Plasma being used non-continuously in between ALD reactions

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CPC
C23C16/4554

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4554Plasma being used non-continuously in between ALD reactions

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Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,368,024
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- Abdullah Zafar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 12,365,987
- Issue date Jul 22, 2025
- Kokusai Electric Corporation
- Hiroaki Hiramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus with pressure sensor and shower head on same p...
- Patent number 12,365,985
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Yuji Obata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for forming a silicon oxycarbide layer and struct...
- Patent number 12,359,312
- Issue date Jul 15, 2025
- ASM IP Holding B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus and method of forming metal oxide layer using...
- Patent number 12,359,313
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Fa Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for forming a layer comprising aluminum, titani...
- Patent number 12,362,171
- Issue date Jul 15, 2025
- ASM IP Holding B.V.
- Lifu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for low temperature silicon nitride films
- Patent number 12,362,169
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Wenbo Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,351,913
- Issue date Jul 8, 2025
- Kioxia Corporation
- Tomoki Ishimaru
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Targeted temporal ALD
- Patent number 12,351,912
- Issue date Jul 8, 2025
- Microsoft Technology Licensing, LLC
- Ville Kalevi Saunajoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Porous inlet
- Patent number 12,351,915
- Issue date Jul 8, 2025
- Picosun Oy
- Marko Pudas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon-based thin films from N-alkyl substituted perhydridocyclotr...
- Patent number 12,344,934
- Issue date Jul 1, 2025
- Gelest, Inc.
- Barry C. Arkles
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for topography-selective depositions
- Patent number 12,347,675
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Akiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming plasma coating
- Patent number 12,347,652
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Lance A. Scudder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma ultraviolet enhanced deposition
- Patent number 12,334,317
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming metal oxide layer using deposition apparatus
- Patent number 12,331,398
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Fa Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treatment apparatus
- Patent number 12,331,400
- Issue date Jun 17, 2025
- Creating Nano Technologies, Inc.
- Ming-Yueh Chuang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for homogenous intermixing of precursors in all...
- Patent number 12,331,396
- Issue date Jun 17, 2025
- Lam Research Corporation
- Ilanit Fisher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,334,336
- Issue date Jun 17, 2025
- Kokusai Electric Corporation
- Yoshitomo Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film deposition process
- Patent number 12,322,591
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsing plasma treatment for film densification
- Patent number 12,322,573
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Solids vaporizer
- Patent number 12,312,685
- Issue date May 27, 2025
- Entegris, Inc.
- Benjamin Cardozo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing apparatus and semiconductor processing met...
- Patent number 12,312,690
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Minju Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 12,312,683
- Issue date May 27, 2025
- Tokyo Electron Limited
- Munehito Kagaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for filling gap using atomic layer deposition
- Patent number 12,312,686
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Eunhyoung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra high-k hafnium oxide and hafnium zirconium oxide films
- Patent number 12,305,279
- Issue date May 20, 2025
- Applied Materials, Inc.
- Harshil Kashyap
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,305,280
- Issue date May 20, 2025
- Kioxia Corporation
- Tomoki Ishimaru
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming metal silicon oxide and metal silicon oxynitride...
- Patent number 12,305,281
- Issue date May 20, 2025
- ASM IP Holding B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dithering or dynamic offsets for improved uniformity
- Patent number 12,305,283
- Issue date May 20, 2025
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
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- Kimihiko NAKATANI
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Information Patent Application
METHODS OF OPERATING A SPATIAL DEPOSITION TOOL
- Publication number 20250239479
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION DEVICE FOR UNIFORM COATING ON INNER SURFACE...
- Publication number 20250236953
- Publication date Jul 24, 2025
- HARBIN INSTITUTE OF TECHNOLOGY
- GANG GAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS
- Publication number 20250239445
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250223692
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250223690
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Hajime KARASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250226207
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Yasunobu KOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND METHOD FOR...
- Publication number 20250223693
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YU-SEN CHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250218784
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250215564
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250215563
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Takashi YOKOGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VANADIUM CONTAINING LAYERS AND METHODS AND SYSTEMS FOR DEPOSITING S...
- Publication number 20250215565
- Publication date Jul 3, 2025
- ASM IP HOLDING B.V.
- Jocelyn Kofi Brobbey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION EQUIPMENT
- Publication number 20250207243
- Publication date Jun 26, 2025
- SAMSUNG DISPLAY CO., LTD.
- Sung Woon KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTION CHAMBER, ATOMIC LAYER DEPOSITION APPARATUS AND A METHOD
- Publication number 20250207252
- Publication date Jun 26, 2025
- BENEQ OY
- Pekka SOININEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF ULTRA-THIN FUNCTIONAL COATINGS ON FLEXIBLE MATERIALS
- Publication number 20250207253
- Publication date Jun 26, 2025
- Nfinite Nanotechnology Inc.
- Jhi Yong Loke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NIT...
- Publication number 20250197996
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS HUB FOR MULTI-STATION WAFER PROCESSING SYSTEM
- Publication number 20250198002
- Publication date Jun 19, 2025
- EUGENUS, INC.
- Sangdon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD...
- Publication number 20250201584
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Yusaku OKAJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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METHODS FOR DEPOSITING GAP FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20250201628
- Publication date Jun 19, 2025
- ASM IP HOLDING B.V.
- Timothee Blanquart
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METHOD, INSERT AND APPARATUS FOR PROCESS CONTROL AND MONITORING OF...
- Publication number 20250198004
- Publication date Jun 19, 2025
- Picosun Oy
- Jesse KALLIOMÄKI
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METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING SILICON AND COMP...
- Publication number 20250197431
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- ASM IP HOLDING B.V.
- Patricio Eduardo Romero
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PLASMA-ENHANCED ATOMIC LAYER DEPOSITION WITH RADIO-FREQUENCY POWER...
- Publication number 20250197995
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- LAM RESEARCH CORPORATION
- Jeremy David Fields
- H01 - BASIC ELECTRIC ELEMENTS
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METHODS AND SYSTEMS FOR IMPROVED DEPOSITION PRODUCTS
- Publication number 20250197997
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- LOTUS APPLIED TECHNOLOGY
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Vacuum Gauge Protector for Deposition Systems
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- Publication date Jun 12, 2025
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- David R. Beaulieu
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Method and system for depositing transition metal carbide
- Publication number 20250188602
- Publication date Jun 12, 2025
- ASM IP HOLDING B.V.
- Paloma Ruiz Y Kärkkäinen
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SEAM-FREE AND CRACK-FREE DEPOSITION
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- Publication date Jun 12, 2025
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- Awnish Gupta
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Device for Performing Plasma Treatment, and Method for Performing P...
- Publication number 20250188610
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METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
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SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL
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Plasma being used non-continuously in between ALD reactions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatus for processing a substrate

Method of processing substrate, method of manufacturing semiconduct...

Deposition apparatus with pressure sensor and shower head on same p...

Method and system for forming a silicon oxycarbide layer and struct...

Deposition apparatus and method of forming metal oxide layer using...

Plasma processing apparatus and plasma processing method

Methods and systems for forming a layer comprising aluminum, titani...

Methods and apparatus for low temperature silicon nitride films

Film forming apparatus and film forming method

Targeted temporal ALD

Porous inlet

Ultrathin atomic layer deposition film accuracy thickness control

Silicon-based thin films from N-alkyl substituted perhydridocyclotr...

Methods and systems for topography-selective depositions

Method for forming plasma coating

Remote plasma ultraviolet enhanced deposition

Method of forming metal oxide layer using deposition apparatus

Surface treatment apparatus

Systems and methods for homogenous intermixing of precursors in all...

Method of manufacturing semiconductor device, substrate processing...

Thin film deposition process

Pulsing plasma treatment for film densification

Solids vaporizer

Semiconductor processing apparatus and semiconductor processing met...

Substrate processing method and substrate processing device

Method and apparatus for filling gap using atomic layer deposition

Ultra high-k hafnium oxide and hafnium zirconium oxide films

Film forming apparatus and film forming method

Method for forming metal silicon oxide and metal silicon oxynitride...

Dithering or dynamic offsets for improved uniformity

Patents Applicationslast 30 patents

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHODS OF OPERATING A SPATIAL DEPOSITION TOOL

ATOMIC LAYER DEPOSITION DEVICE FOR UNIFORM COATING ON INNER SURFACE...

METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

APPARATUS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND METHOD FOR...

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

VANADIUM CONTAINING LAYERS AND METHODS AND SYSTEMS FOR DEPOSITING S...

DEPOSITION EQUIPMENT

REACTION CHAMBER, ATOMIC LAYER DEPOSITION APPARATUS AND A METHOD

DEPOSITION OF ULTRA-THIN FUNCTIONAL COATINGS ON FLEXIBLE MATERIALS

LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NIT...

GAS HUB FOR MULTI-STATION WAFER PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD...

METHODS FOR DEPOSITING GAP FILLING FLUIDS AND RELATED SYSTEMS AND D...

METHOD, INSERT AND APPARATUS FOR PROCESS CONTROL AND MONITORING OF...

METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING SILICON AND COMP...

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION WITH RADIO-FREQUENCY POWER...

METHODS AND SYSTEMS FOR IMPROVED DEPOSITION PRODUCTS

Vacuum Gauge Protector for Deposition Systems

Method and system for depositing transition metal carbide

SEAM-FREE AND CRACK-FREE DEPOSITION

Device for Performing Plasma Treatment, and Method for Performing P...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

BORON NITRIDE FILM FORMING METHOD AND FILM FORMING APPARATUS

SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL