Process monitoring

Industry

CPC
H01L21/67253

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67253Process monitoring

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Information processing apparatus, information processing method and...
- Patent number 12,228,390
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Masahide Tadokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,230,516
- Issue date Feb 18, 2025
- Semes Co., Ltd.
- Jae Oh Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive sensor for monitoring gas concentration
- Patent number 12,228,534
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, method of manufacture by monitoring relative...
- Patent number 12,230,532
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun Chen Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective component forming apparatus
- Patent number 12,230,520
- Issue date Feb 18, 2025
- Disco Corporation
- Yoshinori Kakinuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate type sensor and method of measuring the impact point and...
- Patent number 12,224,189
- Issue date Feb 11, 2025
- Semes Co., Ltd.
- Young Seop Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and apparatus for a valve assembly
- Patent number 12,224,190
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Andrew Michael Yednak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process recipe search apparatus, etching recipe search method and s...
- Patent number 12,222,690
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Takashi Dobashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for pulse width modulated dose control
- Patent number 12,215,421
- Issue date Feb 4, 2025
- Lam Research Corporation
- Mariusch Gregor
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for non-destructive inspection of cell etch redeposition
- Patent number 12,218,014
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- I-Che Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems of optical inspection of electronic device manu...
- Patent number 12,215,966
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Mohsin Waqar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial pattern loading measurement with imaging metrology
- Patent number 12,211,717
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Eric Chin Hong Ng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Deposition system and method
- Patent number 12,211,756
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device capable of controlling...
- Patent number 12,211,689
- Issue date Jan 28, 2025
- Kokusai Electric Corporation
- Keigo Nishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,211,197
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Hideji Naohara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,211,708
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Shuichi Yasuda
- B08 - CLEANING
Information Patent Grant
Impedance measurement jig and method of controlling a substrate-pro...
- Patent number 12,210,045
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Byeongsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma control method in semiconductor wafer fabrication
- Patent number 12,205,844
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Huang-Shao Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus and polishing apparatus
- Patent number 12,205,831
- Issue date Jan 21, 2025
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Method of cleaning, method of manufacturing semiconductor device, s...
- Patent number 12,195,848
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Kazuhiro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas-phase reactor system including a gas detector
- Patent number 12,195,855
- Issue date Jan 14, 2025
- ASM IP Holding B.V.
- SungBae Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for operating the same
- Patent number 12,198,953
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jia-Rong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor delivery head for preventing stiction of high aspect ratio st...
- Patent number 12,198,945
- Issue date Jan 14, 2025
- Lam Research AG
- Bhaskar Bandarapu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and processing apparatus
- Patent number 12,198,964
- Issue date Jan 14, 2025
- Toto Ltd.
- Jun Shiraishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing chamber, substrate processing system including...
- Patent number 12,191,190
- Issue date Jan 7, 2025
- Samsung Electronics Co., Ltd.
- Yongmyung Jun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning substrates using high temperature...
- Patent number 12,186,684
- Issue date Jan 7, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Fuping Chen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Nozzle having real time inspection functions
- Patent number 12,191,175
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Kai-Lin Chuang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Integrated substrate measurement system to improve manufacturing pr...
- Patent number 12,191,176
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Upendra V. Ummethala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Information handling system display backplane vapor chamber
- Patent number 12,189,370
- Issue date Jan 7, 2025
- Dell Products L.P.
- Jace W. Files
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR WAFER WET PROCESS
- Publication number 20250062141
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jie CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS AND METHOD
- Publication number 20250062140
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jieh-Chau HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250061565
- Publication date Feb 20, 2025
- SCREEN Holdings Co., Ltd.
- Hideji NAOHARA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FABRICATION AND IMPLEMENTATION OF PROCESS CONDITION MEASU...
- Publication number 20250054789
- Publication date Feb 13, 2025
- KLA Corporation
- Farhat A. Quli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING DEVICE AND EXHAUST SYSTEM THEREOF
- Publication number 20250054779
- Publication date Feb 13, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Lika WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SU...
- Publication number 20250054794
- Publication date Feb 13, 2025
- Kokusai Electric Corporation
- Yasuhiro MIZUGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250054782
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Takumi HONDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING CHAMBER, SUBSTRATE PROCESSING SYSTEM INCLUDING...
- Publication number 20250054805
- Publication date Feb 13, 2025
- SAMSUNG ELECTRONICS CoO., LTD.
- Yongmyung JUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE
- Publication number 20250046634
- Publication date Feb 6, 2025
- SAMSUNG DISPLAY CO., LTD.
- Soonjong Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT US...
- Publication number 20250046587
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Taehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...
- Publication number 20250044704
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Yuichi ASAHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER ALIGNMENT DEVICE AND METHOD AND WAFER SPEED CALCULATION METHOD
- Publication number 20250038031
- Publication date Jan 30, 2025
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- Qi YIN
- B08 - CLEANING
Information Patent Application
CONTROL AND MONITORING SYSTEM FOR GAS DELIVERY SYSTEM
- Publication number 20250038020
- Publication date Jan 30, 2025
- WATLOW ELECTRIC MANUFACTURING COMPANY
- Miranda PIZZELLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Epitaxy Process Control in Semiconductor Manufacturing
- Publication number 20250034753
- Publication date Jan 30, 2025
- ROBERT BOSCH GmbH
- Stella Maris Van Eek
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS OF ANALYZING UNIFORMITY, AND RELATED APPARATUS AND SYSTEMS,...
- Publication number 20250029850
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Kim Ramkumar VELLORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250029852
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi MARUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND PROCESS GAS SUPPLY CONTROL VERIFICA...
- Publication number 20250029851
- Publication date Jan 23, 2025
- SEMES CO., LTD.
- Tae Sung KIM
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR SEPARATING WAFER SLICES
- Publication number 20250029846
- Publication date Jan 23, 2025
- Yield Engineering Systems, Inc.
- Al Stone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIE BONDER HAVING A ROTARY BOND ARM ACTUATOR
- Publication number 20250022727
- Publication date Jan 16, 2025
- ASMPT SINGAPORE PTE. LTD
- Ka Shing KWAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING DEVICE, SEMICONDUCTOR PROCESSING SYSTEM, A...
- Publication number 20250014932
- Publication date Jan 9, 2025
- HUAYING RESEARCH CO., LTD
- Sophia Ziying WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE THICKNESS METROLOGY USING FOCUSED BEAM INTERFERENCE
- Publication number 20250012560
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Venkatakaushik Voleti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INFORMATION PROCESSING APPARATUS, ABNORMALITY DETECTION METHOD, AND...
- Publication number 20250014925
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Yuka NAKASATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATING APPARATUS, SEPARATING SYSTEM AND SEPARATING METHOD
- Publication number 20250014916
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Naoto Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, METHOD...
- Publication number 20250014924
- Publication date Jan 9, 2025
- Kokusai Electric Corporation
- Tsukasa KAMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS APPARATUS INCLUDING GAS SUPPLIER AND METHOD OF OPERATING TH...
- Publication number 20250010257
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- Dongsik Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...
- Publication number 20250014923
- Publication date Jan 9, 2025
- Hitachi High-Tech Corporation
- Satoshi MURASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATING APPARATUS, SEPARATING SYSTEM AND SEPARATING METHOD
- Publication number 20250014917
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Naoto Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTIL...
- Publication number 20250004384
- Publication date Jan 2, 2025
- KLA Corporation
- Zhaxylyk Kudyshev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250006525
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Takeshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND...
- Publication number 20250005737
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- G06 - COMPUTING CALCULATING COUNTING

Process monitoring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Information processing apparatus, information processing method and...

Substrate treating apparatus and substrate treating method

Capacitive sensor for monitoring gas concentration

Semiconductor device, method of manufacture by monitoring relative...

Protective component forming apparatus

Substrate type sensor and method of measuring the impact point and...

System and apparatus for a valve assembly

Process recipe search apparatus, etching recipe search method and s...

Interferometer systems and methods for real time etch process compe...

Systems and methods for pulse width modulated dose control

Method for non-destructive inspection of cell etch redeposition

Methods and systems of optical inspection of electronic device manu...

Spatial pattern loading measurement with imaging metrology

Deposition system and method

Method of manufacturing semiconductor device capable of controlling...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Impedance measurement jig and method of controlling a substrate-pro...

Plasma control method in semiconductor wafer fabrication

Cleaning apparatus and polishing apparatus

Method of cleaning, method of manufacturing semiconductor device, s...

Gas-phase reactor system including a gas detector

System and method for operating the same

Vapor delivery head for preventing stiction of high aspect ratio st...

Electrostatic chuck and processing apparatus

Substrate processing chamber, substrate processing system including...

Method and apparatus for cleaning substrates using high temperature...

Nozzle having real time inspection functions

Integrated substrate measurement system to improve manufacturing pr...

Information handling system display backplane vapor chamber

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR WAFER WET PROCESS

WAFER CLEANING APPARATUS AND METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD OF FABRICATION AND IMPLEMENTATION OF PROCESS CONDITION MEASU...

SEMICONDUCTOR PROCESSING DEVICE AND EXHAUST SYSTEM THEREOF

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SU...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING CHAMBER, SUBSTRATE PROCESSING SYSTEM INCLUDING...

APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE

PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT US...

SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...

WAFER ALIGNMENT DEVICE AND METHOD AND WAFER SPEED CALCULATION METHOD

CONTROL AND MONITORING SYSTEM FOR GAS DELIVERY SYSTEM

Epitaxy Process Control in Semiconductor Manufacturing

METHODS OF ANALYZING UNIFORMITY, AND RELATED APPARATUS AND SYSTEMS,...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING SYSTEM AND PROCESS GAS SUPPLY CONTROL VERIFICA...

APPARATUS AND METHOD FOR SEPARATING WAFER SLICES

DIE BONDER HAVING A ROTARY BOND ARM ACTUATOR

SEMICONDUCTOR PROCESSING DEVICE, SEMICONDUCTOR PROCESSING SYSTEM, A...

SAMPLE THICKNESS METROLOGY USING FOCUSED BEAM INTERFERENCE

INFORMATION PROCESSING APPARATUS, ABNORMALITY DETECTION METHOD, AND...

SEPARATING APPARATUS, SEPARATING SYSTEM AND SEPARATING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, METHOD...

PROCESS APPARATUS INCLUDING GAS SUPPLIER AND METHOD OF OPERATING TH...

DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...

SEPARATING APPARATUS, SEPARATING SYSTEM AND SEPARATING METHOD

METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTIL...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND...