Patterning of masks by imaging

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G03F1/76

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/76Patterning of masks by imaging

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method, template manufacturing method, and photomas...
- Patent number 12,140,861
- Issue date Nov 12, 2024
- Kioxia Corporation
- Yoshinori Kagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask having recessed region
- Patent number 11,914,288
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image pickup apparatus and focus adjustment method using bending co...
- Patent number 11,822,233
- Issue date Nov 21, 2023
- Lasertec Corporation
- Hiroki Miyai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverse lithography and machine learning for mask synthesis
- Patent number 11,762,283
- Issue date Sep 19, 2023
- Synopsys, Inc.
- Amyn A. Poonawala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process proximity correction method and the computing device for th...
- Patent number 11,714,347
- Issue date Aug 1, 2023
- Samsung Electronics Co., Ltd.
- Soo Yong Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,687,006
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensating deposition non-uniformities in circuit elements
- Patent number 11,662,664
- Issue date May 30, 2023
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aware variable fill pattern generator
- Patent number 11,657,202
- Issue date May 23, 2023
- Texas Instmments Incorporated
- Sumanth Somashekar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask with enhanced contamination control and method of forming...
- Patent number 11,480,869
- Issue date Oct 25, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chien-Hung Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 11,461,532
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Onium salt, negative resist composition, and resist pattern forming...
- Patent number 11,429,023
- Issue date Aug 30, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photomask including fiducial mark and method of making semiconducto...
- Patent number 11,422,466
- Issue date Aug 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask for EUV lithography and method of manufacturing the same
- Patent number 11,402,745
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensating deposition non-uniformities in circuit elements
- Patent number 11,378,890
- Issue date Jul 5, 2022
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,327,405
- Issue date May 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing photomask, method for producing semiconductor...
- Patent number 11,275,305
- Issue date Mar 15, 2022
- Kioxia Corporation
- Yukio Oppata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 11,226,562
- Issue date Jan 18, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum-integrated hardmask processes and apparatus
- Patent number 11,209,729
- Issue date Dec 28, 2021
- Lam Research Corporation
- Jeffrey Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask having recessed region
- Patent number 11,099,478
- Issue date Aug 24, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Masks and methods of forming the same
- Patent number 11,086,211
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Hao Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Portion of layer removal at substrate edge
- Patent number 11,054,746
- Issue date Jul 6, 2021
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark, method of patterning the photoma...
- Patent number 11,042,084
- Issue date Jun 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film mask, method for manufacturing same, and method for forming pa...
- Patent number 11,029,596
- Issue date Jun 8, 2021
- LG Chem, Ltd.
- Ji Young Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensating deposition non-uniformities in circuit elements
- Patent number 10,990,017
- Issue date Apr 27, 2021
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for producing an optical mask for surface microte...
- Patent number 10,969,679
- Issue date Apr 6, 2021
- H.E.F.
- Maxime Bichotte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method thereof
- Patent number 10,908,494
- Issue date Feb 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask and method
- Patent number 10,859,902
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and fabrication method thereof, display panel and touch panel
- Patent number 10,859,920
- Issue date Dec 8, 2020
- BOE Technology Group Co., Ltd.
- Liqing Liao
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM OF ARRANGING PATTERNS OF SEMICONDUCTOR DEVICE
- Publication number 20250006550
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- KAZUYUKI TATEISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20240377728
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND METHOD OF FABRICATING THE SAME
- Publication number 20240345473
- Publication date Oct 17, 2024
- SK enpulse Co., Ltd.
- Tae Wan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240329522
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOMASK STRUCTURE, SEMICONDUCTOR STRUCTURE AND MANUFACTURING METH...
- Publication number 20240162038
- Publication date May 16, 2024
- United Microelectronics Corp.
- Chien Heng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142870
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
- Publication number 20240126173
- Publication date Apr 18, 2024
- FUJIFILM CORPORATION
- Kazuki WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240118613
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK STRUCTURE
- Publication number 20240085780
- Publication date Mar 14, 2024
- United Microelectronics Corp.
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK HAVING RECESSED REGION
- Publication number 20240012324
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A LIFT-OFF MASK STRUCTURE
- Publication number 20240012327
- Publication date Jan 11, 2024
- ams-Osram AG
- Patrik Pertl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230393465
- Publication date Dec 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERSE LITHOGRAPHY AND MACHINE LEARNING FOR MASK SYNTHESIS
- Publication number 20230375916
- Publication date Nov 23, 2023
- Synopsys, Inc.
- Amyn A. POONAWALA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES
- Publication number 20230333484
- Publication date Oct 19, 2023
- Mycronic AB
- Fredric IHREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20230314927
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND M...
- Publication number 20230280648
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230273516
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230266662
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS
- Publication number 20230119165
- Publication date Apr 20, 2023
- Google LLC
- Brian James Burkett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...
- Publication number 20230119980
- Publication date Apr 20, 2023
- Merck Patent GmbH
- Daniel HUDSON
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FLEXIBLE PHOTO-PATTERNED MASK FOR ORGANIC LIGHT EMITTING DISPLAY WI...
- Publication number 20230043183
- Publication date Feb 9, 2023
- HUNETPLUS CO., LTD.
- Hyuk Jin CHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20220342293
- Publication date Oct 27, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220334463
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20220283496
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220260909
- Publication date Aug 18, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MASK AND METHOD FOR PREPARING SAME, AND METHOD FOR PREPARING DISPLA...
- Publication number 20220173320
- Publication date Jun 2, 2022
- BOE TECHNOLOGY GROUP CO., LTD.
- Kuo SHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20220121121
- Publication date Apr 21, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- YUNG-YAO LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK, METHOD FOR PRODUCING PHOTOMASK, AND METHOD FOR PRODUCING...
- Publication number 20220100082
- Publication date Mar 31, 2022
- TOPPAN INC.
- Akihito OKUMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, TEMPLATE MANUFACTURING METHOD, AND PHOTOMAS...
- Publication number 20220091499
- Publication date Mar 24, 2022
- KIOXIA Corporation
- Yoshinori Kagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patterning of masks by imaging

