Overlay

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CPC
G03F7/70633

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70633Overlay

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,365
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,364
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
IC fabrication flow with dynamic sampling for measurement
- Patent number 12,169,178
- Issue date Dec 17, 2024
- Texas Instruments Incorporated
- Jonas Hoehenberger
- G01 - MEASURING TESTING
Information Patent Grant
System and method for focus control in extreme ultraviolet lithogra...
- Patent number 12,153,352
- Issue date Nov 26, 2024
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology measurement method and apparatus
- Patent number 12,140,875
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Ilse Van Weperen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for overlay metrology and apparatus thereof
- Patent number 12,130,246
- Issue date Oct 29, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus, metrology systems, illumination sources and...
- Patent number 12,124,173
- Issue date Oct 22, 2024
- ASML Netherlands B.V. & ASML Holding N.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 12,124,174
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Paul Jonathan Turner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensation method for overlay deviation
- Patent number 12,124,175
- Issue date Oct 22, 2024
- Semiconductor Manufacturing South China Corporation
- Hai Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining overlay error during semiconductor fabrication
- Patent number 12,117,735
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Kai Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and device for determining a complex-valued field
- Patent number 12,117,734
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Mask reticle
- Patent number 12,111,568
- Issue date Oct 8, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yunsheng Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,111,583
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay targets using moiré elements and rotational symmetr...
- Patent number 12,105,433
- Issue date Oct 1, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and associated computer product
- Patent number 12,105,432
- Issue date Oct 1, 2024
- ASML Netherlands B.V.
- Narjes Javaheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning method and overlay measurement method
- Patent number 12,106,962
- Issue date Oct 1, 2024
- United Microelectronics Corp.
- Yi Jing Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
- Patent number 12,107,052
- Issue date Oct 1, 2024
- AUROS TECHNOLOGY, INC.
- Hyun Chul Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annular apodizer for small target overlay measurement
- Patent number 12,105,431
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target and algorithm to measure overlay by modeling back scattering...
- Patent number 12,100,574
- Issue date Sep 24, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for overlay error compensation and computer-reada...
- Patent number 12,100,135
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shun Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of determining position of mark, lithography method, exposur...
- Patent number 12,092,967
- Issue date Sep 17, 2024
- Canon Kabushiki Kaisha
- Ryota Makino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically determining electrical contact between metallic features...
- Patent number 12,092,964
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Shakeeb Bin Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...
- Publication number 20240411221
- Publication date Dec 12, 2024
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240410827
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Diederik Jan MAAS
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...
- Publication number 20240405100
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Sheng TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY
- Publication number 20240402616
- Publication date Dec 5, 2024
- City University of Hong Kong
- Yubin Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
- Publication number 20240402618
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385537
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Structures for Acoustic Wave Overlay Error Determination
- Publication number 20240385533
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ching Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...
- Publication number 20240385531
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT
- Publication number 20240377757
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jun Yeob KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME
- Publication number 20240377756
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT
- Publication number 20240361703
- Publication date Oct 31, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND DEVICE
- Publication number 20240361705
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Sergey TARABRIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION
- Publication number 20240354485
- Publication date Oct 24, 2024
- ONTO INNOVATION INC.
- Keith Frank Best
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD
- Publication number 20240353761
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD OF MONITORING A MEASUREMENT RECIPE AND ASSOCIATED METROLOG...
- Publication number 20240337954
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...
- Publication number 20240337953
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20240329543
- Publication date Oct 3, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
MEASURING METHOD FOR MEASURING OVERLAY SHIFT AND NON-TRANSIENT COMP...
- Publication number 20240319616
- Publication date Sep 26, 2024
- NANYA TECHNOLOGY CORPORATION
- Chun Yen WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMEN...
- Publication number 20240312757
- Publication date Sep 19, 2024
- FRACTILIA, LLC
- Chris MACK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-OVERLAY STACKED GRATING METROLOGY TARGET
- Publication number 20240302751
- Publication date Sep 12, 2024
- KLA Corporation
- Jordan Pio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POST-OVERLAY COMPENSATION ON LARGE-FIELD PACKAGING
- Publication number 20240302752
- Publication date Sep 12, 2024
- ONTO INNOVATION INC.
- Yin-Yi John Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS
- Publication number 20240302164
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Tzu-Yi YANG
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20240295827
- Publication date Sep 5, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY TOOL
- Publication number 20240288782
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
- Publication number 20240288780
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Computer-readable storage medium recording data structure for stori...

Computer-readable storage medium recording data structure for stori...

Voltage contrast metrology mark

IC fabrication flow with dynamic sampling for measurement

System and method for focus control in extreme ultraviolet lithogra...

System and method for aligned stitching

Overlay target design for improved target placement accuracy

Optical designs of miniaturized overlay measurement system

Metrology measurement method and apparatus

Method and apparatus to determine a patterning process parameter us...

Method for overlay metrology and apparatus thereof

Lithographic apparatus, metrology systems, illumination sources and...

Overlay measurement system using lock-in amplifier technique

Metrology method and apparatus, computer program and lithographic s...

Compensation method for overlay deviation

Method of determining overlay error during semiconductor fabrication

Metrology method and device for determining a complex-valued field

Mask reticle

Optical metrology utilizing short-wave infrared wavelengths

Semiconductor processing tool and methods of operation

Imaging overlay targets using moiré elements and rotational symmetr...

Metrology method and associated computer product

Patterning method and overlay measurement method

Overlay mark forming Moire pattern, overlay measurement method usin...

Targets for diffraction-based overlay error metrology

Annular apodizer for small target overlay measurement

Target and algorithm to measure overlay by modeling back scattering...

Method and system for overlay error compensation and computer-reada...

Method of determining position of mark, lithography method, exposur...

Optically determining electrical contact between metallic features...

Patents Applicationslast 30 patents

PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY

METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

Method and Structures for Acoustic Wave Overlay Error Determination

METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...

DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT

COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME

ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METROLOGY METHOD AND DEVICE

TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

A METHOD OF MONITORING A MEASUREMENT RECIPE AND ASSOCIATED METROLOG...

SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

MEASURING METHOD FOR MEASURING OVERLAY SHIFT AND NON-TRANSIENT COMP...

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMEN...

MULTI-OVERLAY STACKED GRATING METROLOGY TARGET

POST-OVERLAY COMPENSATION ON LARGE-FIELD PACKAGING

OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

METROLOGY METHOD AND ASSOCIATED METROLOGY TOOL

INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD