Polysilicon containing oxygen, nitrogen, or carbon

Industry

CPC
Y10S257/914

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S257/00Active solid-state devices

Current Industry

Y10S257/914Polysilicon containing oxygen, nitrogen, or carbon

Industries

Patents Grantslast 30 patents

Information Patent Grant
Coatings for relatively movable surfaces
- Patent number 9,487,397
- Issue date Nov 8, 2016
- Texas Instruments Incorporated
- William Robert Morrison
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Coatings for relatively movable surfaces
- Patent number 9,150,410
- Issue date Oct 6, 2015
- Texas Instruments Incorporated
- William Robert Morrison
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Dynamic access point based positioning
- Patent number 9,056,767
- Issue date Jun 16, 2015
- Texas Instruments Incorporated
- Deric Wayne Waters
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor memory device and method for manufacturing the same
- Patent number 9,012,973
- Issue date Apr 21, 2015
- Kabushiki Kaisha Toshiba
- Takuo Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Coatings for relatively movable surfaces
- Patent number 8,803,296
- Issue date Aug 12, 2014
- Texas Instruments Incorporated
- William Robert Morrison
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Increasing an electrical resistance of a resistor by oxidation
- Patent number 8,440,522
- Issue date May 14, 2013
- International Business Machines Corporation
- Arne W. Ballantine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-K SiC copper diffusion barrier films
- Patent number 7,968,436
- Issue date Jun 28, 2011
- Novellus Systems, Inc.
- Yongsik Yu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High-k dielectric film, method of forming the same and related semi...
- Patent number 7,923,336
- Issue date Apr 12, 2011
- Infineon Technologies AG
- Kil-Ho Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of controlling grain size in a polysilicon layer and in semi...
- Patent number 7,777,302
- Issue date Aug 17, 2010
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k dielectric film, method of forming the same and related semi...
- Patent number 7,655,099
- Issue date Feb 2, 2010
- Infineon Technologies AG
- Kil-Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fingerprint detection device and method of its manufacture, and app...
- Patent number 7,629,200
- Issue date Dec 8, 2009
- Sony Corporation
- Seiichi Miyai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Low-k SiC copper diffusion barrier films
- Patent number 7,573,061
- Issue date Aug 11, 2009
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Increasing an electrical resistance of a resistor by nitridization
- Patent number 7,456,074
- Issue date Nov 25, 2008
- International Business Machines Corporation
- Arne W. Ballantine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-k dielectric film, method of forming the same and related semi...
- Patent number 7,405,482
- Issue date Jul 29, 2008
- Infineon Technologies AG
- Kil-Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,368,823
- Issue date May 6, 2008
- Fujitsu Limited
- Masahiro Horibe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Increasing an electrical resistance of a resistor by oxidation or n...
- Patent number 7,351,639
- Issue date Apr 1, 2008
- International Business Machines Corporation
- Arne W. Ballantine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k SiC copper diffusion barrier films
- Patent number 7,282,438
- Issue date Oct 16, 2007
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling grain size in a polysilicon layer and in semi...
- Patent number 7,247,924
- Issue date Jul 24, 2007
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fingerprint detection device and method of its manufacture, and app...
- Patent number 7,235,853
- Issue date Jun 26, 2007
- Sony Corporation
- Seiichi Miyai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,094,692
- Issue date Aug 22, 2006
- Fujitsu Limited
- Masahiro Horibe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including an interconnect having copper as a m...
- Patent number 7,042,095
- Issue date May 9, 2006
- Renesas Technology Corp.
- Junji Noguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of eliminating photoresist poisoning in damascene applications
- Patent number 7,034,409
- Issue date Apr 25, 2006
- Applied Materials Inc.
- Ping Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fingerprint detection device and method of its manufacture, and app...
- Patent number 6,960,790
- Issue date Nov 1, 2005
- Sony Corporation
- Seiichi Miyai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Conductor layer nitridation
- Patent number 6,887,774
- Issue date May 3, 2005
- Micron Technology, Inc.
- Yongjun Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductor layer nitridation
- Patent number 6,798,026
- Issue date Sep 28, 2004
- Micron Technology, Inc.
- Yongjun Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite material and semiconductor device using the same
- Patent number 6,737,168
- Issue date May 18, 2004
- Sumitomo Electric Industries, Ltd.
- Shinichi Yamagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Operation method of semiconductor devices
- Patent number 6,734,499
- Issue date May 11, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Increasing an electrical resistance of a resistor by oxidation or n...
- Patent number 6,730,984
- Issue date May 4, 2004
- International Business Machines Corporation
- Arne W. Ballantine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling grain size in a polysilicon layer and in semi...
- Patent number 6,682,992
- Issue date Jan 27, 2004