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern forming method, template manufacturing method, and photomas...

Method of manufacturing photo masks

Photomask having recessed region

Photomask including fiducial mark and method of making a semiconduc...

Image pickup apparatus and focus adjustment method using bending co...

Inverse lithography and machine learning for mask synthesis

Process proximity correction method and the computing device for th...

Method of manufacturing photo masks

Compensating deposition non-uniformities in circuit elements

Aware variable fill pattern generator

Photomask with enhanced contamination control and method of forming...

Three-dimensional mask model for photolithography simulation

Onium salt, negative resist composition, and resist pattern forming...

Photomask including fiducial mark and method of making semiconducto...

Mask for EUV lithography and method of manufacturing the same

Compensating deposition non-uniformities in circuit elements

Method of manufacturing photo masks

Method for producing photomask, method for producing semiconductor...

Semiconductor structure and manufacturing method thereof

Vacuum-integrated hardmask processes and apparatus

Photomask having recessed region

Masks and methods of forming the same

Portion of layer removal at substrate edge

Photomask including fiducial mark, method of patterning the photoma...

Film mask, method for manufacturing same, and method for forming pa...

Compensating deposition non-uniformities in circuit elements

System and method for producing an optical mask for surface microte...

Photomask and manufacturing method thereof

Lithography mask and method

Mask and fabrication method thereof, display panel and touch panel

Patents Applicationslast 30 patents

METHOD AND SYSTEM OF ARRANGING PATTERNS OF SEMICONDUCTOR DEVICE

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

BLANK MASK AND METHOD OF FABRICATING THE SAME

METHOD OF MANUFACTURING PHOTO MASKS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

PHOTOMASK STRUCTURE, SEMICONDUCTOR STRUCTURE AND MANUFACTURING METH...

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

PHOTOMASK STRUCTURE

PHOTOMASK HAVING RECESSED REGION

METHOD FOR FORMING A LIFT-OFF MASK STRUCTURE

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

INVERSE LITHOGRAPHY AND MACHINE LEARNING FOR MASK SYNTHESIS

DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND M...

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

COMPENSATING DEPOSITION NON-UNIFORMITIES IN CIRCUIT ELEMENTS

A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...

FLEXIBLE PHOTO-PATTERNED MASK FOR ORGANIC LIGHT EMITTING DISPLAY WI...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

MASK FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

MASK AND METHOD FOR PREPARING SAME, AND METHOD FOR PREPARING DISPLA...

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

PHOTOMASK, METHOD FOR PRODUCING PHOTOMASK, AND METHOD FOR PRODUCING...

PATTERN FORMING METHOD, TEMPLATE MANUFACTURING METHOD, AND PHOTOMAS...