on a silicon body

Industry

CPC
H01L21/3162

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3162on a silicon body

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 10,468,531
- Issue date Nov 5, 2019
- Semiconductor Energy Laboratory Co., Ltd.
- Kunio Kimura
- G02 - OPTICS
Information Patent Grant
Durable, heat-resistant multi-layer coatings and coated articles
- Patent number 9,972,583
- Issue date May 15, 2018
- SPTS Technologies Limited
- Boris Kobrin
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 9,490,368
- Issue date Nov 8, 2016
- Semiconductor Energy Laboratory Co., Ltd.
- Kunio Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pixel of image sensor and method for fabricating the same
- Patent number 9,263,484
- Issue date Feb 16, 2016
- Intellectual Ventures II, LLC
- Woon-Il Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping with ALD technology
- Patent number 9,139,906
- Issue date Sep 22, 2015
- ASM America, Inc.
- Chang-Gong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-K heterostructure
- Patent number 8,994,109
- Issue date Mar 31, 2015
- STMicroelectronics S.A.
- Clément Merckling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices formed with dual damascene process
- Patent number 8,860,225
- Issue date Oct 14, 2014
- Infineon Technologies AG
- Philipp Riess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge reservoir structure
- Patent number 8,802,539
- Issue date Aug 12, 2014
- Soitec
- Frederic Allibert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric layers and memory cells including metal-doped alumina
- Patent number 8,653,573
- Issue date Feb 18, 2014
- Micron Technology, Inc.
- Brian A. Vaartstra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and producing method of semiconducto...
- Patent number 8,598,047
- Issue date Dec 3, 2013
- Hitachi Kokusai Electric Inc.
- Masanori Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 8,563,421
- Issue date Oct 22, 2013
- Samsung Electronics Co., Ltd.
- Jin-Gyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier-metal-free copper damascene technology using enhanced reflow
- Patent number 8,513,112
- Issue date Aug 20, 2013
- Mosaid Technologies, Incorporated
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Durable, heat-resistant multi-layer coatings and coated articles
- Patent number 8,501,277
- Issue date Aug 6, 2013
- Applied Microstructures, Inc.
- Boris Kobrin
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
High-k heterostructure
- Patent number 8,426,261
- Issue date Apr 23, 2013
- STMicroelectronics S.A.
- Clément Merckling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing method
- Patent number 8,389,410
- Issue date Mar 5, 2013
- United Microelectronics Corp.
- Kun-Lin Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming non-conformal layers
- Patent number 8,334,218
- Issue date Dec 18, 2012
- ASM America, Inc.
- Sebastian E. Van Nooten
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal capacitor and method of making the same including dielectric...
- Patent number 8,324,712
- Issue date Dec 4, 2012
- United Microelectronics Corp.
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal capacitor and method of making the same including dielectric...
- Patent number 8,324,048
- Issue date Dec 4, 2012
- United Microelectronics Corp.
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pixel of image sensor and method for fabricating the same
- Patent number 8,309,993
- Issue date Nov 13, 2012
- Intellectual Ventures II LLC
- Woon-Il Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Constructions comprising hafnium oxide and/or zirconium oxide
- Patent number 8,299,462
- Issue date Oct 30, 2012
- Round Rock Research, LLC
- Cancheepuram V. Srividya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reducing amine based contaminants
- Patent number 8,288,281
- Issue date Oct 16, 2012
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device, semiconductor device...
- Patent number 8,278,740
- Issue date Oct 2, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Satoshi Toriumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glass material for radio-frequency applications
- Patent number 8,273,671
- Issue date Sep 25, 2012
- Schott AG
- Jürgen Leib
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure having reduced amine-based contaminants
- Patent number 8,242,544
- Issue date Aug 14, 2012
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing semiconductor device
- Patent number 8,227,346
- Issue date Jul 24, 2012
- Hitachi Kokusai Electric Inc.
- Hironobu Miya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier-metal-free copper damascene technology using atomic hydroge...
- Patent number 8,211,792
- Issue date Jul 3, 2012
- MOSAID Technologies Incorporated
- Kie Y Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to avoid threshold voltage shift in thicker dielectric films
- Patent number 8,202,806
- Issue date Jun 19, 2012
- Micron Technology, Inc.
- Randhir P. S. Thakur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a high-dielectric-constant gate insulat...
- Patent number 8,143,676
- Issue date Mar 27, 2012
- Kabushiki Kaisha Toshiba
- Seiji Inumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 8,129,264
- Issue date Mar 6, 2012
- Samsung Electronics Co., Ltd.
- Jin-Gyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal capacitor and method of making the same
- Patent number 8,114,734
- Issue date Feb 14, 2012
- United Microelectronics Corp.
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MOISTURE BARRIER COATINGS
- Publication number 20130320509
- Publication date Dec 5, 2013
- APPLIED MICROSTRUCTURES, INC.
- Boris Kobrin
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
DURABLE, HEAT-RESISTANT MULTI-LAYER COATINGS AND COATED ARTICLES
- Publication number 20130320510
- Publication date Dec 5, 2013
- APPLIED MICROSTRUCTURES, INC.
- Boris Kobrin
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
HIGH-K HETEROSTRUCTURE
- Publication number 20130200440
- Publication date Aug 8, 2013
- STMicroelectronics S.A.
- Clement Merckling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIXEL OF IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME
- Publication number 20130059413
- Publication date Mar 7, 2013
- Woon-Il Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER-METAL-FREE COPPER DAMASCENE TECHNOLOGY USING ENHANCED REFLOW
- Publication number 20120235295
- Publication date Sep 20, 2012
- MOSAID TECHNOLOGIES, INCORPORATED
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120129356
- Publication date May 24, 2012
- JIN GYUN KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL CAPACITOR AND METHOD OF MAKING THE SAME
- Publication number 20120115301
- Publication date May 10, 2012
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CAPACITOR AND METHOD OF MAKING THE SAME
- Publication number 20120098094
- Publication date Apr 26, 2012
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20120077350
- Publication date Mar 29, 2012
- Hironobu Miya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONSTRUCTIONS COMPRISING HAFNIUM OXIDE AND/OR ZIRCONIUM OXIDE
- Publication number 20120037902
- Publication date Feb 16, 2012
- ROUND ROCK RESEARCH, LLC
- Cancheepuram V. Srividya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20120034790
- Publication date Feb 9, 2012
- Hironobu Miya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PRODUCING METHOD OF SEMICONDUCTO...
- Publication number 20120034788
- Publication date Feb 9, 2012
- Masanori Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Devices Formed With Dual Damascene Process
- Publication number 20120025382
- Publication date Feb 2, 2012
- INFINEON TECHNOLOGIES AG
- Philipp Riess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20110294304
- Publication date Dec 1, 2011
- Kabushiki Kaisha Toshiba
- Yoshio Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
- Publication number 20110284959
- Publication date Nov 24, 2011
- Semiconductor Energy Laboratory Co., Ltd.
- Kunio KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILMS
- Publication number 20110256718
- Publication date Oct 20, 2011
- ASM INTERNATIONAL N.V.
- Suvi P. Haukka
- C30 - CRYSTAL GROWTH
Information Patent Application
CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20110189854
- Publication date Aug 4, 2011
- Kun-Lin Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...
- Publication number 20110175208
- Publication date Jul 21, 2011
- Semiconductor Energy Laboratory Co., Ltd.
- Satoshi TORIUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dielectric Layers and Memory Cells Including Metal-Doped Alumina
- Publication number 20110121376
- Publication date May 26, 2011
- Micron Technology, Inc.
- Brian A. Vaartstra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BARRIER-METAL-FREE COPPER CAMASCENCE TECHNOLOGY USING ATOMIC HYDROG...
- Publication number 20110111589
- Publication date May 12, 2011
- MOSAID TECHNOLOGIES, INCORPORATED
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BPSG FILM DEPOSITION WITH UNDOPED CAPPING
- Publication number 20110062560
- Publication date Mar 17, 2011
- Yuri Sokolov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN PLASMA REDUCTION TO ELIMINATE PRECURSOR OVERFLOW IN BPTEOS F...
- Publication number 20100311252
- Publication date Dec 9, 2010
- Chin Kun Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K HETEROSTRUCTURE
- Publication number 20100301420
- Publication date Dec 2, 2010
- Clément Merckling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIXEL OF IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME
- Publication number 20100276737
- Publication date Nov 4, 2010
- Woon-Il Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING AMINE BASED CONTAMINANTS
- Publication number 20100279508
- Publication date Nov 4, 2010
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20100252933
- Publication date Oct 7, 2010
- Renesas Technology Corporation
- Jun Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...
- Publication number 20100239758
- Publication date Sep 23, 2010
- Shreyas S. Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING...
- Publication number 20100233887
- Publication date Sep 16, 2010
- Hitachi Kokusai Electric Inc.
- Hironobu Miya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20100224922
- Publication date Sep 9, 2010
- Elpida Memory, Inc.
- Takashi SHINHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated circuits having organic-inorganic dielectric materials a...
- Publication number 20100215839
- Publication date Aug 26, 2010
- Juha T. Rantala
- C07 - ORGANIC CHEMISTRY

