Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Industry

CPC
G03F7/085

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photocurable composition comprising a fullerene
- Patent number 12,061,416
- Issue date Aug 13, 2024
- Canon Kabushiki Kaisha
- Fen Wan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,880,135
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition, via-forming method, display subst...
- Patent number 11,526,077
- Issue date Dec 13, 2022
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, solder resist film using said pho...
- Patent number 11,402,754
- Issue date Aug 2, 2022
- Arisawa Mfg. Co., Ltd.
- Takashi Gondaira
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 11,402,755
- Issue date Aug 2, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Kuroiwa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, photosensitive dry film, and patt...
- Patent number 11,187,982
- Issue date Nov 30, 2021
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification type positive photosensitive resin compositi...
- Patent number 11,061,326
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition that can be activated by multiphoton abs...
- Patent number 11,061,325
- Issue date Jul 13, 2021
- Universite Grenoble Alpes
- Olivier Stephan
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Tunable adhesion of EUV photoresist on oxide surface
- Patent number 11,022,887
- Issue date Jun 1, 2021
- International Business Machines Corporation
- Yongan Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, cured product of same, interlayer...
- Patent number 11,021,572
- Issue date Jun 1, 2021
- HD MICROSYSTEMS, LTD.
- Ayaka Azuma
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive adhesive composition, photosensitive conductive adhe...
- Patent number 11,016,385
- Issue date May 25, 2021
- Industrial Technology Research Institute
- Yi-Chi Yang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cured film and method for producing same
- Patent number 10,908,500
- Issue date Feb 2, 2021
- Toray Industries, Inc.
- Yu Shoji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Embossing lacquer and method for embossing, and substrate surface c...
- Patent number 10,809,622
- Issue date Oct 20, 2020
- Joanneum Research Forschungsgesellschaft mbH
- Dieter Nees
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable adhesion of EUV photoresist on oxide surface
- Patent number 10,551,742
- Issue date Feb 4, 2020
- International Business Machines Corporation
- Yongan Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 10,365,560
- Issue date Jul 30, 2019
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition sensitive to radiation in electromagnetic spectrum rang...
- Patent number 10,254,646
- Issue date Apr 9, 2019
- IBF Industria Brasileira De Filmes S/A
- Andre Luiz Arias
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Modified nano-silica and method for preparing the same, pigment dis...
- Patent number 10,138,390
- Issue date Nov 27, 2018
- BOE Technology Group Co., Ltd.
- Ming Zhao
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 10,101,657
- Issue date Oct 16, 2018
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin laminate and relief printing original plate
- Patent number 10,042,257
- Issue date Aug 7, 2018
- Toray Industries, Inc.
- Tsutomu Abura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursors and coating
- Patent number 10,012,904
- Issue date Jul 3, 2018
- Mark'Andy Inc.
- Anthony Paul Kitson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating microscopic patterns of protein and other mac...
- Patent number 9,939,424
- Issue date Apr 10, 2018
- Washington University
- Paul C Bridgman
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Grant
Polymer, chemically amplified positive resist composition and patte...
- Patent number 9,810,983
- Issue date Nov 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,740,097
- Issue date Aug 22, 2017
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, printed circuit board using the composition, and...
- Patent number 9,733,565
- Issue date Aug 15, 2017
- SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Young Kwan Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursors and processes for preparing...
- Patent number 9,690,195
- Issue date Jun 27, 2017
- FUJIFILM Corporation
- Hiroyuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laminated structure, dry film and method of producing laminated str...
- Patent number 9,497,856
- Issue date Nov 15, 2016
- TAIYO INK MFG. CO., LTD.
- Daichi Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive element, method for forming resist pattern, and meth...
- Patent number 9,439,291
- Issue date Sep 6, 2016
- Hitachi Chemical Company, Ltd.
- Masao Kubota
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polymer for lithography
- Patent number 9,296,842
- Issue date Mar 29, 2016
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, method for forming pattern-cured...
- Patent number 9,274,422
- Issue date Mar 1, 2016
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-type photosensitive resin composition, pattern forming met...
- Patent number 9,244,346
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Dai Shiota
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
A Lithographic Printing Plate Precursor
- Publication number 20230382100
- Publication date Nov 30, 2023
- AGFA Offset BV
- Fabienne Goethals
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
