Process specially adapted to improve the resolution of the mask

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H01L21/0338

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0338Process specially adapted to improve the resolution of the mask

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Dynamic random access memory device with active regions of differen...
- Patent number 12,334,345
- Issue date Jun 17, 2025
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yaoguang Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-dimension self-aligned scheme with subtractive metal etch
- Patent number 12,327,764
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch scaling in microfabrication
- Patent number 12,322,597
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 12,315,727
- Issue date May 27, 2025
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for non-resist nanolithography
- Patent number 12,308,368
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual critical dimension patterning
- Patent number 12,308,233
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Chang Kau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 12,288,689
- Issue date Apr 29, 2025
- Winbond Electronics Corp.
- Pei-Hsiu Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming patterned mask layer
- Patent number 12,266,528
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning semiconductor devices and structures resulting therefrom
- Patent number 12,266,529
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,218,004
- Issue date Feb 4, 2025
- Semiconductor Manufacturing International (Shanghai) Corporation
- He Zuopeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high modulus and etch selectivity boron-carbon hardmask films
- Patent number 12,211,694
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of semiconductor structure and semiconductor structure
- Patent number 12,198,933
- Issue date Jan 14, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- ChihCheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 12,191,299
- Issue date Jan 7, 2025
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,183,580
- Issue date Dec 31, 2024
- SK Hynix Inc.
- Ji Hoon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure and semiconductor stru...
- Patent number 12,170,201
- Issue date Dec 17, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask structure, semiconductor structure and methods for manufacturi...
- Patent number 12,148,618
- Issue date Nov 19, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Penghui Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern
- Patent number 12,125,704
- Issue date Oct 22, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,112,979
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yan-Jhi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,112,949
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Double-patterning method to improve sidewall uniformity
- Patent number 12,106,964
- Issue date Oct 1, 2024
- Winbond Electronics Corp.
- Chu-Chun Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming self-aligned double pattern and semiconductor st...
- Patent number 12,100,593
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhongming Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active region array formation method
- Patent number 12,100,594
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- ChihCheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, semiconductor structure and method for fabric...
- Patent number 12,094,718
- Issue date Sep 17, 2024
- NANYA TECHNOLOGY CORPORATION
- Huan-Yung Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Improving resolution of masks for semiconductor manufacture
- Patent number 12,087,582
- Issue date Sep 10, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jisong Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,080,553
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processes for reducing line-end spacing
- Patent number 12,068,168
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Yen Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF FORMING NANOSTRUCTURES UTILIZING SELF-ASSEMBLED NUCLEIC...
- Publication number 20250166993
- Publication date May 22, 2025
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250087488
- Publication date Mar 13, 2025
- SK HYNIX INC.
- Ji Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE
- Publication number 20250079174
- Publication date Mar 6, 2025
- Tokyo Election Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION
- Publication number 20240379358
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsong-Hua Ou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Semiconductor Devices and Structures Resulting Therefrom
- Publication number 20240379359
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363349
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR REDUCING LINE-END SPACING
- Publication number 20240355633
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Yen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240297042
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Min HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240234144
- Publication date Jul 11, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240234145
- Publication date Jul 11, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20240222131
- Publication date Jul 4, 2024
- Lodestar Licensing Group LLC
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE, METHOD FOR FABRICATING THEREOF, AND METHOD...
- Publication number 20240222124
- Publication date Jul 4, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Gang-Yi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DIST...
- Publication number 20240178002
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Sung Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Patterning and Resulting Structures
- Publication number 20240177995
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH LINING LAYER
- Publication number 20240153772
- Publication date May 9, 2024
- NANYA TECHNOLOGY CORPORATION
- Ping HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240136185
- Publication date Apr 25, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240136186
- Publication date Apr 25, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240120329
- Publication date Apr 11, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20240096595
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME
- Publication number 20240096628
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bao-Chin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING MANDRELS AND SPACERS, RELATED STRUCTURES, AND S...
- Publication number 20240087893
- Publication date Mar 14, 2024
- ASM IP HOLDING, B.V.
- Daniele Piumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE-END EXTENSION METHOD AND DEVICE
- Publication number 20240087896
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Min HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning a Semiconductor Substrate
- Publication number 20240063019
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Alexandra Krawicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Semiconductor Devices and Structures Resulting Therefrom
- Publication number 20240063020
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...
- Publication number 20240047217
- Publication date Feb 8, 2024
- NANYA TECHNOLOGY CORPORATION
- HUAN-YUNG YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON HARDMASK OPENING USING BORON NITRIDE MASK
- Publication number 20240014039
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Jeong Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20240006178
- Publication date Jan 4, 2024
- WINBOND ELECTRONICS CORP.
- Pei-Hsiu Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED MASK LAYER
- Publication number 20230352303
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chen CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD TO REDUCE SPACING BETWEEN INTERCONNECT WIRES IN...
- Publication number 20230335433
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...
- Publication number 20230335408
- Publication date Oct 19, 2023
- NANYA TECHNOLOGY CORPORATION
- HUAN-YUNG YEH
- H01 - BASIC ELECTRIC ELEMENTS

Process specially adapted to improve the resolution of the mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dynamic random access memory device with active regions of differen...

Two-dimension self-aligned scheme with subtractive metal etch

Pitch scaling in microfabrication

Eliminating yield impact of stochastics in lithography

Method for non-resist nanolithography

Dual critical dimension patterning

Semiconductor structure

Film deposition apparatus for fine pattern forming

Selective deposition of carbon on photoresist layer for lithography...

Method for forming patterned mask layer

Patterning semiconductor devices and structures resulting therefrom

Method for reducing lithography defects and pattern transfer

Semiconductor manufacturing system, method of manufacturing a semic...

Method for forming semiconductor structure

Ultra-high modulus and etch selectivity boron-carbon hardmask films

Forming method of semiconductor structure and semiconductor structure

Method of fabricating semiconductor device

Method of manufacturing a semiconductor device

Method for preparing semiconductor structure and semiconductor stru...

Mask structure, semiconductor structure and methods for manufacturi...

Method for forming pattern

Semiconductor device and manufacturing method thereof

Highly etch selective amorphous carbon film

Double-patterning method to improve sidewall uniformity

Method for forming self-aligned double pattern and semiconductor st...

Active region array formation method

Semiconductor device, semiconductor structure and method for fabric...

Improving resolution of masks for semiconductor manufacture

Semiconductor device and method of manufacture

Processes for reducing line-end spacing

Patents Applicationslast 30 patents

METHODS OF FORMING NANOSTRUCTURES UTILIZING SELF-ASSEMBLED NUCLEIC...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD FOR PROCESSING A SUBSTRATE

METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION

Patterning Semiconductor Devices and Structures Resulting Therefrom

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

PROCESSES FOR REDUCING LINE-END SPACING

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

SEMICONDUCTOR STRUCTURE, METHOD FOR FABRICATING THEREOF, AND METHOD...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DIST...

Semiconductor Patterning and Resulting Structures

METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH LINING LAYER

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME

METHODS FOR FORMING MANDRELS AND SPACERS, RELATED STRUCTURES, AND S...

LINE-END EXTENSION METHOD AND DEVICE

Patterning a Semiconductor Substrate

Patterning Semiconductor Devices and Structures Resulting Therefrom

SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...

CARBON HARDMASK OPENING USING BORON NITRIDE MASK

SEMICONDUCTOR STRUCTURE

METHOD FOR FORMING PATTERNED MASK LAYER

LITHOGRAPHY METHOD TO REDUCE SPACING BETWEEN INTERCONNECT WIRES IN...

SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...