Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

CPC
H01J2237/20

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industries

Patents Grantslast 30 patents

Information Patent Grant
Holding method of edge ring, plasma processing apparatus, and subst...
- Patent number 11,984,303
- Issue date May 14, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 11,984,304
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,978,654
- Issue date May 7, 2024
- Semes Co., Ltd.
- Min Sung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement system, temperature measurement method, and...
- Patent number 11,972,921
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 11,972,923
- Issue date Apr 30, 2024
- FEI Company
- Christopher Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support for chucking of mask for deposition processes
- Patent number 11,967,516
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Jrjyan Jerry Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with ceramic monolithic body
- Patent number 11,967,517
- Issue date Apr 23, 2024
- Lam Research Corporation
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus, ion implantation apparatus, and ion i...
- Patent number 11,961,695
- Issue date Apr 16, 2024
- Semes Co., Ltd.
- Doyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid structures of ion beam etching (IBE) systems
- Patent number 11,961,706
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of in situ HR-LCTEM nanofluidic cell for nanobubble int...
- Patent number 11,961,702
- Issue date Apr 16, 2024
- Saudi Arabian Oil Company
- Hassan Alqahtani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate retainer and method of ma...
- Patent number 11,961,715
- Issue date Apr 16, 2024
- Kokusai Electric Corporation
- Daisuke Hara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of sample collection component
- Patent number 11,959,834
- Issue date Apr 16, 2024
- Materials Analysis Technology Inc.
- Pin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,955,315
- Issue date Apr 9, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolated volume seals and method of forming an isolated volume with...
- Patent number 11,955,355
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,955,314
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic phased array plasma source for complete plasma coverage of...
- Patent number 11,948,783
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Automatic electrostatic chuck bias compensation during plasma proce...
- Patent number 11,948,780
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample analyzing method and sample preparing method
- Patent number 11,946,945
- Issue date Apr 2, 2024
- Materials Analysis Technology Inc.
- Keng-Chieh Chu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of making a semiconductor manufacturing apparatus member
- Patent number 11,939,678
- Issue date Mar 26, 2024
- Toto Ltd.
- Yasutaka Nitta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and substrate holding device
- Patent number 11,942,350
- Issue date Mar 26, 2024
- Shinko Electric Industries Co., Ltd.
- Masakuni Miyazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 11,942,351
- Issue date Mar 26, 2024
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 11,935,729
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus and method for controlling operation...
- Patent number 11,929,238
- Issue date Mar 12, 2024
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having electrostatic chuck and subst...
- Patent number 11,929,251
- Issue date Mar 12, 2024
- ASM IP Holding B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...
- Publication number 20240153734
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOLUME FILLING CASSETTE FOR LOAD LOCK
- Publication number 20240153733
- Publication date May 9, 2024
- Applied Materials, Inc.
- Michael Mason Carrell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM
- Publication number 20240145217
- Publication date May 2, 2024
- Applied Materials, Inc.
- Qintao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY
- Publication number 20240145220
- Publication date May 2, 2024
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
- Publication number 20240136161
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTATABLE TEM GRID HOLDER FOR IMPROVED FIB THINNING PROCESS
- Publication number 20240128046
- Publication date Apr 18, 2024
- SANDISK TECHNOLOGIES LLC
- Xiaochen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITANCE SENSING SYSTEMS AND METHODS
- Publication number 20240125832
- Publication date Apr 18, 2024
- Advanced Energy Industries, Inc.
- Donald Enzinna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC ANISOTROPIC SUBSTRATE SUPPORTS
- Publication number 20240128062
- Publication date Apr 18, 2024
- LAM RESEARCH CORPORATION
- Joel HOLLINGSWORTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS DESIGN FOR FILM REMOVAL FROM THE BEVEL AND EDGE OF THE SU...
- Publication number 20240128061
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- FARZAD HOUSHMAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Microscope and Stage
- Publication number 20240120169
- Publication date Apr 11, 2024
- Hitachi High-Tech Corporation
- Kazuki ISHIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240120182
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Yusuke KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID CONDUIT AND FLANGE FOR HIGH BIAS APPLICATIONS
- Publication number 20240112894
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Sankaranarayanan RAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
- Publication number 20240112888
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT-CHUCKING SCHEME FOR IMPROVED BACKSIDE PARTICLE PERFORMANCE
- Publication number 20240112939
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Tony Jefferson GNANAPRAKASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Transferring A Sample
- Publication number 20240112879
- Publication date Apr 4, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING ION BEAM BASED ON OPTICAL MICROSCOPY IMAGING
- Publication number 20240112880
- Publication date Apr 4, 2024
- Institute of Biophysics, Chinese Academy of Sciences
- Tao XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Plasma Etch Process
- Publication number 20240112887
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM SEALING INTEGRITY OF CRYOGENIC ELECTROSTATIC CHUCKS USING NO...
- Publication number 20240110836
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Sankaranarayanan RAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER OF TRANSMISSION ELECTRON MICROSCOPE AND SEMICONDUCTOR...
- Publication number 20240105417
- Publication date Mar 28, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY
- Publication number 20240105488
- Publication date Mar 28, 2024
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20240105429
- Publication date Mar 28, 2024
- Lam Reseach Corporation
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20240105426
- Publication date Mar 28, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20240096590
- Publication date Mar 21, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR ETCHING WITH A PLASMA
- Publication number 20240096594
- Publication date Mar 21, 2024
- Adaptive Plasma Technology Corp.
- Woo Hyung CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT
- Publication number 20240096605
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Arun Kumar Kotrappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087854
- Publication date Mar 14, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANAGING BEAM POWER EFFECTS BY VARYING BASE EMISSIVITY
- Publication number 20240087839
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Dawei Sun
- G02 - OPTICS

Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Holding method of edge ring, plasma processing apparatus, and subst...

Apparatus and method for plasma etching

Substrate processing apparatus

Wafer positioning method and apparatus

Temperature measurement system, temperature measurement method, and...

Systems and methods for performing sample lift-out for highly react...

Substrate support for chucking of mask for deposition processes

Electrostatic chuck with ceramic monolithic body

Substrate treating apparatus, ion implantation apparatus, and ion i...

Replaceable module for a charged particle apparatus

Grid structures of ion beam etching (IBE) systems

Charged particle beam writing apparatus, charged particle beam writ...

Plasma processing method and plasma processing apparatus

Fabrication of in situ HR-LCTEM nanofluidic cell for nanobubble int...

Plasma processing apparatus

Substrate processing apparatus, substrate retainer and method of ma...

Manufacturing method of sample collection component

Workpiece processing apparatus with plasma and thermal processing s...

Isolated volume seals and method of forming an isolated volume with...

Plasma processing apparatus

Methods and apparatus for processing a substrate

Dynamic phased array plasma source for complete plasma coverage of...

Automatic electrostatic chuck bias compensation during plasma proce...

Sample analyzing method and sample preparing method

Method of making a semiconductor manufacturing apparatus member

Electrostatic chuck and substrate holding device

Electrostatic chucks with coolant gas zones and corresponding groov...

Substrate support and plasma processing apparatus

Ion beam processing apparatus and method for controlling operation...

Substrate processing apparatus having electrostatic chuck and subst...

Patents Applicationslast 30 patents

SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...

VOLUME FILLING CASSETTE FOR LOAD LOCK

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

ELECTROSTATIC CHUCK ASSEMBLY

TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

ROTATABLE TEM GRID HOLDER FOR IMPROVED FIB THINNING PROCESS

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

CAPACITANCE SENSING SYSTEMS AND METHODS

MONOLITHIC ANISOTROPIC SUBSTRATE SUPPORTS

APPARATUS DESIGN FOR FILM REMOVAL FROM THE BEVEL AND EDGE OF THE SU...

Charged Particle Microscope and Stage

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

FLUID CONDUIT AND FLANGE FOR HIGH BIAS APPLICATIONS

In-Situ Adsorbate Formation for Dielectric Etch

SOFT-CHUCKING SCHEME FOR IMPROVED BACKSIDE PARTICLE PERFORMANCE

Systems And Methods For Transferring A Sample

METHOD OF PROCESSING ION BEAM BASED ON OPTICAL MICROSCOPY IMAGING

In-Situ Adsorbate Formation for Plasma Etch Process

VACUUM SEALING INTEGRITY OF CRYOGENIC ELECTROSTATIC CHUCKS USING NO...

SAMPLE HOLDER OF TRANSMISSION ELECTRON MICROSCOPE AND SEMICONDUCTOR...

ELECTROSTATIC CHUCK ASSEMBLY

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

SYSTEM FOR ETCHING WITH A PLASMA

BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

MANAGING BEAM POWER EFFECTS BY VARYING BASE EMISSIVITY