Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

CPC
H01J2237/20

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industries

Patents Grantslast 30 patents

Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for positioning objects in a particle beam microscope with t...
- Patent number 12,300,459
- Issue date May 13, 2025
- Carl Zeiss Microscopy GmbH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,300,476
- Issue date May 13, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placement stage and substrate processing apparatus
- Patent number 12,300,530
- Issue date May 13, 2025
- Tokyo Electron Limited
- Daisuke Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 12,293,937
- Issue date May 6, 2025
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of post-curing additive manufacturing parts using electron...
- Patent number 12,285,915
- Issue date Apr 29, 2025
- Ford Global Technologies, LLC
- Christopher Michael Seubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertically adjustable plasma source
- Patent number 12,288,677
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and substrate processing apparatus
- Patent number 12,288,676
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Takayuki Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic susceptor
- Patent number 12,283,513
- Issue date Apr 22, 2025
- MiCo Ceramics Ltd.
- Jusung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder state detection device and substrate holder state...
- Patent number 12,278,083
- Issue date Apr 15, 2025
- SCREEN Holdings Co., Ltd.
- Yuji Okita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,278,087
- Issue date Apr 15, 2025
- FEI Company
- Christopher Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anodized titanium material and method for producing the same
- Patent number 12,276,037
- Issue date Apr 15, 2025
- Yamaguchi Prefectural Industrial Technology Institute
- Takehiko Muranaka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanopositioning systems and associated methods
- Patent number 12,266,501
- Issue date Apr 1, 2025
- The Texas A&M University System
- ChaBum Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,266,557
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for sputtering and depositing metal on surface of...
- Patent number 12,266,513
- Issue date Apr 1, 2025
- Lanzhou Institute of Chemical Physics, CAS
- Bin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,266,515
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,266,562
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Hajime Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and control method therefor
- Patent number 12,261,013
- Issue date Mar 25, 2025
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus
- Patent number 12,261,015
- Issue date Mar 25, 2025
- NuFlare Technology, Inc.
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D fiducial for precision 3D NAND channel tilt/shift analysis
- Patent number 12,260,583
- Issue date Mar 25, 2025
- FEI Company
- Mark Najarian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and support for coating eyeglass lenses
- Patent number 12,261,031
- Issue date Mar 25, 2025
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning electron microscope and image generation method using scan...
- Patent number 12,255,043
- Issue date Mar 18, 2025
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to eliminate of deposition on wafer bevel and backside
- Patent number 12,255,054
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157844
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Ryosuke Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...
- Publication number 20250157785
- Publication date May 15, 2025
- HITACHI HIGH-TECH CORPORATION
- Hidenori MACHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...
- Publication number 20250157795
- Publication date May 15, 2025
- SEMES CO., LTD.
- Jun Seok PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING IRREGULARITIES WITHIN A PLASMA-BAS...
- Publication number 20250157794
- Publication date May 15, 2025
- Applied Materials, Inc.
- Sheng Yi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH A ROTATABLE PEDESTAL HUB
- Publication number 20250157796
- Publication date May 15, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Bowed Substrate Clamping Method, Apparatus, and System
- Publication number 20250149361
- Publication date May 8, 2025
- Applied Materials, Inc.
- Arvinder S. CHADHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149310
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250149287
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device, and Inspection System
- Publication number 20250149288
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Naohiro FUJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149370
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250149311
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Junho IM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF
- Publication number 20250140512
- Publication date May 1, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Huaidong ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH UNIFORMITY IMPROVEMENT IN RADICAL ETCH USING CONFINEMENT RING
- Publication number 20250140529
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES
- Publication number 20250140530
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT DEVICE AND METHOD OF CONTROLLING PREVENTION OF LE...
- Publication number 20250140533
- Publication date May 1, 2025
- SEMES CO., LTD.
- Soon Cheon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...
- Publication number 20250140521
- Publication date May 1, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250140534
- Publication date May 1, 2025
- SEMES CO., LTD.
- Young Seo AN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250140535
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Takashi KANAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...
- Publication number 20250132134
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Taeil Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING OF HIGH-QUALITY SUPERCONDUCTING THIN FILMS
- Publication number 20250129468
- Publication date Apr 24, 2025
- Northrop Grumman Systems Corporation
- THOMAS SCOTT GESKE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250132136
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250132184
- Publication date Apr 24, 2025
- NGK Insulators, Ltd.
- Taro USAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER...
- Publication number 20250132120
- Publication date Apr 24, 2025
- Ohio State Innovation Foundation
- Alexander REIFSNYDER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT APPARATUS AND METHODS
- Publication number 20250132122
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Thomas Izaak Fred HAARTSEN
- G01 - MEASURING TESTING
Information Patent Application
Charged Particle Beam Device
- Publication number 20250132123
- Publication date Apr 24, 2025
- Hitachi High-Tech Corporation
- Hiroyuki YAMAMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE SUPPORT DESIGNS FOR A DEPOSITION CHAMBER
- Publication number 20250132186
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Kaushik RAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM
- Publication number 20250125121
- Publication date Apr 17, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250125128
- Publication date Apr 17, 2025
- NGK Insulators, Ltd.
- Shingo AMANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETECTOR DEVICE, ELECTRON BEAM APPARATUS, AND METHOD FOR INSPECTING...
- Publication number 20250125118
- Publication date Apr 17, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Birgit Schabinger
- H01 - BASIC ELECTRIC ELEMENTS

Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stage, plasma processing apparatus, and cleaning method

Method for positioning objects in a particle beam microscope with t...

Wafer placement table

Placement stage and substrate processing apparatus

Substrate support and plasma processing apparatus

Plasma processing apparatus and mounting table thereof

Substrate processing apparatus including shower head and edge ring...

Methods of post-curing additive manufacturing parts using electron...

Vertically adjustable plasma source

Stage and substrate processing apparatus

Ceramic susceptor

Substrate holder state detection device and substrate holder state...

Systems and methods for performing sample lift-out for highly react...

Anodized titanium material and method for producing the same

Wafer chuck structure with holes in upper surface to improve temper...

Nanopositioning systems and associated methods

Wafer placement table

Device and method for sputtering and depositing metal on surface of...

Wafer placement table

Substrate processing method and substrate processing apparatus

Charged particle beam system and control method therefor

Electron beam inspection apparatus

3D fiducial for precision 3D NAND channel tilt/shift analysis

Method and apparatus for revitalizing plasma processing tools

Plasma processing apparatus

System, method and support for coating eyeglass lenses

Device and method for producing layers with improved uniformity in...

Nano-coating protection method for electrical devices

Scanning electron microscope and image generation method using scan...

Methods to eliminate of deposition on wafer bevel and backside

Patents Applicationslast 30 patents

CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE...

ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...

SYSTEMS AND METHODS FOR REDUCING IRREGULARITIES WITHIN A PLASMA-BAS...

PROCESSING CHAMBER WITH A ROTATABLE PEDESTAL HUB

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

Bowed Substrate Clamping Method, Apparatus, and System

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

Ion Milling Device

Ion Milling Device, and Inspection System

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE PROCESSING APPARATUS

ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF

ETCH UNIFORMITY IMPROVEMENT IN RADICAL ETCH USING CONFINEMENT RING

IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES

SUBSTRATE SUPPORT DEVICE AND METHOD OF CONTROLLING PREVENTION OF LE...

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...

SPUTTERING OF HIGH-QUALITY SUPERCONDUCTING THIN FILMS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER...

ASSESSMENT APPARATUS AND METHODS

Charged Particle Beam Device

SUBSTRATE SUPPORT DESIGNS FOR A DEPOSITION CHAMBER

TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM

CERAMIC SUSCEPTOR

DETECTOR DEVICE, ELECTRON BEAM APPARATUS, AND METHOD FOR INSPECTING...