Originals having apertures

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CPC
G03F1/16

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

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G03F1/16Originals having apertures

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Patents Grantslast 30 patents

Information Patent Grant
Mapping of patterns between design layout and patterning device
- Patent number 10,796,063
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask and method of forming the same
- Patent number 10,488,749
- Issue date Nov 26, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask frame assembly and method of manufacturing the same
- Patent number 9,982,333
- Issue date May 29, 2018
- Samsung Display Co., Ltd.
- Kie Hyun Nam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photo mask and exposure system
- Patent number 9,978,595
- Issue date May 22, 2018
- BOE Technology Group Co., Ltd.
- Seungmin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of electron beam writing
- Patent number 8,525,135
- Issue date Sep 3, 2013
- Cadence Design Systems, Inc.
- Dmitri Lanpanik
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and method of electron beam writing
- Patent number 7,777,204
- Issue date Aug 17, 2010
- Cadence Design Systems, Inc.
- Dmitri Lapanik
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MAPPING OF PATTERNS BETWEEN DESIGN LAYOUT AND PATTERNING DEVICE
- Publication number 20190130060
- Publication date May 2, 2019
- ASML NETHERLANDS R.V
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK FRAME ASSEMBLY AND METHOD OF MANUFACTURING THE SAME
- Publication number 20180245199
- Publication date Aug 30, 2018
- SAMSUNG DISPLAY CO., LTD.
- Kie Hyun Nam
- B32 - LAYERED PRODUCTS
Information Patent Application
PHOTO MASK AND EXPOSURE SYSTEM
- Publication number 20170194139
- Publication date Jul 6, 2017
- BOE TECHNOLOGY GROUP CO., LTD.
- Seungmin LEE
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD OF ELECTRON BEAM WRITING
- Publication number 20110192994
- Publication date Aug 11, 2011
- Cadence Design Systems, Inc.
- Dmitri LANPANIK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method pf electron beam writing
- Publication number 20070125967
- Publication date Jun 7, 2007
- Cadence Design Systems, Inc.
- Dmitri Lapanik
- G06 - COMPUTING CALCULATING COUNTING