FLEXIBLE SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Publication number 20230314950
- Publication date Oct 5, 2023
- E Ink Holdings Inc.
- Hsien-Yi HSIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT ABSORPTION FILTER, OPTICAL FILTER, SELF-LUMINOUS DISPLAY DEVI...
- Publication number 20230288748
- Publication date Sep 14, 2023
- FUJIFILM CORPORATION
- Nobutaka FUKAGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20230205085
- Publication date Jun 29, 2023
- DONGJIN SEMICHEM CO., LTD.
- Hyoc Min YOUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE COMPOSITION COMPRISING A FULLERENE
- Publication number 20230021464
- Publication date Jan 26, 2023
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED MATERIAL AND ELEC...
- Publication number 20220382154
- Publication date Dec 1, 2022
- TAIYO HOLDINGS CO., LTD.
- Maho AKIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, MEMBER FOR...
- Publication number 20210198416
- Publication date Jul 1, 2021
- TORAY INDUSTRIES, INC.
- Mika Koshino
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20210181629
- Publication date Jun 17, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Mitsuru Haga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE WITH IMPROVED BARRIER L...
- Publication number 20210173307
- Publication date Jun 10, 2021
- FOLEX AG
- François Varescon
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING LAYER PREPARED THER...
- Publication number 20210149306
- Publication date May 20, 2021
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jin Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING LAYER PREPARED THER...
- Publication number 20210149305
- Publication date May 20, 2021
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Su Min Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-TONE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESI...
- Publication number 20200201181
- Publication date Jun 25, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Hirofumi IMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...
- Publication number 20200117089
- Publication date Apr 16, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TUNABLE ADHESION OF EUV PHOTORESIST ON OXIDE SURFACE
- Publication number 20200073246
- Publication date Mar 5, 2020
- International Business Machines Corporation
- Yongan Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE ADHESIVE COMPOSITION, PHOTOSENSITIVE CONDUCTIVE ADHE...
- Publication number 20200064736
- Publication date Feb 27, 2020
- Industrial Technology Research Institute
- Yi-Chi Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, SOLDER RESIST FILM USING SAID PHO...
- Publication number 20190332011
- Publication date Oct 31, 2019
- ARISAWA MFG. CO., LTD.
- Takashi GONDAIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TUNABLE ADHESION OF EUV PHOTORESIST ON OXIDE SURFACE
- Publication number 20190187565
- Publication date Jun 20, 2019
- International Business Machines Corporation
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION THAT CAN BE ACTIVATED BY MULTIPHOTON ABS...
- Publication number 20190113841
- Publication date Apr 18, 2019
- UNIVERSITE GRENOBLE ALPES
- Olivier STEPHAN
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
BLACK MATRIX, METHOD FOR MANUFACTURING THE SAME AND LIQUID PANEL HA...
- Publication number 20180246368
- Publication date Aug 30, 2018
- Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Chengzhong Yu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
EMBOSSING LACQUER AND METHOD FOR EMBOSSING, AND SUBSTRATE SURFACE C...
- Publication number 20170343900
- Publication date Nov 30, 2017
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Dieter NEES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND
- Publication number 20160170302
- Publication date Jun 16, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Dai SHIOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20150153647
- Publication date Jun 4, 2015
- Hitachi Chemical Company, Ltd.
- Katsutoshi Itagaki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RESIN COMPOSITION, PRINTED CIRCUIT BOARD USING THE COMPOSITION, AND...
- Publication number 20150050473
- Publication date Feb 19, 2015
- Samsung Electro-Mechanics Co., Ltd.
- Young Kwan SEO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Optical Member and Ultraviolet-Curable Adhesive to Be Used for Prod...
- Publication number 20140356591
- Publication date Dec 4, 2014
- NIPPON KAYAKU KABUSHIKIKAISHA
- Hayato Motohashi
- B32 - LAYERED PRODUCTS
Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...
- Publication number 20140231729
- Publication date Aug 21, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Dai Shiota
- B82 - NANO-TECHNOLOGY
Information Patent Application
NOVEL COMPOUND
- Publication number 20140221649
- Publication date Aug 7, 2014
- DAICEL CORPORATION
- Dai Shiota
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND
- Publication number 20140205949
- Publication date Jul 24, 2014
- ADEKA CORPORATION
- Kenji Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER
- Publication number 20140199632
- Publication date Jul 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN-CURED...
- Publication number 20140120462
- Publication date May 1, 2014
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSORS AND PROCESSES FOR PREPARING...
- Publication number 20130344440
- Publication date Dec 26, 2013
- FUJIFILM CORPORATION
- Hiroyuki SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photocurable composition comprising a fullerene

