Polyester

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CPC
Y10S430/109

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

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Y10S430/109Polyester

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Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition
- Patent number 9,897,913
- Issue date Feb 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,846,292
- Issue date Sep 30, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition for ArF immersion...
- Patent number 8,815,492
- Issue date Aug 26, 2014
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,110,334
- Issue date Feb 7, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Heat-sensitive positive-working lithographic printing plate precursor
- Patent number 8,110,338
- Issue date Feb 7, 2012
- Agfa Graphics NV
- Johan Loccufier
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method of making a lithographic printing plate
- Patent number 8,088,561
- Issue date Jan 3, 2012
- Agfa Graphics NV
- Hieronymus Andriessen
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Acrylic polymer-containing gap fill material forming composition fo...
- Patent number 8,007,979
- Issue date Aug 30, 2011
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for preparing resin binder for toner
- Patent number 7,385,002
- Issue date Jun 10, 2008
- Kao Corporation
- Eiji Shirai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resins, resin compositions and products of curing th...
- Patent number 7,361,450
- Issue date Apr 22, 2008
- Nippon Kayaku Kabushiki Kaisha
- Hiroo Koyanagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective compositions for photoresists
- Patent number 7,264,913
- Issue date Sep 4, 2007
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Enabling chain scission of branched photoresist
- Patent number 7,166,413
- Issue date Jan 23, 2007
- Intel Corporation
- Heidi B. Cao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer for photoresist and resin compositions therefor
- Patent number 7,105,268
- Issue date Sep 12, 2006
- Daicel Chemical Industries, Ltd.
- Yoshinori Funaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist based on polycondensates and having an increased resolu...
- Patent number 7,041,426
- Issue date May 9, 2006
- Infineon Technologies AG
- Christian Eschbaumer
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Monomers, polymers, methods of synthesis thereof and photoresist co...
- Patent number 7,022,454
- Issue date Apr 4, 2006
- Shipley Company, L.L.C.
- George G. Barclay
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon-containing polymer, resist composition and patterning process
- Patent number 6,994,946
- Issue date Feb 7, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Imageable element and composition comprising thermally reversible p...
- Patent number 6,911,296
- Issue date Jun 28, 2005
- Kodak Polychrome Graphics LLC
- Peter S. Pappas
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Two-layer imageable element comprising thermally reversible polymers
- Patent number 6,902,860
- Issue date Jun 7, 2005
- Kodak Polychrome Graphics LLC
- Yasuhiro Asawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Lithographic printing plate precursor and production method of lith...
- Patent number 6,893,795
- Issue date May 17, 2005
- Fuji Photo Film Co., Ltd.
- Ikuo Kawauchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Stabilized infrared-sensitive polymerizable systems
- Patent number 6,884,568
- Issue date Apr 26, 2005
- Kodak Polychrome Graphics, LLC
- Hans-Joachim Timpe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Enabling chain scission of branched photoresist
- Patent number 6,872,505
- Issue date Mar 29, 2005
- Intel Corporation
- Heidi B. Cao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation sensitive refractive index changing composition and refra...
- Patent number 6,787,289
- Issue date Sep 7, 2004
- JSR Corporation
- Kenji Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions comprising polycyclic polymers with acid l...
- Patent number 6,723,486
- Issue date Apr 20, 2004
- Sumitomo Bakelite Co., Ltd.
- Brian L. Goodall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 6,632,582
- Issue date Oct 14, 2003
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Imageable element and composition comprising thermally reversible p...
- Patent number 6,506,536
- Issue date Jan 14, 2003
- Kodak Polychrome Graphics, LLC
- S. Peter Pappas
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compositions containing unsaturated polyester resins and their use...
- Patent number 6,476,094
- Issue date Nov 5, 2002
- Bayer Aktiengesellschaft
- Jürgen Meixner
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Alicyclic dissolution inhibitors and positive potoresist compositio...
- Patent number 6,265,131
- Issue date Jul 24, 2001
- Everlight USA. Inc.
- Shang-Wern Chang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist compositions comprising polycyclic polymers with acid l...
- Patent number 6,232,417
- Issue date May 15, 2001
- The B. F. Goodrich Company
- Larry F Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Heat-shrinkable polyester film and method for manufacturing the same
- Patent number 6,231,958
- Issue date May 15, 2001
- SKC Co., Ltd.
- Nam-il Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic photochromic compositions and method for fabrication of pol...
- Patent number 6,194,120
- Issue date Feb 27, 2001
- Molecular OptoElectronics Corporation
- Kwok Pong Chan
- G02 - OPTICS
Information Patent Grant
Image forming process using silver halide, reducing agent and polym...
- Patent number 6,156,475
- Issue date Dec 5, 2000
- Fuji Photo Film Co., Ltd.
- Hiromitsu Yanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20120171379
- Publication date Jul 5, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20100047709
- Publication date Feb 25, 2010
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HEAT-SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR
- Publication number 20090170028
- Publication date Jul 2, 2009
- AGFA GRAPHICS NV
- Johan Loccufier
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Method of Making a Lithographic Printing Plate
- Publication number 20080307990
- Publication date Dec 18, 2008
- AGFA GRAPHICS NV
- Hieronymus Andriessen
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Acrylic polymer-containing gap filler forming composition for litho...
- Publication number 20060068526
- Publication date Mar 30, 2006
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for preparing resin binder for toner
- Publication number 20050271963
- Publication date Dec 8, 2005
- KAO CORPORATION
- Eiji Shirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resins, resin compositions and products of curing th...
- Publication number 20050153230
- Publication date Jul 14, 2005
- Hiroo Koyanagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Enabling chain scission of branched photoresist
- Publication number 20050106498
- Publication date May 19, 2005
- Heidi B. Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENABLING CHAIN SCISSION OF BRANCHED PHOTORESIST
- Publication number 20050058931
- Publication date Mar 17, 2005
- Heidi B. Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing polymer, resist composition and patterning process
- Publication number 20040242821
- Publication date Dec 2, 2004
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective compositions for photoresists
- Publication number 20040101779
- Publication date May 27, 2004
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer for photoresist and resin compositions therefor
- Publication number 20030148210
- Publication date Aug 7, 2003
- Yoshinori Funaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation sensitive refractive index changing composition and refra...
- Publication number 20030139486
- Publication date Jul 24, 2003
- JSR Corporation
- Kenji Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Imageable element and composition comprising thermally reversible p...
- Publication number 20030129506
- Publication date Jul 10, 2003
- KODAK POLYCHROME GRAPHICS, L.L.C.
- Peter S. Pappas
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lithographic printing plate precursor and production method of lith...
- Publication number 20030129532
- Publication date Jul 10, 2003
- Fuji Photo Film Co., Ltd.
- Ikuo Kawauchi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photoresist based on polycondensates and having an increased resolu...
- Publication number 20030082480
- Publication date May 1, 2003
- Christian Eschbaumer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stabilized infrared-sensitive polymerizable systems
- Publication number 20020197564
- Publication date Dec 26, 2002
- Hans-Joachim Timpe
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Two-layer imageable element comprising thermally reversible polymers
- Publication number 20020160299
- Publication date Oct 31, 2002
- Kodak Polychrome Graphics, L.L.C
- Yasuhiro Asawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Imageable element and composition comprising thermally reversible p...
- Publication number 20020150833
- Publication date Oct 17, 2002
- KODAK POLYCHROME GRAPHICS, L.L.C.
- S. Peter Pappas
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Photoresist compositions comprising polycyclic polymers with acid l...
- Publication number 20020128408
- Publication date Sep 12, 2002
- Brian L. Goodall
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel monomers, polymers, methods of synthesis thereof and photores...
- Publication number 20020013448
- Publication date Jan 31, 2002
- Shipley Company, L.L.C.
- George G. Barclay
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Pattern formation material and pattern formation method
- Publication number 20020013059
- Publication date Jan 31, 2002
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiation-sensitive composition

Radiation-sensitive composition

Chemically amplified positive resist composition for ArF immersion...

Radiation-sensitive composition

Heat-sensitive positive-working lithographic printing plate precursor

Method of making a lithographic printing plate

Acrylic polymer-containing gap fill material forming composition fo...

Process for preparing resin binder for toner

Photosensitive resins, resin compositions and products of curing th...

Antireflective compositions for photoresists

Enabling chain scission of branched photoresist

Polymer for photoresist and resin compositions therefor

Photoresist based on polycondensates and having an increased resolu...

Monomers, polymers, methods of synthesis thereof and photoresist co...

Silicon-containing polymer, resist composition and patterning process

Imageable element and composition comprising thermally reversible p...

Two-layer imageable element comprising thermally reversible polymers

Lithographic printing plate precursor and production method of lith...

Stabilized infrared-sensitive polymerizable systems

Enabling chain scission of branched photoresist

Radiation sensitive refractive index changing composition and refra...

Photoresist compositions comprising polycyclic polymers with acid l...

Pattern formation material and pattern formation method

Imageable element and composition comprising thermally reversible p...

Compositions containing unsaturated polyester resins and their use...

Alicyclic dissolution inhibitors and positive potoresist compositio...

Photoresist compositions comprising polycyclic polymers with acid l...

Heat-shrinkable polyester film and method for manufacturing the same

Organic photochromic compositions and method for fabrication of pol...

Image forming process using silver halide, reducing agent and polym...

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION

HEAT-SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR

Method of Making a Lithographic Printing Plate

Acrylic polymer-containing gap filler forming composition for litho...

Process for preparing resin binder for toner

Photosensitive resins, resin compositions and products of curing th...

Enabling chain scission of branched photoresist

ENABLING CHAIN SCISSION OF BRANCHED PHOTORESIST

Silicon-containing polymer, resist composition and patterning process

Antireflective compositions for photoresists

Polymer for photoresist and resin compositions therefor

Radiation sensitive refractive index changing composition and refra...

Imageable element and composition comprising thermally reversible p...

Lithographic printing plate precursor and production method of lith...

Photoresist based on polycondensates and having an increased resolu...

Stabilized infrared-sensitive polymerizable systems

Two-layer imageable element comprising thermally reversible polymers

Imageable element and composition comprising thermally reversible p...

Photoresist compositions comprising polycyclic polymers with acid l...

Novel monomers, polymers, methods of synthesis thereof and photores...

Pattern formation material and pattern formation method