Processing objects on a macro-scale

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H01J2237/31

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31Processing objects on a macro-scale

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ion milling device
- Patent number 12,224,155
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for preparing a microscopic sample from a volume...
- Patent number 12,198,895
- Issue date Jan 14, 2025
- Carl Zeiss Microscopy GmbH
- Fabian Perez Willard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,552
- Issue date Dec 31, 2024
- KELK Ltd.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and imaging method
- Patent number 12,183,542
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroki Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam chamber fluid delivery apparatus and method and ion beam e...
- Patent number 12,176,177
- Issue date Dec 24, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single beam plasma source
- Patent number 12,165,829
- Issue date Dec 10, 2024
- Board of Trustees of Michigan State University
- Qi Hua Fan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,165,832
- Issue date Dec 10, 2024
- FEI Company
- Adam Stokes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas phase sample preparation for cryo-electron microscopy
- Patent number 12,130,217
- Issue date Oct 29, 2024
- Wisconsin Alumni Research Foundation
- Joshua Coon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Systems and methods for pre-aligning samples for more efficient pro...
- Patent number 12,106,931
- Issue date Oct 1, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus and computer program for analyzing and/or process...
- Patent number 12,105,415
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Oliver Jäckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography with dynamic fin overlay correction
- Patent number 12,099,304
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Simon Dawes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing a sidewall of hole milled in a sample to determine thickn...
- Patent number 12,033,831
- Issue date Jul 9, 2024
- Applied Materials Israel Ltd.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,020,892
- Issue date Jun 25, 2024
- Kioxia Corporation
- Yusuke Goki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, devices, and methods for aligning a particle beam and perf...
- Patent number 12,020,897
- Issue date Jun 25, 2024
- PDF Solutions, Inc.
- Indranil De
- G01 - MEASURING TESTING
Information Patent Grant
Method for cross-section sample preparation
- Patent number 12,007,344
- Issue date Jun 11, 2024
- Fibics Incorporated
- Michael William Phaneuf
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for cross-sectioning a sample with a preset thick...
- Patent number RE50001
- Issue date Jun 4, 2024
- FIBICS INCORPORATED
- Michael William Phaneuf
Information Patent Grant
Adjustable support for arc chamber of ion source
- Patent number 12,002,647
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Tang Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-tuned ultrafast X-ray shutter using optics-on-a-chip
- Patent number 11,996,210
- Issue date May 28, 2024
- UChicago Argonne, LLC
- Jin Wang
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN
- Publication number 20250054720
- Publication date Feb 13, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEM NAVIGATION BY FOCUSED ION BEAM SYSTEM WITH CRYO COOLING SAMPLE...
- Publication number 20250046568
- Publication date Feb 6, 2025
- FEI Company
- Libor Strakoš
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JIG AND SAMPLE PROCESSING METHOD
- Publication number 20250037964
- Publication date Jan 30, 2025
- KIOXIA Corporation
- Takafumi INAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20250040442
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...
- Publication number 20250022680
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Dmitry Klochkov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...
- Publication number 20240404786
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Ivo IHRKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENTROPY BASED IMAGE PROCESSING FOR FOCUSED ION BEAM DELAYER – EDGE...
- Publication number 20240379327
- Publication date Nov 14, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yuval Tsedek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM DEVICE
- Publication number 20240355574
- Publication date Oct 24, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR PREPARING MICROSCOPIC SAMPLES VIA BACKSIDE TH...
- Publication number 20240347312
- Publication date Oct 17, 2024
- CARL ZEISS MICROSCOPY GMBH
- Heiko Stegmann
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS
- Publication number 20240339289
- Publication date Oct 10, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Adar Sonn-Segev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS
- Publication number 20240331973
- Publication date Oct 3, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...
- Publication number 20240331969
- Publication date Oct 3, 2024
- FEI Company
- Chad Rue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Actively Cooled Gas Line For Ion Source
- Publication number 20240331972
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuit with FIB-Ready Structures
- Publication number 20240321548
- Publication date Sep 26, 2024
- Nuvoton Technology Corporation
- Yuval Kirschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT
- Publication number 20240310722
- Publication date Sep 19, 2024
- Carl Zeiss SMT GMBH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20240304414
- Publication date Sep 12, 2024
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING

Processing objects on a macro-scale

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion milling device

Method and device for preparing a microscopic sample from a volume...

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Substrate processing apparatus

Transmission electron microscope and imaging method

Ion beam chamber fluid delivery apparatus and method and ion beam e...

Method for producing lamella, analysis system and method for analyz...

Single beam plasma source

Systems and methods for performing sample lift-out for highly react...

Automated ion-beam alignment for dual-beam instrument

Ion beam device

Gas phase sample preparation for cryo-electron microscopy

Ion beam processing apparatus, electrode assembly, and method of cl...

Systems and methods for pre-aligning samples for more efficient pro...

Modulation of rolling k vectors of angled gratings

Scanned angled etching apparatus and techniques providing separate...

Apparatus and methods for beam processing of substrates

Method, apparatus and computer program for analyzing and/or process...

Electron beam lithography with dynamic fin overlay correction

Multi-charged particle beam writing apparatus, and multi-charged pa...

Energy filter element for ion implantation systems for the use in t...

Method of manufacturing photo masks

Analyzing a sidewall of hole milled in a sample to determine thickn...

Etching apparatus and etching method

Systems, devices, and methods for aligning a particle beam and perf...

Method for cross-section sample preparation

Method and system for cross-sectioning a sample with a preset thick...

Adjustable support for arc chamber of ion source

Temperature-tuned ultrafast X-ray shutter using optics-on-a-chip

Patents Applicationslast 30 patents

ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN

SEM NAVIGATION BY FOCUSED ION BEAM SYSTEM WITH CRYO COOLING SAMPLE...

JIG AND SAMPLE PROCESSING METHOD

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

ION IMPLANTER AND ION IMPLANTATION METHOD

METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...

COMPENSATION RASTER SCANNING

ENTROPY BASED IMAGE PROCESSING FOR FOCUSED ION BEAM DELAYER – EDGE...

FOCUSED ION BEAM SYSTEM

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

FOCUSED ION BEAM DEVICE

DEVICE AND METHOD FOR PREPARING MICROSCOPIC SAMPLES VIA BACKSIDE TH...

METHOD OF MANUFACTURING PHOTO MASKS

FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS

ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS

CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...

Actively Cooled Gas Line For Ion Source

Integrated Circuit with FIB-Ready Structures

METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...