Plural frequencies

Industry

CPC
H01J37/32302

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32302Plural frequencies

Industries

Patents Grantslast 30 patents

Information Patent Grant
Near-field microwave heating system and method
- Patent number 11,766,833
- Issue date Sep 26, 2023
- Expert Tooling and Automation, Ltd.
- Iftikhar Ahmad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Near-field microwave heating system and method
- Patent number 11,633,922
- Issue date Apr 25, 2023
- Expert Tooling and Automation, Ltd.
- Iftikhar Ahmad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave output device and plasma processing device
- Patent number 11,031,213
- Issue date Jun 8, 2021
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,971,336
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
- Patent number 10,903,052
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,879,045
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband microwave processing system
- Patent number 10,780,647
- Issue date Sep 22, 2020
- Iftikhar Ahmad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Microwave plasma reactor for manufacturing synthetic diamond material
- Patent number 10,734,198
- Issue date Aug 4, 2020
- Element Six Technologies Limited
- John Robert Brandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,727,088
- Issue date Jul 28, 2020
- HITACHI HIGH-TECH CORPORATION
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Near-field microwave heating system and method
- Patent number 10,710,313
- Issue date Jul 14, 2020
- Iftikhar Ahmad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, abnormality determination method, and...
- Patent number 10,662,531
- Issue date May 26, 2020
- Tokyo Electron Limited
- Kazushi Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,622,197
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device and high-frequency generator
- Patent number 10,510,513
- Issue date Dec 17, 2019
- Tokyo Electron Limited
- Kazushi Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High frequency heating device
- Patent number 10,470,258
- Issue date Nov 5, 2019
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Toshiyuki Okajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having digital control over rotation frequency of a...
- Patent number 10,453,655
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
- Patent number 10,431,429
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 10,418,224
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method with a car...
- Patent number 10,217,612
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having digital control over rotation frequency of a...
- Patent number 10,153,133
- Issue date Dec 11, 2018
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency surface wave plasma source
- Patent number 10,083,820
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,991,097
- Issue date Jun 5, 2018
- Tokyo Electron Limited
- Tomohito Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,960,014
- Issue date May 1, 2018
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facility for microwave treatment of a load
- Patent number 9,860,941
- Issue date Jan 2, 2018
- SAIREM SOCIETE POUR L'APPLICATION
- Adrien Grandemenge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radial waveguide systems and methods for post-match control of micr...
- Patent number 9,564,296
- Issue date Feb 7, 2017
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,502,217
- Issue date Nov 22, 2016
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radial waveguide systems and methods for post-match control of micr...
- Patent number 9,299,537
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radial waveguide systems and methods for post-match control of micr...
- Patent number 9,299,538
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,216,420
- Issue date Jul 10, 2012
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma catalyst
- Patent number 7,608,798
- Issue date Oct 27, 2009
- BTU International Inc.
- Satyendra Kumar
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Plasma generation and processing with multiple radiation sources
- Patent number 7,592,564
- Issue date Sep 22, 2009
- BTU International Inc.
- Satyendra Kumar
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230081182
- Publication date Mar 16, 2023
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220230848
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Near-Field Microwave Heating System and Method
- Publication number 20200298503
- Publication date Sep 24, 2020
- Iftikhar Ahmad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Near-Field Microwave Heating System and Method
- Publication number 20200298502
- Publication date Sep 24, 2020
- Iftikhar Ahmad
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20200083026
- Publication date Mar 12, 2020
- Hitachi High-Technologies Corporation
- Takamasa ICHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING DEVICE
- Publication number 20200013587
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
- Publication number 20190362944
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190148115
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A...
- Publication number 20190108981
- Publication date Apr 11, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20180233329
- Publication date Aug 16, 2018
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
- Publication number 20180226230
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180211818
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY SURFACE WAVE PLASMA SOURCE
- Publication number 20180138018
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Broadband microwave processing system
- Publication number 20180130638
- Publication date May 10, 2018
- Iftikhar Ahmad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180114677
- Publication date Apr 26, 2018
- TOKYO ELECTRON LIMITED
- Tomohito KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180090301
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY HEATING DEVICE
- Publication number 20170347410
- Publication date Nov 30, 2017
- Panasonic Intellectual Property Management Co., Ltd.
- Toshiyuki OKAJIMA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170103874
- Publication date Apr 13, 2017
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING PROCESSING CONDITION OF PLASMA PROCESSING APPAR...
- Publication number 20160329194
- Publication date Nov 10, 2016
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20150144594
- Publication date May 28, 2015
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FACILITY FOR MICROWAVE TREATMENT OF A LOAD
- Publication number 20140197761
- Publication date Jul 17, 2014
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Adrien Grandemenge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140148016
- Publication date May 29, 2014
- Hitachi High-Technologies Corporation
- Shunsuke Kanazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140057445
- Publication date Feb 27, 2014
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20130087285
- Publication date Apr 11, 2013
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PROCESSING APPARATUS AND METHOD FOR PROCESSING OBJECT TO...
- Publication number 20130075390
- Publication date Mar 28, 2013
- Mitsutoshi ASHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma generation and processing with multiple radiation sources
- Publication number 20070164680
- Publication date Jul 19, 2007
- Satyendra Kumar
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Staggered in-situ deposition and etching of a dielectric layer for...
- Publication number 20070071908
- Publication date Mar 29, 2007
- Applied Materials, Inc.
- Kent Rossman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20060283550
- Publication date Dec 21, 2006
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma catalyst
- Publication number 20060249367
- Publication date Nov 9, 2006
- Satyendra Kumar
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
High-frequency heating device, semiconductor manufacturing device,...
- Publication number 20060081624
- Publication date Apr 20, 2006
- Yutaka Takada
- H03 - BASIC ELECTRONIC CIRCUITRY

