Phase shift masks

Industry

CPC
G03F1/0046

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/0046Phase shift masks

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,709,885
- Issue date Jul 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography process to print low pattern densit...
- Patent number 9,535,334
- Issue date Jan 3, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,488,906
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing photomask blank
- Patent number 9,400,422
- Issue date Jul 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takashi Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, method of forming asymmetric pattern, method of m...
- Patent number 9,390,934
- Issue date Jul 12, 2016
- Hitachi High-Technologies Corporation
- Kazuyuki Kakuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, halftone phase shift photomas...
- Patent number 9,366,951
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method
- Patent number 9,349,585
- Issue date May 24, 2016
- Kabushiki Kaisha Toshiba
- Sonoe Nakaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluation of etching conditions for pattern-forming film
- Patent number 8,992,788
- Issue date Mar 31, 2015
- Shin-Etsu Chemical Co., Ltd.
- Shinichi Igarashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Light pattern exposure method, photomask, and photomask blank
- Patent number 8,753,787
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
System and Method of Measuring Refractive Index of EUV Mask Absorber
- Publication number 20210382398
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK, METHOD OF FORMING ASYMMETRIC PATTERN, METHOD OF M...
- Publication number 20140302679
- Publication date Oct 9, 2014
- Hitachi High-Technologies Corporation
- Kazuyuki Kakuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION FOR ETCH MASK FILM
- Publication number 20130132014
- Publication date May 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Shinichi IGARASHI
- G01 - MEASURING TESTING
Information Patent Application
EVALUATION OF ETCHING CONDITIONS FOR PATTERN-FORMING FILM
- Publication number 20130126471
- Publication date May 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Shinichi IGARASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK
- Publication number 20130130160
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Phase shift masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photomask blank and method for manufacturing photomask blank

Extreme ultraviolet lithography process to print low pattern densit...

Photomask blank and method for manufacturing photomask blank

Method for manufacturing photomask blank

Phase shift mask, method of forming asymmetric pattern, method of m...

Halftone phase shift photomask blank, halftone phase shift photomas...

Pattern formation method

Evaluation of etching conditions for pattern-forming film

Light pattern exposure method, photomask, and photomask blank

Patents Applicationslast 30 patents

System and Method of Measuring Refractive Index of EUV Mask Absorber

PHASE SHIFT MASK, METHOD OF FORMING ASYMMETRIC PATTERN, METHOD OF M...

EVALUATION FOR ETCH MASK FILM

EVALUATION OF ETCHING CONDITIONS FOR PATTERN-FORMING FILM

LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK