Phase shift masks [PSM] PSM blanks Preparation thereof

Industry

CPC
G03F1/26

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/26Phase shift masks [PSM] PSM blanks Preparation thereof

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank, method for producing photomask, and photomask
- Patent number 11,971,653
- Issue date Apr 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift blankmask and photomask for EUV lithography
- Patent number 11,927,880
- Issue date Mar 12, 2024
- S&S TECH Co., Ltd.
- Yong-Dae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 11,914,281
- Issue date Feb 27, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,880,130
- Issue date Jan 23, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabrication and control of nano-structure array by angle-...
- Patent number 11,837,470
- Issue date Dec 5, 2023
- Samsung Electronics Co., Ltd.
- Jisun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,829,065
- Issue date Nov 28, 2023
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift masks for extreme ultraviolet lithography
- Patent number 11,774,846
- Issue date Oct 3, 2023
- Samsung Electronics Co., Ltd.
- Seongsue Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, and manufacturing method thereof
- Patent number 11,774,845
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for forming the same
- Patent number 11,681,215
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsuan-Wen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method of forming the same
- Patent number 11,662,656
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, manufacturing method thereof, and phase shi...
- Patent number 11,644,742
- Issue date May 9, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 11,630,388
- Issue date Apr 18, 2023
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask and manufacturing method of semiconductor device
- Patent number 11,586,107
- Issue date Feb 21, 2023
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, transfer mask, and method for manufacturing semiconduct...
- Patent number 11,543,744
- Issue date Jan 3, 2023
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic mask correction using volume correction techniques
- Patent number 11,531,273
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zhiru Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask having a plurality of shielding layers
- Patent number 11,531,263
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift masks for extreme ultraviolet lithography
- Patent number 11,487,197
- Issue date Nov 1, 2022
- Samsung Electronics Co., Ltd.
- Seongsue Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,480,867
- Issue date Oct 25, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of measuring refractive index of EUV mask absorber
- Patent number 11,467,499
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 11,442,357
- Issue date Sep 13, 2022
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and method of fabricating a photomask
- Patent number 11,435,660
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method and apparatus
- Patent number 11,429,027
- Issue date Aug 30, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercut EUV absorber reflective contrast enhancement
- Patent number 11,402,742
- Issue date Aug 2, 2022
- Synopsys, Inc.
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and electronic component manufacturing method
- Patent number 11,385,537
- Issue date Jul 12, 2022
- Beijing Boe Display Technology Co., Ltd.
- Xiaoxiang Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 11,372,323
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, array substrate, fabrication method thereof and d...
- Patent number 11,360,378
- Issue date Jun 14, 2022
- Beijing Boe Display Technology Co., Ltd.
- Xiaoxiang Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask blank, manufacturing method thereof, and phase shi...
- Patent number 11,333,965
- Issue date May 17, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126162
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126163
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240103354
- Publication date Mar 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...
- Publication number 20240103355
- Publication date Mar 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240094622
- Publication date Mar 21, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK STRUCTURE
- Publication number 20240012322
- Publication date Jan 11, 2024
- United Microelectronics Corp.
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Photomask Blank, and Method for Manufacturing Reflective...
- Publication number 20230367199
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keisuke SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...
- Publication number 20230333461
- Publication date Oct 19, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kyoko KUROKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MANUFACTURING PHASE MASKS AND LENS-LESS CAMERA MODULE
- Publication number 20230291986
- Publication date Sep 14, 2023
- UIF (UNIVERSITY INDUSTRY FOUNDATION), YONSEI UNIVERSITY
- Seung Ah LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, METHOD AND PROGRAM PRODUCT FOR IMPROVING ACCURACY OF PHOTOM...
- Publication number 20230259016
- Publication date Aug 17, 2023
- PHOTRONICS, INC.
- Christopher Progler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20230259014
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20230251564
- Publication date Aug 10, 2023
- AGC Inc.
- Shunya TAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20230244135
- Publication date Aug 3, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE HOLOGRAPHIC PHASE MASKS
- Publication number 20230236494
- Publication date Jul 27, 2023
- University of Central Florida Research Foundation, Inc.
- Ivan Divliansky
- G01 - MEASURING TESTING
Information Patent Application
REFLECTION-TYPE MASK, REFLECTION-TYPE MASK BLANK, AND METHOD FOR MA...
- Publication number 20230185181
- Publication date Jun 15, 2023
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATE FOR BLANK MASK AND MANUFACTURING METHOD FOR THE SAME
- Publication number 20230168574
- Publication date Jun 1, 2023
- SKC solmics Co., Ltd.
- Taewan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR CLEANING LITHOGRAPHY MASK
- Publication number 20230152686
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsiung HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS
- Publication number 20230101021
- Publication date Mar 30, 2023
- Astrileux Corporation
- Supriya JAISWAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20230099176
- Publication date Mar 30, 2023
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230030141
- Publication date Feb 2, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20230018819
- Publication date Jan 19, 2023
- Samsung Electronics Co., Ltd.
- SEONGSUE KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MASK AND METHODS
- Publication number 20220390827
- Publication date Dec 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220390826
- Publication date Dec 8, 2022
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND APPARATUS
- Publication number 20220365438
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK
- Publication number 20220334462
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUAL CRITICAL DIMENSION PATTERNING
- Publication number 20220328304
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Chang Kau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK
- Publication number 20220317554
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20220299862
- Publication date Sep 22, 2022
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20220269160
- Publication date Aug 25, 2022
- S&S TECH CO., LTD.
- Yong-Dae KIM
- H01 - BASIC ELECTRIC ELEMENTS