Photoresist compositions and pattern formation methods

Positive photoresist composition, via-forming method, display subst...

Photosensitive resin composition, solder resist film using said pho...

Chemically amplified positive-type photosensitive resin composition...

Photosensitive resin composition, photosensitive dry film, and patt...

Chemical amplification type positive photosensitive resin compositi...

Photosensitive composition that can be activated by multiphoton abs...

Tunable adhesion of EUV photoresist on oxide surface

Photosensitive resin composition, cured product of same, interlayer...

Photosensitive adhesive composition, photosensitive conductive adhe...

Cured film and method for producing same

Embossing lacquer and method for embossing, and substrate surface c...

Tunable adhesion of EUV photoresist on oxide surface

Resist composition and method for producing resist pattern

Composition sensitive to radiation in electromagnetic spectrum rang...

Modified nano-silica and method for preparing the same, pigment dis...

Resin, resist composition and method for producing resist pattern

Resin laminate and relief printing original plate

Lithographic printing plate precursors and coating

Method for generating microscopic patterns of protein and other mac...

Polymer, chemically amplified positive resist composition and patte...

Resist composition and method for producing resist pattern

Resin composition, printed circuit board using the composition, and...

Lithographic printing plate precursors and processes for preparing...

Laminated structure, dry film and method of producing laminated str...

Photosensitive element, method for forming resist pattern, and meth...

Polymer for lithography

Photosensitive resin composition, method for forming pattern-cured...

Negative-type photosensitive resin composition, pattern forming met...

Patents Applicationslast 30 patents

A Lithographic Printing Plate Precursor

FLEXIBLE SUBSTRATE AND MANUFACTURING METHOD THEREOF

LIGHT ABSORPTION FILTER, OPTICAL FILTER, SELF-LUMINOUS DISPLAY DEVI...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

PHOTOCURABLE COMPOSITION COMPRISING A FULLERENE

PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED MATERIAL AND ELEC...

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, MEMBER FOR...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE WITH IMPROVED BARRIER L...

PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING LAYER PREPARED THER...

PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING LAYER PREPARED THER...

NEGATIVE-TONE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESI...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...

TUNABLE ADHESION OF EUV PHOTORESIST ON OXIDE SURFACE

PHOTOSENSITIVE ADHESIVE COMPOSITION, PHOTOSENSITIVE CONDUCTIVE ADHE...

PHOTOSENSITIVE RESIN COMPOSITION, SOLDER RESIST FILM USING SAID PHO...

TUNABLE ADHESION OF EUV PHOTORESIST ON OXIDE SURFACE

PHOTOSENSITIVE COMPOSITION THAT CAN BE ACTIVATED BY MULTIPHOTON ABS...

BLACK MATRIX, METHOD FOR MANUFACTURING THE SAME AND LIQUID PANEL HA...

EMBOSSING LACQUER AND METHOD FOR EMBOSSING, AND SUBSTRATE SURFACE C...

NOVEL COMPOUND

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

RESIN COMPOSITION, PRINTED CIRCUIT BOARD USING THE COMPOSITION, AND...

Optical Member and Ultraviolet-Curable Adhesive to Be Used for Prod...

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MET...

NOVEL COMPOUND

PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND

PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND MONOMER

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN-CURED...

LITHOGRAPHIC PRINTING PLATE PRECURSORS AND PROCESSES FOR PREPARING...