Plasma being used non-continuously in between ALD reactions

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CPC
C23C16/4554

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4554Plasma being used non-continuously in between ALD reactions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,288,683
- Issue date Apr 29, 2025
- Kokusai Electric Corporation
- Yasunobu Koshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas container and deposition system including the same
- Patent number 12,287,064
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Sunhye Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,281,389
- Issue date Apr 22, 2025
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 12,283,479
- Issue date Apr 22, 2025
- ASM IP Holding B.V.
- JaeOk Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method, method of manufacturing semiconductor...
- Patent number 12,278,108
- Issue date Apr 15, 2025
- Kokusai Electric Corporation
- Arito Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,276,025
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Kwang Ryul Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming phosphosilicate glass layers, structures formed...
- Patent number 12,276,021
- Issue date Apr 15, 2025
- ASM IP Holding B.V.
- Seunghyun Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate and method of manufacturing semicond...
- Patent number 12,278,103
- Issue date Apr 15, 2025
- Kokusai Electric Corporation
- Takayuki Waseda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment fixture for a reactor system
- Patent number 12,278,129
- Issue date Apr 15, 2025
- ASM IP Holding B.V.
- Surojit Ganguli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition method and apparatus for filling a recess forme...
- Patent number 12,272,593
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing a ceramic matrix composite component
- Patent number 12,269,779
- Issue date Apr 8, 2025
- RTX Corporation
- Paul Sheedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate suppport and method of ma...
- Patent number 12,272,579
- Issue date Apr 8, 2025
- Kokusai Electric Corporation
- Yusaku Okajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced atomic layer deposition with radio-frequency power...
- Patent number 12,270,103
- Issue date Apr 8, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilayer coatings of component parts for a work piece processing...
- Patent number 12,266,509
- Issue date Apr 1, 2025
- Lam Researh Corporation
- Paul Konkola
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and mixing inlet device
- Patent number 12,264,393
- Issue date Apr 1, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jingfeng Wei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 12,261,038
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming thin film
- Patent number 12,252,788
- Issue date Mar 18, 2025
- Soulbrain Co., Ltd.
- Changbong Yeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ PECVD cap layer
- Patent number 12,252,782
- Issue date Mar 18, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for performing film forming process on substrate and meth...
- Patent number 12,247,287
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Manabu Honma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate supporting assembly and substrate processing apparatus
- Patent number 12,249,536
- Issue date Mar 11, 2025
- Wonik IPS Co., Ltd.
- Hyun Jong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater assembly including cooling apparatus and method of using same
- Patent number 12,247,286
- Issue date Mar 11, 2025
- ASM IP Holding B.V.
- Carl Louis White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,247,288
- Issue date Mar 11, 2025
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum gauge protector for deposition systems
- Patent number 12,247,890
- Issue date Mar 11, 2025
- Arradiance, LLC
- David R. Beaulieu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Impurity removal in doped ALD tantalum nitride
- Patent number 12,243,774
- Issue date Mar 4, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Combination CVD/ALD method, source and pulse profile modification
- Patent number 12,241,156
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- Hannu Huotari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle remover and method
- Patent number 12,233,368
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Hao Cheng
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Semiconductor processing apparatus and methods for monitoring and c...
- Patent number 12,234,552
- Issue date Feb 25, 2025
- ASM IP Holding B.V.
- Mohith Verghese
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor accumulator for corrosive gases with purging
- Patent number 12,227,842
- Issue date Feb 18, 2025
- Lam Research Corporation
- Gary Bridger Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive sensor for monitoring gas concentration
- Patent number 12,228,534
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for semiconductor processing
- Patent number 12,230,530
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
VAPOR ACCUMULATOR FOR CORROSIVE GASES WITH PURGING
- Publication number 20250137125
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical Supply Device, Radical Processing Device, Radical Generatio...
- Publication number 20250140527
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR DEPOSITING THIN FILM, AND THIN FILM
- Publication number 20250137124
- Publication date May 1, 2025
- JIANGSU LEADMICRO NANO TECHNOLOGY CO., LTD.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR DEPOSITING METAL PHOSPHIDE
- Publication number 20250137121
- Publication date May 1, 2025
- ASM IP HOLDING B.V.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas Manifold for Simultaneous Gas Property Control in Deposition Sy...
- Publication number 20250137130
- Publication date May 1, 2025
- Arradiance, LLC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250129472
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE INPUT POST MIX SHOWERHEAD
- Publication number 20250129475
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Norman JACOBSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING SYSTEM
- Publication number 20250129479
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUSES FOR TEMPERATURE INDEXED ALD
- Publication number 20250129473
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Bert Jongbloed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND APPARATUS FOR ATOMIC LAYER DEPOSITION
- Publication number 20250122618
- Publication date Apr 17, 2025
- SparkNano B.V.
- Paul POODT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING CHAMBER WITH RF RETURN PATH
- Publication number 20250118593
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Vellaichamy NAGAPPAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL DEPOSITION
- Publication number 20250115998
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Ravi Vellanki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MIXING BLOCKS FOR FLUID SYSTEMS, FIXTURES AND FIXTURE ARRANGEMENTS...
- Publication number 20250115995
- Publication date Apr 10, 2025
- ASM IP HOLDING B.V.
- Iordan Iordanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FURNACE TUBE FOR THIN FILM DEPOSITION, THIN FILM DEPOSITION METHOD...
- Publication number 20250109495
- Publication date Apr 3, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20250104998
- Publication date Mar 27, 2025
- Kokusai Electric Corporation
- Shoma MIYATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALIDE-FUNCTIONALIZED CYCLOTRISILAZANES AS PRECURSORS FOR DEPOSITIO...
- Publication number 20250101586
- Publication date Mar 27, 2025
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250101593
- Publication date Mar 27, 2025
- Kokusai Electric Corporation
- Yukinao KAGA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20250101585
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR FORMING LARGE-AREA ELECTRONIC-GRADE METAL CHA...
- Publication number 20250092511
- Publication date Mar 20, 2025
- The University of Hong Kong
- Lain-Jong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND PROCESS
- Publication number 20250092520
- Publication date Mar 20, 2025
- ASM IP HOLDING B.V.
- Davide Proserpio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEM FOR MITIGATING CVD FORELINE GROWTH
- Publication number 20250092519
- Publication date Mar 20, 2025
- ASM IP HOLDING B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD
- Publication number 20250092524
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masatoshi SATO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20250087480
- Publication date Mar 13, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Haifeng QIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250084530
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF ORGANIC MATERIAL
- Publication number 20250079161
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Adam Vianna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for cleaning a reaction chamber
- Publication number 20250075318
- Publication date Mar 6, 2025
- Picosun Oy
- Tom BLOMBERG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20250066916
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...
- Publication number 20250059645
- Publication date Feb 20, 2025
- Duck Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD
- Publication number 20250051920
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Yudai FUKUSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHDOS AND SYSTEMS FOR FILLING A GAP
- Publication number 20250051925
- Publication date Feb 13, 2025
- ASM IP HOLDING B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Plasma being used non-continuously in between ALD reactions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor device, substrate processing...

