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H01L21/3144

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/3144on silicon

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for providing a magnetoresistive element having small critic...
- Patent number 9,196,270
- Issue date Nov 24, 2015
- Western Digital (Fremont), LLC
- Danning Yang
- G11 - INFORMATION STORAGE
Information Patent Grant
Selective oxidation process
- Patent number 9,127,340
- Issue date Sep 8, 2015
- ASM International N.V.
- Jerome Noiray
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory device and manufacturing method therefor
- Patent number 9,082,704
- Issue date Jul 14, 2015
- Renesas Electronics Corporation
- Shien Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a nonvolatile charge trap memory device
- Patent number 8,993,453
- Issue date Mar 31, 2015
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced cyclic chemical vapor deposition of silicon-contain...
- Patent number 8,828,505
- Issue date Sep 9, 2014
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a nitrided silicon-oxide gate dielectric
- Patent number 8,709,887
- Issue date Apr 29, 2014
- International Business Machines Corporation
- Jay S. Burnham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing silicon oxide thin film or silicon oxynitride...
- Patent number 8,673,070
- Issue date Mar 18, 2014
- National Institute of Advanced Industrial Science and Technology
- Sei Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of nitrogen containing dielectric layers having an improv...
- Patent number 8,617,954
- Issue date Dec 31, 2013
- Texas Instruments Incorporated
- Hiroaki Niimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 8,557,717
- Issue date Oct 15, 2013
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for forming nitrogen-containing layers
- Patent number 8,546,273
- Issue date Oct 1, 2013
- Applied Materials, Inc.
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier-metal-free copper damascene technology using enhanced reflow
- Patent number 8,513,112
- Issue date Aug 20, 2013
- Mosaid Technologies, Incorporated
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for forming nitrogen-containing layers
- Patent number 8,481,433
- Issue date Jul 9, 2013
- Applied Materials, Inc.
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming an insulation structure and method of manufacturi...
- Patent number 8,481,387
- Issue date Jul 9, 2013
- Samsung Electronics Co., Ltd.
- Jung-Geun Jee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide-nitride stack gate dielectric
- Patent number 8,445,381
- Issue date May 21, 2013
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image sensor comprising anti-reflection layer having high refractiv...
- Patent number 8,384,133
- Issue date Feb 26, 2013
- Samsung Electronics Co., Ltd.
- Chang Rok Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a nonvolatile charge trap memory device
- Patent number 8,318,608
- Issue date Nov 27, 2012
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a high-k gate dielectric layer
- Patent number 8,304,333
- Issue date Nov 6, 2012
- Texas Instruments Incorporated
- Manfred Ramin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices and methods to improve carrier mobility
- Patent number 8,294,224
- Issue date Oct 23, 2012
- Micron Technology, Inc.
- Arup Bhattacharyya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical oxidation process for fabricating a nonvolatile charge trap...
- Patent number 8,283,261
- Issue date Oct 9, 2012
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,241,982
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Yoshihiro Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for low temperature deposition of silicon-co...
- Patent number 8,236,097
- Issue date Aug 7, 2012
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming semiconductor device and semiconductor device
- Patent number 8,227,356
- Issue date Jul 24, 2012
- Kabushiki Kaisha Toshiba
- Kouichi Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier-metal-free copper damascene technology using atomic hydroge...
- Patent number 8,211,792
- Issue date Jul 3, 2012
- MOSAID Technologies Incorporated
- Kie Y Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor component with stress-absorbing semiconductor layer
- Patent number 8,198,681
- Issue date Jun 12, 2012
- Infineon Technologies AG
- Georg Tempel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming insulating layer and method of manufacturing tran...
- Patent number 8,183,136
- Issue date May 22, 2012
- Samsung Electronics Co., Ltd.
- Seong-Hoon Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,183,165
- Issue date May 22, 2012
- Tokyo Electron Limited
- Seiji Matsuyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for low temperature deposition of silicon-co...
- Patent number 8,153,833
- Issue date Apr 10, 2012
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a stressed passivation film using a microwave-ass...
- Patent number 8,119,540
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Robert D. Clark
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a semiconductor device having a nitrogen-c...
- Patent number 8,105,959
- Issue date Jan 31, 2012
- Elpida Memory, Inc.
- Takuo Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating non-volatile semiconductor memory device by u...
- Patent number 8,084,315
- Issue date Dec 27, 2011
- Hitachi Kokusai Electric Inc.
