Physical or chemical etching of the layers

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H01L21/3213

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3213Physical or chemical etching of the layers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor test sample and manufacturing method thereof
- Patent number 12,368,051
- Issue date Jul 22, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Rui Ding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive feature formation
- Patent number 12,369,293
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating semiconductor device
- Patent number 12,369,314
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Seung-Heon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,362,180
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chin-Ta Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure and semiconductor s...
- Patent number 12,363,882
- Issue date Jul 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xinman Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Select gate spacer formation to facilitate embedding of split gate...
- Patent number 12,356,673
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching metals in semiconductor devices
- Patent number 12,354,881
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact structure for semiconductor device
- Patent number 12,354,913
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yu Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure passivating species drive-in method and structure fo...
- Patent number 12,354,876
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,356,646
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment of spin on organic material to improve wet resistance
- Patent number 12,347,727
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Yang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,347,683
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method using the same, and...
- Patent number 12,347,657
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End point detection method and apparatus for anisotropic etching us...
- Patent number 12,347,663
- Issue date Jul 1, 2025
- SanDisk Technologies, Inc.
- Shoichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for metal gate cut and structure thereof
- Patent number 12,347,690
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside metal patterning die singulation system and related methods
- Patent number 12,341,069
- Issue date Jun 24, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. Seddon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate stack for metal gate transistor
- Patent number 12,342,591
- Issue date Jun 24, 2025
- Marvell Asia Pte, Ltd.
- Runzi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation method for semiconductor structure and same
- Patent number 12,341,010
- Issue date Jun 24, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Longyang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid preparation device, and substrate processing device
- Patent number 12,337,289
- Issue date Jun 24, 2025
- SCREEN Holdings Co., Ltd.
- Hajime Nishide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,341,020
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Ryutaro Suda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride inhibitors for high selectivity of TiN—SiN CMP applications
- Patent number 12,338,369
- Issue date Jun 24, 2025
- CMC MATERIALS LLC
- Chih-Hsien Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,336,161
- Issue date Jun 17, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,336,253
- Issue date Jun 17, 2025
- United Microelectronics Corp.
- Chun-Hsien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for patterning a silicon oxide-silicon nitride-silicon oxid...
- Patent number 12,334,333
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Yi-Ren Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integration processes utilizing boron-doped silicon materials
- Patent number 12,334,358
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure including graphite and method forming same
- Patent number 12,334,397
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Cheng Chin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,336,271
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20250239451
- Publication date Jul 24, 2025
- Samsung SDI Co., Ltd.
- Yejin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW WARPAGE HIGH DENSITY TRENCH CAPACITOR
- Publication number 20250240981
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Jyun-Ying LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE FILM DEPOSITION
- Publication number 20250239484
- Publication date Jul 24, 2025
- ASM IP HOLDING B.V.
- Paul Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVI...
- Publication number 20250236793
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Min Hyung CHO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS
- Publication number 20250235805
- Publication date Jul 24, 2025
- Tokuyama Corporation
- Tomoaki SATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20250237953
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takashi SAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE WITH SELF-ALIGNED VIAS
- Publication number 20250239487
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR EUV APPLICATIONS
- Publication number 20250237941
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Hsun Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GATE RESISTANCE IMPROVEMENT AND METHOD THEREOF
- Publication number 20250241001
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Different Via Configurations for Different Via Interface Requirements
- Publication number 20250239527
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD F...
- Publication number 20250230358
- Publication date Jul 17, 2025
- FUJIFILM CORPORATION
- Atsushi Mizutani
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Contact Structures in Semiconductor Devices
- Publication number 20250234629
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Structure For Semiconductor Device
- Publication number 20250226263
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yu HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METALLIZATION STRUCTURE FOR COUPLING BOILING ENHANCED LAYER TO SUBS...
- Publication number 20250226216
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chihting Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250226220
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- TAE-HOI PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...
- Publication number 20250226235
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Yung-chen LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226228
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuaki IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERCONNECT WITH TOPVIA
- Publication number 20250226319
- Publication date Jul 10, 2025
- International Business Machines Corporation
- Gideon Oyibo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER
- Publication number 20250218774
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DIE AND METHODS OF FORMATION
- Publication number 20250218793
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufactacturing Company, Ltd.
- I-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR TREATMENT LIQUID FOR REMOVING RUTHENIUM SILICIDE
- Publication number 20250215574
- Publication date Jul 3, 2025
- Tokuyama Corporation
- Yuzan SUZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216776
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH CATALYTIC CONDUCTIVE LAYER AND METHOD FOR...
- Publication number 20250218791
- Publication date Jul 3, 2025
- NANYA TECHNOLOGY CORPORATION
- WEI-YU CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANU...
- Publication number 20250215318
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Po Ting CHOU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING COMPOSITION, METHOD OF ETCHING METAL-CONTAINING LAYER USING...
- Publication number 20250215575
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Byungjoon KANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMAGE PICKUP DEVICE AND METHOD OF TRACKING SUBJECT THEREOF
- Publication number 20250216747
- Publication date Jul 3, 2025
- Maxell, Ltd.
- Hiroshi SHIMIZU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216777
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE LEAKAGE CURRENT SUPPRESSION BY SOURCE SURROUNDING GATE STRUC...
- Publication number 20250212484
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Aurelien Gauthier Brun
- H01 - BASIC ELECTRIC ELEMENTS

