Plasma etching Reactive-ion etching

Industry

CPC
H01L21/3065

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/3065Plasma etching Reactive-ion etching

Industries

Patents Grantslast 30 patents

Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 12,176,236
- Issue date Dec 24, 2024
- Kioxia Corporation
- Wu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,170,314
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,170,320
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Chia Tai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diagnostics of semiconductor process using hyperspectral im...
- Patent number 12,165,937
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus, and me...
- Patent number 12,165,848
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Kenichi Oyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and methods of formation
- Patent number 12,165,875
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu Ming Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,165,873
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- En-Ping Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GaN vertical-channel junction field-effect transistors with regrown...
- Patent number 12,159,943
- Issue date Dec 3, 2024
- Arizona Board of Regents on behalf of Arizona State University
- Yuji Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method using halogen fluoride and method for producing semi...
- Patent number 12,154,789
- Issue date Nov 26, 2024
- Resonac Corporation
- Atsushi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 12,154,973
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsai-Jung Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method having a through substrate via and...
- Patent number 12,148,664
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Fa Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Jet ablation die singulation systems and related methods
- Patent number 12,148,665
- Issue date Nov 19, 2024
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. Seddon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium removal composition and method of producing magnetoresist...
- Patent number 12,150,386
- Issue date Nov 19, 2024
- FUJIFILM Corporation
- Keeyoung Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post etch defluorination process
- Patent number 12,148,608
- Issue date Nov 19, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Vijay Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method using potential control of grid and substrate
- Patent number 12,148,626
- Issue date Nov 19, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,142,485
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Pin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,142,495
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Toshiki Kanaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 12,142,484
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Takahiro Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming ion sensors
- Patent number 12,140,557
- Issue date Nov 12, 2024
- Life Technologies Corporation
- Phil Waggoner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a vertical fin field effect transistor with reduced...
- Patent number 12,136,573
- Issue date Nov 5, 2024
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for ion energy analysis of plasma processes
- Patent number 12,136,542
- Issue date Nov 5, 2024
- IMPEDANS LTD
- Paul Scullin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma treatment device
- Patent number 12,129,544
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yoshiyuki Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure cutting process and structures formed thereby
- Patent number 12,132,050
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming recesses in source/drain regions and devices fo...
- Patent number 12,132,089
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DEPOSITION IN HIGH ASPECT RATIO (HAR) FEATURES
- Publication number 20240420965
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Shihsheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING...
- Publication number 20240417648
- Publication date Dec 19, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenta Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC SUBSTRATE SUPPORT
- Publication number 20240420984
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE WET CHANNELS FOR WATER DRAINAGE PPLICATIONS
- Publication number 20240421104
- Publication date Dec 19, 2024
- SAUDI ARABIANOIL COMPANY
- Dong Kyu Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240412958
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DRY ETCHING USING PLASMA
- Publication number 20240412979
- Publication date Dec 12, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE FETS
- Publication number 20240413232
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Mehdi Saremi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSED STACKED DIES
- Publication number 20240404990
- Publication date Dec 5, 2024
- ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
- Cyprian Emeka Uzoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING VERTICAL POWER TRANSISTORS AND VERTICAL POWER...
- Publication number 20240404836
- Publication date Dec 5, 2024
- ROBERT BOSCH GmbH
- Jens Baringhaus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Forming MEMS Super-Junction Meta...
- Publication number 20240405067
- Publication date Dec 5, 2024
- IceMos Technology Limited
- Samuel J. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE
- Publication number 20240404835
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Leonard M. TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Forming MEMS Super-Junction Meta...
- Publication number 20240405068
- Publication date Dec 5, 2024
- IceMos Technology Limited
- Samuel J. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD FOR SIDEWALL CONTAMINATION OF MRAM MAGNETIC TUNNEL
- Publication number 20240407267
- Publication date Dec 5, 2024
- JIANGSU LEUVEN INSTRUMENT CO. LTD
- Yuxin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHODS USING SILICON-CONTAINING HYDROFLUOROCARBONS
- Publication number 20240404833
- Publication date Dec 5, 2024
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Nicolas GOSSET
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240395874
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hsien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SEMICONDUCTOR ETCHING
- Publication number 20240395557
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Du ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device and Method
- Publication number 20240395625
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kun-Mu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURES AND METHODS FOR SOURCE-DOWN VERTICAL SEMICONDUCTOR DEVICE
- Publication number 20240395925
- Publication date Nov 28, 2024
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Gordon M. Grivna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD
- Publication number 20240387701
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsai-Jung Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Forming Thereof
- Publication number 20240387664
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Zhen Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET DEVICE AND METHOD OF FORMING SAME
- Publication number 20240387237
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bo-Cyuan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE OF HIGH-RESISTIVITY SILICON-ON-INSULATOR EMBEDDED WITH CH...
- Publication number 20240387241
- Publication date Nov 21, 2024
- ZING SEMICONDUCTOR CORPORATION
- Xing WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING
- Publication number 20240387184
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yan-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHODS THEREOF
- Publication number 20240387737
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TREATMENT SYSTEM AND METHOD OF TREATING WAFER
- Publication number 20240387146
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Po Hsun CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM HAVING FOCUS RING WITH PROLONGED LIFETIME
- Publication number 20240387150
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MODULATING STRESS OF DIELECTRIC LAYERS
- Publication number 20240387729
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH
- Publication number 20240387152
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, METHOD AND TOOL OF MANUFACTURE
- Publication number 20240387227
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS

Plasma etching Reactive-ion etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Scanning ion beam deposition and etch

Semiconductor manufacturing apparatus and method for manufacturing...

Semiconductor device and manufacturing method thereof

Semiconductor device and method of manufacture

Methods and systems for advanced ion control for etching processes

Optical diagnostics of semiconductor process using hyperspectral im...

Control method and plasma processing apparatus

Substrate processing method, substrate processing apparatus, and me...

Semiconductor device and methods of formation

Method of manufacturing a semiconductor device

GaN vertical-channel junction field-effect transistors with regrown...

Etching method using halogen fluoride and method for producing semi...

Etching apparatus and etching method

Fin field-effect transistor device and method

Etching method and plasma processing apparatus

Semiconductor device and method having a through substrate via and...

Jet ablation die singulation systems and related methods

Ruthenium removal composition and method of producing magnetoresist...

Post etch defluorination process

Dry etching method using potential control of grid and substrate

Symmetric plasma source to generate pie-shaped treatment

Semiconductor structure and manufacturing method thereof

Etching method and etching apparatus

Etching method

Method of forming ion sensors

Fabrication of a vertical fin field effect transistor with reduced...

Apparatus for ion energy analysis of plasma processes

Cleaning method and plasma treatment device

Semiconductor structure cutting process and structures formed thereby

Methods for forming recesses in source/drain regions and devices fo...

Patents Applicationslast 30 patents

METHOD OF DEPOSITION IN HIGH ASPECT RATIO (HAR) FEATURES

PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING...

ELECTROSTATIC SUBSTRATE SUPPORT

SELECTIVE WET CHANNELS FOR WATER DRAINAGE PPLICATIONS

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

METHOD FOR DRY ETCHING USING PLASMA

HIGH PERFORMANCE FETS

PROCESSED STACKED DIES

METHOD FOR PRODUCING VERTICAL POWER TRANSISTORS AND VERTICAL POWER...

Semiconductor Device and Method of Forming MEMS Super-Junction Meta...

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE

Semiconductor Device and Method of Forming MEMS Super-Junction Meta...

CONTROL METHOD FOR SIDEWALL CONTAMINATION OF MRAM MAGNETIC TUNNEL

ETCHING METHODS USING SILICON-CONTAINING HYDROFLUOROCARBONS

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

SYSTEMS AND METHODS FOR SEMICONDUCTOR ETCHING

FinFET Device and Method

STRUCTURES AND METHODS FOR SOURCE-DOWN VERTICAL SEMICONDUCTOR DEVICE

FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD

Semiconductor Device and Method of Forming Thereof

FINFET DEVICE AND METHOD OF FORMING SAME

STRUCTURE OF HIGH-RESISTIVITY SILICON-ON-INSULATOR EMBEDDED WITH CH...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING

SEMICONDUCTOR DEVICE AND MANUFACTURING METHODS THEREOF

WAFER TREATMENT SYSTEM AND METHOD OF TREATING WAFER

PLASMA ETCHING SYSTEM HAVING FOCUS RING WITH PROLONGED LIFETIME

METHOD OF MODULATING STRESS OF DIELECTRIC LAYERS

DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH

SEMICONDUCTOR DEVICE, METHOD AND TOOL OF MANUFACTURE