Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

CPC
H01J2237/20

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,170,219
- Issue date Dec 17, 2024
- Kyocera Corporation
- Naoki Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support table and RF rod
- Patent number 12,170,190
- Issue date Dec 17, 2024
- NGK Insulators, Ltd.
- Yutaka Unno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,162,110
- Issue date Dec 10, 2024
- Kyocera Corporation
- Hiromasa Takemori
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,165,832
- Issue date Dec 10, 2024
- FEI Company
- Adam Stokes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and transfer method
- Patent number 12,165,893
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching device and method of manufacturing display device using the...
- Patent number 12,161,041
- Issue date Dec 3, 2024
- Samsung Display Co., Ltd.
- Dae Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing equipment and surface processing method
- Patent number 12,154,768
- Issue date Nov 26, 2024
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Self-differential confocal tilt sensor for measuring level variatio...
- Patent number 12,142,456
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Jinmei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Testing assembly including a multiple degree of freedom stage
- Patent number 12,140,571
- Issue date Nov 12, 2024
- Bruker Nano, Inc.
- Edward Cyrankowski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with seal surface
- Patent number 12,142,509
- Issue date Nov 12, 2024
- Lam Research Corporation
- Patrick G. Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum apparatus
- Patent number 12,142,512
- Issue date Nov 12, 2024
- NuFlare Technology, Inc.
- Yoshiaki Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing leakage of heat transfer gas and plasma processi...
- Patent number 12,142,462
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with multiple radio frequency meshes to control...
- Patent number 12,136,536
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device and method for manufacturing same
- Patent number 12,136,540
- Issue date Nov 5, 2024
- LG Display Co., Ltd.
- Young Gon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for conditioning semiconductor processing chamber components
- Patent number 12,129,569
- Issue date Oct 29, 2024
- Lam Research Corporation
- Lin Xu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Chuck for plasma processing chamber
- Patent number 12,131,890
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ann Erickson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate support leveling apparatus
- Patent number 12,131,934
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Katherine Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,131,891
- Issue date Oct 29, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for projecting an array of multiple charged pa...
- Patent number 12,123,841
- Issue date Oct 22, 2024
- DELMIC IP B.V.
- Andries Pieter Johan Effting
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240429033
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Sample Preparation
- Publication number 20240426717
- Publication date Dec 26, 2024
- FEI Company
- Jakub Kuba
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...
- Publication number 20240429020
- Publication date Dec 26, 2024
- Hitachi, Ltd
- Akira SUGAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE
- Publication number 20240429070
- Publication date Dec 26, 2024
- SK HYNIX INC.
- Jin Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM
- Publication number 20240420916
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xiaoyu JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ROTATING SUBSTRATE SUPPORT
- Publication number 20240420931
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Yukihiro Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240420935
- Publication date Dec 19, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsunahiko NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...
- Publication number 20240420933
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amir H. Tavakoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240412958
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240414919
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Sung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
- Publication number 20240412944
- Publication date Dec 12, 2024
- KLA Corporation
- Weijie Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...
- Publication number 20240412957
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Gautam PISHARODY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PREPARING ELECTRON MICROSCOPY SAMPLES AND METHODS OF...
- Publication number 20240412942
- Publication date Dec 12, 2024
- The Regents of the University of California
- Maxim Armstrong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...
- Publication number 20240412948
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Shuran SHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER AND ELECTRON MICROSCOPE
- Publication number 20240404781
- Publication date Dec 5, 2024
- Hitachi Ltd.
- Toshiaki TANIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240404795
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLDING DEVICE
- Publication number 20240404796
- Publication date Dec 5, 2024
- Niterra Co., Ltd.
- Yasuaki KIMIKADO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUBSTRATE, METHOD OF MANUFACTURING THE SAME, ELECTROSTATIC...
- Publication number 20240404862
- Publication date Dec 5, 2024
- Shinko Electric Industries Co., Ltd.
- Ryosuke Hori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240404799
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shota EZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240404782
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Hirohisa ENOMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION
- Publication number 20240395498
- Publication date Nov 28, 2024
- GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Chelsea Edge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS AND METHOD WITH EM RADIATION
- Publication number 20240384409
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC DEVICE AND OPERATION METHOD THEREFOR
- Publication number 20240387153
- Publication date Nov 21, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Pyung-Woo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...
- Publication number 20240387154
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS

Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method, device and system for reducing off-axial aberration in elec...

Scanning ion beam deposition and etch

Method for producing lamella, analysis system and method for analyz...

Ribbon beam angle adjustment in an ion implantation system

Electrostatic chuck

Plasma treatment apparatus, a method of monitoring a process of man...

Wafer support table and RF rod

Coating apparatus and coating method

Substrate support and substrate processing apparatus

Sample holder

System and methods for automated processing of multiple samples in...

Systems and methods for performing sample lift-out for highly react...

Substrate processing system and transfer method

Etching device and method of manufacturing display device using the...

Atomic layer etch process using plasma in conjunction with a rapid...

Surface processing equipment and surface processing method

Self-differential confocal tilt sensor for measuring level variatio...

Testing assembly including a multiple degree of freedom stage

Device and method for substrate transport in vacuum processing systems

Electrostatic chuck with seal surface

Vacuum apparatus

Method of reducing leakage of heat transfer gas and plasma processi...

Plasma processing chambers configured for tunable substrate and edg...

Electrostatic chuck with multiple radio frequency meshes to control...

Substrate processing device and method for manufacturing same

Method for conditioning semiconductor processing chamber components

Chuck for plasma processing chamber

Semiconductor substrate support leveling apparatus

Wafer placement table

Apparatus and method for projecting an array of multiple charged pa...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Method and System for Sample Preparation

SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...

WAFER SUPPORT DEVICE

SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

ROTATING SUBSTRATE SUPPORT

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS

HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...

APPARATUS FOR PREPARING ELECTRON MICROSCOPY SAMPLES AND METHODS OF...

METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

SAMPLE HOLDER AND ELECTRON MICROSCOPE

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

HOLDING DEVICE

CERAMIC SUBSTRATE, METHOD OF MANUFACTURING THE SAME, ELECTROSTATIC...

PLASMA PROCESSING APPARATUS

CHARGED PARTICLE BEAM DEVICE

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION

DEPOSITION APPARATUS AND METHOD WITH EM RADIATION

ELECTROSTATIC DEVICE AND OPERATION METHOD THEREFOR

AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...