Off-axis setting using an aperture

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/701Off-axis setting using an aperture

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Patents Grantslast 30 patents

Information Patent Grant
Method for measuring an effect of a wavelength-dependent measuring...
- Patent number 12,174,546
- Issue date Dec 24, 2024
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 12,158,702
- Issue date Dec 3, 2024
- NANOSYSTEM SOLUTIONS, INC.
- Kazuhiko Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method of semiconductor device
- Patent number 12,147,157
- Issue date Nov 19, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double-scanning opto-mechanical configurations to improve throughpu...
- Patent number 12,140,870
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gray tone uniformity control over substrate topography
- Patent number 12,140,871
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- YingChiao Wang
- G02 - OPTICS
Information Patent Grant
Phase plate and fabrication method for color-separated laser backli...
- Patent number 12,124,070
- Issue date Oct 22, 2024
- Meta Platforms Technologies, LLC
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, illumination sources and...
- Patent number 12,124,173
- Issue date Oct 22, 2024
- ASML Netherlands B.V. & ASML Holding N.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for photolithographic imaging
- Patent number 12,117,730
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for an illumination optical unit of a projection exposure ap...
- Patent number 12,111,578
- Issue date Oct 8, 2024
- Carl Zeiss SMT GmbH
- Christof Jalics
- G02 - OPTICS
Information Patent Grant
Method and device for correcting a telecentricity error of an imagi...
- Patent number 12,105,427
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly, in particular in a microlithographic projection exposure...
- Patent number 12,105,434
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Stefan Troeger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator unit for positioning an optical element
- Patent number 12,099,307
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Sjoerd Martijn Huiberts
- G02 - OPTICS
Information Patent Grant
Device manufacturing methods
- Patent number 12,078,935
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Rizvi Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a membrane assembly
- Patent number 12,072,620
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protective coating for nonlinear optical crystal
- Patent number 12,072,606
- Issue date Aug 27, 2024
- KLA Corporation
- John Fielden
- G01 - MEASURING TESTING
Information Patent Grant
Reticle-masking structure, extreme ultra violet apparatus, and meth...
- Patent number 12,066,760
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ching-Hsiang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask processing apparatus and substrate processing apparatus
- Patent number 12,055,857
- Issue date Aug 6, 2024
- SEMES CO., LTD.
- Tae Hee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 12,044,976
- Issue date Jul 23, 2024
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Grant
Optical lithography system and method of using the same
- Patent number 12,032,295
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and lithographic apparatuses
- Patent number 12,025,925
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Filippo Alpeggiani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-brightness laser produced plasma source and method of generati...
- Patent number 12,028,958
- Issue date Jul 2, 2024
- Isteq B.V.
- Samir Ellwi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods that utilize angled photolithography for manufa...
- Patent number 11,994,802
- Issue date May 28, 2024
- Waymo LLC
- James Dunphy
- G02 - OPTICS
Information Patent Grant
Radiation system
- Patent number 11,984,236
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G02 - OPTICS
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,979,971
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...
- Publication number 20240402610
- Publication date Dec 5, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT
- Publication number 20240402611
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Sjoerd Martijn HUIBERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240402613
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING
- Publication number 20240377753
- Publication date Nov 14, 2024
- KLA Corporation
- Mahsa Farsad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20240369920
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...
- Publication number 20240369939
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HSING LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMS Based Spatial Light Modulators and Applications
- Publication number 20240369824
- Publication date Nov 7, 2024
- SILICON LIGHT MACHINES CORPORATION
- Stephen Hamann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...
- Publication number 20240353758
- Publication date Oct 24, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Hrvoje Petek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...
- Publication number 20240345488
- Publication date Oct 17, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES
- Publication number 20240329540
- Publication date Oct 3, 2024
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Lithography System and Method of Using the Same
- Publication number 20240319609
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
FAST UNIFORMITY DRIFT CORRECTION
- Publication number 20240319608
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Roberto B. WIENER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240295824
- Publication date Sep 5, 2024
- Gigaphoton Inc.
- Tomoyoshi TOIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20240295808
- Publication date Sep 5, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...
- Publication number 20240272058
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Michal Emanuel PAWLOWSKI
- G01 - MEASURING TESTING
Information Patent Application
SCANNING INTERFERENCE LITHOGRAPHIC SYSTEM
- Publication number 20240264534
- Publication date Aug 8, 2024
- TSINGHUA UNIVERSITY
- Leijie WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...
- Publication number 20240255855
- Publication date Aug 1, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...
- Publication number 20240255856
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...
- Publication number 20240248409
- Publication date Jul 25, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY

Off-axis setting using an aperture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for measuring an effect of a wavelength-dependent measuring...

System and method for performing extreme ultraviolet photolithograp...

Method for generating a mathematical model for positioning individu...

Exposure device

Photomask and manufacturing method of semiconductor device

Double-scanning opto-mechanical configurations to improve throughpu...

Gray tone uniformity control over substrate topography

Phase plate and fabrication method for color-separated laser backli...

Lithographic apparatus, metrology systems, illumination sources and...

Method and apparatus for photolithographic imaging

Mirror for an illumination optical unit of a projection exposure ap...

Method and device for correcting a telecentricity error of an imagi...

Assembly, in particular in a microlithographic projection exposure...

Actuator unit for positioning an optical element

Device manufacturing methods

Laser system for target metrology and alteration in an EUV light so...

Method of manufacturing a membrane assembly

Protective coating for nonlinear optical crystal

Reticle-masking structure, extreme ultra violet apparatus, and meth...

Extreme ultraviolet lithography system

Mask processing apparatus and substrate processing apparatus

Assembly for collimating broadband radiation

Configuring optical layers in imprint lithography processes

Optical lithography system and method of using the same

Metrology method and lithographic apparatuses

High-brightness laser produced plasma source and method of generati...

Metrology system and method for determining a characteristic of one...

Systems and methods that utilize angled photolithography for manufa...

Radiation system

EUV light source and apparatus for lithography

Patents Applicationslast 30 patents

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

HIGH RESOLUTION PHOTOLITHOGRAPHY

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...

ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...

MEMS Based Spatial Light Modulators and Applications

SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...

EXPOSURE DEVICE

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

Optical Device and Method of Manufacture

Optical Lithography System and Method of Using the Same

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

FAST UNIFORMITY DRIFT CORRECTION

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...

SCANNING INTERFERENCE LITHOGRAPHIC SYSTEM

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...

METHOD FOR DETERMINING A POSITION OF A MIRROR

PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING