Position of mark on substrate: i.e. position in (x, y, z) of mark

Industry

CPC
G03F9/7084

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7084Position of mark on substrate: i.e. position in (x, y, z) of mark

Industries

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Patents Grantslast 30 patents

Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,199,093
- Issue date Jan 14, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer-level etching methods for planar photonics circuits and devices
- Patent number 12,057,332
- Issue date Aug 6, 2024
- Ayar Labs, Inc.
- Chen Sun
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,027,518
- Issue date Jul 2, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method of movable body, exposure method, device manufacturi...
- Patent number 11,994,811
- Issue date May 28, 2024
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark, mask and display substrate motherboard
- Patent number 11,994,810
- Issue date May 28, 2024
- BOE Technology Group Co., Ltd.
- Li Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 11,984,445
- Issue date May 14, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Detection apparatus, lithography apparatus, and article manufacturi...
- Patent number 11,934,098
- Issue date Mar 19, 2024
- Canon Kabushiki Kaisha
- Tomokazu Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
- Patent number 11,927,879
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 11,927,892
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,914,308
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement system, substrate processing system, and device manufac...
- Patent number 11,915,961
- Issue date Feb 27, 2024
- Nikon Corporation
- Go Ichinose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display panel test method comprising the step of automatically sear...
- Patent number 11,841,627
- Issue date Dec 12, 2023
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zanting Zeng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for disposing substrate and method for manufacturing article
- Patent number 11,774,850
- Issue date Oct 3, 2023
- Canon Kabushiki Kaisha
- Naoki Funabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit overlay test patterns and method thereof
- Patent number 11,762,302
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tseng Chin Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor apparatus for lithographic measurements
- Patent number 11,761,929
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Alessandro Polo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for removing photoresist layer from alignment...
- Patent number 11,747,742
- Issue date Sep 5, 2023
- VisEra Technologies Company Limited
- Yuan-Chun Chao
- B08 - CLEANING
Information Patent Grant
Overlay marks for reducing effect of bottom layer asymmetry
- Patent number 11,726,413
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chih Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus
- Patent number 11,709,421
- Issue date Jul 25, 2023
- Canon Kabushiki Kaisha
- Ken-ichiro Shinoda
- G02 - OPTICS
Information Patent Grant
Selecting a set of locations associated with a measurement or featu...
- Patent number 11,681,231
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Pierluigi Frisco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 11,646,309
- Issue date May 9, 2023
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of pattern alignment for field stitching
- Patent number 11,640,118
- Issue date May 2, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,630,397
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus
- Patent number 11,609,503
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D integrated circuit device and structure with hybrid bonding
- Patent number 11,605,630
- Issue date Mar 14, 2023
- Monolithic 3D Inc.
- Zvi Or-Bach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Workpiece processing apparatus using workpiece having reference mar...
- Patent number 11,577,269
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Wataru Yoshitomi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Control method of movable body, exposure method, device manufacturi...
- Patent number 11,567,419
- Issue date Jan 31, 2023
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coaxial see-through alignment imaging system
- Patent number 11,526,088
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Anton J. Devilliers
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240369919
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240304617
- Publication date Sep 12, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...
- Publication number 20240288787
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- WATARU YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240222368
- Publication date Jul 4, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240210843
- Publication date Jun 27, 2024
- Canon Kabushiki Kaisha
- Nozomu Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...
- Publication number 20240201605
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Ulrich MUELLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20240184222
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Guido DE HAAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240120332
- Publication date Apr 11, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLO...
- Publication number 20240069447
- Publication date Feb 29, 2024
- Intel Corporation
- Deepak SELVANATHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS
- Publication number 20240036486
- Publication date Feb 1, 2024
- Fuji Electric Co., Ltd.
- Kazuhiro KITAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20240027919
- Publication date Jan 25, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY
- Publication number 20230359135
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuit Overlay Test Patterns And Method Thereof
- Publication number 20230359131
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tseng Chin Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Back Side to Front Side Alignment on a Semiconductor Wafer with Spe...
- Publication number 20230296994
- Publication date Sep 21, 2023
- INFINEON TECHNOLOGIES AG
- Dirk Offenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20230266678
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20230194980
- Publication date Jun 22, 2023
- Canon Kabushiki Kaisha
- TOMOKAZU TAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Avoiding Damage to Overlay Metrology Mark
- Publication number 20230161268
- Publication date May 25, 2023
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK, TEMPLATE, AND SEMICONDCTOR DEVICE MANUFACTURING METHOD
- Publication number 20230092256
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Sachiko Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF MOVABLE BODY, EXPOSURE METHOD, DEVICE MANUFACTURI...
- Publication number 20230034966
- Publication date Feb 2, 2023
- Nikon Corporation
- Akihiro UEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE, ELECTRONIC APPARATUS, AND METHOD FOR MANUFACT...
- Publication number 20230024469
- Publication date Jan 26, 2023
- Sony Semiconductor Solutions Corporation
- MASAKI IWAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230004097
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPLAY PANEL TEST METHOD AND DISPLAY PANEL TEST DEVICE
- Publication number 20220404723
- Publication date Dec 22, 2022
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zanting Zeng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK, MASK AND DISPLAY SUBSTRATE MOTHERBOARD
- Publication number 20220373900
- Publication date Nov 24, 2022
- BOE TECHNOLOGY GROUP CO., LTD.
- Li XIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFAC...
- Publication number 20220367224
- Publication date Nov 17, 2022
- Nikon Corporation
- Go ICHINOSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20220334502
- Publication date Oct 20, 2022
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DESIGNING AN ALIGNMENT MARK
- Publication number 20220334505
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Jigang MA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20220328474
- Publication date Oct 13, 2022
- Monolithic 3D Inc.
- Zvi Or-Bach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY
- Publication number 20220221804
- Publication date Jul 14, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTING A SET OF LOCATIONS ASSOCIATED WITH A MEASUREMENT OR FEATU...
- Publication number 20220187714
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Pierluigi FRISCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Position of mark on substrate: i.e. position in (x, y, z) of mark

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

3D semiconductor devices and structures with metal layers

Wafer-level etching methods for planar photonics circuits and devices

3D semiconductor devices and structures with metal layers

Control method of movable body, exposure method, device manufacturi...

Alignment mark, mask and display substrate motherboard

3D semiconductor devices and structures with metal layers

Method for producing overlay results with absolute reference for se...

Detection apparatus, lithography apparatus, and article manufacturi...

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Alignment method and associated alignment and lithographic apparatuses

Lithographic apparatus

Measurement system, substrate processing system, and device manufac...

Massive overlay metrology sampling with multiple measurement columns

Display panel test method comprising the step of automatically sear...

Method for disposing substrate and method for manufacturing article

Integrated circuit overlay test patterns and method thereof

Sensor apparatus for lithographic measurements

Apparatus and method for removing photoresist layer from alignment...

Overlay marks for reducing effect of bottom layer asymmetry

Imprint apparatus

Selecting a set of locations associated with a measurement or featu...

Self-referencing and self-calibrating interference pattern overlay...

3D semiconductor devices and structures with metal layers

Method of pattern alignment for field stitching

Method for producing overlay results with absolute reference for se...

Lithographic apparatus

3D integrated circuit device and structure with hybrid bonding

Workpiece processing apparatus using workpiece having reference mar...

Control method of movable body, exposure method, device manufacturi...

Coaxial see-through alignment imaging system

Patents Applicationslast 30 patents

PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...

METROLOGY METHOD AND APPARATUS

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLO...

MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY

Integrated Circuit Overlay Test Patterns And Method Thereof

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

Back Side to Front Side Alignment on a Semiconductor Wafer with Spe...

LITHOGRAPHIC APPARATUS

DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURI...

Method for Avoiding Damage to Overlay Metrology Mark

MARK, TEMPLATE, AND SEMICONDCTOR DEVICE MANUFACTURING METHOD

CONTROL METHOD OF MOVABLE BODY, EXPOSURE METHOD, DEVICE MANUFACTURI...

SEMICONDUCTOR DEVICE, ELECTRONIC APPARATUS, AND METHOD FOR MANUFACT...

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

DISPLAY PANEL TEST METHOD AND DISPLAY PANEL TEST DEVICE

ALIGNMENT MARK, MASK AND DISPLAY SUBSTRATE MOTHERBOARD

MEASUREMENT SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFAC...

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

METHOD OF DESIGNING AN ALIGNMENT MARK

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY

SELECTING A SET OF LOCATIONS ASSOCIATED WITH A MEASUREMENT OR FEATU...