Originals for X-Ray exposures, X-Ray masks

Industry

CPC
G03F1/146

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/146Originals for X-Ray exposures, X-Ray masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photomask and method of forming the same
- Patent number 10,488,749
- Issue date Nov 26, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically transparent and electrically conductive coatings and meth...
- Patent number 9,519,209
- Issue date Dec 13, 2016
- Fundació Institut de Ciències Fotòniques
- Valerio Pruneri
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank and reflective mask, and methods for manufact...
- Patent number 9,448,468
- Issue date Sep 20, 2016
- Toppan Printing Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Binary silica-titania glass articles having a ternary doped silica-...
- Patent number 9,034,450
- Issue date May 19, 2015
- Corning Incorporated
- Sezhian Annamalai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate with reflective layer for EUV lithography and reflective...
- Patent number 8,828,626
- Issue date Sep 9, 2014
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Collector mirror exchanging apparatus and method for extreme ultrav...
- Patent number 8,804,902
- Issue date Aug 12, 2014
- Gigaphoton Inc.
- Hiroshi Someya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Collector mirror exchanging apparatus and method for extreme ultrav...
- Patent number 8,477,412
- Issue date Jul 2, 2013
- Gigaphoton Inc.
- Hiroshi Someya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method and apparatus
- Patent number 6,984,472
- Issue date Jan 10, 2006
- Matsushita Electric Industrial Co., Ltd.
- Shigeo Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspecting reflection masks for defects
- Patent number 6,555,828
- Issue date Apr 29, 2003
- The Regents of the University of California
- Jeffrey Bokor
- G01 - MEASURING TESTING
Information Patent Grant
Method for fabricating a mask for a LIGA process
- Patent number 6,379,871
- Issue date Apr 30, 2002
- NEC Corporation
- Kenichiro Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron-beam exposure system, a mask for electron-beam exposure an...
- Patent number 6,355,383
- Issue date Mar 12, 2002
- NEC Corporation
- Hiroshi Yamashita
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Clean-enclosure window to protect photolithographic mask
- Patent number 6,280,886
- Issue date Aug 28, 2001
- Intel Corporation
- Pei-Yang Yan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Clean-enclosure window to protect photolithographic mask
- Patent number 6,197,454
- Issue date Mar 6, 2001
- Intel Corporation
- Pei-Yang Yan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask pellicles and their attachment in semiconductor manufact...
- Patent number 6,192,100
- Issue date Feb 20, 2001
- International Business Machines Corporation
- Raul Edmundo Acosta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask and fabrication process therefor
- Patent number 6,066,418
- Issue date May 23, 2000
- NEC Corporation
- Takuya Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of soft x-ray imaging
- Patent number 5,987,092
- Issue date Nov 16, 1999
- University of Hawaii
- William Pong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask pellicle
- Patent number 5,793,836
- Issue date Aug 11, 1998
- International Business Machines Corporation
- Juan R. Maldonado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of soft x-ray imaging
- Patent number 5,778,042
- Issue date Jul 7, 1998
- University of Hawaii
- William Pong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK
- Publication number 20200089099
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICALLY TRANSPARENT AND ELECTRICALLY CONDUCTIVE COATINGS AND METH...
- Publication number 20140295330
- Publication date Oct 2, 2014
- INSTITUCIO CATALANA DE RECERCA I ESTUDIS AVANCATS
- Valerio Pruneri
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK, AND METHODS FOR MANUFACT...
- Publication number 20140212795
- Publication date Jul 31, 2014
- Toppan Printing Co., Ltd.
- Masahito TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN...
- Publication number 20140165236
- Publication date Jun 12, 2014
- Michael Budach
- B82 - NANO-TECHNOLOGY
Information Patent Application
COLLECTOR MIRROR EXCHANGING APPARATUS AND METHOD FOR EXTREME ULTRAV...
- Publication number 20130221247
- Publication date Aug 29, 2013
- GIGAPHOTON INC.
- Hiroshi Someya
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE WITH REFLECTIVE LAYER FOR EUV LITHOGRAPHY AND REFLECTIVE...
- Publication number 20130115547
- Publication date May 9, 2013
- ASAHI GLASS COMPANY, LIMITED
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Application
BINARY SILICA-TITANIA GLASS ARTICLES HAVING A TERNARY DOPED SILICA-...
- Publication number 20130052391
- Publication date Feb 28, 2013
- Sezhian Annamalai
- B82 - NANO-TECHNOLOGY
Information Patent Application
Collector mirror exchanging apparatus and method for extreme ultrav...
- Publication number 20080104828
- Publication date May 8, 2008
- Hiroshi Someya
- G02 - OPTICS
Information Patent Application
Exposure method and apparatus
- Publication number 20040196446
- Publication date Oct 7, 2004
- Matsushita Electric Industrial Co., Ltd.
- Shigeo Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and apparatus
- Publication number 20010055104
- Publication date Dec 27, 2001
- Shigeo Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Originals for X-Ray exposures, X-Ray masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photomask and method of forming the same

Optically transparent and electrically conductive coatings and meth...

Reflective mask blank and reflective mask, and methods for manufact...

Binary silica-titania glass articles having a ternary doped silica-...

Substrate with reflective layer for EUV lithography and reflective...

Collector mirror exchanging apparatus and method for extreme ultrav...

Collector mirror exchanging apparatus and method for extreme ultrav...

Exposure method and apparatus

Method and apparatus for inspecting reflection masks for defects

Method for fabricating a mask for a LIGA process

Electron-beam exposure system, a mask for electron-beam exposure an...

Clean-enclosure window to protect photolithographic mask

Clean-enclosure window to protect photolithographic mask

X-ray mask pellicles and their attachment in semiconductor manufact...

X-ray mask and fabrication process therefor

Method of soft x-ray imaging

X-ray mask pellicle

Method of soft x-ray imaging

Patents Applicationslast 30 patents

PHOTOMASK

OPTICALLY TRANSPARENT AND ELECTRICALLY CONDUCTIVE COATINGS AND METH...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK, AND METHODS FOR MANUFACT...

METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN...

COLLECTOR MIRROR EXCHANGING APPARATUS AND METHOD FOR EXTREME ULTRAV...

SUBSTRATE WITH REFLECTIVE LAYER FOR EUV LITHOGRAPHY AND REFLECTIVE...

BINARY SILICA-TITANIA GLASS ARTICLES HAVING A TERNARY DOPED SILICA-...

Collector mirror exchanging apparatus and method for extreme ultrav...

Exposure method and apparatus

Exposure method and apparatus