Overlay

Industry

CPC
G03F7/70633

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70633Overlay

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Quantum meta-device for ultrasensitive displacement metrology
- Patent number 12,326,665
- Issue date Jun 10, 2025
- City University of Hong Kong
- Yubin Fan
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology system, and intensity imbalance m...
- Patent number 12,326,670
- Issue date Jun 10, 2025
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 12,322,660
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large die wafer, large die and method of forming the same
- Patent number 12,322,707
- Issue date Jun 3, 2025
- Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.
- Sheng Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for applying a deposition model in a semiconductor manufactu...
- Patent number 12,321,101
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining lithographic matching performance
- Patent number 12,306,545
- Issue date May 20, 2025
- ASML Netherlands B.V.
- Yingchao Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for overlay control based on a semiconductor device pattern,...
- Patent number 12,306,546
- Issue date May 20, 2025
- PROSEMI CO., LTD.
- Tian-Xing Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring stitching overlay accuracy of image sensor sti...
- Patent number 12,306,547
- Issue date May 20, 2025
- Shanghai Huali Microelectronics Corporation
- Yu Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and method
- Patent number 12,292,694
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dark field microscope
- Patent number 12,287,470
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and lithographic system
- Patent number 12,282,263
- Issue date Apr 22, 2025
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process recipe, method and system for generating same, and semicond...
- Patent number 12,276,965
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shaowen Qiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a semiconductor manufacturing process
- Patent number 12,276,919
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for avoiding damage to overlay metrology mark
- Patent number 12,276,920
- Issue date Apr 15, 2025
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate comprising a target arrangement, and associated at least...
- Patent number 12,276,921
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Olger Victor Zwier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring mask overlay using test patterns
- Patent number 12,271,116
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tseng Chin Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment-overlay mark and method using the same
- Patent number 12,265,335
- Issue date Apr 1, 2025
- Micron Technology, Inc.
- Kazuko Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device with grating structure
- Patent number 12,259,658
- Issue date Mar 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark, overlay marking method and overlay measuring method
- Patent number 12,259,661
- Issue date Mar 25, 2025
- NEXCHIP SEMICONDUCTOR CORPORATION
- Kuotung Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
- Patent number 12,259,662
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometry overlay metrology with orthogonal fine-pitch segmenta...
- Patent number 12,253,805
- Issue date Mar 18, 2025
- KLA Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Method for overlay error correction
- Patent number 12,242,202
- Issue date Mar 4, 2025
- NANYA TECHNOLOGY CORPORATION
- Shih-Yuan Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,242,765
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning overlay metrology with high signal to noise ratio
- Patent number 12,235,588
- Issue date Feb 25, 2025
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,235,590
- Issue date Feb 25, 2025
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning on overlay management
- Patent number 12,237,188
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF DETERMINING OVERLAYER REFERENCE WAVELENGTH
- Publication number 20250189902
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Byeongseon PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...
- Publication number 20250189901
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20250172881
- Publication date May 29, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
- Publication number 20250147429
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
- Publication number 20250147437
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT
- Publication number 20250147430
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chih HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT
- Publication number 20250139814
- Publication date May 1, 2025
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
- Publication number 20250131552
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Shahrzad NAGHIBZADEH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...
- Publication number 20250123569
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Yau Loong CHONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING ON OVERLAY MANAGEMENT
- Publication number 20250123572
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Cheng LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE AND SYSTEM FOR MANUFACTURING THE SAME
- Publication number 20250123570
- Publication date Apr 17, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Wei WANG
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION
- Publication number 20250123553
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Yu-Chen CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-COLUMN LARGE FIELD OF VIEW IMAGING PLATFORM
- Publication number 20250093786
- Publication date Mar 20, 2025
- KLA Corporation
- Yonatan Vaknin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF
- Publication number 20250096146
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao Chu Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OPTICAL SYSTEM FOR METROLOGY INSPECTION AND METHOD OF M...
- Publication number 20250085642
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Kyuhwan CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
- Publication number 20250060680
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Aabid PATEL
- G01 - MEASURING TESTING
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINE LEARNING MODEL FOR ASYMMETRY-INDUCED OVERLAY ERROR CORRECTION
- Publication number 20250053097
- Publication date Feb 13, 2025
- Kui-Jun HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE OVERLAY
- Publication number 20250044709
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Willem Louis VAN MIERLO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
- Publication number 20250044710
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Jiyou FU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING
- Publication number 20250036033
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
- Publication number 20250036031
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20250028254
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SY...
- Publication number 20250028258
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Oleg Viacheslavovich VOZNYI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY CALIBRATION METHOD
- Publication number 20250021021
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Quantum meta-device for ultrasensitive displacement metrology

Lithographic apparatus, metrology system, and intensity imbalance m...

Method and apparatus to determine a patterning process parameter

Large die wafer, large die and method of forming the same

Method for applying a deposition model in a semiconductor manufactu...

Determining lithographic matching performance

Method for overlay control based on a semiconductor device pattern,...

Method for measuring stitching overlay accuracy of image sensor sti...

Alignment mark and method

Method for controlling a lithographic apparatus and associated appa...

Dark field microscope

Metrology system and lithographic system

Process recipe, method and system for generating same, and semicond...

Method for controlling a semiconductor manufacturing process

Method for avoiding damage to overlay metrology mark

Substrate comprising a target arrangement, and associated at least...

Method of measuring mask overlay using test patterns

Matching process controllers for improved matching of process

Alignment-overlay mark and method using the same

Semiconductor device with grating structure

Overlay mark, overlay marking method and overlay measuring method

Methods for manufacturing semiconductor devices using MOIRÉ patterns

Scatterometry overlay metrology with orthogonal fine-pitch segmenta...

Method for overlay error correction

Target for measuring a parameter of a lithographic process

Information processing apparatus and information processing method

Scanning overlay metrology with high signal to noise ratio

Computer-readable storage medium recording data structure for stori...

Machine learning on overlay management

Inspection method and apparatus, lithographic apparatus, lithograph...

Patents Applicationslast 30 patents

METHODS OF DETERMINING OVERLAYER REFERENCE WAVELENGTH

CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD

METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT

OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT

METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...

MACHINE LEARNING ON OVERLAY MANAGEMENT

SEMICONDUCTOR STRUCTURE AND SYSTEM FOR MANUFACTURING THE SAME

SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

MULTI-COLUMN LARGE FIELD OF VIEW IMAGING PLATFORM

PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

MEASUREMENT OPTICAL SYSTEM FOR METROLOGY INSPECTION AND METHOD OF M...

GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES

Flexible Measurement Models For Model Based Measurements Of Semicon...

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

MACHINE LEARNING MODEL FOR ASYMMETRY-INDUCED OVERLAY ERROR CORRECTION

METHOD AND APPARATUS TO DETERMINE OVERLAY

OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING

METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SY...

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

METROLOGY CALIBRATION METHOD

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...