on a silicon body

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and manufacturing method of the same

Durable, heat-resistant multi-layer coatings and coated articles

Semiconductor device and manufacturing method of the same

Pixel of image sensor and method for fabricating the same

Doping with ALD technology

High-K heterostructure

Devices formed with dual damascene process

Charge reservoir structure

Dielectric layers and memory cells including metal-doped alumina

Substrate processing apparatus and producing method of semiconducto...

Method of fabricating semiconductor device

Barrier-metal-free copper damascene technology using enhanced reflow

Durable, heat-resistant multi-layer coatings and coated articles

High-k heterostructure

Chemical mechanical polishing method

Method of forming non-conformal layers

Metal capacitor and method of making the same including dielectric...

Metal capacitor and method of making the same including dielectric...

Pixel of image sensor and method for fabricating the same

Constructions comprising hafnium oxide and/or zirconium oxide

Method for reducing amine based contaminants

Method for manufacturing semiconductor device, semiconductor device...

Glass material for radio-frequency applications

Semiconductor structure having reduced amine-based contaminants

Method of producing semiconductor device

Barrier-metal-free copper damascene technology using atomic hydroge...

Method to avoid threshold voltage shift in thicker dielectric films

Semiconductor device having a high-dielectric-constant gate insulat...

Method of fabricating a semiconductor device

Metal capacitor and method of making the same

Patents Applicationslast 30 patents

MOISTURE BARRIER COATINGS

DURABLE, HEAT-RESISTANT MULTI-LAYER COATINGS AND COATED ARTICLES

HIGH-K HETEROSTRUCTURE

PIXEL OF IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME

BARRIER-METAL-FREE COPPER DAMASCENE TECHNOLOGY USING ENHANCED REFLOW

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

METAL CAPACITOR AND METHOD OF MAKING THE SAME

METAL CAPACITOR AND METHOD OF MAKING THE SAME

METHOD OF PRODUCING SEMICONDUCTOR DEVICE

CONSTRUCTIONS COMPRISING HAFNIUM OXIDE AND/OR ZIRCONIUM OXIDE

METHOD OF PRODUCING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS AND PRODUCING METHOD OF SEMICONDUCTO...

Devices Formed With Dual Damascene Process

Method of manufacturing semiconductor device

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

THIN FILMS

CHEMICAL MECHANICAL POLISHING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...

Dielectric Layers and Memory Cells Including Metal-Doped Alumina

BARRIER-METAL-FREE COPPER CAMASCENCE TECHNOLOGY USING ATOMIC HYDROG...

BPSG FILM DEPOSITION WITH UNDOPED CAPPING

OXYGEN PLASMA REDUCTION TO ELIMINATE PRECURSOR OVERFLOW IN BPTEOS F...

HIGH-K HETEROSTRUCTURE

PIXEL OF IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME

METHOD FOR REDUCING AMINE BASED CONTAMINANTS

SEMICONDUCTOR DEVICE

SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...

PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Integrated circuits having organic-inorganic dielectric materials a...