Phase shift masks [PSM] PSM blanks Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photomask blank, method for producing photomask, and photomask

Phase shift blankmask and photomask for EUV lithography

Reflective mask blank, reflective mask, and method for manufacturin...

Method for extreme ultraviolet lithography mask treatment

Reflective mask blank, reflective mask and method of manufacturing...

Method for manufacturing reflective mask blank, reflective mask bla...

Method of fabrication and control of nano-structure array by angle-...

Reflective mask blank, reflective mask, method of manufacturing ref...

Phase shift masks for extreme ultraviolet lithography

Photomask blank, and manufacturing method thereof

Photomask and method for forming the same

Mask and method of forming the same

Phase shift mask blank, manufacturing method thereof, and phase shi...

Mask blank, method for manufacturing phase shift mask, and method f...

Phase shift mask and manufacturing method of semiconductor device

Mask blank, transfer mask, and method for manufacturing semiconduct...

Reduction or elimination of pattern placement error in metrology me...

Lithographic mask correction using volume correction techniques

Photomask having a plurality of shielding layers

Phase shift masks for extreme ultraviolet lithography

Reflective mask blank, reflective mask and method of manufacturing...

System and method of measuring refractive index of EUV mask absorber

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Photomask and method of fabricating a photomask

Photolithography method and apparatus

Undercut EUV absorber reflective contrast enhancement

Phase shift mask and electronic component manufacturing method

Phase-shift mask for extreme ultraviolet lithography

Phase shift mask, array substrate, fabrication method thereof and d...

Phase shift mask blank, manufacturing method thereof, and phase shi...

Patents Applicationslast 30 patents

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

PHOTOMASK STRUCTURE

Reflective Photomask Blank, and Method for Manufacturing Reflective...

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...

METHODS FOR MANUFACTURING PHASE MASKS AND LENS-LESS CAMERA MODULE

SYSTEM, METHOD AND PROGRAM PRODUCT FOR IMPROVING ACCURACY OF PHOTOM...

MASK AND METHOD OF FORMING THE SAME

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

REFLECTIVE HOLOGRAPHIC PHASE MASKS

REFLECTION-TYPE MASK, REFLECTION-TYPE MASK BLANK, AND METHOD FOR MA...

LAMINATE FOR BLANK MASK AND MANUFACTURING METHOD FOR THE SAME

METHODS FOR CLEANING LITHOGRAPHY MASK

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...

BLANK MASK AND PHOTOMASK USING THE SAME

PHASE SHIFT MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY

LITHOGRAPHY MASK AND METHODS

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

PHOTOLITHOGRAPHY METHOD AND APPARATUS

PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK

DUAL CRITICAL DIMENSION PATTERNING

PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY