Pollution mitigation, i.e. mitigating effect of contamination or debris

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CPC
G03F7/70916

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70916Pollution mitigation, i.e. mitigating effect of contamination or debris

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 12,167,525
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
End-of-life monitoring of dynamic gas lock membranes and pupil face...
- Patent number 12,158,705
- Issue date Dec 3, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Joseph Harry Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Counterflow gas nozzle for contamination mitigation in extreme ultr...
- Patent number 12,158,576
- Issue date Dec 3, 2024
- KLA Corporation
- Rudy F. Garcia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigating long-term energy decay of laser devices
- Patent number 12,147,166
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for avoiding a degradation of an optical element, projection...
- Patent number 12,140,877
- Issue date Nov 12, 2024
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for cleaning an EUV mask
- Patent number 12,099,310
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Hui Li
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for monitoring and controlling extreme ultraviole...
- Patent number 12,085,860
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for detecting debris in a photolithography system
- Patent number 12,085,865
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Operating method for preventing photomask particulate contamination
- Patent number 12,066,765
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle-masking structure, extreme ultra violet apparatus, and meth...
- Patent number 12,066,760
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ching-Hsiang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for mitigating tin debris
- Patent number 12,061,423
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography contamination control
- Patent number 12,055,867
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh Hsieh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and apparatus for reducing hydrogen permeation from lithogr...
- Patent number 12,025,922
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and operation method thereof
- Patent number 12,025,923
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-brightness laser produced plasma source and method of generati...
- Patent number 12,028,958
- Issue date Jul 2, 2024
- Isteq B.V.
- Samir Ellwi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods of cleaning a lithography system
- Patent number 12,019,378
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cho-Ying Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography exposure system with debris removing mechanism
- Patent number 12,001,143
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jung Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quick-release valve module, reticle pod provided with quick-release...
- Patent number 11,981,483
- Issue date May 14, 2024
- Gudeng Precision Industrial Co., Ltd.
- Chia-Ho Chuang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Contamination trap
- Patent number 11,982,947
- Issue date May 14, 2024
- ASML NETHERLAND B.V.
- Sander Catharina Reinier Derks
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,979,971
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Tin trap device, extreme ultraviolet light generation apparatus, an...
- Patent number 11,940,736
- Issue date Mar 26, 2024
- Gigaphoton Inc.
- Gota Niimi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and operation method thereof
- Patent number 11,899,378
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target debris collection device and extreme ultraviolet light sourc...
- Patent number 11,852,984
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Sunghyup Kim
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vacuum pumping system
- Patent number 11,839,903
- Issue date Dec 12, 2023
- Edwards Limited
- Christopher Mark Bailey
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELEC...
- Publication number 20240429015
- Publication date Dec 26, 2024
- DERKWOO SEMITECH CO., LTD.
- Ki Bum KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION
- Publication number 20240422888
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hsing Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385540
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G02 - OPTICS
Information Patent Application
EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT
- Publication number 20240385541
- Publication date Nov 21, 2024
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
- Publication number 20240385542
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ping YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...
- Publication number 20240377752
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK
- Publication number 20240377766
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Hui LI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240377764
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LITHOGRAPHY APPARATUS
- Publication number 20240379259
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...
- Publication number 20240369936
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- HSIN-FU TSENG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20240361708
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR MITIGATING TIN DEBRIS
- Publication number 20240353765
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS
- Publication number 20240353764
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Kyung Chin YI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE OF PROTECTING FROM PARTICLE ATTACKS
- Publication number 20240353763
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yao-Tang LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INNER POD HOLDING DEVICE CONDUCIVE TO REDUCING DUST CONTAMINATION A...
- Publication number 20240329544
- Publication date Oct 3, 2024
- GUDENG EQUIPMENT CO., LTD.
- YIN-FENG CHAN
- G01 - MEASURING TESTING
Information Patent Application
A CONTAMINATION REDUCTION SYSTEM
- Publication number 20240310742
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Vladimir KVON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGR...
- Publication number 20240310743
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF CLEANING A LITHOGRAPHY SYSTEM
- Publication number 20240302755
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Cho-Ying LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LITHOGRAPHY SYSTEM COMPRISING A GAS-BINDING COMPONENT IN THE FO...
- Publication number 20240201604
- Publication date Jun 20, 2024
- Carl Zeiss SMT GMBH
- Ralf WICHARD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN INSPECTION TOOL, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240192608
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Shikhar BHARDWAJ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
- Publication number 20240121877
- Publication date Apr 11, 2024
- Samsung Electronics Co., Ltd.
- Injae LEE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD
- Publication number 20240094647
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR REMOVING PARTICLES FROM PELLICLE AND PHOTOMASK
- Publication number 20240036463
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- TZU HAN LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRIPPER AND LITHOGRAPHIC APPARATUS COMPRISING THE GRIPPER
- Publication number 20240019790
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTION OF AN INNER POD OR AN OUTER POD OF...
- Publication number 20240006210
- Publication date Jan 4, 2024
- BROOKS AUTOMATION (GERMANY) GMBH
- Lutz REBSTOCK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
ROTARY FOIL TRAP AND LIGHT SOURCE DEVICE
- Publication number 20240004317
- Publication date Jan 4, 2024
- Ushio Denki Kabushiki Kaisha
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Pollution mitigation, i.e. mitigating effect of contamination or debris

