Problems associated with coating

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H01J2237/3322

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3322Problems associated with coating

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma generation systems with multi-dimensional impedance matching...
- Patent number 12,080,520
- Issue date Sep 3, 2024
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for plasma processing arc suppression
- Patent number 11,972,928
- Issue date Apr 30, 2024
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,967,505
- Issue date Apr 23, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,637,015
- Issue date Apr 25, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ultra high purity conditions for atomic scale processing
- Patent number 11,631,571
- Issue date Apr 18, 2023
- Kurt J. Lesker Company
- Gilbert Bruce Rayner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc suppression device for plasma processing equipment
- Patent number 11,574,799
- Issue date Feb 7, 2023
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing material overhang in a feature of a substrate
- Patent number 11,162,170
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Alan A. Ritchie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,139,166
- Issue date Oct 5, 2021
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Arc suppression device for plasma processing equipment
- Patent number 11,114,279
- Issue date Sep 7, 2021
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt, iron, boron, and/or nickel alloy-containing articles and me...
- Patent number 11,101,118
- Issue date Aug 24, 2021
- Materion Corporation
- Xingbo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
AC power connector, sputtering apparatus and method therefor
- Patent number 10,818,475
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Frank Schnappenberger
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Reactors and methods for making diamond coatings
- Patent number 10,679,829
- Issue date Jun 9, 2020
- Nano-Product Engineering, LLC
- Vladimir Gorokhovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooled gas feed block with baffle and nozzle for HDP-CVD
- Patent number 10,662,529
- Issue date May 26, 2020
- Applied Materials, Inc.
- Govinda Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 10,522,347
- Issue date Dec 31, 2019
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for processing gas, and storage medium
- Patent number 10,410,876
- Issue date Sep 10, 2019
- Tokyo Electron Limited
- Jun Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treating arcs in a plasma process
- Patent number 10,297,431
- Issue date May 21, 2019
- TRUMPF Huettinger Sp. z o. o.
- Marcin Zelechowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for the plasma treatment of surfaces and a method for tre...
- Patent number 10,256,080
- Issue date Apr 9, 2019
- tesa SE
- Marcel Hähnel
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Cobalt, iron, boron, and/or nickel alloy-containing articles and me...
- Patent number 10,199,203
- Issue date Feb 5, 2019
- Materion Corporation
- Xingbo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and processing apparatus
- Patent number 10,062,553
- Issue date Aug 28, 2018
- Canon Anelva Corporation
- Taichi Hiromi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process tools and methods of forming devices using process tools
- Patent number 10,043,640
- Issue date Aug 7, 2018
- Infineon Technologies AG
- Manfred Engelhardt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for improved metal ion filtering
- Patent number 9,953,813
- Issue date Apr 24, 2018
- Applied Materials, Inc.
- Xianmin Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnet unit and magnetron sputtering apparatus
- Patent number 9,911,526
- Issue date Mar 6, 2018
- Canon Anelva Corporation
- Tetsuya Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide sintered body and sputtering target
- Patent number 9,905,403
- Issue date Feb 27, 2018
- Kobelco Research Institute, Inc.
- Yuki Tao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Roll-to-roll hybrid plasma modular coating system
- Patent number 9,892,889
- Issue date Feb 13, 2018
- Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan,...
- Cheng-Chang Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ITO ceramic sputtering targets with reduced In2O3 contents and meth...
- Patent number 9,885,109
- Issue date Feb 6, 2018
- Umicore
- Eugene Medvedovski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum-processing apparatus, vacuum-processing method, and storage...
- Patent number 9,790,590
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Shinji Furukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 9,773,661
- Issue date Sep 26, 2017
- Hitachi Kokusai Electric Inc.
- Takafumi Nitta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
(Ga) Zn Sn oxide sputtering target
- Patent number 9,758,856
- Issue date Sep 12, 2017
- Soleras Advanced Coatings BVBA
- Jorg Oberste Berghaus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
FePt-based sputtering target
- Patent number 9,358,612
- Issue date Jun 7, 2016
- Tanaka Kikinzoku Kogyo K.K.
- Takanobu Miyashita
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Process for producing FePt-based sputtering target
- Patent number 9,314,845
- Issue date Apr 19, 2016
- Tanaka Kikinzoku Kogyo K.K.
- Takanobu Miyashita
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20230260785
- Publication date Aug 17, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ultra High Purity Conditions for Atomic Scale Processing
- Publication number 20230230802
- Publication date Jul 20, 2023
- KURT J. LESKER COMPANY
- Gilbert Bruce Rayner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF OPERATING A PVD APPARATUS
- Publication number 20230212736
- Publication date Jul 6, 2023
- SPTS TECHNOLOGIES LIMITED
- Scott HAYMORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR PLASMA PROCESSING ARC SUPPRESSION
- Publication number 20230141067
- Publication date May 11, 2023
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION SYSTEMS WITH MULTI-DIMENSIONAL IMPEDANCE MATCHING...
- Publication number 20230104096
- Publication date Apr 6, 2023
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20220020586
- Publication date Jan 20, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
ARC SUPPRESSION DEVICE FOR PLASMA PROCESSING EQUIPMENT
- Publication number 20210391148
- Publication date Dec 16, 2021
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultra High Purity Conditions for Atomic Scale Processing
- Publication number 20210313145
- Publication date Oct 7, 2021
- KURT J. LESKER COMPANY
- Gilbert Bruce Rayner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20210180185
- Publication date Jun 17, 2021
- Kokusai Electric Corporation
- Daisuke HARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARC SUPPRESSION DEVICE FOR PLASMA PROCESSING EQUIPMENT
- Publication number 20200411290
- Publication date Dec 31, 2020
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER
- Publication number 20200194243
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- DAVID GUNTHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20200144059
- Publication date May 7, 2020
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM
- Publication number 20200066494
- Publication date Feb 27, 2020
- FUJIFILM CORPORATION
- Naoki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER HEAD AND VACUUM PROCESSING APPARATUS
- Publication number 20190055651
- Publication date Feb 21, 2019
- ULVAC, Inc.
- YOSUKE JINBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS
- Publication number 20180269045
- Publication date Sep 20, 2018
- International Business Machines Corporation
- Stephen L. Brown
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS
- Publication number 20180269044
- Publication date Sep 20, 2018
- International Business Machines Corporation
- Stephen L. Brown
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...
- Publication number 20180261438
- Publication date Sep 13, 2018
- JX NIPPON MINING & METALS CORPORATION
- Kengo Kaminaga
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Reactors For Plasma-Assisted Processes And Associated Methods
- Publication number 20180247797
- Publication date Aug 30, 2018
- Vladimir Gorokhovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ATOMIC LAYER DEPOSITION WITH POST-DOSE TREATMENT
- Publication number 20180005814
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Processing Gas, and Storage Medium
- Publication number 20170372914
- Publication date Dec 28, 2017
- TOKYO ELECTRON LIMITED
- Jun YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating Arcs in a Plasma Process
- Publication number 20170330737
- Publication date Nov 16, 2017
- TRUMPF Huettinger Sp. z o. o.
- Marcin Zelechowski
- G01 - MEASURING TESTING
Information Patent Application
COOLED GAS FEED BLOCK WITH BAFFLE AND NOZZLE FOR HDP-CVD
- Publication number 20170191161
- Publication date Jul 6, 2017
- Applied Materials, Inc.
- Govinda RAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND PROCESSING APPARATUS
- Publication number 20170140907
- Publication date May 18, 2017
- Canon ANELVA Corporation
- Taichi HIROMI
- G01 - MEASURING TESTING
Information Patent Application
Sputtering Apparatuses and Methods of Manufacturing a Magnetic Memo...
- Publication number 20170110301
- Publication date Apr 20, 2017
- Joonmyoung LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR COATING A FILM IN A CONTAINER AND METHOD FOR COATING...
- Publication number 20170062189
- Publication date Mar 2, 2017
- Industrial Technology Research Institute
- Chih-Chiang WENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROLL-TO-ROLL HYBRID PLASMA MODULAR COATING SYSTEM
- Publication number 20170040150
- Publication date Feb 9, 2017
- Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan,...
- Cheng-Chang Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OFF-AXIS SPUTTERING DEPOSITION FOR GROWTH OF SINGLE CRYSTALLINE FIL...
- Publication number 20160362812
- Publication date Dec 15, 2016
- Ohio State Innovation Foundation
- Fengyuan Yang
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20160358767
- Publication date Dec 8, 2016
- Hitachi Kokusai Electric Inc.
- Takafumi NITTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SURFACE PREPARATION OF SPUTTERING TARGET
- Publication number 20160333461
- Publication date Nov 17, 2016
- MATERION CORPORATION
- Longzhou Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AC POWER CONNECTOR, SPUTTERING APPARATUS AND METHOD THEREFOR
- Publication number 20160336151
- Publication date Nov 17, 2016
- Frank SCHNAPPENBERGER
- H01 - BASIC ELECTRIC ELEMENTS

