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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/701Off-axis setting using an aperture

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Patents Grantslast 30 patents

Information Patent Grant
High-performance EUV microscope device with free-form illumination...
- Patent number 12,282,144
- Issue date Apr 22, 2025
- ESOL Inc.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Micromirror arrays
- Patent number 12,276,784
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmissive diffusor
- Patent number 12,271,008
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Andrey Nikipelov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Micromirror arrays
- Patent number 12,259,546
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Alexandre Halbach
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of forming photoresist pattern and projection exposure appar...
- Patent number 12,253,804
- Issue date Mar 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Kanyu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, exposure device, method for manufacturing flat pane...
- Patent number 12,248,253
- Issue date Mar 11, 2025
- Nikon Corporation
- Yasushi Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of optical component alignment
- Patent number 12,244,116
- Issue date Mar 4, 2025
- Cymer, LLC
- Hong Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
Radiation conduit
- Patent number 12,235,585
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Remco Johannes Elisa Heijmans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 12,210,289
- Issue date Jan 28, 2025
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual diffraction order spin-on-glass phase-grating beam-splitter ba...
- Patent number 12,204,249
- Issue date Jan 21, 2025
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for setting relative laser intensities
- Patent number 12,197,135
- Issue date Jan 14, 2025
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective two-dimensional spatial light modulators
- Patent number 12,181,657
- Issue date Dec 31, 2024
- Silicon Light Machines Corporation
- Alexander Payne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring an effect of a wavelength-dependent measuring...
- Patent number 12,174,546
- Issue date Dec 24, 2024
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 12,158,702
- Issue date Dec 3, 2024
- NANOSYSTEM SOLUTIONS, INC.
- Kazuhiko Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method of semiconductor device
- Patent number 12,147,157
- Issue date Nov 19, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double-scanning opto-mechanical configurations to improve throughpu...
- Patent number 12,140,870
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Michal Emanuel Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gray tone uniformity control over substrate topography
- Patent number 12,140,871
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- YingChiao Wang
- G02 - OPTICS
Information Patent Grant
Phase plate and fabrication method for color-separated laser backli...
- Patent number 12,124,070
- Issue date Oct 22, 2024
- Meta Platforms Technologies, LLC
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, illumination sources and...
- Patent number 12,124,173
- Issue date Oct 22, 2024
- ASML Netherlands B.V. & ASML Holding N.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for photolithographic imaging
- Patent number 12,117,730
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for an illumination optical unit of a projection exposure ap...
- Patent number 12,111,578
- Issue date Oct 8, 2024
- Carl Zeiss SMT GmbH
- Christof Jalics
- G02 - OPTICS
Information Patent Grant
Method and device for correcting a telecentricity error of an imagi...
- Patent number 12,105,427
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly, in particular in a microlithographic projection exposure...
- Patent number 12,105,434
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Stefan Troeger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator unit for positioning an optical element
- Patent number 12,099,307
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Sjoerd Martijn Huiberts
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...
- Publication number 20250130506
- Publication date Apr 24, 2025
- Carl Zeiss Jena GmbH
- Markus GIEHL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS
- Publication number 20250126698
- Publication date Apr 17, 2025
- Carl Zeiss SMT GMBH
- Silvi HAENDEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARA...
- Publication number 20250116939
- Publication date Apr 10, 2025
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS
- Publication number 20250116938
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DIE
- Publication number 20250095987
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20250068082
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- YingChiao WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20250060677
- Publication date Feb 20, 2025
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJEC...
- Publication number 20250044703
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
- Publication number 20250044711
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...
- Publication number 20250044705
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...
- Publication number 20250044704
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Yuichi ASAHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20250044702
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250020993
- Publication date Jan 16, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20240427233
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Shunsuke HONDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...
- Publication number 20240402610
- Publication date Dec 5, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT
- Publication number 20240402611
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Sjoerd Martijn HUIBERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240402613
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING
- Publication number 20240377753
- Publication date Nov 14, 2024
- KLA Corporation
- Mahsa Farsad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20240369920
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...
- Publication number 20240369939
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HSING LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMS Based Spatial Light Modulators and Applications
- Publication number 20240369824
- Publication date Nov 7, 2024
- SILICON LIGHT MACHINES CORPORATION
- Stephen Hamann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Off-axis setting using an aperture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High-performance EUV microscope device with free-form illumination...

Method for controlling extreme ultraviolet light

Micromirror arrays

Transmissive diffusor

Micromirror arrays

Method of forming photoresist pattern and projection exposure appar...

Optical device, exposure device, method for manufacturing flat pane...

Apparatus for and method of optical component alignment

Inspection method and apparatus, lithographic apparatus, lithograph...

Radiation conduit

Mirror, in particular for a microlithographic projection exposure a...

Dual diffraction order spin-on-glass phase-grating beam-splitter ba...

Device and method for setting relative laser intensities

Cleaning a structure surface in an EUV chamber

Scanning interference lithographic system

Reflective two-dimensional spatial light modulators

Method for measuring an effect of a wavelength-dependent measuring...

System and method for performing extreme ultraviolet photolithograp...

Method for generating a mathematical model for positioning individu...

Exposure device

Photomask and manufacturing method of semiconductor device

Double-scanning opto-mechanical configurations to improve throughpu...

Gray tone uniformity control over substrate topography

Phase plate and fabrication method for color-separated laser backli...

Lithographic apparatus, metrology systems, illumination sources and...

Method and apparatus for photolithographic imaging

Mirror for an illumination optical unit of a projection exposure ap...

Method and device for correcting a telecentricity error of an imagi...

Assembly, in particular in a microlithographic projection exposure...

Actuator unit for positioning an optical element

Patents Applicationslast 30 patents

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...

EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS

METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARA...

LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS

METHOD FOR FORMING SEMICONDUCTOR DIE

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJEC...

TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR

METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...

SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

SEMICONDUCTOR PROCESS APPARATUS

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

HIGH RESOLUTION PHOTOLITHOGRAPHY

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...

ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...

MEMS Based Spatial Light Modulators and Applications