- Katsuhiko Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEVICES AND METHODS TO IMPROVE CARRIER MOBILITY
- Publication number 20130045578
- Publication date Feb 21, 2013
- Micron Technology, Inc.
- Arup Bhattacharyya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER-METAL-FREE COPPER DAMASCENE TECHNOLOGY USING ENHANCED REFLOW
- Publication number 20120235295
- Publication date Sep 20, 2012
- MOSAID TECHNOLOGIES, INCORPORATED
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...
- Publication number 20120178267
- Publication date Jul 12, 2012
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C30 - CRYSTAL GROWTH
Information Patent Application
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Contai...
- Publication number 20120171874
- Publication date Jul 5, 2012
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20120058645
- Publication date Mar 8, 2012
- Kabushiki Kaisha Toshiba
- Kouichi Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR FORMING NITROGEN-CONTAINING LAYERS
- Publication number 20110281442
- Publication date Nov 17, 2011
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN INSULATION STRUCTURE AND METHOD OF MANUFACTURI...
- Publication number 20110275190
- Publication date Nov 10, 2011
- Jung-Geun Jee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A DOUBLE EMBOSSING STRUCTURE
- Publication number 20110215469
- Publication date Sep 8, 2011
- MEGICA Corporation
- HSIN-JUNG LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PRODUCING SILICON OXIDE THIN FILM OR SILICON OXYNITRIDE...
- Publication number 20110185948
- Publication date Aug 4, 2011
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Sei Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...
- Publication number 20110183528
- Publication date Jul 28, 2011
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C30 - CRYSTAL GROWTH
Information Patent Application
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...
- Publication number 20110136343
- Publication date Jun 9, 2011
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF FORMING INSULATING LAYER AND METHOD OF MANUFACTURING TRAN...
- Publication number 20110124172
- Publication date May 26, 2011
- SAMSUNG ELECTRONICS CO., LTD.
- Seong-Hoon JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND COMPUTER STORAGE MEDIUM
- Publication number 20110124202
- Publication date May 26, 2011
- TOKYO ELECTRON LIMITED
- Seiji Matsuyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BARRIER-METAL-FREE COPPER CAMASCENCE TECHNOLOGY USING ATOMIC HYDROG...
- Publication number 20110111589
- Publication date May 12, 2011
- MOSAID TECHNOLOGIES, INCORPORATED
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20110073931
- Publication date Mar 31, 2011
- TOKYO ELECTRON LIMITED
- Yoshihiro HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A HIGH-K GATE DIELECTRIC LAYER
- Publication number 20110006375
- Publication date Jan 13, 2011
- TEXAS INSTRUMENTS INCORPORATED
- Manfred Ramin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing a semiconductor device
- Publication number 20110003481
- Publication date Jan 6, 2011
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...
- Publication number 20100285663
- Publication date Nov 11, 2010
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND COMPUTER...
- Publication number 20100275846
- Publication date Nov 4, 2010
- TOKYO ELECTRON LIMITED
- Junichi Kitagawa
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS AND APPARATUS FOR FORMING NITROGEN-CONTAINING LAYERS
- Publication number 20100248497
- Publication date Sep 30, 2010
- Applied Materials, Inc.
- Malcolm J. BEVAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SELECTIVE NITRIDATION
- Publication number 20100248435
- Publication date Sep 30, 2010
- Applied Materials, Inc.
- CHRISTOPHER S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS, MICROWAVE PLASMA PROCESSING...
- Publication number 20100240225
- Publication date Sep 23, 2010
- TOKYO ELECTRON LIMITED
- Yoshihiro Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...
- Publication number 20100221914
- Publication date Sep 2, 2010
- Advanced Technology Materials, Inc.
- Ziyun Wang
- C30 - CRYSTAL GROWTH
Information Patent Application
SELECTIVE OXIDATION PROCESS
- Publication number 20100209597
- Publication date Aug 19, 2010
- ASM INTERNATIONAL N.V.
- Jerome Noiray
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Barrier-Metal-Free Copper Damascene Technology Using Atomic Hydroge...
- Publication number 20100197132
- Publication date Aug 5, 2010
- KIE Y. AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND COMPUTER STORAGE MEDIUM
- Publication number 20100196627
- Publication date Aug 5, 2010
- TOKYO ELECTRON LIMITED
- Seiji Matsuyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Plasma Processing Apparatus
- Publication number 20100175621
- Publication date Jul 15, 2010
- Koichi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING METHOD AND SPUTTERING APPARATUS
- Publication number 20100133092
- Publication date Jun 3, 2010
- Canon ANELVA Corporation
- Kimiko Mashimo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING GATE INSULATION FILM, SEMICONDUCTOR DEVICE, AND C...
- Publication number 20100130023
- Publication date May 27, 2010
- TOKYO ELECTRON LIMITED
- Tatsuo Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING...
- Publication number 20100123183
- Publication date May 20, 2010
- Hitachi Kokusai Electric Inc.
- Katsuhiko YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for providing a magnetoresistive element having small critic...