Problems associated with coating

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma generation systems with multi-dimensional impedance matching...

Method and system for plasma processing arc suppression

Method for manufacturing sputtering target, method for forming oxid...

Method for manufacturing sputtering target, method for forming oxid...

Ultra high purity conditions for atomic scale processing

Arc suppression device for plasma processing equipment

Methods for reducing material overhang in a feature of a substrate

Method for manufacturing sputtering target, method for forming oxid...

Arc suppression device for plasma processing equipment

Cobalt, iron, boron, and/or nickel alloy-containing articles and me...

AC power connector, sputtering apparatus and method therefor

Reactors and methods for making diamond coatings

Cooled gas feed block with baffle and nozzle for HDP-CVD

Method for manufacturing sputtering target, method for forming oxid...

Apparatus and method for processing gas, and storage medium

Treating arcs in a plasma process

Apparatus for the plasma treatment of surfaces and a method for tre...

Cobalt, iron, boron, and/or nickel alloy-containing articles and me...

Sputtering apparatus and processing apparatus

Process tools and methods of forming devices using process tools

Methods and apparatus for improved metal ion filtering

Magnet unit and magnetron sputtering apparatus

Oxide sintered body and sputtering target

Roll-to-roll hybrid plasma modular coating system

ITO ceramic sputtering targets with reduced In2O3 contents and meth...

Vacuum-processing apparatus, vacuum-processing method, and storage...

Method of manufacturing semiconductor device, substrate processing...

(Ga) Zn Sn oxide sputtering target

FePt-based sputtering target

Process for producing FePt-based sputtering target

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

Ultra High Purity Conditions for Atomic Scale Processing

METHOD OF OPERATING A PVD APPARATUS

METHOD AND SYSTEM FOR PLASMA PROCESSING ARC SUPPRESSION

PLASMA GENERATION SYSTEMS WITH MULTI-DIMENSIONAL IMPEDANCE MATCHING...

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

ARC SUPPRESSION DEVICE FOR PLASMA PROCESSING EQUIPMENT

Ultra High Purity Conditions for Atomic Scale Processing

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

ARC SUPPRESSION DEVICE FOR PLASMA PROCESSING EQUIPMENT

PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM

SHOWER HEAD AND VACUUM PROCESSING APPARATUS

PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS

PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS

Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...

Reactors For Plasma-Assisted Processes And Associated Methods

SELECTIVE ATOMIC LAYER DEPOSITION WITH POST-DOSE TREATMENT

Apparatus and Method for Processing Gas, and Storage Medium

Treating Arcs in a Plasma Process

COOLED GAS FEED BLOCK WITH BAFFLE AND NOZZLE FOR HDP-CVD

SPUTTERING APPARATUS AND PROCESSING APPARATUS

Sputtering Apparatuses and Methods of Manufacturing a Magnetic Memo...

APPARATUS FOR COATING A FILM IN A CONTAINER AND METHOD FOR COATING...

ROLL-TO-ROLL HYBRID PLASMA MODULAR COATING SYSTEM

OFF-AXIS SPUTTERING DEPOSITION FOR GROWTH OF SINGLE CRYSTALLINE FIL...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHODS FOR SURFACE PREPARATION OF SPUTTERING TARGET

AC POWER CONNECTOR, SPUTTERING APPARATUS AND METHOD THEREFOR