Physical or chemical etching of the layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor test sample and manufacturing method thereof

Conductive feature formation

Plasma processing method

Plasma processing method and plasma processing apparatus

Methods of fabricating semiconductor device

Ion beam etching chamber with etching by-product redistributor

Method of manufacturing semiconductor devices

Method of manufacturing semiconductor structure and semiconductor s...

Select gate spacer formation to facilitate embedding of split gate...

Methods of etching metals in semiconductor devices

Contact structure for semiconductor device

Gate structure passivating species drive-in method and structure fo...

Semiconductor device and method for manufacturing the same

Treatment of spin on organic material to improve wet resistance

Method of manufacturing a semiconductor device

Plasma etching apparatus, plasma etching method using the same, and...

End point detection method and apparatus for anisotropic etching us...

Method for metal gate cut and structure thereof

Backside metal patterning die singulation system and related methods

Gate stack for metal gate transistor

Preparation method for semiconductor structure and same

Chemical liquid preparation device, and substrate processing device

Substrate processing method and substrate processing apparatus

Nitride inhibitors for high selectivity of TiN—SiN CMP applications

Semiconductor structure and manufacturing method thereof

Semiconductor device and method for fabricating the same

Methods for patterning a silicon oxide-silicon nitride-silicon oxid...

Integration processes utilizing boron-doped silicon materials

Interconnect structure including graphite and method forming same

Semiconductor devices and methods of manufacturing thereof

Patents Applicationslast 30 patents

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

LOW WARPAGE HIGH DENSITY TRENCH CAPACITOR

SELECTIVE FILM DEPOSITION

ETCHING COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVI...

LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS

SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...

SEMICONDUCTOR DEVICE WITH SELF-ALIGNED VIAS

PELLICLE FOR EUV APPLICATIONS

GATE RESISTANCE IMPROVEMENT AND METHOD THEREOF

Different Via Configurations for Different Via Interface Requirements

COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD F...

Contact Structures in Semiconductor Devices

Contact Structure For Semiconductor Device

METALLIZATION STRUCTURE FOR COUPLING BOILING ENHANCED LAYER TO SUBS...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

PHOTORESIST AND METHOD OF FORMATION AND USE

INTERCONNECT WITH TOPVIA

HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER

SEMICONDUCTOR DIE AND METHODS OF FORMATION

SEMICONDUCTOR TREATMENT LIQUID FOR REMOVING RUTHENIUM SILICIDE

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR DEVICE WITH CATALYTIC CONDUCTIVE LAYER AND METHOD FOR...

ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANU...

ETCHING COMPOSITION, METHOD OF ETCHING METAL-CONTAINING LAYER USING...

IMAGE PICKUP DEVICE AND METHOD OF TRACKING SUBJECT THEREOF

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SOURCE LEAKAGE CURRENT SUPPRESSION BY SOURCE SURROUNDING GATE STRUC...