Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

CPC
H01J2237/20

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System and method for uniform ion milling
- Patent number 12,362,130
- Issue date Jul 15, 2025
- E. A. Fischione Instruments, Inc.
- Paul E Fischione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 12,362,152
- Issue date Jul 15, 2025
- SPTS Technologies Limited
- Maxime Varvara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transport device and charged particle beam system
- Patent number 12,362,133
- Issue date Jul 15, 2025
- Jeol Ltd.
- Shuichi Yuasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated sample alignment for microscopy
- Patent number 12,362,137
- Issue date Jul 15, 2025
- FEI Company
- John Flanagan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, temperature control method of subst...
- Patent number 12,362,155
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Toshiharu Hirata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and substrate processing apparatus
- Patent number 12,362,142
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma based film modification for semiconductor devices
- Patent number 12,351,900
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Timothy J. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 12,354,852
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Hyun Tak Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer placement table
- Patent number 12,354,851
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Yusuke Akai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic material having high resistivity and high corrosion resista...
- Patent number 12,354,900
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Akiyoshi Hattori
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Multi-zone heater tuning in substrate heater
- Patent number 12,351,917
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Jun Ma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,347,694
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for topography-selective depositions
- Patent number 12,347,675
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Akiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming plasma coating
- Patent number 12,347,652
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Lance A. Scudder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,654
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,347,658
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for cryogenic applications
- Patent number 12,347,659
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microscope stage fixture for horizontal rotation
- Patent number 12,340,971
- Issue date Jun 24, 2025
- Gabriel Demeneghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus
- Patent number 12,340,990
- Issue date Jun 24, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing target material in deposition chamber with ti...
- Patent number 12,341,042
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsuan-Chih Chu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electrostatic chuck including a heater element with mutiple heating...
- Patent number 12,341,049
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate fixing device
- Patent number 12,340,991
- Issue date Jun 24, 2025
- Shinko Electric Industries Co., Ltd.
- Aya Uchiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,341,001
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Wakako Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,341,050
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL
- Publication number 20250232943
- Publication date Jul 17, 2025
- Carl Zeiss MultiSEM GmbH
- Ticia Buhr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shield for an Ion Implanter
- Publication number 20250232949
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tseh-Jen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20250233008
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250232963
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Motoi YAMAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20250232964
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250233001
- Publication date Jul 17, 2025
- TOTO LTD.
- Yuki SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF FILTER TOPOLOGY FOR SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20250233571
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250226256
- Publication date Jul 10, 2025
- Tomoegawa Corporation
- Ryouji Shikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226190
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS
- Publication number 20250226255
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218825
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218845
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Tomoya TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218858
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Musashi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250218735
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Si Young JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING
- Publication number 20250218788
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Morgan EVANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF WAFER GROUNDING UTILIZING WAFER EDGE BACKSIDE COATING EXC...
- Publication number 20250218720
- Publication date Jul 3, 2025
- ASML NETHERLANDS B.V.
- Yinglong LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218843
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ELECTRODE ASSEMBLY, SUBSTRATE PROCE...
- Publication number 20250218738
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250210326
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK
- Publication number 20250210325
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Atsushi KAWABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210393
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Volume Transmission Electron Microscopy Grid
- Publication number 20250201509
- Publication date Jun 19, 2025
- Yale University
- Cong Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...
- Publication number 20250201521
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Dae Hyun YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT TO BE USED FOR PLASMA PROCESSING DEVICE, METHOD FOR MANUF...
- Publication number 20250201537
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Taisei SEGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD
- Publication number 20250201601
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250201531
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Chan Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250201535
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Sho OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER CIRCUIT, CONTROLLING METHOD THEREOF, AND SUBSTRATE PROCESSIN...
- Publication number 20250201615
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Byeong Hyeon KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20250201528
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System and method for uniform ion milling

Plasma etching apparatus and method

Transport device and charged particle beam system

Automated sample alignment for microscopy

Plasma processing apparatus and plasma processing method

Substrate processing apparatus, temperature control method of subst...

Plasma processing method and substrate processing apparatus

Plasma based film modification for semiconductor devices

High aspect ratio etch with infinite selectivity

In-situ focus ring coating

Electrostatic chuck, substrate processing apparatus, and substrate...

Ultrathin atomic layer deposition film accuracy thickness control

Wafer placement table

Ceramic material having high resistivity and high corrosion resista...

Multi-zone heater tuning in substrate heater

Method and apparatus for treating substrate

Methods and systems for topography-selective depositions

Method for forming plasma coating

Plasma processing apparatus

Stage and plasma processing apparatus

Electrostatic chuck assembly for cryogenic applications

Microscope stage fixture for horizontal rotation

Plasma processing apparatus and plasma processing method

Member for semiconductor manufacturing apparatus

Method for depositing target material in deposition chamber with ti...

Electrostatic chuck including a heater element with mutiple heating...

Substrate fixing device

Cleaning method and plasma processing apparatus

Electrostatic chuck

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Patents Applicationslast 30 patents

MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL

Shield for an Ion Implanter

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

Substrate Processing Apparatus

VERTICALLY ADJUSTABLE PLASMA SOURCE

ELECTROSTATIC CHUCK

RF FILTER TOPOLOGY FOR SUBSTRATE SUPPORT ASSEMBLY

ELECTROSTATIC CHUCK

STAGE AND SUBSTRATE PROCESSING APPARATUS

EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS

SUBSTRATE PROCESSING APPARATUS

SAMPLE HOLDER

SAMPLE HOLDER

GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...

SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING

METHOD OF WAFER GROUNDING UTILIZING WAFER EDGE BACKSIDE COATING EXC...

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

SUBSTRATE PROCESSING APPARATUS, ELECTRODE ASSEMBLY, SUBSTRATE PROCE...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

High-Volume Transmission Electron Microscopy Grid

SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...

COMPONENT TO BE USED FOR PLASMA PROCESSING DEVICE, METHOD FOR MANUF...

PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD

HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

HEATER CIRCUIT, CONTROLLING METHOD THEREOF, AND SUBSTRATE PROCESSIN...

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS