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RF capacitive coupled etch reactor
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Patent number 11,742,187
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Issue date Aug 29, 2023
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EVATEC AG
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Johannes Weichart
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Substrate processing method
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Patent number 11,705,309
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Issue date Jul 18, 2023
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Tokyo Electron Limited
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Yasutaka Hama
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Cleaning method
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Patent number 11,517,942
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Issue date Dec 6, 2022
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Edwards, S.R.O.
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Martin Zahradka
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B08 - CLEANING
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Plasma processor
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Patent number 11,508,561
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Issue date Nov 22, 2022
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FUJI CORPORATION
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Takahiro Jindo
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 11,456,157
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Issue date Sep 27, 2022
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Tokyo Electron Limited
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Jun Yoshikawa
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 11,437,224
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Issue date Sep 6, 2022
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Shibaura Mechatronics Corporation
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Hidehito Azumano
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H01 - BASIC ELECTRIC ELEMENTS
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Processing method
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Patent number 11,414,753
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Issue date Aug 16, 2022
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Tokyo Electron Limited
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Hideomi Hane
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B08 - CLEANING