Plural frequencies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Near-field microwave heating system and method

Near-field microwave heating system and method

Microwave output device and plasma processing device

Plasma processing apparatus and plasma processing method

Systems and methods for radial and azimuthal control of plasma unif...

Plasma processing apparatus

Broadband microwave processing system

Microwave plasma reactor for manufacturing synthetic diamond material

Plasma processing apparatus and plasma processing method

Near-field microwave heating system and method

Plasma processing apparatus, abnormality determination method, and...

Plasma processing apparatus and plasma processing method

Plasma processing device and high-frequency generator

High frequency heating device

Plasma reactor having digital control over rotation frequency of a...

Systems and methods for radial and azimuthal control of plasma unif...

Plasma etching method

Plasma processing apparatus and plasma processing method with a car...

Plasma reactor having digital control over rotation frequency of a...

Dual-frequency surface wave plasma source

Plasma processing apparatus

Plasma etching method

Facility for microwave treatment of a load

Radial waveguide systems and methods for post-match control of micr...

Plasma processing apparatus and plasma processing method

Radial waveguide systems and methods for post-match control of micr...

Radial waveguide systems and methods for post-match control of micr...

Plasma processing apparatus

Plasma catalyst

Plasma generation and processing with multiple radiation sources

Patents Applicationslast 30 patents

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Near-Field Microwave Heating System and Method

Near-Field Microwave Heating System and Method

PLASMA PROCESSING DEVICE

MICROWAVE OUTPUT DEVICE AND PLASMA PROCESSING DEVICE

SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA REACTOR HAVING DIGITAL CONTROL OVER ROTATION FREQUENCY OF A...

PLASMA ETCHING METHOD

SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DUAL-FREQUENCY SURFACE WAVE PLASMA SOURCE

Broadband microwave processing system

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

HIGH FREQUENCY HEATING DEVICE

PLASMA PROCESSING APPARATUS

METHOD OF PRODUCING PROCESSING CONDITION OF PLASMA PROCESSING APPAR...

Plasma Processing Apparatus and Plasma Processing Method

FACILITY FOR MICROWAVE TREATMENT OF A LOAD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA ETCHING APPARATUS

MICROWAVE PROCESSING APPARATUS AND METHOD FOR PROCESSING OBJECT TO...

Plasma generation and processing with multiple radiation sources

Staggered in-situ deposition and etching of a dielectric layer for...

Plasma processing apparatus

Plasma catalyst

High-frequency heating device, semiconductor manufacturing device,...