Gas container and deposition system including the same

Substrate processing method and substrate processing apparatus

Substrate processing method

Substrate processing method, method of manufacturing semiconductor...

Substrate processing apparatus and substrate processing method

Methods of forming phosphosilicate glass layers, structures formed...

Method of processing substrate and method of manufacturing semicond...

Alignment fixture for a reactor system

Cyclical deposition method and apparatus for filling a recess forme...

Method for producing a ceramic matrix composite component

Substrate processing apparatus, substrate suppport and method of ma...

Plasma-enhanced atomic layer deposition with radio-frequency power...

Multilayer coatings of component parts for a work piece processing...

Semiconductor processing apparatus and mixing inlet device

Gapfill of variable aspect ratio features with a composite PEALD an...

Method for forming thin film

In-situ PECVD cap layer

Apparatus for performing film forming process on substrate and meth...

Substrate supporting assembly and substrate processing apparatus

Heater assembly including cooling apparatus and method of using same

Substrate processing apparatus and method

Vacuum gauge protector for deposition systems

Impurity removal in doped ALD tantalum nitride

Combination CVD/ALD method, source and pulse profile modification

Particle remover and method

Semiconductor processing apparatus and methods for monitoring and c...

Vapor accumulator for corrosive gases with purging

Capacitive sensor for monitoring gas concentration

Apparatus and methods for semiconductor processing

Patents Applicationslast 30 patents

VAPOR ACCUMULATOR FOR CORROSIVE GASES WITH PURGING

Radical Supply Device, Radical Processing Device, Radical Generatio...

METHOD AND DEVICE FOR DEPOSITING THIN FILM, AND THIN FILM

METHOD AND SYSTEM FOR DEPOSITING METAL PHOSPHIDE

Gas Manifold for Simultaneous Gas Property Control in Deposition Sy...

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

MULTIPLE INPUT POST MIX SHOWERHEAD

FILM-FORMING METHOD AND FILM-FORMING SYSTEM

METHOD AND APPARATUSES FOR TEMPERATURE INDEXED ALD

PLASMA SOURCE AND APPARATUS FOR ATOMIC LAYER DEPOSITION

PROCESSING CHAMBER WITH RF RETURN PATH

METAL DEPOSITION

MIXING BLOCKS FOR FLUID SYSTEMS, FIXTURES AND FIXTURE ARRANGEMENTS...

FURNACE TUBE FOR THIN FILM DEPOSITION, THIN FILM DEPOSITION METHOD...

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

HALIDE-FUNCTIONALIZED CYCLOTRISILAZANES AS PRECURSORS FOR DEPOSITIO...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

FILM FORMING APPARATUS

SYSTEM AND METHOD FOR FORMING LARGE-AREA ELECTRONIC-GRADE METAL CHA...

SEMICONDUCTOR MANUFACTURING APPARATUS AND PROCESS

METHODS AND SYSTEM FOR MITIGATING CVD FORELINE GROWTH

SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

DEPOSITION OF ORGANIC MATERIAL

Method and apparatus for cleaning a reaction chamber

PROCESSING APPARATUS AND PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...

SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD

METHDOS AND SYSTEMS FOR FILLING A GAP