Pollution mitigation, i.e. mitigating effect of contamination or debris

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CPC
G03F7/70916

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70916Pollution mitigation, i.e. mitigating effect of contamination or debris

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,353,142
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle of protecting from particle attacks
- Patent number 12,353,143
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yao-Tang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chamber device, gas laser device, and electronic device manufacturi...
- Patent number 12,347,995
- Issue date Jul 1, 2025
- Gigaphoton Inc.
- Junichi Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic system provided with a deflection apparatus for changi...
- Patent number 12,332,570
- Issue date Jun 17, 2025
- ASML Holding N.V.
- Ronald Peter Albright
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light source device and protection method for r...
- Patent number 12,321,107
- Issue date Jun 3, 2025
- USHIO DENKI KABUSHIKI KAISHA
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Inner pod holding device conducive to reducing dust contamination a...
- Patent number 12,306,550
- Issue date May 20, 2025
- GUDENG EQUIPMENT CO., LTD.
- Yin-Feng Chan
- G01 - MEASURING TESTING
Information Patent Grant
Method for operating an EUV lithography apparatus, and EUV lithogra...
- Patent number 12,287,588
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Moritz Becker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photoresist inspection apparatus, photoresist inspection method usi...
- Patent number 12,276,907
- Issue date Apr 15, 2025
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,265,336
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G02 - OPTICS
Information Patent Grant
Device and method to remove debris from an extreme ultraviolet (EUV...
- Patent number 12,216,413
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Han Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet lithography system with heated tin vane bucket...
- Patent number 12,207,381
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vacuum system, low-pressure vacuum process device, and cutoff member
- Patent number 12,191,167
- Issue date Jan 7, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Tao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 12,167,525
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
End-of-life monitoring of dynamic gas lock membranes and pupil face...
- Patent number 12,158,705
- Issue date Dec 3, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Joseph Harry Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Counterflow gas nozzle for contamination mitigation in extreme ultr...
- Patent number 12,158,576
- Issue date Dec 3, 2024
- KLA Corporation
- Rudy F. Garcia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigating long-term energy decay of laser devices
- Patent number 12,147,166
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for avoiding a degradation of an optical element, projection...
- Patent number 12,140,877
- Issue date Nov 12, 2024
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for cleaning an EUV mask
- Patent number 12,099,310
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Hui Li
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for monitoring and controlling extreme ultraviole...
- Patent number 12,085,860
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for detecting debris in a photolithography system
- Patent number 12,085,865
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Operating method for preventing photomask particulate contamination
- Patent number 12,066,765
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle-masking structure, extreme ultra violet apparatus, and meth...
- Patent number 12,066,760
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ching-Hsiang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for mitigating tin debris
- Patent number 12,061,423
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography contamination control
- Patent number 12,055,867
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh Hsieh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM
- Publication number 20250216803
- Publication date Jul 3, 2025
- CYMER, LLC
- Sean Marcus Buczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...
- Publication number 20250218718
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE CLAMPING MODULE
- Publication number 20250199420
- Publication date Jun 19, 2025
- GUDENG EQUIPMENT CO., LTD.
- YU-LIN CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...
- Publication number 20250175589
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Senthil Lakshmanan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
FLUID FILTRATION FOR SEMICONDUCTOR PROCESSING
- Publication number 20250161840
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chia Pao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250166983
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR
- Publication number 20250155796
- Publication date May 15, 2025
- NIPPON LIGHT METAL COMPANY, LTD.
- Takeshi OSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...
- Publication number 20250147439
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Han LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE, RETICLE REPAIR METHOD, AND SUBSTRATE PROCESSING METHOD INC...
- Publication number 20250138437
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- YOONKI HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL APPARATUS
- Publication number 20250116943
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Debashis DE MUNSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250102902
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Tim Willem Johan VAN DE GOOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING...
- Publication number 20250076775
- Publication date Mar 6, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- CHULMIN CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...
- Publication number 20250060682
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Armin Bernhard RIDINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250060681
- Publication date Feb 20, 2025
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20250053103
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD
- Publication number 20250028256
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Keiichi YAHATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOP MODULE AND EXPOSING APPARATUS INCLUDING THE SAME
- Publication number 20250021008
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Yebin Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROSTATIC HOLDER, OBJECT TABLE AND LITHOGRAPHIC APPARATUS
- Publication number 20250021022
- Publication date Jan 16, 2025
- Tiannan GUAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT S...
- Publication number 20250013159
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Hayato KIKUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELEC...
- Publication number 20240429015
- Publication date Dec 26, 2024
- DERKWOO SEMITECH CO., LTD.
- Ki Bum KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION
- Publication number 20240422888
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hsing Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385540
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G02 - OPTICS
Information Patent Application
EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT
- Publication number 20240385541
- Publication date Nov 21, 2024
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
- Publication number 20240385542
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ping YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...
- Publication number 20240377752
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK
- Publication number 20240377766
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Hui LI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240377764
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LITHOGRAPHY APPARATUS
- Publication number 20240379259
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Pollution mitigation, i.e. mitigating effect of contamination or debris

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor processing tool and methods of operation

Reticle of protecting from particle attacks

Chamber device, gas laser device, and electronic device manufacturi...

Lithographic system provided with a deflection apparatus for changi...

Extreme ultraviolet light source device and protection method for r...

Inner pod holding device conducive to reducing dust contamination a...

Method for operating an EUV lithography apparatus, and EUV lithogra...

Photoresist inspection apparatus, photoresist inspection method usi...

Semiconductor processing tool and methods of operation

Device and method to remove debris from an extreme ultraviolet (EUV...

Extreme ultraviolet lithography system with heated tin vane bucket...

Vacuum system, low-pressure vacuum process device, and cutoff member

Cleaning a structure surface in an EUV chamber

System and method for performing extreme ultraviolet photolithograp...

EUV light source and apparatus for lithography

Semiconductor processing tool and methods of operation

End-of-life monitoring of dynamic gas lock membranes and pupil face...

Counterflow gas nozzle for contamination mitigation in extreme ultr...

Mitigating long-term energy decay of laser devices

Method for avoiding a degradation of an optical element, projection...

EUV lithography apparatus

System and method for cleaning an EUV mask

System and method for monitoring and controlling extreme ultraviole...

System and method for detecting debris in a photolithography system

Operating method for preventing photomask particulate contamination

Reticle-masking structure, extreme ultra violet apparatus, and meth...

Pellicle and pellicle assembly

Method and apparatus for mitigating tin debris

Extreme ultraviolet lithography system

Lithography contamination control

Patents Applicationslast 30 patents

PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM

CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...

RETICLE CLAMPING MODULE

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...

FLUID FILTRATION FOR SEMICONDUCTOR PROCESSING

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR

CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...

RETICLE, RETICLE REPAIR METHOD, AND SUBSTRATE PROCESSING METHOD INC...

OPTICAL APPARATUS

ASSEMBLY FOR A LITHOGRAPHIC APPARATUS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING...

LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...

A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD

TOP MODULE AND EXPOSING APPARATUS INCLUDING THE SAME

ELECTROSTATIC HOLDER, OBJECT TABLE AND LITHOGRAPHIC APPARATUS

CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT S...

PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELEC...

EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT

MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES

SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...

SYSTEM AND METHOD FOR CLEANING AN EUV MASK

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

EUV LITHOGRAPHY APPARATUS