Phase-edge PSM

Industry

CPC
G03F1/34

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/34Phase-edge PSM

Industries

Patents Grantslast 30 patents

Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 11,372,323
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,314,161
- Issue date Apr 26, 2022
- Hoya Corporation
- Hiroaki Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chromeless phase shift mask structure and process
- Patent number 11,022,874
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning devices for use within a lithographic apparatus, methods...
- Patent number 10,509,310
- Issue date Dec 17, 2019
- ASML Netherlands B.V.
- Frank Arnoldus Johannes Maria Driessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromeless phase shift mask structure and process
- Patent number 10,394,114
- Issue date Aug 27, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices for measuring phase aberration
- Patent number 9,201,311
- Issue date Dec 1, 2015
- ASML Netherlands B.V.
- Willem Marie Julia Marcel Coene
- G01 - MEASURING TESTING
Information Patent Grant
Forming a bridging feature using chromeless phase-shift lithography
- Patent number 8,685,597
- Issue date Apr 1, 2014
- Seagate Technology LLC
- Daniel B. Sullivan
- G11 - INFORMATION STORAGE
Information Patent Grant
Forming a bridging feature using chromeless phase-shift lithography
- Patent number 8,603,706
- Issue date Dec 10, 2013
- Seagate Technology LLC
- Daniel B. Sullivan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Chromeless phase-shifting photomask with undercut rim-shifting element
- Patent number 8,591,749
- Issue date Nov 26, 2013
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically semitransmissive film, photomask blank and photomask, and...
- Patent number 8,580,466
- Issue date Nov 12, 2013
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming a bridging feature using chromeless phase-shift lithography
- Patent number 8,563,199
- Issue date Oct 22, 2013
- Seagate Technology LLC
- Daniel B. Sullivan
- G11 - INFORMATION STORAGE
Information Patent Grant
Optically semitransmissive film, photomask blank and photomask, and...
- Patent number 8,486,588
- Issue date Jul 16, 2013
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromeless phase-shifting photomask with undercut rim-shifting element
- Patent number 8,389,183
- Issue date Mar 5, 2013
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask with assist phase regions
- Patent number 8,323,857
- Issue date Dec 4, 2012
- Ultratech, Inc.
- Robert L. Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,293,435
- Issue date Oct 23, 2012
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing optical element, and optical element
- Patent number 8,273,506
- Issue date Sep 25, 2012
- Hoya Corporation
- Kazuhide Yamashiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for fabricating the same
- Patent number 8,247,140
- Issue date Aug 21, 2012
- Hynix Semiconductor Inc.
- Jea Young Jun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically semitransmissive film, photomask blank and photomask, and...
- Patent number 8,110,323
- Issue date Feb 7, 2012
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for fabricating three-dimensional structures with...
- Patent number 8,071,277
- Issue date Dec 6, 2011
- 3M Innovative Properties Company
- Jerome C. Porque
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method to pattern chromeless phase lithography contact hole
- Patent number 8,057,968
- Issue date Nov 15, 2011
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Sia Kim Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming supports bearing features, such as lithography masks
- Patent number 8,048,354
- Issue date Nov 1, 2011
- Commissariat a l'Energie Atomique
- Stephan Landis
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,048,594
- Issue date Nov 1, 2011
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for removing radiation side lobes
- Patent number 8,048,588
- Issue date Nov 1, 2011
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Sia Kim Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,021,806
- Issue date Sep 20, 2011
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CPL mask and a method and program product for generating the same
- Patent number 7,998,355
- Issue date Aug 16, 2011
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating chromeless phase shift mask
- Patent number 7,993,803
- Issue date Aug 9, 2011
- Hynix Semiconductor Inc.
- Jea Young Jun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 7,989,122
- Issue date Aug 2, 2011
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optically semitransmissive film, photomask blank and photomask, and...
- Patent number 7,955,762
- Issue date Jun 7, 2011
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase modulation device, phase modulation device fabrication method...
- Patent number 7,955,432
- Issue date Jun 7, 2011
- Advanced LCD Technologies Development Center Co., Ltd.
- Hiroyuki Ogawa
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High contrast lithographic masks
- Patent number 7,944,545
- Issue date May 17, 2011
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240337919
- Publication date Oct 10, 2024
- HOYA CORPORATION
- Kenta TSUKAGOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220035235
- Publication date Feb 3, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20210048740
- Publication date Feb 18, 2021
- HOYA CORPORATION
- Hiroaki SHISHIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chromeless Phase Shift Mask Structure and Process
- Publication number 20190377255
- Publication date Dec 12, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...
- Publication number 20130309602
- Publication date Nov 21, 2013
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Forming a Bridging Feature Using Chromeless Phase-Shift Lithography
- Publication number 20130089752
- Publication date Apr 11, 2013
- SEAGATE TECHNOLOGY LLC
- Daniel B. Sullivan
- G11 - INFORMATION STORAGE
Information Patent Application
Forming a Bridging Feature Using Chromeless Phase-Shift Lithography
- Publication number 20130089813
- Publication date Apr 11, 2013
- SEAGATE TECHNOLOGY LLC
- Daniel B. Sullivan
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT
- Publication number 20130089815
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Forming a Bridging Feature Using Chromeless Phase-Shift Lithography
- Publication number 20130089753
- Publication date Apr 11, 2013
- SEAGATE TECHNOLOGY LLC
- Daniel B. Sullivan
- G11 - INFORMATION STORAGE
Information Patent Application
OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...
- Publication number 20130011772
- Publication date Jan 10, 2013
- HOYA CORPORATION
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices For Measuring Phase Aberration
- Publication number 20130010306
- Publication date Jan 10, 2013
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel Coene
- G01 - MEASURING TESTING
Information Patent Application
Phase-shift mask with assist phase regions
- Publication number 20120156814
- Publication date Jun 21, 2012
- ULTRATECH, INC.
- Robert L. Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20110250529
- Publication date Oct 13, 2011
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE MODULATION DEVICE, PHASE MODULATION DEVICE FABRICATION METHOD...
- Publication number 20110233591
- Publication date Sep 29, 2011
- Hiroyuki Ogawa
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHASE MODULATION DEVICE, PHASE MODULATION DEVICE FABRICATION METHOD...
- Publication number 20110212001
- Publication date Sep 1, 2011
- Hiroyuki Ogawa
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...
- Publication number 20110207032
- Publication date Aug 25, 2011
- HOYA CORPORATION
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT
- Publication number 20110195349
- Publication date Aug 11, 2011
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING OPTICAL ELEMENT, AND OPTICAL ELEMENT
- Publication number 20110151383
- Publication date Jun 23, 2011
- HOYA CORPORATION
- Kazuhide YAMASHIRO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100304568
- Publication date Dec 2, 2010
- Seiro MIYOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD FOR FABRICATING THE SAME
- Publication number 20100304276
- Publication date Dec 2, 2010
- Hynix Semiconductor Inc.
- Jea Young Jun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Contrast Lithographic Masks
- Publication number 20100283982
- Publication date Nov 11, 2010
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Constructions
- Publication number 20100248093
- Publication date Sep 30, 2010
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD TO PATTERN CHROMELESS PHASE LITHOGRAPHY CONTACT HOLE
- Publication number 20100196805
- Publication date Aug 5, 2010
- CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
- Sia Kim TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK, WITH ABSORBENT CAVITIES
- Publication number 20100178596
- Publication date Jul 15, 2010
- Commissariat Al'energie Atomique
- Christophe Constancias
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...
- Publication number 20100159368
- Publication date Jun 24, 2010
- HOYA CORPORATION
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for etching glass or metal substrates using negative photore...
- Publication number 20100126367
- Publication date May 27, 2010
- Ji-Su Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND PATTERN FORM
- Publication number 20100086877
- Publication date Apr 8, 2010
- Toppan Printing Co., Ltd.
- Munehisa Soma
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20100075236
- Publication date Mar 25, 2010
- HOYA CORPORATION
- Masahiro HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Fabricating Chromeless Phase Shift Mask
- Publication number 20100055579
- Publication date Mar 4, 2010
- Hynix Semiconductor Inc.
- Jea-Young Jun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20090325084
- Publication date Dec 31, 2009
- HOYA CORPORATION
- Masahiro HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Phase-edge PSM

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Phase-shift mask for extreme ultraviolet lithography

Mask blank, phase shift mask, and method of manufacturing semicondu...

Chromeless phase shift mask structure and process

Patterning devices for use within a lithographic apparatus, methods...

Chromeless phase shift mask structure and process

Methods and patterning devices for measuring phase aberration

Forming a bridging feature using chromeless phase-shift lithography

Forming a bridging feature using chromeless phase-shift lithography

Chromeless phase-shifting photomask with undercut rim-shifting element

Optically semitransmissive film, photomask blank and photomask, and...

Forming a bridging feature using chromeless phase-shift lithography

Optically semitransmissive film, photomask blank and photomask, and...

Chromeless phase-shifting photomask with undercut rim-shifting element

Phase-shift mask with assist phase regions

Photomask blank, photomask, and methods of manufacturing the same

Method of manufacturing optical element, and optical element

Mask and method for fabricating the same

Optically semitransmissive film, photomask blank and photomask, and...

Method and system for fabricating three-dimensional structures with...

Mask and method to pattern chromeless phase lithography contact hole

Method of forming supports bearing features, such as lithography masks

Photomask blank, photomask, and methods of manufacturing the same

Method and apparatus for removing radiation side lobes

Photomask blank, photomask, and methods of manufacturing the same

CPL mask and a method and program product for generating the same

Method for fabricating chromeless phase shift mask

Photomask blank, photomask, and methods of manufacturing the same

Optically semitransmissive film, photomask blank and photomask, and...

Phase modulation device, phase modulation device fabrication method...

High contrast lithographic masks

Patents Applicationslast 30 patents

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

Chromeless Phase Shift Mask Structure and Process

OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...

Forming a Bridging Feature Using Chromeless Phase-Shift Lithography

Forming a Bridging Feature Using Chromeless Phase-Shift Lithography

CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT

Forming a Bridging Feature Using Chromeless Phase-Shift Lithography

OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...

Methods and Patterning Devices For Measuring Phase Aberration

Phase-shift mask with assist phase regions

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

PHASE MODULATION DEVICE, PHASE MODULATION DEVICE FABRICATION METHOD...

PHASE MODULATION DEVICE, PHASE MODULATION DEVICE FABRICATION METHOD...

OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...

CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT

METHOD OF MANUFACTURING OPTICAL ELEMENT, AND OPTICAL ELEMENT

PATTERN FORMING METHOD

MASK AND METHOD FOR FABRICATING THE SAME

High Contrast Lithographic Masks

Reticle Constructions

MASK AND METHOD TO PATTERN CHROMELESS PHASE LITHOGRAPHY CONTACT HOLE

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK, WITH ABSORBENT CAVITIES

OPTICALLY SEMITRANSMISSIVE FILM, PHOTOMASK BLANK AND PHOTOMASK, AND...

Method for etching glass or metal substrates using negative photore...

PATTERN FORMING METHOD AND PATTERN FORM

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

Method for Fabricating Chromeless Phase Shift Mask

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME