Process specially adapted to improve the resolution of the mask

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H01L21/0338

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0338Process specially adapted to improve the resolution of the mask

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for preparing semiconductor structure and semiconductor stru...
- Patent number 12,170,201
- Issue date Dec 17, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask structure, semiconductor structure and methods for manufacturi...
- Patent number 12,148,618
- Issue date Nov 19, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Penghui Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern
- Patent number 12,125,704
- Issue date Oct 22, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,112,979
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yan-Jhi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,112,949
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Double-patterning method to improve sidewall uniformity
- Patent number 12,106,964
- Issue date Oct 1, 2024
- Winbond Electronics Corp.
- Chu-Chun Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming self-aligned double pattern and semiconductor st...
- Patent number 12,100,593
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhongming Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active region array formation method
- Patent number 12,100,594
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- ChihCheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, semiconductor structure and method for fabric...
- Patent number 12,094,718
- Issue date Sep 17, 2024
- NANYA TECHNOLOGY CORPORATION
- Huan-Yung Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Improving resolution of masks for semiconductor manufacture
- Patent number 12,087,582
- Issue date Sep 10, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jisong Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,080,553
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processes for reducing line-end spacing
- Patent number 12,068,168
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Yen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line-end extension method and device
- Patent number 12,062,543
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Min Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image-guided adjustment to super-resolution operations
- Patent number 12,062,151
- Issue date Aug 13, 2024
- Mediatek Inc.
- Ming-En Shih
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 12,027,370
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming nanostructures using self-assembled nucleic acid...
- Patent number RE50029
- Issue date Jul 2, 2024
- Micron Technology, Inc.
- Scott E. Sills
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,014,927
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self aligned litho etch process patterning method
- Patent number 12,014,926
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Min Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography method to reduce spacing between interconnect wires in...
- Patent number 12,014,952
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with reduced critical dimensions
- Patent number 12,009,212
- Issue date Jun 11, 2024
- NANYA TECHNOLOGY CORPORATION
- Kuo-Hui Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and methods of forming the same
- Patent number 12,002,710
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Hsin Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tip-to-tip graphic preparation method
- Patent number 12,002,682
- Issue date Jun 4, 2024
- Shanghai IC R&D Center Co., Ltd.
- Yanli Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning methods for semiconductor devices and structures resulti...
- Patent number 12,002,711
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tai-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,001,138
- Issue date Jun 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yusuke Kai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor structure, method for fabricating thereof, and method...
- Patent number 11,996,290
- Issue date May 28, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Gang-Yi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming contact holes with controlled local critical dimension unif...
- Patent number 11,978,631
- Issue date May 7, 2024
- Tokyo Electron Limited
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,935,756
- Issue date Mar 19, 2024
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor patterning and resulting structures
- Patent number 11,929,254
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of high-density pattern forming
- Patent number 11,929,255
- Issue date Mar 12, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chen En Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming nanostructures utilizing self-assembled nucleic...
- Patent number 11,923,197
- Issue date Mar 5, 2024
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION
- Publication number 20240379358
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsong-Hua Ou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Semiconductor Devices and Structures Resulting Therefrom
- Publication number 20240379359
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363349
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR REDUCING LINE-END SPACING
- Publication number 20240355633
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Yen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240297042
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Min HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240234144
- Publication date Jul 11, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240234145
- Publication date Jul 11, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20240222131
- Publication date Jul 4, 2024
- Lodestar Licensing Group LLC
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE, METHOD FOR FABRICATING THEREOF, AND METHOD...
- Publication number 20240222124
- Publication date Jul 4, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Gang-Yi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DIST...
- Publication number 20240178002
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Sung Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Patterning and Resulting Structures
- Publication number 20240177995
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH LINING LAYER
- Publication number 20240153772
- Publication date May 9, 2024
- NANYA TECHNOLOGY CORPORATION
- Ping HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240136185
- Publication date Apr 25, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...
- Publication number 20240136186
- Publication date Apr 25, 2024
- NANYA TECHNOLOGY CORPORATION
- Chih-Ching LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240120329
- Publication date Apr 11, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20240096595
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME
- Publication number 20240096628
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bao-Chin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING MANDRELS AND SPACERS, RELATED STRUCTURES, AND S...
- Publication number 20240087893
- Publication date Mar 14, 2024
- ASM IP HOLDING, B.V.
- Daniele Piumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE-END EXTENSION METHOD AND DEVICE
- Publication number 20240087896
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Min HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning a Semiconductor Substrate
- Publication number 20240063019
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Alexandra Krawicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Semiconductor Devices and Structures Resulting Therefrom
- Publication number 20240063020
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...
- Publication number 20240047217
- Publication date Feb 8, 2024
- NANYA TECHNOLOGY CORPORATION
- HUAN-YUNG YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON HARDMASK OPENING USING BORON NITRIDE MASK
- Publication number 20240014039
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Jeong Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20240006178
- Publication date Jan 4, 2024
- WINBOND ELECTRONICS CORP.
- Pei-Hsiu Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED MASK LAYER
- Publication number 20230352303
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chen CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD TO REDUCE SPACING BETWEEN INTERCONNECT WIRES IN...
- Publication number 20230335433
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...
- Publication number 20230335408
- Publication date Oct 19, 2023
- NANYA TECHNOLOGY CORPORATION
- HUAN-YUNG YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Features with Metal Based Resists
- Publication number 20230326755
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20230317454
- Publication date Oct 5, 2023
- SK HYNIX INC.
- Ji Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS
- Publication number 20230317455
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Prashant Kumar KULSHRESHTHA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Process specially adapted to improve the resolution of the mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for preparing semiconductor structure and semiconductor stru...

Mask structure, semiconductor structure and methods for manufacturi...

Method for forming pattern

Semiconductor device and manufacturing method thereof

Highly etch selective amorphous carbon film

Double-patterning method to improve sidewall uniformity

Method for forming self-aligned double pattern and semiconductor st...

Active region array formation method

Semiconductor device, semiconductor structure and method for fabric...

Improving resolution of masks for semiconductor manufacture

Semiconductor device and method of manufacture

Processes for reducing line-end spacing

Line-end extension method and device

Image-guided adjustment to super-resolution operations

Method of forming an integrated circuit using a patterned mask layer

Methods of forming nanostructures using self-assembled nucleic acid...

Highly etch selective amorphous carbon film

Self aligned litho etch process patterning method

Lithography method to reduce spacing between interconnect wires in...

Semiconductor device with reduced critical dimensions

Semiconductor structure and methods of forming the same

Tip-to-tip graphic preparation method

Patterning methods for semiconductor devices and structures resulti...

Composition for forming silicon-containing resist underlayer film a...

Semiconductor structure, method for fabricating thereof, and method...

Forming contact holes with controlled local critical dimension unif...

Pitch reduction technology using alternating spacer depositions dur...

Semiconductor patterning and resulting structures

Method of high-density pattern forming

Methods of forming nanostructures utilizing self-assembled nucleic...

Patents Applicationslast 30 patents

METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION

Patterning Semiconductor Devices and Structures Resulting Therefrom

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

PROCESSES FOR REDUCING LINE-END SPACING

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

SEMICONDUCTOR STRUCTURE, METHOD FOR FABRICATING THEREOF, AND METHOD...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DIST...

Semiconductor Patterning and Resulting Structures

METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH LINING LAYER

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PAT...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME

METHODS FOR FORMING MANDRELS AND SPACERS, RELATED STRUCTURES, AND S...

LINE-END EXTENSION METHOD AND DEVICE

Patterning a Semiconductor Substrate

Patterning Semiconductor Devices and Structures Resulting Therefrom

SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...

CARBON HARDMASK OPENING USING BORON NITRIDE MASK

SEMICONDUCTOR STRUCTURE

METHOD FOR FORMING PATTERNED MASK LAYER

LITHOGRAPHY METHOD TO REDUCE SPACING BETWEEN INTERCONNECT WIRES IN...

SEMICONDUCTOR DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRIC...

Patterning Features with Metal Based Resists

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

ULTRA-HIGH MODULUS AND ETCH SELECTIVITY BORON-CARBON HARDMASK FILMS