Plasma being used non-continuously during the ALD reactions

Industry

CPC
C23C16/45542

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Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45542Plasma being used non-continuously during the ALD reactions

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for depositing a gap-fill layer by plasma-assisted deposition
- Patent number 11,972,944
- Issue date Apr 30, 2024
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective cobalt deposition on copper surfaces
- Patent number 11,959,167
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Sang-Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method
- Patent number 11,952,661
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of iridium containing films
- Patent number 11,946,135
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source, microwave plasma processing apparatus and...
- Patent number 11,942,308
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Yasuaki Taniike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage, low pressure plasma enhanced atomic layer deposition
- Patent number 11,935,759
- Issue date Mar 19, 2024
- Lotus Applied Technology, LLC
- Eric R. Dickey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing silicon-free carbon-containing film as gap-fi...
- Patent number 11,923,190
- Issue date Mar 5, 2024
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,915,914
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Sena Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,820,654
- Issue date Nov 21, 2023
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Jean-Marc Girard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method
- Patent number 11,781,219
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Kazuo Yabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,784,047
- Issue date Oct 10, 2023
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of ox...
- Patent number 11,776,807
- Issue date Oct 3, 2023
- ASM IP Holding, B.V.
- Lingyun Jia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilayer encapsulation stacks by atomic layer deposition
- Patent number 11,732,356
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Cong Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing a conformal metal or metalloid silicon nitri...
- Patent number 11,732,351
- Issue date Aug 22, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming metal silicon oxide and metal silicon oxynitride...
- Patent number 11,725,280
- Issue date Aug 15, 2023
- ASM IP Holding B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective PEALD of oxide on dielectric
- Patent number 11,728,164
- Issue date Aug 15, 2023
- ASM IP Holding B.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k films
- Patent number 11,713,507
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Trisilylamine derivatives as precursors for high growth rate silico...
- Patent number 11,702,743
- Issue date Jul 18, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing silicon-free carbon-containing film as gap-fi...
- Patent number 11,646,197
- Issue date May 9, 2023
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature deposition of iridium containing films
- Patent number 11,643,721
- Issue date May 9, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF power source operation in plasma enhanced processes
- Patent number 11,631,583
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Farhad Moghadam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PEALD nitride films
- Patent number 11,626,281
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,610,775
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method, materials and process for native oxide removal and regrowth...
- Patent number 11,598,000
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Ranga Rao Arnepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,600,530
- Issue date Mar 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Yi Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods for the deposition of silicon oxide films
- Patent number 11,584,854
- Issue date Feb 21, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming a microelectronic device, and related systems an...
- Patent number 11,551,926
- Issue date Jan 10, 2023
- Micron Technology, Inc.
- Farrell M. Good
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for atomic layer deposition of SiCO(N) using halogenated si...
- Patent number 11,549,181
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead with inlet mixer
- Patent number 11,549,183
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Ashutosh Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-cycle ALD process for film uniformity and thickness profile m...
- Patent number 11,479,856
- Issue date Oct 25, 2022
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240030031
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE INCLUDING TRANSPARENT POLYMER WITH HYDROPHILIC COATING, AND...
- Publication number 20230399744
- Publication date Dec 14, 2023
- Agilent Technologies, Inc.
- Elizabeth CARR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR FORMING METAL SILICON OXIDE AND METAL SILICON...
- Publication number 20230349043
- Publication date Nov 2, 2023
- ASM IP HOLDING B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20230298884
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS
- Publication number 20230227968
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEALD Nitride Films
- Publication number 20230230830
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20230212744
- Publication date Jul 6, 2023
- ASM IP HOLDING, B.V.
- René Henricus Jozef Vervuurt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230207309
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Viljami PORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20230197524
- Publication date Jun 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yi Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL
- Publication number 20230175117
- Publication date Jun 8, 2023
- LAM RESEARCH CORPORATION
- Dustin Zachary AUSTIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOSS PREVENTION DURING ATOMIC LAYER DEPOSITION
- Publication number 20230154754
- Publication date May 18, 2023
- LAM RESEARCH CORPORATION
- Jason Alexander VARNELL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Atomic Layer Deposition Of SiCO(N) Using Halogenated Si...
- Publication number 20230090196
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING A GAP-FILL LAYER BY PLASMA-ASSISTED DEPOSITION
- Publication number 20230065627
- Publication date Mar 2, 2023
- ASM IP HOLDING B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Resistant YxHfyOz Homogeneous Films and Methods of Film Prod...
- Publication number 20230044068
- Publication date Feb 9, 2023
- Greene, Tweed Technologies, Inc.
- Alexadru C. Pavel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU PECVD CAP LAYER
- Publication number 20230002887
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Jeremy David FIELDS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20220411920
- Publication date Dec 29, 2022
- Tokyo Electron Limited
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
- Publication number 20220403515
- Publication date Dec 22, 2022
- Tokyo Electron Limited
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-CONFORMAL PLASMA INDUCED ALD GAPFILL
- Publication number 20220389580
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA ULTRAVIOLET ENHANCED DEPOSITION
- Publication number 20220328292
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K FILMS
- Publication number 20220307134
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
- Publication number 20220298625
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Sang-Ho YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
- Publication number 20220275510
- Publication date Sep 1, 2022
- LAM RESEARCH CORPORATION
- Awnish GUPTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF FORMING PHOSPHOSILICATE GLASS LAYERS, STRUCTURES FORMED...
- Publication number 20220267903
- Publication date Aug 25, 2022
- ASM IP HOLDING B.V.
- SeungHyun Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU CONTROL OF FILM PROPERTIES DURING ATOMIC LAYER DEPOSITION
- Publication number 20220238325
- Publication date Jul 28, 2022
- LAM RESEARCH CORPORATION
- Douglas Walter Agnew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A MICROELECTRONIC DEVICE, AND RELATED SYSTEMS AN...
- Publication number 20220238324
- Publication date Jul 28, 2022
- Micron Technology, Inc.
- Farrell M. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON PRECURSORS FOR SILICON NITRIDE DEPOSITION
- Publication number 20220181148
- Publication date Jun 9, 2022
- ASM IP HOLDING B.V.
- Charles Dezelah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VARIABLE CYCLE AND TIME RF ACTIVATION METHOD FOR FILM THICKNESS MAT...
- Publication number 20220154336
- Publication date May 19, 2022
- LAM RESEARCH CORPORATION
- Ishtak Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PEALD OF OXIDE ON DIELECTRIC
- Publication number 20220076949
- Publication date Mar 10, 2022
- ASM IP HOLDING B.V.
- Eva Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING METAL SILICON OXIDE AND METAL SILICON...
- Publication number 20220064795
- Publication date Mar 3, 2022
- ASM IP HOLDING B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF OX...
- Publication number 20220044931
- Publication date Feb 10, 2022
- ASM IP HOLDING B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS

Plasma being used non-continuously during the ALD reactions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for depositing a gap-fill layer by plasma-assisted deposition

Selective cobalt deposition on copper surfaces

Deposition method

Low temperature deposition of iridium containing films

Microwave plasma source, microwave plasma processing apparatus and...

High voltage, low pressure plasma enhanced atomic layer deposition

Method for depositing silicon-free carbon-containing film as gap-fi...

Film forming method and film forming apparatus

Si-containing film forming precursors and methods of using the same

Processing apparatus and processing method

Tin oxide thin film spacers in semiconductor device manufacturing

Plasma enhanced deposition processes for controlled formation of ox...

Multilayer encapsulation stacks by atomic layer deposition

Methods for depositing a conformal metal or metalloid silicon nitri...

Method for forming metal silicon oxide and metal silicon oxynitride...

Selective PEALD of oxide on dielectric

Low-k films

Trisilylamine derivatives as precursors for high growth rate silico...

Method for depositing silicon-free carbon-containing film as gap-fi...

Low temperature deposition of iridium containing films

RF power source operation in plasma enhanced processes

PEALD nitride films

Method and apparatus for filling a gap

Method, materials and process for native oxide removal and regrowth...

Semiconductor device and method of manufacture

Compositions and methods for the deposition of silicon oxide films

Methods of forming a microelectronic device, and related systems an...

Methods for atomic layer deposition of SiCO(N) using halogenated si...

Showerhead with inlet mixer

Multi-cycle ALD process for film uniformity and thickness profile m...

Patents Applicationslast 30 patents

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

DEVICE INCLUDING TRANSPARENT POLYMER WITH HYDROPHILIC COATING, AND...

METHOD AND SYSTEM FOR FORMING METAL SILICON OXIDE AND METAL SILICON...

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS

PEALD Nitride Films

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

METHOD AND APPARATUS FOR FILLING A GAP

Semiconductor Device and Method of Manufacture

SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL

LOSS PREVENTION DURING ATOMIC LAYER DEPOSITION

Methods For Atomic Layer Deposition Of SiCO(N) Using Halogenated Si...

METHOD FOR DEPOSITING A GAP-FILL LAYER BY PLASMA-ASSISTED DEPOSITION

Plasma Resistant YxHfyOz Homogeneous Films and Methods of Film Prod...

IN-SITU PECVD CAP LAYER

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

NON-CONFORMAL PLASMA INDUCED ALD GAPFILL

REMOTE PLASMA ULTRAVIOLET ENHANCED DEPOSITION

LOW-K FILMS

SELECTIVE COBALT DEPOSITION ON COPPER SURFACES

THERMAL ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS

METHODS OF FORMING PHOSPHOSILICATE GLASS LAYERS, STRUCTURES FORMED...

IN-SITU CONTROL OF FILM PROPERTIES DURING ATOMIC LAYER DEPOSITION

METHODS OF FORMING A MICROELECTRONIC DEVICE, AND RELATED SYSTEMS AN...

SILICON PRECURSORS FOR SILICON NITRIDE DEPOSITION

VARIABLE CYCLE AND TIME RF ACTIVATION METHOD FOR FILM THICKNESS MAT...

SELECTIVE PEALD OF OXIDE ON DIELECTRIC

METHOD AND SYSTEM FOR FORMING METAL SILICON OXIDE AND METAL SILICON...

PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF OX...