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System and method for performing extreme ultraviolet photolithograp...

EUV light source and apparatus for lithography

Semiconductor processing tool and methods of operation

End-of-life monitoring of dynamic gas lock membranes and pupil face...

Counterflow gas nozzle for contamination mitigation in extreme ultr...

Mitigating long-term energy decay of laser devices

Method for avoiding a degradation of an optical element, projection...

EUV lithography apparatus

System and method for cleaning an EUV mask

System and method for monitoring and controlling extreme ultraviole...

System and method for detecting debris in a photolithography system

Operating method for preventing photomask particulate contamination

Reticle-masking structure, extreme ultra violet apparatus, and meth...

Pellicle and pellicle assembly

Method and apparatus for mitigating tin debris

Extreme ultraviolet lithography system

Lithography contamination control

Methods and apparatus for reducing hydrogen permeation from lithogr...

Lithography system and operation method thereof

High-brightness laser produced plasma source and method of generati...

Methods of cleaning a lithography system

Lithography exposure system with debris removing mechanism

Quick-release valve module, reticle pod provided with quick-release...

Contamination trap

EUV light source and apparatus for lithography

Tin trap device, extreme ultraviolet light generation apparatus, an...

Lithography system and operation method thereof

Target debris collection device and extreme ultraviolet light sourc...

Prolonging optical element lifetime in an EUV lithography system

Vacuum pumping system

Patents Applicationslast 30 patents

PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELEC...

EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT

MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES

SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...

SYSTEM AND METHOD FOR CLEANING AN EUV MASK

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

EUV LITHOGRAPHY APPARATUS

EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAP...

LITHOGRAPHY CONTAMINATION CONTROL

METHOD AND APPARATUS FOR MITIGATING TIN DEBRIS

LITHOGRAPHY APPARATUS

RETICLE OF PROTECTING FROM PARTICLE ATTACKS

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

INNER POD HOLDING DEVICE CONDUCIVE TO REDUCING DUST CONTAMINATION A...

A CONTAMINATION REDUCTION SYSTEM

METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGR...

METHODS OF CLEANING A LITHOGRAPHY SYSTEM

EUV LITHOGRAPHY SYSTEM COMPRISING A GAS-BINDING COMPONENT IN THE FO...

AN INSPECTION TOOL, METHOD AND LITHOGRAPHIC APPARATUS

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD

GUIDING DEVICE AND ASSOCIATED SYSTEM

METHOD FOR REMOVING PARTICLES FROM PELLICLE AND PHOTOMASK

GRIPPER AND LITHOGRAPHIC APPARATUS COMPRISING THE GRIPPER

METHOD AND SYSTEM FOR INSPECTION OF AN INNER POD OR AN OUTER POD OF...

MEMBRANE FOR EUV LITHOGRAPHY

ROTARY FOIL TRAP AND LIGHT SOURCE DEVICE