pre- or post-treatments

Industry

CPC
H01L21/32138

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32138pre- or post-treatments

Industries

Patents Grantslast 30 patents

Information Patent Grant
Etching method and etching apparatus
- Patent number 11,764,070
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Satoshi Toda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 11,756,793
- Issue date Sep 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Yohei Ishii
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Designer atomic layer etching
- Patent number 11,721,558
- Issue date Aug 8, 2023
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas phase etch with controllable etch selectivity of metals
- Patent number 11,715,643
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Subhadeep Kal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron excitation atomic layer etch
- Patent number 11,637,022
- Issue date Apr 25, 2023
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,551,931
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Koji Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating layered structure
- Patent number 11,488,820
- Issue date Nov 1, 2022
- JIANGSU ADVANCED MEMORY TECHNOLOGY CO., LTD.
- Chung Hon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution for removing dry etching residue and method for m...
- Patent number 11,441,109
- Issue date Sep 13, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takahiro Kikunaga
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Etching method
- Patent number 11,404,283
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Shigeru Tahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal atomic layer etch with rapid temperature cycling
- Patent number 11,380,556
- Issue date Jul 5, 2022
- Lam Research Corporation
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,335,567
- Issue date May 17, 2022
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of workpieces using ozone gas and hydrogen radicals
- Patent number 11,315,801
- Issue date Apr 26, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Designer atomic layer etching
- Patent number 11,239,094
- Issue date Feb 1, 2022
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor arrangement and method of manufacture
- Patent number 11,217,487
- Issue date Jan 4, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Yi-Chen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch (ALE) of tungsten or other metal layers
- Patent number 11,189,499
- Issue date Nov 30, 2021
- Tokyo Electron Limited
- Yu-Hao Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and non-transitory com...
- Patent number 11,189,483
- Issue date Nov 30, 2021
- Kokusai Electric Corporation
- Yuichiro Takeshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for removing photoresist residue and/or polymer residue
- Patent number 11,091,726
- Issue date Aug 17, 2021
- Kanto Kagaku Kabushiki Kaisha
- Yasuyuki Seino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method utilizing using post etch pattern encapsulation
- Patent number 10,950,460
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Angelique Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating layered structure
- Patent number 10,903,069
- Issue date Jan 26, 2021
- JIANGSU ADVANCED MEMORY TECHNOLOGY CO., LTD.
- Chung Hon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Titanium silicide region forming method
- Patent number 10,903,086
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Hideaki Yamasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Roughness reduction methods for materials using illuminated etch so...
- Patent number 10,896,824
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Omid Zandi
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor structure and method
- Patent number 10,868,106
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing conductive line
- Patent number 10,818,513
- Issue date Oct 27, 2020
- Wuhan China Star Optoelectronics Semiconductor Display Co., Ltd.
- Pengbin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,770,308
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,714,499
- Issue date Jul 14, 2020
- SK Hynix Inc.
- Won Joon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Designer atomic layer etching
- Patent number 10,566,212
- Issue date Feb 18, 2020
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching of tantalum
- Patent number 10,566,213
- Issue date Feb 18, 2020
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of directionality in atomic layer etching
- Patent number 10,559,475
- Issue date Feb 11, 2020
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing TFT substrate and method for manufacturing...
- Patent number 10,510,785
- Issue date Dec 17, 2019
- WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Songshan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern of a film layer including aluminum, and manufacturing metho...
- Patent number 10,508,346
- Issue date Dec 17, 2019
- BOE Technology Group Co., Ltd.
- Xiaodi Huo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LOW-STRESS PASSIVATION LAYER
- Publication number 20240136291
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Ku SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIRING FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240071774
- Publication date Feb 29, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN-FREE ETCHING OF NON-VOLATILE METALS
- Publication number 20230420267
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Stephanie Oyola-Reynoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING CONTACT STRUCTURE
- Publication number 20230360969
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Ting Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EXCITATION ATOMIC LAYER ETCH
- Publication number 20230298904
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND SUBSTRATE TREATMENT METHOD
- Publication number 20230287304
- Publication date Sep 14, 2023
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SELECTIVE THERMAL ETCHING METHODS OF METAL OR METAL-CONTAINING MATE...
- Publication number 20230274947
- Publication date Aug 31, 2023
- American Air Liquide, Inc.
- Rocio Alejandra ARTEAGA MULLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF MOLYBDENUM
- Publication number 20230093011
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RECESSED METAL ETCHING METHODS
- Publication number 20230083577
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Wangkeun CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL REMOVAL METHOD, DRY ETCHING METHOD, AND PRODUCTION METHOD FOR...
- Publication number 20220325418
- Publication date Oct 13, 2022
- SHOWA DENKO K.K.
- Kazuma MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
- Publication number 20220293431
- Publication date Sep 15, 2022
- LAM RESEARCH CORPORATION
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGNER ATOMIC LAYER ETCHING
- Publication number 20220093413
- Publication date Mar 24, 2022
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL ATOMIC LAYER ETCH AND DEPOSITION APPARATUSES AND PROCESSES WI...
- Publication number 20220084838
- Publication date Mar 17, 2022
- He ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE CHAMBER FLOWABLE FILM FORMATION AND TREATMENTS
- Publication number 20220076922
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220020601
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Satoshi TODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING PLASTIC ELEMENT PROVIDED WITH FINE SURFACE ROU...
- Publication number 20220013369
- Publication date Jan 13, 2022
- Nalux Co., Ltd.
- Kenji TANIBE
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Processing of Workpieces Using Ozone Gas and Hydrogen Radicals
- Publication number 20210366727
- Publication date Nov 25, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EXCITATION ATOMIC LAYER ETCH
- Publication number 20210280433
- Publication date Sep 9, 2021
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20210217620
- Publication date Jul 15, 2021
- TOKYO ELECTRON LIMITED
- Koji KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
- Publication number 20210104414
- Publication date Apr 8, 2021
- LAM RESEARCH CORPORATION
- Theo Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20210090898
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING SOLUTION FOR REMOVING DRY ETCHING RESIDUE AND METHOD FOR M...
- Publication number 20210047594
- Publication date Feb 18, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takahiro KIKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING LAYERED STRUCTURE
- Publication number 20210028003
- Publication date Jan 28, 2021
- JIANGSU ADVANCED MEMORY TECHNOLOGY CO., LTD.
- Chung Hon LAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING LAYERED STRUCTURE
- Publication number 20200411305
- Publication date Dec 31, 2020
- JIANGSU ADVANCED MEMORY TECHNOLOGY CO., LTD.
- Chung Hon LAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20200402814
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Shigeru TAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH (ALE) OF TUNGSTEN OR OTHER METAL LAYERS
- Publication number 20200312673
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Yu-Hao Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CONDUCTIVE LINE
- Publication number 20200194279
- Publication date Jun 18, 2020
- Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Pengbin ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROUGHNESS REDUCTION METHODS FOR MATERIALS USING ILLUMINATED ETCH SO...
- Publication number 20200194278
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ARRANGEMENT AND METHOD OF MANUFACTURE
- Publication number 20200176323
- Publication date Jun 4, 2020
- Taiwan Semiconductor Manufacturing Company Limited
- Yi-Chen LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGNER ATOMIC LAYER ETCHING
- Publication number 20200118835
- Publication date Apr 16, 2020
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS

pre- or post-treatments

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Etching method and etching apparatus

Semiconductor device manufacturing method

Designer atomic layer etching

Gas phase etch with controllable etch selectivity of metals

Electron excitation atomic layer etch

Substrate processing apparatus, substrate processing method, and st...

Method of fabricating layered structure

Cleaning solution for removing dry etching residue and method for m...

Etching method

Thermal atomic layer etch with rapid temperature cycling

Etching method and etching apparatus

Processing of workpieces using ozone gas and hydrogen radicals

Designer atomic layer etching

Semiconductor arrangement and method of manufacture

Atomic layer etch (ALE) of tungsten or other metal layers

Method of manufacturing semiconductor device and non-transitory com...

Composition for removing photoresist residue and/or polymer residue

Method utilizing using post etch pattern encapsulation

Method of fabricating layered structure

Titanium silicide region forming method

Roughness reduction methods for materials using illuminated etch so...

Semiconductor structure and method

Method for manufacturing conductive line

Etching method

Method of manufacturing semiconductor device

Designer atomic layer etching

Atomic layer etching of tantalum

Control of directionality in atomic layer etching

Method for manufacturing TFT substrate and method for manufacturing...

Pattern of a film layer including aluminum, and manufacturing metho...

Patents Applicationslast 30 patents

LOW-STRESS PASSIVATION LAYER

WIRING FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

OXYGEN-FREE ETCHING OF NON-VOLATILE METALS

METHOD OF FABRICATING CONTACT STRUCTURE

ELECTRON EXCITATION ATOMIC LAYER ETCH

TREATMENT LIQUID AND SUBSTRATE TREATMENT METHOD

SELECTIVE THERMAL ETCHING METHODS OF METAL OR METAL-CONTAINING MATE...

ATOMIC LAYER ETCHING OF MOLYBDENUM

RECESSED METAL ETCHING METHODS

METAL REMOVAL METHOD, DRY ETCHING METHOD, AND PRODUCTION METHOD FOR...

THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING

DESIGNER ATOMIC LAYER ETCHING

METAL ATOMIC LAYER ETCH AND DEPOSITION APPARATUSES AND PROCESSES WI...

SINGLE CHAMBER FLOWABLE FILM FORMATION AND TREATMENTS

ETCHING METHOD AND ETCHING APPARATUS

METHOD FOR PRODUCING PLASTIC ELEMENT PROVIDED WITH FINE SURFACE ROU...

Processing of Workpieces Using Ozone Gas and Hydrogen Radicals

ELECTRON EXCITATION ATOMIC LAYER ETCH

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING

ETCHING METHOD AND ETCHING APPARATUS

CLEANING SOLUTION FOR REMOVING DRY ETCHING RESIDUE AND METHOD FOR M...

METHOD OF FABRICATING LAYERED STRUCTURE

METHOD OF FABRICATING LAYERED STRUCTURE

ETCHING METHOD

ATOMIC LAYER ETCH (ALE) OF TUNGSTEN OR OTHER METAL LAYERS

METHOD FOR MANUFACTURING CONDUCTIVE LINE

ROUGHNESS REDUCTION METHODS FOR MATERIALS USING ILLUMINATED ETCH SO...

SEMICONDUCTOR ARRANGEMENT AND METHOD OF MANUFACTURE

DESIGNER ATOMIC LAYER ETCHING