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulated gate field effect transistor and its manufacturing method
- Patent number 6,680,486
- Issue date Jan 20, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COATINGS FOR RELATIVELY MOVABLE SURFACES
- Publication number 20140329392
- Publication date Nov 6, 2014
- William Robert MORRISON
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
DYNAMIC ACCESS POINT BASED POSITIONING
- Publication number 20140171108
- Publication date Jun 19, 2014
- TEXAS INSTRUMENTS INCORPORATED
- Deric Wayne Waters
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
COATINGS FOR RELATIVELY MOVABLE SURFACES
- Publication number 20140167295
- Publication date Jun 19, 2014
- TEXAS INSTRUMENTS INCORPORATED
- William Robert MORRISON
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
HIGH-K DIELECTRIC FILM, METHOD OF FORMING THE SAME AND RELATED SEMI...
- Publication number 20100047991
- Publication date Feb 25, 2010
- Infineon Technologies AG
- Kil-Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY NITRIDIZATION
- Publication number 20090011526
- Publication date Jan 8, 2009
- Arne W. Ballantine
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY NITRIDIZATION
- Publication number 20080314754
- Publication date Dec 25, 2008
- Arne W. Ballantine
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
HIGH-K DIELECTRIC FILM, METHOD OF FORMING THE SAME AND RELATED SEMI...
- Publication number 20080246100
- Publication date Oct 9, 2008
- Infineon Technologies AG
- Kil-Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080105982
- Publication date May 8, 2008
- FUJITSU LIMITED
- Masahiro Horibe
- B82 - NANO-TECHNOLOGY
Information Patent Application
INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY OXIDATION
- Publication number 20080102543
- Publication date May 1, 2008
- Arne W. Ballantine
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF CONTROLLING GRAIN SIZE IN A POLYSILICON LAYER AND IN SEMI...
- Publication number 20070284694
- Publication date Dec 13, 2007
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fingerprint detection device and method of its manufacture, and app...
- Publication number 20070269922
- Publication date Nov 22, 2007
- Sony Corporation
- Seiichi Miyai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY OXIDATION OR N...
- Publication number 20070267286
- Publication date Nov 22, 2007
- Arne W. Ballantine
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of eliminating photoresist poisoning in damascene applications
- Publication number 20060205206
- Publication date Sep 14, 2006
- APPLIED MATERIALS, INC.
- Ping Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High-k dielectric film, method of forming the same and related semi...
- Publication number 20060194451
- Publication date Aug 31, 2006
- Kil-Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fingerprint detection device and method of its manufacture, and app...
- Publication number 20050259853
- Publication date Nov 24, 2005
- Sony Corporation
- Seiichi Miyai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050215049
- Publication date Sep 29, 2005
- Masahiro Horibe
- B82 - NANO-TECHNOLOGY
Information Patent Application
Conductor layer nitridation
- Publication number 20040238845
- Publication date Dec 2, 2004
- Micron Technology Inc.
- Yongjun Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fingerprint detection device and method of its manufacture, and app...
- Publication number 20040185590
- Publication date Sep 23, 2004
- Seiichi Miyai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Increasing an electrical resistance of a resistor by oxidation or n...
- Publication number 20040140529
- Publication date Jul 22, 2004
- Arne W. Ballantine
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of eliminating photoresist poisoning in damascene applications
- Publication number 20040106278
- Publication date Jun 3, 2004
- APPLIED MATERIALS, INC.
- Ping Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of controlling grain size in a polysilicon layer and in semi...
- Publication number 20040084754
- Publication date May 6, 2004
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling grain size in a polysilicon layer and in semi...
- Publication number 20030216013
- Publication date Nov 20, 2003
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and a method of manufacturing the same
- Publication number 20030183940
- Publication date Oct 2, 2003
- Junji Noguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of eliminating photoresist poisoning in damascene applications
- Publication number 20030077916
- Publication date Apr 24, 2003
- APPLIED MATERIALS, INC.
- Ping Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicone polymer insulation film on semiconductor substrate
- Publication number 20030054666
- Publication date Mar 20, 2003
- ASM JAPAN K.K.
- Nobuo Matsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Conductor layer nitridation
- Publication number 20030001212
- Publication date Jan 2, 2003
- Micron Technology, Inc.
- Yongjun Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-ON-INSULATOR(SOI)SUBSTRATE
- Publication number 20020153563
- Publication date Oct 24, 2002
- Atsushi Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Highly linear integrated resistive contact
- Publication number 20020109230
- Publication date Aug 15, 2002
- Dustin A. Woodbury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTOR LAYER NITRIDATION
- Publication number 20020008292
- Publication date Jan 24, 2002
- YONGIUN HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor integrated circuit manufacturing method and device
- Publication number 20010025998
- Publication date Oct 4, 2001
- TOSHIBA CORPORATION`
- Masakatsu Tsuchiaki
- H01 - BASIC ELECTRIC ELEMENTS

Polysilicon containing oxygen, nitrogen, or carbon

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Coatings for relatively movable surfaces

Coatings for relatively movable surfaces

Dynamic access point based positioning

Semiconductor memory device and method for manufacturing the same

Coatings for relatively movable surfaces

Increasing an electrical resistance of a resistor by oxidation

Low-K SiC copper diffusion barrier films

High-k dielectric film, method of forming the same and related semi...

Method of controlling grain size in a polysilicon layer and in semi...

High-k dielectric film, method of forming the same and related semi...

Fingerprint detection device and method of its manufacture, and app...

Low-k SiC copper diffusion barrier films

Increasing an electrical resistance of a resistor by nitridization

High-k dielectric film, method of forming the same and related semi...

Semiconductor device and method of manufacturing the same

Increasing an electrical resistance of a resistor by oxidation or n...

Low-k SiC copper diffusion barrier films

Method of controlling grain size in a polysilicon layer and in semi...

Fingerprint detection device and method of its manufacture, and app...

Semiconductor device and method of manufacturing the same

Semiconductor device including an interconnect having copper as a m...

Method of eliminating photoresist poisoning in damascene applications

Fingerprint detection device and method of its manufacture, and app...

Conductor layer nitridation

Conductor layer nitridation

Composite material and semiconductor device using the same

Operation method of semiconductor devices

Increasing an electrical resistance of a resistor by oxidation or n...

Method of controlling grain size in a polysilicon layer and in semi...

Insulated gate field effect transistor and its manufacturing method

Patents Applicationslast 30 patents

COATINGS FOR RELATIVELY MOVABLE SURFACES

DYNAMIC ACCESS POINT BASED POSITIONING

COATINGS FOR RELATIVELY MOVABLE SURFACES

HIGH-K DIELECTRIC FILM, METHOD OF FORMING THE SAME AND RELATED SEMI...

INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY NITRIDIZATION

INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY NITRIDIZATION

HIGH-K DIELECTRIC FILM, METHOD OF FORMING THE SAME AND RELATED SEMI...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY OXIDATION

METHOD OF CONTROLLING GRAIN SIZE IN A POLYSILICON LAYER AND IN SEMI...

Fingerprint detection device and method of its manufacture, and app...

INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY OXIDATION OR N...

Method of eliminating photoresist poisoning in damascene applications

High-k dielectric film, method of forming the same and related semi...

Fingerprint detection device and method of its manufacture, and app...

Semiconductor device and method of manufacturing the same

Conductor layer nitridation

Fingerprint detection device and method of its manufacture, and app...

Increasing an electrical resistance of a resistor by oxidation or n...

Method of eliminating photoresist poisoning in damascene applications

Method of controlling grain size in a polysilicon layer and in semi...

Method of controlling grain size in a polysilicon layer and in semi...

Semiconductor device and a method of manufacturing the same

Method of eliminating photoresist poisoning in damascene applications

Silicone polymer insulation film on semiconductor substrate

Conductor layer nitridation

SILICON-ON-INSULATOR(SOI)SUBSTRATE

Highly linear integrated resistive contact

CONDUCTOR LAYER NITRIDATION

Semiconductor integrated circuit manufacturing method and device