Processing objects on a macro-scale

Industry

CPC
H01J2237/31

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31Processing objects on a macro-scale

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for forming a three-dimensional article
- Patent number 12,269,092
- Issue date Apr 8, 2025
- Arcam AB
- Safdar Ali
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
3D metrology from 3D datacube created from stack of registered imag...
- Patent number 12,272,518
- Issue date Apr 8, 2025
- Applied Materials Israel Ltd.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D fiducial for precision 3D NAND channel tilt/shift analysis
- Patent number 12,260,583
- Issue date Mar 25, 2025
- FEI Company
- Mark Najarian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fiducial guided cross-sectioning and lamella preparation with tomog...
- Patent number 12,255,044
- Issue date Mar 18, 2025
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transmission charged particle microscope with an electron energy lo...
- Patent number 12,255,045
- Issue date Mar 18, 2025
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter, ion implantation method, and semiconductor device ma...
- Patent number 12,255,039
- Issue date Mar 18, 2025
- Sumitomo Heavy Industries, Ltd.
- Sayumi Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam sputtering apparatus and method
- Patent number 12,243,715
- Issue date Mar 4, 2025
- Institute of Geological and Nuclear Sciences Limited
- Richard John Futter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of plasma resistant oxyfluoride coating layer
- Patent number 12,237,153
- Issue date Feb 25, 2025
- KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY
- Sung min Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and system and method using electron gun
- Patent number 12,237,140
- Issue date Feb 25, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Effective temperature calculation method for multi-charged particle...
- Patent number 12,230,472
- Issue date Feb 18, 2025
- NuFlare Technology, Inc.
- Shingo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recovery of a hierarchical functional representation of an integrat...
- Patent number 12,229,482
- Issue date Feb 18, 2025
- Battelle Memorial Institute
- Adam G. Kimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Temperature-controlled surface with a cryo-nanomanipulator for impr...
- Patent number 12,230,473
- Issue date Feb 18, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion milling device
- Patent number 12,224,155
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for preparing a microscopic sample from a volume...
- Patent number 12,198,895
- Issue date Jan 14, 2025
- Carl Zeiss Microscopy GmbH
- Fabian Perez Willard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,552
- Issue date Dec 31, 2024
- KELK Ltd.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and imaging method
- Patent number 12,183,542
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroki Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam chamber fluid delivery apparatus and method and ion beam e...
- Patent number 12,176,177
- Issue date Dec 24, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single beam plasma source
- Patent number 12,165,829
- Issue date Dec 10, 2024
- Board of Trustees of Michigan State University
- Qi Hua Fan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,165,832
- Issue date Dec 10, 2024
- FEI Company
- Adam Stokes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas phase sample preparation for cryo-electron microscopy
- Patent number 12,130,217
- Issue date Oct 29, 2024
- Wisconsin Alumni Research Foundation
- Joshua Coon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Systems and methods for pre-aligning samples for more efficient pro...
- Patent number 12,106,931
- Issue date Oct 1, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM CURING OF CLEAR AND PIGMENTED COATINGS FOR THE COIL I...
- Publication number 20250112025
- Publication date Apr 3, 2025
- Energy Sciences Inc.
- Imtiaz Rangwalla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System
- Publication number 20250109481
- Publication date Apr 3, 2025
- JEOL Ltd.
- Noriaki Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADAPTIVE SLICE DEPTH IN SLICE & VIEW WORKFLOW
- Publication number 20250112024
- Publication date Apr 3, 2025
- FEI Company
- Jirí Vítecek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ANGLE ROTATION AND SAMPLE ROTATION
- Publication number 20250104963
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Thomas Korb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PERFORMING SAMPLE LIFT-OUT FOR HIGHLY REACT...
- Publication number 20250095953
- Publication date Mar 20, 2025
- FEI Company
- Adam STOKES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYERING APPARATUS AND METHODS
- Publication number 20250095959
- Publication date Mar 20, 2025
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Publication number 20250095949
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Christopher A. Rowland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSCALE FAILURE ANALYSIS METHOD
- Publication number 20250087453
- Publication date Mar 13, 2025
- Shanghai Huali Microeloctronics Corporation
- Yunong Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTIC...
- Publication number 20250079120
- Publication date Mar 6, 2025
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ION BEAM ANGLE MEASUREMENT
- Publication number 20250069850
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...
- Publication number 20250069958
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Alex Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20250069848
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Kazuya HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN
- Publication number 20250054720
- Publication date Feb 13, 2025
- Ralf Edinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEM NAVIGATION BY FOCUSED ION BEAM SYSTEM WITH CRYO COOLING SAMPLE...
- Publication number 20250046568
- Publication date Feb 6, 2025
- FEI Company
- Libor Strakoš
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JIG AND SAMPLE PROCESSING METHOD
- Publication number 20250037964
- Publication date Jan 30, 2025
- KIOXIA Corporation
- Takafumi INAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20250040442
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...
- Publication number 20250022680
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Dmitry Klochkov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...
- Publication number 20250014854
- Publication date Jan 9, 2025
- mi2-factory GmbH
- Florian KRIPPENDORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20240429022
- Publication date Dec 26, 2024
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...
- Publication number 20240404786
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Ivo IHRKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENTROPY BASED IMAGE PROCESSING FOR FOCUSED ION BEAM DELAYER – EDGE...
- Publication number 20240379327
- Publication date Nov 14, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yuval Tsedek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM DEVICE
- Publication number 20240355574
- Publication date Oct 24, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS

Processing objects on a macro-scale

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for forming a three-dimensional article

3D metrology from 3D datacube created from stack of registered imag...

3D fiducial for precision 3D NAND channel tilt/shift analysis

Fiducial guided cross-sectioning and lamella preparation with tomog...

Transmission charged particle microscope with an electron energy lo...

Ion implanter, ion implantation method, and semiconductor device ma...

Method and system for determining a charged particle beam exposure...

Ion beam sputtering apparatus and method

Forming method of plasma resistant oxyfluoride coating layer

Electron gun and system and method using electron gun

Effective temperature calculation method for multi-charged particle...

Recovery of a hierarchical functional representation of an integrat...

Temperature-controlled surface with a cryo-nanomanipulator for impr...

Ion milling device

Method and device for preparing a microscopic sample from a volume...

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Substrate processing apparatus

Transmission electron microscope and imaging method

Ion beam chamber fluid delivery apparatus and method and ion beam e...

Method for producing lamella, analysis system and method for analyz...

Single beam plasma source

Systems and methods for performing sample lift-out for highly react...

Automated ion-beam alignment for dual-beam instrument

Ion beam device

Gas phase sample preparation for cryo-electron microscopy

Ion beam processing apparatus, electrode assembly, and method of cl...

Systems and methods for pre-aligning samples for more efficient pro...

Modulation of rolling k vectors of angled gratings

Scanned angled etching apparatus and techniques providing separate...

Patents Applicationslast 30 patents

ELECTRON BEAM CURING OF CLEAR AND PIGMENTED COATINGS FOR THE COIL I...

Focused Ion Beam System

ADAPTIVE SLICE DEPTH IN SLICE & VIEW WORKFLOW

BEAM ANGLE ROTATION AND SAMPLE ROTATION

SYSTEMS AND METHODS FOR PERFORMING SAMPLE LIFT-OUT FOR HIGHLY REACT...

DELAYERING APPARATUS AND METHODS

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

NANOSCALE FAILURE ANALYSIS METHOD

MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTIC...

IN-SITU ION BEAM ANGLE MEASUREMENT

DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...

CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN

SEM NAVIGATION BY FOCUSED ION BEAM SYSTEM WITH CRYO COOLING SAMPLE...

JIG AND SAMPLE PROCESSING METHOD

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN T...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

ION IMPLANTER AND ION IMPLANTATION METHOD

METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...

COMPENSATION RASTER SCANNING

ENTROPY BASED IMAGE PROCESSING FOR FOCUSED ION BEAM DELAYER – EDGE...

FOCUSED ION BEAM SYSTEM

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

FOCUSED ION BEAM DEVICE