction order spin-on-glass phase-grating beam-splitter ba...

Device and method for setting relative laser intensities

Cleaning a structure surface in an EUV chamber

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

SEMICONDUCTOR PROCESS APPARATUS

METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND E...

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM

HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...

APPARATUS FOR STRESS-REDUCED MOUNTING OF MEMS-BASED MICROMIRRORS

ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMIN...

MICROELECTROMECHANICAL DEVICE

INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

Diffraction-Based Illumination Sampling

OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

RADIATION CONDUIT

PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS

INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND

METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...

MIRROR FOR A PROJECTION EXPOSURE APPARATUS

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...

EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS

METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARA...

LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS

METHOD FOR FORMING SEMICONDUCTOR DIE

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJEC...

TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR

METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...