Claims
- 1. A photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and a copolymer comprising at least two types of polycyclic repeating units one of which contains a pendant acid labile group and another of which contains a pendant polar functional group wherein the repeating unit containing the pendant functional group is polymerized from a monomer represented by the structure: wherein R5 to R8 independently represent a substituent selected from the group consisting of hydrogen, linear and branched (C1 to C10) alkyl, and a pendant functional substituent represented as follows: —(A)n—C(O)OR″, —(A)n—OR″, —(A)n—OC(O)R″, —(A)n—OC(O)OR″, —(A)n—C(O)R″, —(A)n—OC(O)C)(O)OR″, —(A)n—O—A′—C(O)OR″, —A(A)n—OC(O)—A′—C(O)OR″, —(A)n—C(O)O—A′—C(O)OR″, —(A)n—C(O)—A′—OR″, —(A)n—C (O)O—A′—OC(O)OR″, —(A)n—C(O)O—A′—A′—C(O)OR″, —(A)n—C(O)O—A′—OC(O)C(O)OR″, —(A)n—C(R″)2CH(R″)(C(O)OR″), and —(A)n—C(R″)2CH(C(O)OR″)2, wherein n is 0 or 1, p is an integer from 0 to 5, —A— and —A′— independently represent a divalent radical selected from the group consisting of linear and branched (C1 to C10) alkylene, (C2 to C10) alkylene ethers, polyethers, cyclic ethers, cyclic diethers or a cyclic group of the formula: wherein a is an integer from 2 to 7, and R″ represents a substituent selected from hydrogen, linear and branched (C1 to C10) alkyl, linear and branched (C1 to C10) alkoxyalkylene, polyethers, monocyclic and polycyclic (C4 to C20) cycloaliphatic moieties, cyclic ethers, cyclic diethers, cyclic ketones, and lactones, at least one of R5 to R8 must be selected from said pendant functional substituent with the proviso that when R″ is an alkyl, lactone, cycloaliphatic or cyclic ketone group, or when R5 to R8 represent the group —(A)n—C(O)OR″, —(A)n—OR″, —(A)n—OC(O)R″, —(A)n—OC(O)OR″, —(A)n—C(O)R″, —(A)n—C(R″)2CH(R″)(C(O)OR″, and —(A)n—C(R″)2CH(C(O)OR″)2, —A— must be present and can not represent an alkylene radical.
- 2. The composition of claim 1 wherein said polymer is polymerized from one or more acid labile group substituted polycyclic monomer(s) represented by the structure: wherein R1 to R4 independently represent a substituent selected from the group consisting of hydrogen, linear and branched (C1 to C10) alkyl, —(A)n—C(O)OR, —(A)n—OR, —(A)n—OC(O)R, —(A)n—C(O)R, —(A)n—OC(O)OR, —(A)n—OCH2 C(O)OR*, —(A)n—C(O)O—A′—OCH2C(O)OR*, —(A)n—OC(O)—A′C(O)OR*, —(A)nC(R)2CH(R)(C(O)OR**), and —(A)nC(R)2CH(C(O)OR**)2 wherein n is 0 or 1, m is an integer from 0 to 5, —A— and —A′— independently represent a divalent radical selected from the group consisting of linear and branched (C1 to C10) alkylene, (C2 to C10) alkylene ethers, polyethers, or a cyclic group of the formula: wherein a is an integer from 2 to 7, R represents hydrogen or linear and branched (C1 to C10) alkyl, and R19 represents an acid labile group that is cleavable by a photoacid initiator and is selected from the group consisting of —C(CH3)3, —Si(CH3)3, —CH(Rp)OCH2CH3, —CH(Rp)OC(CH3)3, or the following cyclic groups: wherein Rp represents hydrogen or a linear or branched (C1 to C5) alkyl group, R··independently represents R and R·and at least one of R1 to R4 must be selected from a substituent containing said acid labile group.
- 3. The composition of claim 2 wherein said polycyclic polymer includes repeating units polymerized from one or more monomers represented by the following structures: wherein R9 to R16 independently represent hydrogen and linear and branched (C1 to C10) alkyl, with the proviso that at least one of R9 to R12 is a carboxylic substituent represented by the formula —(CH2)nC(O)OH wherein n is an integer from 0 to 10; and q and r are integers from 0 to 5.
- 4. The composition of claim 2 wherein said monomers are polymerized by free radical polymerization.
- 5. The composition of claim 1, 2, or 3 wherein said polymer comprises repeating units represented by the formulae: wherein R1 to R8, m and p are as previously defined.
- 6. The composition of claim 5 wherein said polymer further comprises at least one repeating unit selected from the group represented as follows: wherein R9 to R16 are as previously defined.
- 7. A photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and a copolymer comprising polycyclic repeating units represented as follows: wherein R1 to R4 independently represent a substituent selected from the group consisting of hydrogen, linear and branched (C1 to Cl0) alkyl, —(A)n C(O)OR*, —(A)n—C(O)OR, —(A)n—OR, —(A)n—OC(O)R, —(A)n—C(O)R, —(A)n—OC(O)OR, —(A)n—OC(O)—A′—C(O)OR*, —(A)nC(R)2CH (R)(C(O)OR**), and —(A)nC(R)2CH(C(O)OR**)2, and R5 to R8 independently represent a substituent selected from the group consisting of hydrogen, linear and branched (C1 to C10) alkyl, and at least one of R5 to R8 must be selected from a pendant functional substituent represented by —(A)n—C(O)OR″, —(A)nOR″, —(A)n—OC(O)R″, —(A)n—OC(O)OR″, —(A)n—C(O)R″, —(A)n—OC(O)C(O)OR″, —(A)n—O—A′—C(O)ORΔ, —(A)n—OC(O)—A′—C(O)OR ″, —(A)n—C(O)O—A′—C(O)—A′—OC(O)C(O)C(O)OR″, —(A)n—C(O)O—A′—OC(O)OR″, —(A)n—C(O)O—A′—O—A′—C(O)OR″, —(A)n—C(O)O—A′—OC(O)C(O)OR″, —(A)n—C(R″)2CH(R″)(C(O)OR″)and —(A)n—(R″)2CH(C(OR″)2; —A—and —A′—independently represent a divalent radical selected from the group consisting of linear and branched (C1 to C10) alkylene, (C2 to C10) alkylene ethers, polyethers, cyclic ethers, cyclic diethers or a cyclic group of the formula: wherein a is an integer from 2 to 7, n independently is 0 or 1, m and p independently are integers from 0 to 5, R represents hydrogen or linear and branched (C1 to C10) alkyl, R19 represents an acid labile group that is cleavable by a photoacid initiator selected from the group consisting of —C(CH3)3, —Si(CH3)3, —CH(Rp)OCH2CH3, —CH(Rp)OC(CH3), or the following cyclic groups: wherein Rp represents hydrogen or a linear or branched (C1 to C5) alkyl group, R··independently represents R and R·, and at least one of R1 to R4 must be selected from a substituent containing said acid labile group, and R″ represents a substituent selected from hydrogen, linear and branched (C1 to C10) alkyl, linear and branched (C1 to C10) alkoxyalkylene, polyethers, monocyclic and polycyclic (C4 to C20) cycloaliphatic moieties, cyclic ethers, cyclic ketones, and lactones, with the proviso that when R″ is an alkyl, lactone, cycloaliphatic or cyclic ketone group, or when R5 to R8 represent the group —(A)n—C(O)OR″, —(A)n—OR″, —(A)n—OC(O)R″, —(A)n—OC(O)OR″, —(A)n—C(O)R″, —(A)n—C(R″)2CH(R″)(C(O)OR″, and —(A)n—C(R″)2CH(C(O)OR″)2, —A—must be present and can not represent and alkylene radical.
- 8. The composition of claim 7 wherein said copolymer further comprises at least one repeating unit selected from the group represented as follows: wherein R9 to R16 independently represent hydrogen and linear and branched (C1 to C10) alkyl, with the proviso that at least one of R9 to R12 is a carboxylic substituent represented by the formula —(CH2)nC(O)OH wherein n is an integer from 0 to 10; and q and r independently are integers from 0 to 5.
- 9. The composition of claim 7 wherein said copolymer comprises repeating units represented by the following structures: wherein R·represents a moiety that is cleavable by a photoacid initiator selected from the group consisting of —C(CH3)3, Si(CH3)3, 1-methyl-cyclohexyl, isobornyl, 2-methyl-2-isobornyl, 2-methyl-2-adamantyl, tetrahydrofuranyl, tetrahydropyranyl, 3-oxocyclohexanonyl, mevalonic lactonyl, (1-ethoxyethyl, 1-t-butoxy ethyl, dicyclopropylmethyl (Dcpm), and dimethylcyclopropylmethyl (Dmcp) groups, and R″ is selected from linear and branched (C1 to C10) alkyl.
- 10. The composition of claim 9 wherein R1 to R3 and R5 to 1 R7 are hydrogen or linear or branched (C1 to C10) alkyl, and R″ is linear or branched (C1to C10) alkyl.
- 11. The composition of claim 10 wherein said copolymer comprises repeating units represented by the following structures: wherein m and p independently are 0 or 1, n is 1 and A is an alkylene group containing 1 to 10 carbon atoms.
- 12. The composition of claim 11 wherein R19 is t-butyl, A is a methylene group and R″ is selected from linear or branched (C1 to C5) alkyl.
- 13. The composition of claim 1, 2, 3, 7, 8, 9, or 10 wherein said polymer contains 5 to 100 mole % of repeating units containing said acid labile groups.
- 14. The composition of claim 13 wherein said polymer contains 20 to 90 mole % of repeating units containing said acid labile groups.
- 15. The composition of claim 13 wherein said polymer contains 30 to 70 mole % of repeating units containing said acid labile groups.
- 16. The composition of claim 13 wherein said polymer contains 5 to 100 mole % of repeating units containing said acid labile groups.
- 17. The composition of claim 5, 6, 7, 8, 9, 10, 11, or 12 wherein said polymer has a pendant perfluorophenyl group of at least one terminal end thereof.
- 18. The composition of claim 1, 2, or 3 wherein said polycyclic polymer includes repeating units polymerized from maleic anhydride.
- 19. The composition of claim 5, 6, 7, 8, 9, 10, 11, or 12 wherein said polymer includes the repeating unit represented as follows:
Parent Case Info
This application is a continuation of application Ser. No. 08/928,573 filed on Sept. 12, 1997 now U.S. Pat. No. 6,232,417 which is a continuation-in-part of Ser. No. 08/812,418 filed on Mar. 6, 1997, now U.S. Pat. No. 6,136,499, which claims priority to provisional application Ser. No. 60/025,174 filed on Mar. 7, 1996.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
6103445 |
Willson et al. |
Aug 2000 |
A |
6147177 |
Jayaraman et al. |
Nov 2000 |
A |
6303724 |
Giidall et al. |
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B1 |
Provisional Applications (1)
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Number |
Date |
Country |
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60/025174 |
Mar 1996 |
US |
Continuations (1)
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Number |
Date |
Country |
Parent |
08/928573 |
Sep 1997 |
US |
Child |
09/850915 |
|
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
08/812418 |
Mar 1997 |
US |
Child |
08/928573 |
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US |