Selective oxidation process

Semiconductor memory device and manufacturing method therefor

Method of fabricating a nonvolatile charge trap memory device

Plasma enhanced cyclic chemical vapor deposition of silicon-contain...

Method for fabricating a nitrided silicon-oxide gate dielectric

Process for producing silicon oxide thin film or silicon oxynitride...

Formation of nitrogen containing dielectric layers having an improv...

Method for manufacturing a semiconductor device

Methods and apparatus for forming nitrogen-containing layers

Barrier-metal-free copper damascene technology using enhanced reflow

Methods and apparatus for forming nitrogen-containing layers

Method of forming an insulation structure and method of manufacturi...

Oxide-nitride stack gate dielectric

Image sensor comprising anti-reflection layer having high refractiv...

Method of fabricating a nonvolatile charge trap memory device

Method of forming a high-k gate dielectric layer

Devices and methods to improve carrier mobility

Radical oxidation process for fabricating a nonvolatile charge trap...

Semiconductor device manufacturing method

Composition and method for low temperature deposition of silicon-co...

Method of forming semiconductor device and semiconductor device

Barrier-metal-free copper damascene technology using atomic hydroge...

Semiconductor component with stress-absorbing semiconductor layer

Method of forming insulating layer and method of manufacturing tran...

Plasma processing method

Composition and method for low temperature deposition of silicon-co...

Method of forming a stressed passivation film using a microwave-ass...

Method for manufacturing a semiconductor device having a nitrogen-c...

Method of fabricating non-volatile semiconductor memory device by u...

Patents Applicationslast 30 patents

DEVICES AND METHODS TO IMPROVE CARRIER MOBILITY

BARRIER-METAL-FREE COPPER DAMASCENE TECHNOLOGY USING ENHANCED REFLOW

COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...

Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Contai...

METHOD OF FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

METHODS AND APPARATUS FOR FORMING NITROGEN-CONTAINING LAYERS

METHOD OF FORMING AN INSULATION STRUCTURE AND METHOD OF MANUFACTURI...

METHOD FOR FORMING A DOUBLE EMBOSSING STRUCTURE

PROCESS FOR PRODUCING SILICON OXIDE THIN FILM OR SILICON OXYNITRIDE...

COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...

COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...

METHOD OF FORMING INSULATING LAYER AND METHOD OF MANUFACTURING TRAN...

PLASMA PROCESSING METHOD AND COMPUTER STORAGE MEDIUM

BARRIER-METAL-FREE COPPER CAMASCENCE TECHNOLOGY USING ATOMIC HYDROG...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD OF FORMING A HIGH-K GATE DIELECTRIC LAYER

Method for manufacturing a semiconductor device

COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...

PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND COMPUTER...

METHODS AND APPARATUS FOR FORMING NITROGEN-CONTAINING LAYERS

METHOD OF SELECTIVE NITRIDATION

MICROWAVE PLASMA PROCESSING APPARATUS, MICROWAVE PLASMA PROCESSING...

COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CO...

SELECTIVE OXIDATION PROCESS

Barrier-Metal-Free Copper Damascene Technology Using Atomic Hydroge...

PLASMA PROCESSING METHOD AND COMPUTER STORAGE MEDIUM

Microwave Plasma Processing Apparatus

SPUTTERING METHOD AND SPUTTERING APPARATUS

METHOD OF FORMING GATE INSULATION FILM, SEMICONDUCTOR DEVICE, AND C...

NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING...