Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

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CPC
H01J2237/20

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device
- Patent number 12,205,795
- Issue date Jan 21, 2025
- Ulvac, Inc.
- Taichi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of fabricating same
- Patent number 12,205,802
- Issue date Jan 21, 2025
- Semes Co., Ltd.
- Dong Mok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,205,839
- Issue date Jan 21, 2025
- Kyocera Corporation
- Yoshinori Narazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support designs for a deposition chamber
- Patent number 12,198,967
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Kaushik Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and substrate fixing device
- Patent number 12,198,968
- Issue date Jan 14, 2025
- Shinko Electric Industries Co., Ltd.
- Kentaro Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring device and optical fiber strain measuring jig thereof
- Patent number 12,196,629
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tong Wu
- G01 - MEASURING TESTING
Information Patent Grant
Wafer placement table
- Patent number 12,191,123
- Issue date Jan 7, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inert gas sample transfer for beam systems
- Patent number 12,183,539
- Issue date Dec 31, 2024
- FEI Company
- Libor Novák
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for inspecting electrostatic chuck
- Patent number 12,181,504
- Issue date Dec 31, 2024
- Semes Co., Ltd.
- Su Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, semiconductor device and man...
- Patent number 12,183,538
- Issue date Dec 31, 2024
- Kioxia Corporation
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of hysteresis compensation
- Patent number 12,183,537
- Issue date Dec 31, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,170,219
- Issue date Dec 17, 2024
- Kyocera Corporation
- Naoki Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support table and RF rod
- Patent number 12,170,190
- Issue date Dec 17, 2024
- NGK Insulators, Ltd.
- Yutaka Unno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,162,110
- Issue date Dec 10, 2024
- Kyocera Corporation
- Hiromasa Takemori
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,165,832
- Issue date Dec 10, 2024
- FEI Company
- Adam Stokes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and transfer method
- Patent number 12,165,893
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching device and method of manufacturing display device using the...
- Patent number 12,161,041
- Issue date Dec 3, 2024
- Samsung Display Co., Ltd.
- Dae Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SENSOR SUBSTRATE, APPARATUS, AND METHOD
- Publication number 20250029811
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Arthur Eduard OVERLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE FIXING DEVICE
- Publication number 20250022741
- Publication date Jan 16, 2025
- Shinko Electric Industries Co., Ltd.
- Yuma Terashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANIPULATING A MICROSCOPIC SAMPLE
- Publication number 20250022677
- Publication date Jan 16, 2025
- FEI Company
- Joseph M. Lebow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENVIRONMENTAL CELL AND ELECTRON MICROSCOPE
- Publication number 20250022678
- Publication date Jan 16, 2025
- Hitachi, Ltd
- Fumiaki ICHIHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLU...
- Publication number 20250022692
- Publication date Jan 16, 2025
- ASM IP HOLDING B.V.
- Koji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING T...
- Publication number 20250022693
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...
- Publication number 20250022695
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Kazuki HOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS
- Publication number 20250014874
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Takahiko SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION
- Publication number 20250014857
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Shaoqian WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
- Publication number 20250014871
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- Sungwon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
- Publication number 20250014873
- Publication date Jan 9, 2025
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE
- Publication number 20250014878
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Andreas SCHMID
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DEVICE
- Publication number 20250014933
- Publication date Jan 9, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Keisuke MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...
- Publication number 20250003536
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROCESSING EQUIPMENT
- Publication number 20250006475
- Publication date Jan 2, 2025
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
VIBRATION-FREE CRYOGENIC COOLING
- Publication number 20250003845
- Publication date Jan 2, 2025
- FEI Company
- Ronald Lamers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME
- Publication number 20250006538
- Publication date Jan 2, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Milling System and Apparatus and Method for Image Generation
- Publication number 20250006458
- Publication date Jan 2, 2025
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
- Publication number 20250006477
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240429033
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Sample Preparation
- Publication number 20240426717
- Publication date Dec 26, 2024
- FEI Company
- Jakub Kuba
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...
- Publication number 20240429020
- Publication date Dec 26, 2024
- Hitachi, Ltd
- Akira SUGAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE
- Publication number 20240429070
- Publication date Dec 26, 2024
- SK HYNIX INC.
- Jin Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM
- Publication number 20240420916
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xiaoyu JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING SUBSTRATE SUPPORT
- Publication number 20240420931
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Yukihiro Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Rating substrate support assemblies based on impedance circuit elec...

Method for depositing film and film deposition system

Plasma processing device

Plasma processing apparatus and plasma processing method

Substrate processing apparatus and method of fabricating same

Sample holder

Substrate support designs for a deposition chamber

Electrostatic chuck and substrate fixing device

Measuring device and optical fiber strain measuring jig thereof

Wafer placement table

Inert gas sample transfer for beam systems

Workpiece processing apparatus with thermal processing systems

Apparatus and method for inspecting electrostatic chuck

Semiconductor manufacturing apparatus, semiconductor device and man...

Systems and methods of hysteresis compensation

Method, device and system for reducing off-axial aberration in elec...

Scanning ion beam deposition and etch

Method for producing lamella, analysis system and method for analyz...

Ribbon beam angle adjustment in an ion implantation system

Electrostatic chuck

Plasma treatment apparatus, a method of monitoring a process of man...

Wafer support table and RF rod

Coating apparatus and coating method

Substrate support and substrate processing apparatus

Sample holder

System and methods for automated processing of multiple samples in...

Systems and methods for performing sample lift-out for highly react...

Substrate processing system and transfer method

Etching device and method of manufacturing display device using the...

Atomic layer etch process using plasma in conjunction with a rapid...

Patents Applicationslast 30 patents

SENSOR SUBSTRATE, APPARATUS, AND METHOD

SUBSTRATE FIXING DEVICE

APPARATUS AND METHOD FOR MANIPULATING A MICROSCOPIC SAMPLE

ENVIRONMENTAL CELL AND ELECTRON MICROSCOPE

ELECTROSTATIC CHUCK DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLU...

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING T...

PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS

METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION

SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA

CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER

WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE

ELECTROSTATIC CHUCK DEVICE

SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...

SURFACE PROCESSING EQUIPMENT

VIBRATION-FREE CRYOGENIC COOLING

CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME

Sample Milling System and Apparatus and Method for Image Generation

PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Method and System for Sample Preparation

SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...

WAFER SUPPORT DEVICE

SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM

ROTATING SUBSTRATE SUPPORT

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES